Photocurable composition

Abstract

The photocurable composition may include a polymerizable material and an initiator. The polymerizable material may include at least one first polyfunctional monomer containing an allyloxymethyl methacrylate structure in an amount of at least 5 wt% and 20 wt% or less based on the polymerizable material. The photocurable composition may be suitable for use in inkjet adaptive planarization and may be adapted to form a cured layer having a glass transition temperature of at least 120°C.

Description

Technology Field

[0001] The present disclosure relates to a photocurable composition, in particular a photocurable composition for inkjet adaptive planarization comprising a monomer having an allyloxymethyl acrylate structure. Background Technology

[0002] Inkjet adaptive planarization (IAP) is a process for planarizing the surface of a substrate, for example, a wafer containing electronic circuits, by spraying liquid droplets of a curable composition onto the surface of a substrate and bringing a flat superstrate into direct contact with the added liquid to form a flat liquid layer. The flat liquid layer typically solidifies under UV light exposure, and a flat surface is obtained to which subsequent processing steps, such as baking, etching, and / or additional deposition steps, can be applied after the removal of the superstrate. There is a need for improved IAP materials that lead to a flat-cured layer with a high glass transition temperature and improved dry etch performance.

[0003] summation

[0004] In one embodiment, the photocurable composition may comprise a polymerizable material and a photoinitiator, wherein the polymerizable material may comprise at least one polyfunctional monomer of formula (1) in an amount of at least 5 wt% and 20 wt% or less based on the total weight of the polymerizable material, and

[0005]

[0006] (where R is a C1-C6 alkyl, alkyl-aryl, or aryl),

[0007] The above composition can be adapted to form a cured layer having a glass transition temperature of at least 120°C.

[0008] In one aspect, the amount of at least one first polyfunctional monomer may be 15 wt% or less based on the total weight of the polymerizable material.

[0009] In another specific aspect, the amount of at least one first polyfunctional monomer may be 10 wt% or less based on the total weight of the polymerizable material.

[0010] In another specific aspect, R of the monomer of chemical formula (1) may include methyl or benzyl.

[0011] In addition, the viscosity of the photocurable composition may be 15 mPa·s or less.

[0012] In another aspect, the amount of polymerizable material of the photocurable composition may be at least 95 wt% based on the total weight of the photocurable composition.

[0013] In one aspect, the polymerizable material may further comprise at least one second polyfunctional monomer different from at least one first polyfunctional monomer, and at least one monofunctional monomer.

[0014] In certain aspects, the amount of at least one second polyfunctional monomer may be at least 15 wt% and 50 wt% or less based on the total weight of the polymerizable material.

[0015] In certain aspects, at least one second polyfunctional monomer of the polymerizable material may include bisphenol-A-dimethacrylate.

[0016] In an additional aspect, at least one monofunctional monomer of the polymerizable material may comprise a monofunctional acrylate monomer. In a specific aspect, the monofunctional acrylate monomer may comprise benzyl acrylate (BA), benzyl methacrylate (BMA), 1-naphthyl acrylate (1-NA), 1-naphthyl methacrylate (1-NMA), or any combination thereof.

[0017] In one aspect of the curable composition, the weight percentage ratio of at least one first polyfunctional monomer to at least one second polyfunctional monomer of the polymerizable material may be in the range of 1:2 to 1:4.

[0018] In certain aspects, the photocurable composition of the present disclosure can be adapted to form a planar layer in an inkjet-based adaptive planarization process.

[0019] In one embodiment, the laminate may comprise a substrate and a photo-cured layer disposed on the substrate, wherein the photo-cured layer may be formed from the photocurable composition of the present disclosure described above.

[0020] In one aspect, the photo-cured layer of the laminate may have a glass transition temperature of at least 120°C.

[0021] In another embodiment, a method for forming a photo-cured layer on a substrate comprises the step of applying a photocurable composition on a substrate, wherein the photocurable composition may comprise a polymerizable material and a photoinitiator, wherein the polymerizable material comprises at least one first polyfunctional monomer of formula (1) in an amount of at least 5 wt% and 20 wt% or less based on the total weight of the polymerizable material.

