System and method for producing electrode

Abstract

The present invention relates to an electrode production system and method, and more specifically, to an electrode production system and method that integrally eliminates process errors occurring during a coating process for producing electrodes for secondary batteries. An electrode production system according to an embodiment of the present invention comprises a driving device for moving a substrate, a control device for removing process errors generated in the substrate by controlling process elements that determine the movement pattern of the substrate, and a management device for controlling the control device so that at least one target process element corresponding to the removal of process errors generated in the substrate is controlled among the process elements.

Description

Technology Field

[0001] The present invention relates to an electrode production system and method, and more specifically, to an electrode production system and method that integrally eliminates process errors occurring during a coating process for producing electrodes for secondary batteries. Background Technology

[0002] Secondary batteries can be manufactured through electrode processes, assembly processes, and activation processes. Through the electrode process, a negative electrode and a positive electrode are produced, through the assembly process, the shape of the secondary battery is formed, and through the activation process, electrical energy can be activated.

[0003] The electrode process may include a mixing process, a coating process, a drying process, a roll press process, and a slitting process. Through the mixing process, an active material is produced as a slurry, and through the coating process, the slurry is coated onto a substrate such as aluminum or copper. Through the roll press process, the substrate coated with the slurry is compressed to form an electrode plate, through the drying process, the compressed electrode plate is dried, and through the slitting process, the dried electrode plate can be cut into an appropriate size.

[0004] If process errors occur during the coating process, such as improper substrate tension or the substrate moving unevenly, proper coating may not be performed. In this case, eliminating one process error may lead to the occurrence of another.

[0005] Therefore, there is a need for an invention that can comprehensively eliminate process errors occurring during the coating process for the production of electrodes for secondary batteries. Prior art literature

[0006] Republic of Korea Published Patent Application No. 10-2021-0057944 (May 24, 2021) The problem to be solved

[0007] The problem that the present invention aims to solve is to provide an electrode production system and method that comprehensively eliminate process errors occurring during the coating process for producing electrodes for secondary batteries.

[0008] The problems of the present invention are not limited to those mentioned above, and other problems not mentioned will be clearly understood by those skilled in the art from the description below. means of solving the problem

[0009] An electrode production system according to an embodiment of the present invention comprises a driving device for moving a substrate, a control device for removing process errors generated in the substrate by controlling process elements that determine the movement pattern of the substrate, and a management device for controlling the control device so that at least one target process element corresponding to the removal of process errors generated in the substrate is controlled among the process elements.

[0010] The above process element includes at least one of the tension of the substrate, the central axis of the substrate, and the twisting of the substrate.

[0011] The above process error includes at least one of the tension error of the above material, the meandering error of the above material, and the wrinkle error of the above material.

[0012] The above-described management device determines whether a process error has occurred in the said substrate by referring to the change pattern of process elements for a plurality of different substrate samples.

[0013] The above control device is provided in a plurality of units, and the management device controls at least one target control device among the plurality of control devices corresponding to the point where a process error occurred to eliminate the process error that occurred at said point.

[0014] A method for producing an electrode according to an embodiment of the present invention comprises the steps of: moving a substrate; determining whether a process error occurs with respect to the moving substrate; extracting at least one target process element corresponding to the removal of the process error among process elements determining the movement pattern of the substrate; and adjusting the target process element to remove the process error.

[0015] The above process element includes at least one of the tension of the substrate, the central axis of the substrate, and the twisting of the substrate.

[0016] The above process error includes at least one of the tension error of the above material, the meandering error of the above material, and the wrinkle error of the above material.

[0017] The step of determining whether a process error has occurred regarding the above-mentioned material includes the step of determining whether a process error has occurred regarding the above-mentioned material by referring to the change pattern of the process element for different material samples.

[0018] The above at least one target process element is extracted by referencing the change pattern of the process element.

