System for synthesegas reforming and method for controlling the same

Abstract

A raw gas reforming system is introduced comprising: a raw gas supply tank for storing and discharging raw gas; a supply water tank for storing and discharging supply water; a reformer for receiving raw gas and supply water discharged from the raw gas supply tank and the supply water tank, generating and discharging a mixed gas containing hydrogen; a PSA for receiving the mixed gas from the reformer, purifying the hydrogen gas, and discharging it; a raw gas valve for controlling the supply amount of the raw gas supply tank, a supply water valve for controlling the supply amount of the supply water tank, and a hydrogen gas valve for controlling the hydrogen discharge amount of the PSA; and a control unit for controlling the flow rate of the hydrogen gas discharged through the control of the hydrogen gas valve, controlling the raw gas valve based on the pressure of the discharged hydrogen gas, and controlling the supply water valve based on the flow rate of the raw gas discharged through the control of the raw gas valve.

Description

Technology Field

[0001] The present invention relates to a reforming system and a control method thereof for obtaining hydrogen gas used in hydrogen fuel cells from natural gas containing methane, etc. Background Technology

[0003] As pollution caused by greenhouse gases accelerates globally, methods to generate or use electricity without emitting greenhouse gases such as CO2 are attracting attention. Representative examples include solar and wind energy, and electricity production using hydrogen gas is also one of the leading methods.

[0004] Hydrogen fuel cells are a method of generating electricity by utilizing the energy produced during the oxidation-reduction reaction between hydrogen and oxygen. Because they produce water (H2O) as a byproduct, they are gaining attention as an eco-friendly energy source, and extensive research is currently underway.

[0005] However, since there is almost no hydrogen gas (H2) in the air, a method to obtain pure hydrogen gas is required, and hydrogen gas can be obtained by reforming substances such as hydrocarbons or ammonia. However, since CO2 may be generated when hydrocarbon substances are reformed, the significance of being a carbon-free energy source in the process of generating hydrogen gas used as fuel is diminished.

[0006] Therefore, it is necessary to prevent CO2 generation during the process of reforming hydrocarbon materials, and accordingly, technologies for capturing, storing, and recycling the generated CO2, as well as reforming methods that remove CO2 and produce hydrogen, have been developed.

[0007] However, although reforming methods have advanced, reforming systems generally operated manually, allowing process operators to limit operations to values ​​determined by demand in order to regulate the hydrogen gas flow rate required by the end user.

[0009] The matters described above as background technology are intended only to enhance understanding of the background of the present invention and should not be construed as an acknowledgment that they constitute prior art already known to those skilled in the art. Prior art literature

[0011] KR 10-1277123 B The problem to be solved

[0012] The present invention is proposed to solve these problems and aims to provide a raw gas reforming system and a control method capable of automatically controlling the process according to the amount of hydrogen gas supplied by the end user. means of solving the problem

[0014] A raw gas reforming system according to the present invention for achieving the above objective comprises: a reformer that receives raw gas and feed water to generate and discharge a mixed gas containing hydrogen; a PSA that receives the mixed gas from the reformer, purifies the hydrogen gas, and discharges it; a raw gas supply unit that controls the supply amount of raw gas, a feed water supply unit that controls the supply amount of feed water, and a hydrogen gas supply unit that controls the hydrogen discharge amount of the PSA; and a control unit that controls the flow rate of the hydrogen gas discharged through the control of the hydrogen gas supply unit, controls the raw gas supply unit based on the pressure of the discharged hydrogen gas, and controls the feed water supply unit based on the flow rate of the raw gas discharged through the control of the raw gas supply unit.

[0015] The control unit may include a hydrogen gas controller capable of controlling the hydrogen gas supply unit based on the flow rate or pressure of the hydrogen gas discharged through the PSA, or controlling the hydrogen gas supply unit according to a signal transmitted from the outside.

[0016] The control unit may include a raw gas controller that controls the raw gas supply unit based on the flow rate of the raw gas or the pressure of the hydrogen gas discharged through the PSA.

[0017] The control unit may include a supply water controller that controls the supply water supply unit based on the flow rate of the raw gas.