[0022]

[0023] (where R is a C1-C6-alkyl, alkyl-aryl, or aryl);

[0024] A step of bringing a photocurable composition into contact with a top plate;

[0025] A step of irradiating a photocurable composition with light to form a photo-cured layer, wherein the photo-cured layer may have a glass-transition temperature of at least 120°C; and

[0026] Step of removing the top plate from the photo-cured layer

[0027] It may include.

[0028] In one aspect of the method, the viscosity of the photocurable composition may be 15 mPa·s or less.

[0029] In another aspect of the method, the amount of at least one first polyfunctional monomer of formula (1) may be 15 wt% or less based on the total weight of the polymerizable material.

[0030] In another additional aspect of the method, the photo-cured layer may have a glass-transition temperature of at least 120°C.

[0031] In a further embodiment, a method for manufacturing an article comprises the step of applying a photocurable composition onto a substrate, wherein the photocurable composition may comprise a polymerizable material and a photoinitiator, wherein the polymerizable material comprises at least one first polyfunctional monomer of formula (1) in an amount of at least 5 wt% and 20 wt% or less based on the total weight of the polymerizable material.

[0032]

[0033] (where R is a C1-C6 alkyl, alkyl-aryl, or aryl);

[0034] A step of bringing a photocurable composition into contact with a top plate;

[0035] A step of irradiating light onto a photocurable composition to form a photo-cured layer, wherein the photo-cured layer may have a glass transition temperature of at least 120°C;

[0036] Step of removing the top plate from the photo-cured layer; and

[0037] Step of manufacturing an article by processing a substrate having a photo-cured layer

[0038] It may include. Specific details for implementing the invention

[0039] details

[0040] The following description is provided to aid in understanding the teachings disclosed herein and will focus on specific implementations and modes of practice. This focus is intended to aid in explaining the teachings and should not be interpreted as a limitation on the scope or applicability of the teachings.

[0041] Unless otherwise defined, all technical and scientific terms used herein have the same meaning as generally understood by those skilled in the art to which this invention pertains. Materials, methods, and examples are merely illustrative and are not intended to be limiting. To the extent not described herein, many details regarding specific materials and processing actions are common and can be found in textbooks and other sources within the field of imprint and lithography technology.

[0042] As used herein, the terms “include,” “include,” “include,” “included,” “have,” “have,” or any other variations thereof are intended to cover non-exclusive inclusions. For example, a process, method, article, or device comprising a list of features is not necessarily limited to such features only and may include other features not explicitly listed or inherent in such process, method, article, or device.

[0043] As used herein, and unless explicitly stated otherwise, “or” refers to inclusive or and not exclusive or. For example, condition A or B is satisfied by either of the following: A is true (or exists) and B is false (or does not exist); A is false (or does not exist) and B is true (or exists); and both A and B are true (or exist).

[0044] Additionally, the use of singular expressions is used to describe the elements and components described herein. This is done merely for convenience and to provide a general meaning of the scope of the invention. This description should be read as including one or at least one, and the singular form also includes the plural form unless it is evident that it is otherwise intended.

[0045] The present disclosure relates to a photocurable composition comprising a polymerizable material and a photoinitiator, wherein the polymerizable material may comprise at least one first polyfunctional monomer of formula (1), where R is a C1-C6 alkyl, alkyl-aryl, or aryl. In certain aspects, R may be methyl or benzyl.

[0046]

[0047] The polyfunctional monomer of formula (1) can be polymerized during UV exposure by forming a pentatonic tetrahydrofuran ring in the polymer backbone. As used herein, the monomer of formula (1) is also interchangeably described as "at least one first polyfunctional monomer" to distinguish it from "at least one second polyfunctional monomer" which does not belong under the structure of formula (1). As used herein, the polyfunctional monomer is understood as a monomer having at least two functional groups capable of participating in a polymerization reaction.

[0048] Surprisingly, it was discovered that a small amount of at least one first polyfunctional monomer of formula (1), such as at least 5 wt% to 20 wt% or less based on the total weight of the polymerizable material, can lead to a photocurable composition capable of forming a cured layer having a glass transition temperature of at least 120°C.

[0049] In certain aspects, the amount of at least one first polyfunctional monomer of the photocurable composition may be 18 wt% or less, or 15 wt% or less, or 12 wt% or less, or 10 wt% or less, and a glass transition temperature of at least 120°C of the corresponding cured coating layer may be achieved.