[0019] Specific details of other embodiments are included in the detailed description and drawings. Effects of the invention

[0020] According to the electrode production system according to the embodiment of the present invention as described above, since process errors occurring during the coating process for producing electrodes for secondary batteries are integrally eliminated, there is an advantage in that another process error is prevented from occurring as a result of eliminating one process error. Brief explanation of the drawing

[0021] FIG. 1 is a diagram showing an electrode production system according to an embodiment of the present invention. Figure 2 is a block diagram of the control device. Figure 3 is a diagram illustrating the operation of a management device. Figure 4 is a block diagram of a management device. Figure 5 is a diagram illustrating the operation of the analysis unit. Figure 6 is a diagram illustrating the operation of the setting data generation unit. Figure 7 is a diagram illustrating process elements corresponding to the elimination of process errors. Figure 8 is a diagram showing the first parameter table. Figure 9 is a diagram showing the second parameter table. Figure 10 is a graph showing the change in tension for a reference sample. FIG. 11 is a flowchart illustrating an electrode production method according to an embodiment of the present invention. Specific details for implementing the invention

[0022] Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings. The advantages and features of the present invention, and the methods for achieving them, will become clear by referring to the embodiments described below in detail together with the accompanying drawings. However, the present invention is not limited to the embodiments disclosed below but can be implemented in various different forms. These embodiments are provided merely to ensure that the disclosure of the present invention is complete and to fully inform those skilled in the art of the scope of the invention, and the present invention is defined only by the scope of the claims. Throughout the specification, the same reference numerals refer to the same components.

[0023] Unless otherwise defined, all terms used in this specification (including technical and scientific terms) may be used in a meaning that is commonly understood by those skilled in the art to which the present invention pertains. Additionally, terms defined in commonly used dictionaries are not to be interpreted ideally or excessively unless explicitly and specifically defined otherwise.

[0024] FIG. 1 is a diagram showing an electrode production system according to an embodiment of the present invention.

[0025] Referring to FIG. 1, an electrode production system (10) according to an embodiment of the present invention comprises a driving device (100), a coating device (200), a drying oven (300), a control device (400), and a management device (500).

[0026] An electrode manufacturing process for an electrode of a secondary battery may include a coating process and a drying process. The coating process includes a process of coating an active material onto a substrate. The drying process includes a process of drying the active material by applying heat to the substrate coated with the active material. Here, the substrate may be provided in the form of a thin plate of aluminum or copper. When aluminum is used as the substrate, the substrate coated with the active material may be used as a positive electrode material, and when copper is used as the substrate, the substrate coated with the active material may be used as a negative electrode material. An electrode production system (10) according to an embodiment of the present invention may coat a substrate with an active material and dry the substrate coated with the active material.

[0027] The driving device (100) can move the material. For example, the driving device (100) may be provided in the form of a motor to generate rotational force. The rotational force of the driving device (100) can be used to move the material.

[0028] The driving device (100) can control the movement speed of the material. For example, the driving device (100) can move the material at a movement speed corresponding to a control command received from the management device (500).

[0029] The coating device (200) can coat a substrate with an active material. The coating device (200) can apply an active material in the form of a slurry to the substrate to form an active material layer.

[0030] FIG. 1 illustrates that the electrode production system (10) includes a single coating device (200), but according to some embodiments of the present invention, a plurality of coating devices (200) may be provided. A plurality of coating devices (200) may be positioned at different points to coat a substrate. As the substrate is coated by the plurality of coating devices (200), the substrate may be coated with a plurality of active material layers.

[0031] The drying oven (300) can apply heat to the substrate to dry the active material coated on the substrate. The drying oven (300) can perform a drying operation by applying heat to the substrate moving by the driving device (100).

[0032] A plurality of drying ovens (300) may be provided. A plurality of drying ovens (300) may be arranged side by side to sequentially dry the active material coated on the substrate. For example, the drying ovens (300) may include first to fourth drying ovens. The substrate dried by the first drying oven is transferred to the second drying oven and dried by the second drying oven, and this process may be repeated identically in the third drying oven and the fourth drying oven. As repeated drying is performed by a plurality of drying ovens (300), the drying of the active material can be effectively performed.

[0033] The control device (400) can eliminate process errors generated in the substrate by controlling process elements that determine the movement pattern of the substrate. In the present invention, the process elements that determine the movement pattern of the substrate may include at least one of the tension of the substrate, the central axis of the substrate, and the twisting of the substrate. Additionally, process errors generated in the substrate may include at least one of the tension error of the substrate, the meandering error of the substrate, and the wrinkling error of the substrate.

[0034] Additionally, the control device (400) may eliminate process errors occurring in the substrate by controlling process elements that determine the coating quality of the substrate. In the present invention, the process elements that determine the coating quality of the substrate may include at least one of the moving speed of the substrate, the internal temperature of the drying oven (300), and the wind speed of the drying oven (300).