[0018] The hydrogen gas controller includes a first flow sensor that measures the flow rate of hydrogen gas discharged through the PSA; and a first flow rate indicator controller that can control the hydrogen gas supply unit according to the measured flow rate or the hydrogen gas supply unit according to a signal transmitted from the outside; wherein the first flow rate indicator controller can control the hydrogen gas supply unit to discharge hydrogen gas of a constant flow rate.

[0019] The hydrogen gas controller further includes a first pressure sensor for measuring the pressure of hydrogen gas discharged through the PSA; and a first pressure indicator controller capable of controlling a hydrogen gas supply unit according to the measured pressure; and when the hydrogen gas supply unit is not controlled by the first flow rate indicator controller, the hydrogen gas supply unit can be controlled by the first pressure indicator controller so that hydrogen gas at a constant pressure can be discharged.

[0020] The raw gas controller includes a second pressure indicator controller that controls the raw gas supply unit based on the pressure of the hydrogen gas discharged through the PSA; and the second pressure indicator controller can control the raw gas supply unit to supply the raw gas at a flow rate corresponding to the pressure of the hydrogen gas.

[0021] The raw gas controller further includes a second flow sensor for measuring the flow rate of the raw gas; and a second flow rate indicator controller for controlling the raw gas supply unit based on the flow rate of the raw gas measured by the second flow sensor; wherein, when the raw gas supply unit is not controlled by the second pressure indicator controller, the raw gas supply unit may be controlled by the second flow rate indicator controller so that a constant flow rate of raw gas can be supplied to the reformer.

[0022] The supply water controller may include a third flow rate indicator controller that controls the supply water supply unit to discharge supply water proportional to the flow rate of the raw gas.

[0023] The supply water controller further includes a third flow sensor for measuring the flow rate of the supply water; and the third flow rate indicator controller can control the supply water supply unit to supply a constant flow rate of supply water according to the supply water flow rate measured by the third flow sensor.

[0024] A raw gas reforming system according to the present invention for achieving the above objective comprises, as a method for controlling the raw gas reforming system of claim 1, the steps of: supplying raw gas; supplying supply water; a reformer receiving raw gas and supply water to generate and discharge a mixed gas containing hydrogen; a PSA receiving the mixed gas from the reformer to purify and discharge hydrogen gas; a control unit controlling a hydrogen gas supply unit to adjust the amount of hydrogen gas discharged by the PSA; a control unit controlling a raw gas supply unit based on the pressure of the hydrogen gas changed by the control of the hydrogen gas supply unit; and a control unit controlling a supply water supply unit based on the flow rate of the raw gas changed by the control of the raw gas supply unit. Effects of the invention

[0026] According to the present invention, the amount of hydrogen gas generated can be controlled by automatically controlling the system according to the amount of hydrogen gas required by the customer, and the amount of hydrogen gas can be controlled consistently even when disturbances frequently occur, such as fluctuations in the composition of raw gas, for example, the content of methane, ethane, propane, butane, etc. Brief explanation of the drawing

[0028] Figures 1 and 2 are circuit diagrams of a raw gas reforming system according to one embodiment of the present invention. FIG. 3 is a flowchart illustrating a method for controlling a raw gas reforming system according to one embodiment of the present invention. Specific details for implementing the invention

[0029] Specific structural or functional descriptions of embodiments of the present invention disclosed in this specification or application are merely illustrative for the purpose of explaining embodiments according to the present invention, and embodiments according to the present invention may be implemented in various forms and should not be interpreted as being limited to the embodiments described in this specification or application.

[0030] Since embodiments according to the present invention may be subject to various modifications and may take various forms, specific embodiments are illustrated in the drawings and described in detail in this specification or application. However, this is not intended to limit embodiments according to the concept of the present invention to specific disclosed forms, and it should be understood that it includes all modifications, equivalents, and substitutions that fall within the spirit and scope of the present invention.

[0031] Terms such as "first" and / or "second" may be used to describe various components, but said components shall not be limited by said terms. For the sole purpose of distinguishing one component from another, for example, without departing from the scope of rights according to the concept of the present invention, the first component may be named the second component, and similarly, the second component may be named the first component.