[0050] In another embodiment, increasing the amount of at least one first polyfunctional monomer to at least 45 wt% based on the total weight of the polymerizable material can lead to a photocured layer having a glass transition temperature of at least 140°C or at least 145°C.

[0051] In one embodiment, the photocurable composition may be adapted to have low viscosity, which makes the composition suitable for forming a planar layer in an inkjet-based planarization process. In one aspect, the viscosity of the photocurable composition may be 15 mPa·s or less, e.g. 12 mPa·s or less, or 10 mPa·s or less, or 8 mPa·s or less. In another aspect, the viscosity may be at least 3 mPa·s, or at least 5 mPa·s, or at least 7 mPa·s. The viscosity may be a value between any upper and lower limit values ​​cited above. As used herein, all viscosity values ​​relate to viscosity measured by the Brookfield method at a temperature of 23°C.

[0052] The polymerizable material may constitute the majority of the photocurable composition. In an embodiment, the amount of the polymerizable material may be at least 80 wt%, e.g., at least 85 wt%, or at least 90 wt%, or at least 95 wt%, based on the total weight of the photocurable composition. In another aspect, the amount of the polymerizable material may be 99 wt% or less, or 98 wt% or less, or 97 wt% or less, or 95 wt% or less, or 93 wt% or less, or 90 wt% or less, based on the total weight of the curable composition. In a specific particular aspect, the amount of the polymerizable material may be at least 95 wt% based on the total weight of the curable composition.

[0053] The polymerizable material may include other polymerizable monomers, oligomers, and / or polymers following at least one first polyfunctional monomer of Formula (1). In one embodiment, the polymerizable material may include at least one second polyfunctional monomer and at least one monofunctional monomer that are different from at least one first polyfunctional monomer of Formula (1). In certain aspects, at least one second polyfunctional monomer may be a difunctional monomer, a trifunctional monomer, or a tetrafunctional monomer. In certain aspects, the polyfunctional monomer may be a difunctional acrylate monomer. In certain particular aspects, the difunctional acrylate monomer may include bisphenol-A-dimethacrylate. Other non-limiting examples of at least one second polyfunctional monomer may be a difunctional monomer and include hydroxyphenyl-4-hydroxybenzoate diacrylate, bis(4-methacryloyloxyphenyl)ketone, or any combination thereof.

[0054] The amount of at least one second polyfunctional monomer may be at least 15 wt%, for example, at least 20 wt%, or at least 25 wt%, or at least 30 wt%, based on the total weight of the polymerizable material. In another aspect, at least one second polyfunctional monomer may be 50 wt% or less, for example, 45 wt% or less, 40 wt% or less, or 35 wt% or less, based on the total weight of the polymerizable material.

[0055] In one aspect, at least one monofunctional monomer of the polymerizable material may comprise a monofunctional acrylate monomer. As used herein, the term monofunctional acrylate monomer relates to any monomer structure comprising one acrylate unit or one substituted acrylate unit, e.g., a methacrylate unit. Non-limiting examples of acrylate monomers may be benzyl acrylate (BA); 1-naphthyl acrylate (1-NA); benzyl methacrylate (BMA); or 1-naphthyl methacrylate (1-NMA); or tetrahydrofurfuryl acrylate, isobornyl acrylate, or dicyclofentanyl acrylate, pentafluorobenzyl acrylate, 1-adamantyl methacrylate, 2-adamantyl acrylate, or trimethylcyclohexyl acrylate, or any combination thereof. In one particular aspect, the composition may comprise at least two acrylate monomers selected from benzyl acrylate (BA), benzyl methacrylate (BMA), 1-naphthyl acrylate (1-NA), and 1-naphthyl methacrylate (1-NMA).

[0056] The amount of at least one monofunctional monomer may be at least 25 wt%, e.g., at least 30 wt%, or at least 40 wt%, or at least 50 wt%, based on the total weight of the polymerizable material. In another aspect, the amount of the monofunctional monomer may be 60 wt% or less, or 55 wt% or less, or 50 wt% or less, or 45 wt% or less, or 40 wt% or less, based on the total weight of the polymerizable material. The amount of the monofunctional monomer may be within a range including any of the minimum and maximum values ​​mentioned above.

[0057] In an additional aspect, the photocurable composition of the present disclosure may not contain a solvent, and at least one first polyfunctional monomer of formula (1) may be dissolved in a monofunctional acrylate monomer.