[0035] The control device (400) can control at least one process element to eliminate a process error that occurs in the substrate. For example, if a tension error occurs in the substrate, the control device (400) can control the central axis of the substrate along with the tension of the substrate. At this time, the control device (400) may additionally control at least one of the moving speed of the substrate, the internal temperature of the drying oven (300), and the wind speed of the drying oven (300).

[0036] The electrode production system (10) may include a plurality of control devices (400). The plurality of control devices (400) can detect process errors at installed points and control process elements.

[0037] The management device (500) can control the control device (400) so that at least one target process element corresponding to the removal of a process error occurring in the substrate among the process elements is controlled. When a process error occurs in the substrate, the management device (500) can extract a target process element to remove the process error. And, the management device (500) can control the control device (400) so that the target process element is controlled.

[0038] The control device (400) can control target process elements under the control of the management device (500). For example, if a tension error of the substrate occurs, the management device (500) can analyze the tension error and extract the tension of the substrate and the central axis of the substrate as target process elements to eliminate it. When the extraction of target process elements is completed, the management device (500) can transmit the extracted target process elements and the modification parameters of each target process element to the control device (400). The control device (400) can adjust the tension of the substrate and the central axis of the substrate according to the parameters received from the management device (500) so that the tension error of the substrate is eliminated.

[0039] Figure 2 is a block diagram of the control device.

[0040] Referring to FIG. 2, the control device (400) is configured to include a sensing unit (410), a communication unit (420), a tension control unit (430), a center axis control unit (440), and a twist control unit (450).

[0041] The sensing unit (410) can detect the movement pattern of the substrate. For example, the sensing unit (410) may include a tension sensor (not shown) and an image sensor (not shown). The tension sensor can detect the tension of the substrate. The image sensor can generate an image of the surface of the substrate.

[0042] Additionally, the sensing unit (410) may also detect the thickness and density of the active material layer coated on the substrate. To this end, the sensing unit (410) may additionally include a thickness sensing sensor (not shown) and a density sensing sensor (not shown).

[0043] The communication unit (420) can transmit detection data from the detection unit (410) to the management device (500). Additionally, the communication unit (420) can receive a control command from the management device (500). The control command may include setting data for setting process elements. Here, the setting data may include target process elements and modification parameters.

[0044] The tension adjustment unit (430) can adjust the tension of the substrate. For example, the tension adjustment unit (430) can adjust the tension of the substrate by adjusting the position of a dancer roll (not shown) seated on the substrate.

[0045] The central axis adjustment unit (440) can adjust the central axis of the substrate. For example, the central axis adjustment unit (440) can ensure that the central axis of the substrate, formed parallel to the direction of travel of the substrate, is included within a pre-set threshold range.

[0046] The twist control unit (450) can control the twist of the substrate. The twist control unit (450) may include a plurality of twist control rolls (not shown). The twist control unit (450) can remove the twist of the substrate by changing the position of a specific twist control roll among the plurality of twist control rolls.

[0047] Figure 3 is a diagram illustrating the operation of a management device.

[0048] Referring to FIG. 3, the control device (500) can control the tension of the substrate, the central axis of the substrate, the twisting of the substrate, the moving speed of the substrate, the internal temperature of the drying oven (300), and the wind speed of the drying oven (300).

[0049] As described above, when a process error occurs in the substrate, the control device (500) can control at least one of the tension of the substrate, the central axis of the substrate, and the twisting of the substrate to eliminate the process error. Additionally, the control device (500) can additionally control the movement speed of the substrate, the internal temperature of the drying oven (300), and the wind speed of the drying oven (300) to eliminate the process error. For example, when a tension error occurs in the substrate, the control device (500) can control at least one of the movement speed of the substrate, the internal temperature of the drying oven (300), and the wind speed of the drying oven (300).

[0050] Target process elements controlled to eliminate specific process errors can be extracted by referencing a pre-set parameter table or through artificial intelligence analysis of current movement patterns.

[0051] FIG. 4 is a block diagram of a management device, FIG. 5 is a diagram for explaining the operation of an analysis unit, FIG. 6 is a diagram for explaining the operation of a setting data generation unit, and FIG. 7 is a diagram for explaining a process element corresponding to the removal of process errors.

[0052] Referring to FIG. 4, the management device (500) is configured to include an input unit (510), a storage unit (520), a control unit (530), an analysis unit (540), a setting data generation unit (550), and a communication unit (560).