[0032] When it is stated that one component is "connected" or "connected" to another component, it should be understood that while it may be directly connected or connected to that other component, there may also be other components in between. Conversely, when it is stated that one component is "directly connected" or "directly connected" to another component, it should be understood that there are no other components in between. Other expressions describing the relationship between components, such as "between" and "exactly between," or "adjacent to" and "directly adjacent to," should be interpreted in the same way.

[0033] The terms used herein are used merely to describe specific embodiments and are not intended to limit the invention. Singular expressions include plural expressions unless the context clearly indicates otherwise. In this specification, terms such as “comprising” or “having” are intended to specify the existence of the described features, numbers, steps, actions, components, parts, or combinations thereof, and should be understood as not precluding the existence or addition of one or more other features, numbers, steps, actions, components, parts, or combinations thereof.

[0034] Unless otherwise defined, all terms used herein, including technical or scientific terms, have the same meaning as generally understood by those skilled in the art to which the present invention pertains. Terms such as those defined in commonly used dictionaries should be interpreted as having a meaning consistent with their meaning in the context of the relevant technology, and should not be interpreted in an ideal or overly formal sense unless explicitly defined in this specification.

[0035] The present invention will be described in detail below by explaining preferred embodiments of the invention with reference to the attached drawings. Identical reference numerals in each drawing indicate identical components.

[0037] FIGS. 1 and 2 are circuit diagrams of a raw gas reforming system according to one embodiment of the present invention, and FIG. 3 is a flowchart for system control according to one embodiment of the present invention.

[0039] Referring to FIGS. 1 and 2 to explain a raw gas reforming system according to the present invention for achieving the above objective, the system comprises: a reformer (400) that receives raw gas and supply water to generate and discharge a mixed gas containing hydrogen; a PSA (100) that receives the mixed gas from the reformer, purifies the hydrogen gas, and discharges it; a raw gas supply unit that controls the supply amount of raw gas, a supply water supply unit that controls the supply amount of supply water, and a hydrogen gas supply unit that controls the PSA hydrogen discharge amount; and a control unit that controls the flow rate of the hydrogen gas discharged through the control of the hydrogen gas supply unit, controls the raw gas supply unit based on the pressure of the discharged hydrogen gas, and controls the supply water supply unit based on the flow rate of the raw gas discharged through the control of the raw gas supply unit.

[0040] Specifically, the basic process of the present invention is to generate hydrogen gas without generating CO2. To this end, a gas compressor (201) discharges raw gas containing methane, etc., and a supply water pump (301) discharges supply water. The two substances are mixed and supplied to a reformer, and when reacted under high temperature / high pressure conditions, hydrogen is produced in the reformer. At this time, it is preferable to use highly purified ultrapure water for the supply water.

[0041] Since the generated hydrogen gas is mixed with impurities such as CO, the hydrogen gas can be purified in a PSA (pressure swing adsorber) to produce pure hydrogen. At this time, it is already well known that hydrogen can be produced by additionally providing a transformer (500) between the reformer and the PSA to react with CO once more.

[0042] In such a system, the flow rate of the raw gas is calculated first, and the amount of feed water to be supplied is determined based on the calculated flow rate. Generally, feed water equivalent to three times the flow rate of the raw gas is supplied. In other words, conventionally, the only control required to operate a raw gas reforming system was determining the flow rate of the feed water based on the raw gas supply flow rate.

[0043] Since this system only controls the input of the reactants, it is difficult to operate the process flexibly according to the demand of the hydrogen gas supply source, and there is a problem that the operator must manually adjust the process when there is a change in demand.

[0044] The present invention can solve the above problems by providing a supply unit capable of controlling the flow rate or pressure of reactants and products, and a control unit for controlling said supply unit, thereby enabling automatic process control when the demand for hydrogen gas fluctuates.