[0058] In one aspect, the weight percentage ratio of at least one polyfunctional monomer of formula (1) to at least one second polyfunctional monomer may be 0.5 or less, or 0.4 or less, or 0.3 or less, or 0.25 or less. In an additional aspect, the weight percentage ratio may be at least 0.1 or at least 0.15 or at least 0.2. The weight percentage ratio of at least one first polyfunctional monomer to at least one second polyfunctional monomer may be a value between any maximum and minimum value mentioned above.

[0059] To initiate photocuring of the composition when exposed to light, one or more photoinitiators may be included in the photocurable composition. Non-limiting examples of photoinitiators may be, for example, Irgacure 819, Irgacure 651, Irgacure 1173, or Irgacure 2959.

[0060] In an additional aspect, the photocurable composition may contain at least one optional additive. Non-limiting examples of the optional additive may be surfactants, dispersants, stabilizers, cosolvents, initiators, inhibitors, dyes, or any combination thereof.

[0061] In another embodiment of the present disclosure, the laminate may comprise a substrate and a photo-cured layer disposed on the substrate, wherein the photo-cured layer may be formed from a photocurable composition described in the embodiment. The substrate is not limited to a specific material. In a particular aspect, the substrate may be a patterned silicon wafer.

[0062] In one aspect, the photo-cured layer of the laminate may have a glass transition temperature of at least 120°C, for example, at least 125°C, at least 128°C, or at least 130°C.

[0063] In another aspect, the thickness of the photo-cured layer within the laminate may be at least 80 nm, or at least 100 nm, or at least 200 nm. In an additional aspect, the thickness of the photo-cured layer may be 2000 nm or less, or 1000 nm or less, or 500 nm or less.

[0064] In certain aspects, the laminate may include one or more layers, for example, an adhesive layer, between the substrate and the photocured layer.

[0065] The present disclosure further relates to a method for forming a photo-cured layer on a substrate. The method may include the steps of: applying the photocurable composition described above onto a substrate; bringing the photocurable composition into contact with a top plate; irradiating the photocurable composition with light to form a photo-cured layer; and removing the top plate from the photo-cured layer.

[0066] In one aspect, light irradiation can be performed using light having a wavelength of 250 nm to 760 nm. In a preferred aspect, light irradiation can be performed using light having a wavelength of 300 nm to 450 nm.

[0067] Additional processing to form a desired article may be applied by including an etching process to transfer an image corresponding to a pattern of one or both of the solidification layer and / or a patterning layer located beneath the solidification layer to the substrate and the solidification (photocured) layer. Known steps and processes for manufacturing a device (article), including, for example, curing, oxidation, layer formation, deposition, doping, planarization, etching, removal of moldable material, dicing, bonding, and packaging, may be further applied to the substrate. In certain aspects, the substrate may be processed to manufacture a plurality of articles (devices).

[0068] The cured layer can be further used as an interlayer insulating film for semiconductor devices, such as LSI, system LSI, DRAM, SDRAM, RDRAM, or D-RDRAM, or as a resist film used in semiconductor manufacturing methods.

[0069] As further demonstrated in the examples, it was surprisingly discovered that a specific combination of polymerizable monomers containing a specific amount of the monomer of formula (1) can have properties that are particularly suitable for IAP treatment. The photocurable composition of the present disclosure can have a desired low viscosity of 15 mPa·s or less and can form a photo-cured layer having a glass transition temperature of at least 120°C.

[0070] Examples

[0071] The following non-limiting embodiments illustrate concepts as described herein.

[0072] Example 1

[0073] Preparation of a photocurable IAP composition.

[0074] Photocurable compositions (Samples 1-8) were prepared using varying amounts of polyfunctional monomers belonging to formula (1), such as methyl 2-(allyloxymethyl) acrylate (CAS 219828-90-7, also referred to herein as AMA 1), and benzyl α-(allyloxymethyl) acrylate (CAS 1233368-5-6, also referred to herein as AMA 2). The photocurable compositions further contained the difunctional monomer bisphenyl A dimethacrylate (BPADMA) as a second polyfunctional monomer, and benzyl acrylate (BA) and 1-naphthyl acrylate (1-NA) as monofunctional acrylate monomers. Each composition further contained 3 wt% of the photoinitiator Yirgacure 819 and 1 wt% of the surfactant based on the total weight of the composition. In each composition (Samples 1-8), the total amount of polymerizable material was 97 wt% based on the total weight of the photocurable composition.