[0053] The input unit (510) can receive a recipe for the operation of the coating device (200), the drying oven (300), and the control device (400). The coating device (200), the drying oven (300), and the control device (400) can each perform a coating process, a drying process, and a control process according to the recipe received through the input unit (510).

[0054] The storage unit (520) may temporarily or permanently store a parameter table (see FIG. 8 and FIG. 9). The parameter table may include a first parameter table and a second parameter table. Additionally, the storage unit (520) may temporarily store data required for the operation of the management device (500).

[0055] Referring to FIGS. 4 and FIGS. 5, the analysis unit (540) can determine process errors by analyzing detection data received from the control device (400).

[0056] The detection data received from the control device (400) may include a tension value and an image. The tension value may be detected by a tension sensor, and the image may be generated by an image sensor.

[0057] The analysis unit (540) can determine a tension error by referring to a tension value. For example, the analysis unit (540) can determine whether a tension error has occurred in the substrate by referring to whether the received tension value is included in a preset threshold range. In addition, the analysis unit (540) can determine whether a meandering error or a wrinkle error has occurred in the substrate by referring to an image generated by photographing the surface of the substrate.

[0058] Additionally, the analysis unit (540) may determine process errors by additionally analyzing at least one of the moving speed of the material, the internal temperature of the drying oven (300), and the wind speed of the drying oven (300).

[0059] Referring to FIGS. 4 and FIGS. 6, the setting data generation unit (550) can generate setting data for setting process elements provided in the control device (400) to eliminate process errors.

[0060] The setting data may include a target process element corresponding to the elimination of process errors and a modification parameter of the target process element. A control device (400) that receives the setting data may adjust the target process element specified in the setting data. For example, the setting data may include tension as a target process element and 156 Nm as a modification parameter of the target process element. A control device (400) that receives the setting data may change the position of the dancing roll so that a load of 156 Nm is applied to the substrate in order to adjust the tension of the substrate.

[0061] Referring to FIG. 7, the setting data generation unit (550) can extract at least one target process element corresponding to the removal of a specific process error.

[0062] For example, as illustrated in (a), if a tension error occurs with respect to the substrate, the setting data generation unit (550) can extract the tension of the substrate and the central axis of the substrate as target process elements. Additionally, as illustrated in (b), if a meandering error occurs with respect to the substrate, the setting data generation unit (550) can extract the central axis of the substrate as target process elements. Additionally, as illustrated in (c), if a wrinkle error occurs with respect to the substrate, the setting data generation unit (550) can extract the tension of the substrate, the central axis of the substrate, and the twisting of the substrate as target process elements.

[0063] The setting data generation unit (550) can extract target process elements by referring to the second parameter table (see FIG. 9) described later. Alternatively, the setting data generation unit (550) may extract target process elements by analyzing data regarding process errors using a pre-set artificial intelligence algorithm.

[0064] Meanwhile, FIG. 7 illustrates that at least one target process element is extracted for one process error, but this is exemplary and at least one target process element may be extracted for multiple process errors. For example, when a tension error and a meandering error occur simultaneously, the setting data generation unit (550) can extract at least one target process element corresponding thereto.

[0065] Referring again to FIG. 4, the communication unit (560) can transmit control commands to the driving device (100), the coating device (200), the drying oven (300), and the control device (400). The control command transmitted to the control device (400) may include the aforementioned setting data. Additionally, the communication unit (560) may receive detection data from the control device (400).

[0066] The control unit (530) can perform overall control over the input unit (510), storage unit (520), analysis unit (540), setting data generation unit (550), and communication unit (560). In addition, the control unit (530) may generate process data as described later.

[0067] Figure 8 is a diagram showing the first parameter table.

[0068] Referring to FIG. 8, the first parameter table (600) is configured to include a recipe field (610), a tension field (620), a center axis field (630), and a torsion field (640).

[0069] The recipe field (610) may include recipe information used by the coating device (200) and the drying oven (300). The recipe field (610) may include a list of different recipe information.

[0070] Tension parameters may be specified in the tension field (620), center axis parameters may be specified in the center axis field (630), and torsion parameters may be specified in the torsion field (640). Tension parameters, center axis parameters, and torsion parameters may be specified in a single recipe information.