[0045] Specifically, the supply unit comprises a raw gas supply unit that controls the supply amount of raw gas, a supply water supply unit that controls the supply amount of supply water, and a hydrogen gas supply unit that controls the hydrogen discharge amount. Methods for controlling the supply amount may include RPM control of the compressor (201) or pump (301), bypass valve control of the valves (110, 201, 301), and guide vane control. However, in this description and drawings, a case in which the supply amounts of raw gas, supply water, and hydrogen are controlled by controlling the valves (110, 201, 301) is described as one embodiment. That is, in this description, the raw gas supply unit, supply water supply unit, and hydrogen gas supply unit may refer to the raw gas valve, supply water valve, and hydrogen gas valve, respectively. This corresponds to one embodiment and implies that one or more of the valves, compressors, and pumps can be controlled to control the supply amount.

[0046] Additionally, a separate line may be included to receive raw gas and supply water, and the raw gas and supply water may be received from a separate storage tank. In this description, as one embodiment, the case in which supplies are received from a raw gas storage tank (200) and a supply water tank (300) has been described.

[0048] Below, we examine the mechanism by which the raw gas reforming system control is performed according to the present invention.

[0050] The control unit may include a hydrogen gas controller capable of controlling the hydrogen gas supply unit based on the flow rate or pressure of the hydrogen gas discharged through the PSA, or controlling the hydrogen gas supply unit according to a signal transmitted from the outside.

[0051] As mentioned above, the supply volume can be regulated by controlling the compressor, pump, or valve.

[0052] Therefore, controlling the hydrogen gas supply unit means controlling the hydrogen gas valve.

[0053] Specifically, the hydrogen gas controller can control the hydrogen gas valve (110) by measuring the pressure or flow rate of the discharged hydrogen gas, or control the hydrogen gas valve (110) by setting a target hydrogen gas flow rate or pressure in the hydrogen controller when the demand amount from the hydrogen gas supplier changes. For example, assuming that the demand amount has decreased, the external hydrogen gas controller will control the hydrogen gas valve to close to a certain degree, and thereby the amount of hydrogen gas supplied will decrease.

[0054] In addition to external signals, the hydrogen gas controller can control the hydrogen gas valve by measuring the pressure or flow rate of the discharged hydrogen gas. Specifically, if a valve controlled to discharge a fixed amount of hydrogen gas discharges more or less than that amount, the hydrogen gas controller can detect this and control the valve to close or open it further by a certain amount. In other words, the hydrogen gas controller is capable of feedback control.

[0056] The control unit may include a raw gas controller that controls the raw gas supply unit based on the flow rate of the raw gas or the pressure of the hydrogen gas discharged through the PSA.

[0057] As mentioned above, the supply volume can be regulated by controlling the compressor, pump, or valve.

[0058] Therefore, controlling the raw gas supply unit means controlling the raw gas valve.

[0059] Specifically, the raw gas valve (210) is controlled by the raw gas controller to regulate the flow rate of the raw gas being discharged. The raw gas controller controls the raw gas valve (210) based on the pressure of the hydrogen gas discharged from the PSA. For example, if the amount of hydrogen at the point of demand decreases, the hydrogen gas controller will control the hydrogen gas valve to close to a certain extent, and accordingly, the hydrogen gas pressure at the downstream end of the PSA will increase. In this case, the raw gas controller, having received a signal regarding the pressure of the hydrogen gas, will be controlled to reduce the flow rate of the raw gas to reduce the generated hydrogen gas, thereby closing the raw gas valve to a certain extent.

[0060] In addition, since the raw material gas controller can control the raw material gas valve based on the flow rate of the raw material gas discharged through the raw material gas supply tank, feedback control is possible, just like with the hydrogen gas controller.

[0062] Meanwhile, the control unit may include a supply water controller that controls the supply water supply unit based on the flow rate of the raw gas.

[0063] As mentioned above, the supply volume can be regulated by controlling the compressor, pump, or valve.

[0064] Therefore, controlling the water supply unit means controlling the water supply valve.

[0065] Specifically, the supply water valve (310) controls the flow rate of the supply water based on the flow rate of the raw gas. The supply water controller controls the supply water valve (310) based on the flow rate of the raw gas discharged from the raw gas supply tank, because since the raw gas and the supply water react at a constant rate, it is difficult to generate hydrogen gas consistently if the supply water is too much or too little. Generally, the supply water is supplied at about three times the flow rate of the raw gas.