[0075] The exact weight % amount of each monomer type based on the total weight of the polymerizable material is shown in Table 1.

[0076] Photocuring was performed by applying a liquid film of a photocurable composition with a thickness of about 3 micrometers onto a glass substrate, applying a UV light intensity of 20 mW / cm² corresponding to a curing energy dose of 2.4 J / cm², and curing it for 120 seconds.

[0077] For each photocured layer, the glass transition temperature (Tg) was measured and is also listed in Table 1.

[0078] Table 1

[0079]

[0080] From the data in Table 1, it can be seen that a glass transition temperature of over 120°C was achieved with only 10 wt% of the polyfunctional monomer of formula (1) (AMA 1 or AMA 2) based on the total amount of polymerizable material, and refer to samples 1, 2, and 3.

[0081] When comparing AMA 1 and AMA 2, the inclusion of AMA 1 results in a glass transition temperature that is about 6% higher than that of AMA 2 under otherwise identical conditions.

[0082] Increasing the amount of BPADMA in the curable composition, which is the second polyfunctional monomer, was more advantageous for achieving a high glass transition temperature. By keeping the amount of AMA 1 constant, increasing the amount of BPADMA from 20 wt% to 30 wt% increased the glass transition temperature from 109°C to 122°C, and samples 5 and 3 are compared.

[0083] Increasing the amount of AMA 1 monomer to a maximum of 50 wt% further increases the glass transition temperature to 145°C (Sample 7).

[0084] Table 1 also includes one sample (Sample 8) which was a commercial IAP resist material containing BPADMA, BA, and 1-NA, and did not contain monomers belonging to formula (1) in the polymerizable material. The photocured layer of the composition of Sample 8 had a minimum glass transition temperature of 90°C. An additional comparative example (Sample 9) was prepared by changing the second polyfunctional monomer from bisphenol A dimethacrylate (BPADMA) to bisphenol A diacrylate (BPADA). Sample 9 had the same composition as Sample 6 except that 20 wt% BPADMA was replaced with 20 wt% BPADA (see Table 1). The viscosity of Sample 9 was 7.35 mPa s, and the measured glass transition temperature of the cured layer prepared from Sample 9 was 119°C. A comparison of Sample 9 and Sample 6 shows that the desired synergistic effect can be different when the second polyfunctional monomer is combined with the allyloxymethyl acrylate monomer of Formula (1). Additionally, although the amount of AMA1 in Sample 9 was 30 wt%, the glass transition temperature of the cured layer was 10°C lower compared to Sample 1, which used only 10 wt% AMA1.

[0085] The viscosity of all samples was less than 15 mPa·s. Viscosity was measured for each sample at 23°C using a Brookfield viscometer LVDV-II + Pro with spindle size #18 at 200 rpm. For the viscosity test, approximately 6–7 mL of sample liquid, sufficient to cover the spindle head, was added into the sample chamber. For all viscosity tests, at least three measurements were performed, and the average value was calculated.

[0086] Storage modulus and glass transition temperature were measured using an Anton-Paar MCR-301 rheometer coupled with a Hamamatsu Lightningcure LC8 UV source. Samples were irradiated with a UV intensity of 1.0 mW / cm² at 365 nm, controlled by a Hamamatsu 365 nm UV power meter. Software called RheoPlus was used to control the rheometer and perform data analysis. The temperature was controlled by a Julabo F25-ME water unit and set to 23°C as the starting temperature. For each sample test, a 7 µL resist sample was placed on a glass plate located directly beneath the rheometer's measurement system. Before initiating UV radiation, the distance between the glass plate and the measurement unit was reduced by a 0.1 mm increment. UV radiation exposure was continued until the storage modulus reached a plateau, and the height of the plateau was recorded as the storage modulus listed in Table 3.

[0087] After UV curing is complete, the temperature of the cured sample is increased by controlled heating to measure the change in storage modulus with temperature, and the glass transition temperature T g ...was obtained. The temperature corresponding to the maximum value of tangent(θ) is the glass transition temperature T g It was considered as.