[0071] The management device (500) can control the process elements of the control device (400) by referring to the first parameter table (600). That is, when a recipe for the coating process and drying process currently being performed on the substrate is entered, the management device (500) can search for the recipe information listed in the first parameter table (600) that corresponds to the entered recipe. Thus, when recipe information identical or similar to the entered recipe is detected in the first parameter table (600), the management device (500) can transmit the tension parameter, center axis parameter, and torsion parameter corresponding to the recipe information to the control device (400). The management device (500) can generate process data including the parameters extracted by referencing the first parameter table (600) and transmit it to the control device (400).

[0072] The control device (400) can control each process element according to the parameters specified in the process data received from the control device (500).

[0073] Figure 9 is a diagram showing the second parameter table.

[0074] Referring to FIG. 9, the second parameter table (700) may include a process error field (710), a tension field (720), a center axis field (730), a torsion field (740), a speed field (750), a temperature field (760), and a wind speed field (770).

[0075] The process error field (710) may specify the process error of the record. The process error field (710) may include a list of different process errors.

[0076] The process error field (710) may include multiple process errors for a single process element. For example, the process error field (710) may include multiple tension errors. Each of the multiple tension errors may have a different tension error relative to a preset reference tension.

[0077] In the tension field (720), a tension parameter may be specified, in the center axis field (730), a center axis parameter may be specified, in the torsion field (740), a torsion parameter may be specified, in the speed field (750), a movement speed parameter of the material may be specified, in the temperature field (760), a temperature parameter of the drying oven (300) may be specified, and in the wind speed field (770), a wind speed parameter of the drying oven (300) may be specified. In a single process error, a tension parameter, a center axis parameter, a torsion parameter, a movement speed parameter, a temperature parameter, and a wind speed parameter may be specified.

[0078] The management device (500) can extract target process elements and modification parameters by referring to the second parameter table (700). For example, if it is determined that a specific process error has occurred by analyzing detection data received from the control device (400), the management device (500) can search for process errors listed in the second parameter table (700) that correspond to the analysis result. Thus, if a process error identical or similar to the analyzed process error is detected in the second parameter table (700), the target process elements and modification parameters can be extracted by referring to the tension parameter, center axis parameter, torsion parameter, movement speed parameter, temperature parameter, and wind speed parameter corresponding to the process error. Then, the management device (500) can generate setting data including the extracted target process elements and modification parameters and transmit it to the control device (400). The control device (400) can adjust each process element according to the parameters included in the setting data.

[0079] When it is determined that multiple process errors have occurred based on the analysis results of the detection data received from the control device (400), the management device (500) can search for process errors listed in the second parameter table (700) that correspond to the multiple analysis results. Thus, target process elements and modification parameters can be extracted by referring to the parameters corresponding to the multiple process errors detected in the second parameter table (700).

[0080] Figure 10 is a graph showing the change in tension for a reference sample.

[0081] Referring to FIG. 10, the management device (500) can determine whether a process error has occurred in the substrate by referring to a change pattern of process elements for a plurality of different substrate samples.

[0082] FIG. 10 illustrates the change pattern of tension for multiple different reference samples. Below, we will focus on how the occurrence of a tension error is determined by referring to the change pattern of tension.

[0083] The management device (500) may determine that a tension error has occurred if the detected tension value exceeds the upper threshold (T_high) and lower threshold (T_low). The management device (500) may determine that a tension error has occurred if a number of tension values ​​exceeding a preset number are continuously placed adjacent to the upper threshold (T_high) or lower threshold (T_low). The management device (500) may determine that a tension error has occurred if a number of tension values ​​exceeding a preset number continuously increases or decreases. The management device (500) may determine that a tension error has occurred if a number of tension values ​​exceeding a preset number continuously repeats increasing and decreasing. The management device (500) may determine that a tension error has occurred if a number of tension values ​​among a series of consecutive tension values ​​exceeds a preset reference range. Here, the reference range may be included within the range of the upper threshold (T_high) and lower threshold (T_low). The management device (500) can determine that a tension error has occurred if more than a preset number of tension values ​​are continuously included in the reference range.

[0084] As described above, the management device (500) can determine whether a process error has occurred by analyzing not only the detection data received in real time from the control device (400) but also the accumulated detection data.

[0085] FIG. 11 is a flowchart illustrating an electrode production method according to an embodiment of the present invention.

[0086] Referring to FIG. 11, the control device (500) can control the control device (400) so that at least one target process element corresponding to the removal of a process error occurring in the material is controlled.

[0087] The input unit (510) can receive a recipe for the operation of the coating device (200), the drying oven (300), and the control device (400) (S810).