[0066] In addition, since the feed water controller can control the feed water valve based on the flow rate of the feed water discharged through the feed water tank, feedback control is possible, just like with the hydrogen gas controller and the raw material gas controller.

[0068] More specifically, each controller of the control unit may include the following configuration, and a circuit diagram of a raw gas reforming system according to one embodiment is shown in FIGS. 1 and FIGS. 2. FE (FLOW ELEMENT) shown in FIGS. 1 and FIGS. 2 represents a flow sensor, PE (PRESSURE ELEMENT) represents a pressure sensor, FIC represents a flow indicator controller, and PIC (PRESSURE INDICATOR CONTROLLER) represents a pressure indicator controller.

[0069] Referring to FIGS. 1 and 2, the hydrogen gas controller includes a first flow sensor (121) for measuring the flow rate of hydrogen gas discharged through the PSA; and a first flow rate indicator controller (131) capable of controlling the hydrogen gas supply unit according to the measured flow rate or according to a signal transmitted from the outside. The first flow rate indicator controller can control the hydrogen gas supply unit to discharge a constant flow rate of hydrogen gas.

[0070] The control and feedback control of the hydrogen gas valve described above can be performed by the first flow sensor (121) and the first flow indicator controller (131).

[0072] Meanwhile, the hydrogen gas controller further includes a first pressure sensor (122) for measuring the pressure of hydrogen gas discharged through the PSA; and a first pressure indicator controller (132) capable of controlling the hydrogen gas supply unit according to the measured pressure. When the hydrogen gas supply unit is not controlled by the first flow rate indicator controller, the hydrogen gas supply unit can be controlled by the first pressure indicator controller so that hydrogen gas at a constant pressure can be discharged.

[0073] The hydrogen gas controller can measure not only the flow rate of hydrogen gas but also the pressure of hydrogen gas, and can control the hydrogen gas valve (110) according to the measured pressure so that hydrogen gas is discharged at a constant pressure. In this case, the first pressure indicator controller (132) is activated at the switch unit (140) of the hydrogen controller, so that the hydrogen gas valve is not controlled by the first flow rate indicator controller (131), and the hydrogen gas valve is controlled by the first pressure indicator controller (132).

[0074] Specifically, the feed gas consists of hydrocarbon gases such as methane, ethane, propane, and butane. If the composition of the feed gas is constant and there are no factors hindering the progress of other processes, it is easy to control the process. However, if there is a disturbance, such as when the composition of the feed gas changes, the amount of hydrogen gas produced will differ even with the same flow rate of the feed gas, so system control for cases where frequent disturbances occur is also required.

[0075] In the event of frequent disturbances, stable operation of the raw gas reforming system is possible by using the control mechanism described above to discharge hydrogen gas at a constant pressure. The hydrogen gas valve is controlled by the first pressure indicator control unit, and the first pressure sensor measures the pressure of the hydrogen gas discharged from the PSA. The pressure measured by the first pressure sensor is transmitted to the first pressure indicator control unit, and the first pressure indicator control unit controls the hydrogen gas valve according to the received hydrogen gas pressure information. In other words, feedback control can be performed to maintain a constant target pressure.

[0077] The raw gas controller includes a second pressure indicator controller (232) that controls the raw gas supply unit based on the pressure of the hydrogen gas discharged through the PSA; and the second pressure indicator controller can control the raw gas supply unit so as to supply the raw gas at a flow rate corresponding to the pressure of the hydrogen gas.

[0078] The control and feedback control of the raw material gas valve described above can be performed by the second pressure indicator controller (232).

[0080] The raw gas controller further includes a second flow sensor (221) for measuring the flow rate of the raw gas; and a second flow rate indicator controller (231) for controlling the raw gas supply unit based on the flow rate of the raw gas measured by the second flow sensor; and when the raw gas supply unit is not controlled by the second pressure indicator controller, the raw gas supply unit can be controlled by the second flow rate indicator controller so that a constant flow rate of raw gas can be supplied to the reformer.