[0088] The specifications and examples of embodiments described herein are intended to provide a general understanding of the structures of various embodiments. The specifications and examples are not intended to serve as a thorough and comprehensive description of all elements and features of devices and systems using the structures or methods described herein. Separate embodiments may also be provided as combinations of a single embodiment, and conversely, for the sake of brevity, various features described in the context of a single embodiment may also be provided individually or in any sub-combination. Additionally, references to values ​​specified as ranges include each and all values ​​within that range. Many other embodiments may become apparent to a person skilled in the art only after reading this specification. Other embodiments may be used and derived from the disclosure so that structural substitutions, logical substitutions, or other modifications may be made without departing from the scope of the disclosure. Accordingly, the disclosure should be regarded as illustrative rather than restrictive.

Claims

Claim 1 A photocurable composition for inkjet adaptive planarization in semiconductor manufacturing comprising a polymerizable material and a photoinitiator, wherein the polymerizable material comprises at least one first polyfunctional monomer of formula (1) in an amount of at least 5 wt% and 20 wt% or less based on the total weight of the polymerizable material: (wherein R is a C1-C6 alkyl, alkyl-aryl, or aryl), a photocurable composition that forms a cured layer having a glass transition temperature of at least 120°C. Claim 2 A photocurable composition according to claim 1, wherein the amount of at least one first polyfunctional monomer is 15 wt% or less based on the total weight of the polymerizable material. Claim 3 A photocurable composition according to claim 2, wherein the amount of at least one first polyfunctional monomer is 10 wt% or less based on the total weight of the polymerizable material. Claim 4 A photocurable composition according to claim 1, wherein R of chemical formula (1) comprises methyl or benzyl. Claim 5 A photocurable composition according to claim 1, wherein the amount of polymerizable material is at least 95 wt% based on the total weight of the photocurable composition. Claim 6 A photocurable composition for inkjet adaptive planarization in semiconductor manufacturing comprising a polymerizable material and a photoinitiator, wherein the polymerizable material comprises at least one first polyfunctional monomer of formula (1) in an amount of at least 5 wt% and 20 wt% or less based on the total weight of the polymerizable material, at least one second polyfunctional acrylate monomer in an amount of at least 25 wt% based on the total weight of the polymerizable material, and at least one monofunctional acrylate monomer in an amount of at least 50 wt% based on the total weight of the polymerizable material. (wherein R is a C1-C6 alkyl, alkyl-aryl, or aryl), the amount of polymerizable material is at least 95 wt% based on the total weight of the photocurable composition, and the composition forms a cured layer having a glass transition temperature of at least 120°C, a photocurable composition. Claim 7 A photocurable composition according to claim 1, wherein the polymerizable material further comprises at least one second polyfunctional monomer different from the first polyfunctional monomer and at least one monofunctional monomer, wherein the amount of at least one second polyfunctional monomer is at least 15 wt% and 50 wt% or less based on the total weight of the polymerizable material. Claim 8 A photocurable composition according to claim 7, wherein at least one second polyfunctional monomer comprises bisphenol-A-dimethacrylate. Claim 9 A photocurable composition according to claim 7, wherein at least one monofunctional monomer comprises a monofunctional acrylate monomer. Claim 10 A photocurable composition according to claim 9, wherein at least one monofunctional acrylate monomer comprises benzyl acrylate (BA), benzyl methacrylate (BMA), 1-naphthyl acrylate (1-NA), 1-naphthyl methacrylate (1-NMA), or any combination thereof. Claim 11 A photocurable composition according to claim 7, wherein the weight percentage ratio of at least one first polyfunctional monomer to at least one second polyfunctional monomer is in the range of 1:2 to 1:

4. Claim 12 A method for forming a photo-cured layer on a substrate, comprising the steps of: applying a photocurable composition according to any one of claims 1 to 11 on the substrate; and removing a top plate from the photo-cured layer. Claim 13 A method according to claim 12, wherein the amount of at least one first polyfunctional monomer is 15 wt% or less based on the total weight of the polymerizable material. Claim 14 A method according to claim 12, wherein the photo-cured layer has a glass-transition temperature of at least 125°C. Claim 15 A method for manufacturing an article, comprising the steps of: applying a photocurable composition according to any one of claims 1 to 11 onto a substrate; removing a top plate from a photocured layer; and processing a substrate having a photocured layer to manufacture an article.

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