[0088] The control unit (530) can extract parameters of process elements corresponding to a recipe by referring to the first parameter table (600) (S820), and generate process data by including the extracted parameters.

[0089] Process data generated by the control unit (530) can be transmitted to the control device (400) through the communication unit (560) (S830).

[0090] A control device (400) that receives process data can control process elements according to parameters specified in the process data and transmit detection data regarding the movement pattern of the material. A communication unit (560) can receive detection data from the control device (400) (S840).

[0091] The analysis unit (540) can analyze the detection data to determine whether a process error has occurred in the material (S850).

[0092] If a process error occurs in the material, the setting data generation unit (550) can extract a target process element corresponding to the removal of the process error and a modification parameter of the target process element (S860). Then, the setting data generation unit (550) can generate setting data including the target process element and the modification parameter.

[0093] The setting data generated by the setting data generation unit (550) can be transmitted to the control device (400) through the communication unit (560) (S870).

[0094] The control device (400) that receives the setting data can adjust the process element according to the modification parameter specified in the setting data. As the process element is adjusted according to the modification parameter, the process error generated in the material can be eliminated.

[0095] Although embodiments of the present invention have been described above with reference to the attached drawings, those skilled in the art will understand that the present invention may be implemented in other specific forms without changing its technical concept or essential features. Therefore, the embodiments described above should be understood as illustrative in all respects and not restrictive. Explanation of the symbols

[0096] 10: Electrode production system 100: Driving device 200: Coating device 300: Drying oven 400: Control device 410: Detector 420: Communication unit 430: Tension control unit 440: Center axis adjustment unit 450: Torsion adjustment unit 500: Management unit 510: Input unit 520: Storage unit 530: Control unit 540: Analysis Unit 550: Configuration Data Generation Unit 560: Communications Department

Claims

Claim 1 An electrode production system comprising: a driving device for moving a substrate; at least one drying furnace for drying an active material coated on the substrate; a control device for removing process errors generated in the substrate by controlling process elements that determine the movement pattern of the substrate; and a management device for controlling the control device so that at least one target process element corresponding to the removal of process errors generated in the substrate is controlled among the process elements, wherein the process element includes at least one of tension of the substrate, a central axis of the substrate, and twisting of the substrate, and the process error includes at least one of tension error of the substrate, meandering error of the substrate, and wrinkle error of the substrate, and the management device includes a setting data generation unit for extracting at least one target process element corresponding to the removal of process errors generated in the substrate, wherein the setting data generation unit extracts the at least one target process element by referring to a parameter table specifying process elements for a plurality of different process errors or by analyzing data regarding process errors generated in the substrate using a pre-set artificial intelligence algorithm, and extracts at least one target process element corresponding to the plurality of process errors when the plurality of process errors occur simultaneously. Claim 2 delete Claim 3 delete Claim 4 In claim 1, the management device is an electrode production system that determines whether a process error has occurred for said substrate by referring to a change pattern of process elements for a plurality of different substrate samples. Claim 5 An electrode production system according to claim 1, wherein the control device is provided in a plurality of units, and the management device controls at least one target control device corresponding to a point where a process error occurs among the plurality of control devices to eliminate the process error that occurred at said point. Claim 6 A method for producing an electrode, comprising: a step of moving a substrate; a step of drying an active material coated on the substrate; a step of determining whether a process error has occurred with respect to the moving substrate; a step of extracting at least one target process element corresponding to the removal of the process error among process elements determining the movement pattern of the substrate; and a step of removing the process error by adjusting the target process element, wherein the step of extracting the at least one target process element includes: a step of extracting the at least one target process element by referring to a parameter table specifying process elements for a plurality of different process errors or by analyzing data regarding a process error occurring in the substrate using a pre-set artificial intelligence algorithm; and a step of extracting at least one target process element corresponding to the plurality of process errors when the plurality of process errors occur simultaneously, wherein the process element includes at least one of tension of the substrate, a central axis of the substrate, and twisting of the substrate, and the process error includes at least one of a tension error of the substrate, a meandering error of the substrate, and a wrinkling error of the substrate. Claim 7 delete Claim 8 delete Claim 9 In claim 6, the step of determining whether a process error has occurred regarding the above-mentioned material includes the step of determining whether a process error has occurred regarding the above-mentioned material by referring to the change pattern of the process element for different material samples. Claim 10 In claim 9, the electrode production method wherein at least one target process element is extracted by referencing the change pattern of the process element.

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