[0081] The raw gas controller can measure not only the pressure of the hydrogen gas but also the flow rate of the raw gas, and can control the raw gas valve (210) according to the measured flow rate of the raw gas so that the raw gas is discharged at a constant flow rate. In this case, the second flow rate indicator controller (231) is activated at the switch unit (240) of the raw gas controller, so that the raw gas valve is not controlled by the second pressure indicator controller (232), and the raw gas valve is controlled by the second flow rate indicator controller (231).

[0082] Specifically, in the event of frequent disturbances, the raw gas reforming system can be operated stably by using the control mechanism described above to discharge the raw gas at a constant flow rate. The raw gas valve is controlled by the second flow rate indicator control unit, and the second flow rate sensor measures the pressure of the raw gas discharged from the raw gas supply tank. The flow rate measured by the second flow rate sensor is transmitted to the second flow rate indicator control unit, and the second flow rate indicator control unit controls the hydrogen gas valve according to the received hydrogen gas pressure information. In other words, feedback control can be performed to maintain a constant target pressure.

[0083] Accordingly, in the event of frequent disturbances, the hydrogen gas controller controls the hydrogen gas valve to discharge hydrogen at a constant pressure, and the feedstock gas controller controls the feedstock gas valve solely by the flow rate of the feedstock gas, regardless of the pressure of the hydrogen gas discharged from the PSA, thereby enabling stable process operation.

[0085] The supply water controller may include a third flow rate indicator controller (331) that controls the supply water supply unit to discharge supply water proportional to the flow rate of the raw gas.

[0086] Generally, the feed water is supplied at a rate of about three times the flow rate of the raw gas. Therefore, the feed water controller receives flow rate information of the raw gas from the second flow rate sensor, controls the feed water valve, and supplies the target flow rate of the feed water.

[0088] Additionally, the supply water controller further includes a third flow rate sensor (321) for measuring the flow rate of the supply water; and the third flow rate indicator controller can control the supply water supply unit to supply a constant flow rate of supply water according to the supply water flow rate measured by the third flow rate sensor.

[0089] Specifically, since it is necessary to adjust the flow rate of the supply water again when the flow rate of the supply water is too high or too low, a third flow rate sensor is provided to measure the flow rate of the supply water, and the third flow rate sensor (321) transmits information about the flow rate of the supply water to the third flow rate indicator controller (331), so that the third flow rate indicator controller can control the supply water valve (310). That is, the supply water controller is also capable of feedback control.

[0091] FIG. 3 is a flowchart illustrating a method for controlling a raw gas reforming system according to one embodiment of the present invention.

[0092] A raw gas reforming system according to the present invention for achieving the above objective comprises, as a method for controlling the raw gas reforming system of claim 1, a step of supplying raw gas (S100); a step of supplying supply water (S200); a step in which a reformer receives raw gas and supply water to generate and discharge a mixed gas containing hydrogen (S300); a step in which a PSA receives the mixed gas from the reformer, purifies the hydrogen gas, and discharges it (S400); a step in which a control unit controls a hydrogen gas supply unit to adjust the amount of hydrogen gas discharged by the PSA (S500); a step in which the control unit controls a raw gas supply unit based on the pressure of the hydrogen gas changed by the control of the hydrogen gas supply unit (S600); and a step in which the control unit controls a supply water supply unit based on the flow rate of the raw gas changed by the control of the raw gas supply unit (S700).

[0093] The above steps are a method for controlling a raw gas reforming system. According to the system control method of the present invention, the raw gas reforming system, which was previously controlled manually, can be automated, and the system can be operated flexibly according to the demand of hydrogen gas consumers, and the process can be operated stably even when frequent disturbances occur.

[0095] Although specific embodiments of the present invention have been illustrated and described, it will be obvious to those skilled in the art that the present invention can be modified and changed in various ways without departing from the technical spirit of the invention as provided by the following claims. Explanation of the symbols

[0097] 100 : PSA 200 : Raw gas supply tank 300 : Supply water tank 400 : Reformer 500 : Transformer

Claims

Claim 1 A reformer that receives raw gas and supply water to generate and discharge a mixed gas containing hydrogen; a PSA that receives the mixed gas from the reformer, purifies the hydrogen gas, and discharges it; a raw gas supply unit that controls the supply amount of raw gas, a supply water supply unit that controls the supply amount of supply water, and a hydrogen gas supply unit that controls the hydrogen discharge amount of the PSA; and a control unit that controls the flow rate of the hydrogen gas discharged through the control of the hydrogen gas supply unit, controls the raw gas supply unit based on the pressure of the discharged hydrogen gas, and controls the supply water supply unit based on the flow rate of the raw gas discharged through the control of the raw gas supply unit; wherein the control unit includes a hydrogen gas controller capable of controlling the hydrogen gas supply unit based on the flow rate or pressure of the hydrogen gas discharged through the PSA or controlling the hydrogen gas supply unit according to a signal transmitted from the outside; and the hydrogen gas controller includes a first pressure sensor that measures the pressure of the hydrogen gas discharged through the PSA; A raw gas reforming system further comprising a first pressure indicator controller capable of controlling a hydrogen gas supply unit according to a measured pressure; wherein, when a disturbance occurs in which the composition of the raw gas changes, the control unit controls the hydrogen gas supply unit to supply hydrogen gas at a constant pressure. Claim 2 delete Claim 3 A raw gas reforming system according to claim 1, wherein the control unit comprises a raw gas controller that controls the raw gas supply unit based on the flow rate of the raw gas or the pressure of the hydrogen gas discharged through the PSA. Claim 4 A raw gas reforming system according to claim 1, wherein the control unit comprises a feed water controller that controls the feed water supply unit based on the flow rate of the raw gas. Claim 5 The raw gas reforming system according to claim 1, wherein the hydrogen gas controller comprises: a first flow sensor for measuring the flow rate of hydrogen gas discharged through a PSA; and a first flow rate indicator controller capable of controlling a hydrogen gas supply unit according to the measured flow rate or a signal transmitted from the outside, wherein the first flow rate indicator controller controls the hydrogen gas supply unit to discharge a constant flow rate of hydrogen gas. Claim 6 A raw material gas reforming system according to claim 5, characterized in that when the hydrogen gas supply unit is not controlled by the first flow rate indicator controller, the hydrogen gas supply unit is controlled by the first pressure indicator controller so that hydrogen gas at a constant pressure can be discharged. Claim 7 A raw gas reforming system according to claim 3, wherein the raw gas controller comprises a second pressure indicator controller that controls the raw gas supply unit based on the pressure of hydrogen gas discharged through the PSA, and the second pressure indicator controller controls the raw gas supply unit to supply raw gas at a flow rate corresponding to the pressure of the hydrogen gas. Claim 8 The raw gas reforming system according to claim 7, wherein the raw gas controller further comprises: a second flow sensor for measuring the flow rate of the raw gas; and a second flow rate indicator controller for controlling the raw gas supply unit based on the flow rate of the raw gas measured by the second flow sensor, wherein when the raw gas supply unit is not controlled by the second pressure indicator controller, the raw gas supply unit is controlled by the second flow rate indicator controller so that a constant flow rate of raw gas can be supplied to the reformer. Claim 9 A raw gas reforming system according to claim 4, wherein the feed water controller comprises a third flow rate indicator controller that controls the feed water supply unit to discharge feed water proportional to the flow rate of the raw gas. Claim 10 A raw gas reforming system according to claim 9, wherein the feed water controller further comprises a third flow sensor for measuring the flow rate of the feed water, and the third flow rate indicator controller controls the feed water supply unit to supply a constant flow rate of feed water according to the feed water flow rate measured by the third flow sensor. Claim 11 A method for controlling a raw gas reforming system according to claim 1, comprising: a step of supplying raw gas; a step of supplying feed water; a step in which a reformer receives raw gas and feed water to generate and discharge a mixed gas containing hydrogen; a step in which a PSA receives the mixed gas from the reformer, purifies the hydrogen gas, and discharges it; a step in which a control unit controls a hydrogen gas supply unit to regulate the hydrogen gas discharge amount of the PSA; a step in which the control unit controls a raw gas supply unit based on the pressure of the hydrogen gas changed by the control of the hydrogen gas supply unit; and a step in which the control unit controls a feed water supply unit based on the flow rate of the raw gas changed by the control of the raw gas supply unit.

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