Rod-type tungsten evaporation device for aluminum vacuum deposition and vacuum deposition system comprising the same

Abstract

The present invention relates to an evaporator for aluminum vacuum deposition and a vacuum deposition system equipped with the same. In particular, it is characterized by using a cylindrical tungsten rod in the form of a single metal rod to improve structural stability and durability even in environments of repeated thermal expansion and contraction, and to improve deposition efficiency and deposition quality through stable support and uniform heating of aluminum foil.

Description

Technology Field

[0001] The present invention relates to an evaporator for aluminum vacuum deposition and a vacuum deposition system equipped with the same, and more specifically, to a tungsten evaporator for aluminum vacuum deposition equipped with the same and a vacuum deposition system equipped with the same, which can improve structural stability and durability even in environments of repeated thermal expansion and contraction by using a tungsten rod in the form of a single metal rod, and improve deposition efficiency and deposition quality through stable support and uniform heating of aluminum foil. Background Technology

[0003] In general, vacuum deposition aluminum coating processes are widely used in the fields of automotive headlamps, plastic injection molded parts, and various metal thin film coatings to achieve metallic textures and improve light reflection properties.

[0004] In particular, for automotive headlamps, an aluminum thin film is formed on the surface of injection-molded plastic parts to perform light reflection and diffusion functions, and for this purpose, an evaporation-based vacuum deposition process is applied.

[0005] A typical vacuum deposition apparatus consists of a vacuum chamber, a vacuum pump, and an evaporation source. Using a vacuum pump, the inside of the vacuum chamber is evaporated by approximately 5 × 10⁻⁶ -5 While maintaining a high vacuum of the mbar level, power is applied to a tungsten evaporator, which is the evaporation source, to form a high temperature due to the heating of the tungsten's electrical resistance.

[0006] At this time, the tungsten evaporator is typically supplied with AC power of 20kW to 30kW, a voltage of about 5V to 10V, and a current of about 600A to 1000A.

[0007] Accordingly, aluminum fixed in the tungsten evaporation device is melted and vaporized, and the vaporized aluminum particles diffuse into the vacuum chamber and are deposited on the surface of a rotating substrate, thereby forming an aluminum thin film of approximately 10 nm to 100 nm.

[0008] In this process, the deposited material is generally fixed in a vertical position and rotates at a speed of about 5 RPM to 12 RPM to form a uniform deposition layer.

[0009] Meanwhile, conventional evaporation sources have a structure in which a number of tungsten coils are connected in parallel between conductors on both sides, and a tungsten coil bent in the shape of a so-called camel-back is arranged in the center.

[0010] Aluminum is bonded to the above tungsten coil, and is configured so that the aluminum melts and vaporizes due to the exothermic reaction of tungsten.

[0011] At this time, to prevent the aluminum from melting rapidly, a method of gradually increasing the power using a thyristor is used.

[0012] For example, the rapid melting of aluminum is suppressed by controlling the power by initially applying about 10 kW, and then sequentially increasing it to 20 kW and 30 kW.

[0013] However, in conventional tungsten coil structures, a problem arises where aluminum partially melts first and does not vaporize uniformly throughout.

[0014] In particular, as the part of the aluminum coil connected to the tungsten coil overheats first, some aluminum falls downward without being sufficiently vaporized, or liquid aluminum accumulates on the curved lower part of the tungsten coil.

[0015] As such, aluminum remaining in the curved sections can spring up in lumps during the subsequent deposition process and scatter as particles onto the surface of the deposited material, causing problems such as tickle defects or particle defects on the surface of the injection-molded product.

[0016] In addition, conventional camelback-shaped tungsten coils have a problem in that structural fatigue accumulates as thermal expansion and contraction are repeated during the repetitive deposition process.

[0017] In particular, residual stress is formed when tungsten coils are shaped into coils during the manufacturing process, and if repeated thermal cycles are applied in this state, cracks and breakage occur in the tungsten material.

[0018] Furthermore, in conventional tungsten coil structures formed by twisting multiple wires, a problem arises where molten aluminum penetrates into the fine gaps between the wires. The penetrated aluminum solidifies during the cooling process and then melts again during the subsequent deposition process, undergoing repeated thermal expansion and contraction. During this process, the aluminum continuously separates the tungsten wires, causing a problem where fatigue failure of the tungsten coil is accelerated.

[0019] In addition, this phenomenon also affects the electrical conductivity of the tungsten coil, causing heat dissipation and consequently further accelerating the phenomenon of liquid aluminum accumulating intensively in specific bends.

[0020] Accordingly, there was a problem where early replacement was required to prevent particle defects even when the tungsten coil was not actually damaged. Prior art literature

[0022] Republic of Korea Published Patent No. 10-2018-0033129 The problem to be solved

[0023] The present invention has been devised in consideration of the above-mentioned problems, and the first objective of the present invention is to provide a cylindrical tungsten evaporator for aluminum vacuum deposition and a vacuum deposition system equipped with the same, which can improve the durability and lifespan of an evaporator by applying a cylindrical tungsten rod in the form of a single metal rod instead of a conventional filament-type tungsten coil structure formed by twisting a plurality of wires, thereby mitigating stress concentration occurring in a repetitive thermal expansion and contraction environment and suppressing cracks, breakage, and fatigue failure of tungsten.

[0025] The second objective of the present invention is to provide a round bar type tungsten evaporator for aluminum vacuum deposition and a vacuum deposition system equipped with the same, which can improve the uniformity of deposition quality and deposition thickness by configuring a plurality of aluminum foil plates to be stably supported on a tungsten coil coupled to the outer surface of a tungsten rod, thereby ensuring uniform melting and vaporization of aluminum and preventing localized concentrated melting or downward drop of aluminum. means of solving the problem

[0027] According to the features for achieving the above-mentioned purpose, the invention relates to a cylindrical tungsten evaporator for aluminum vacuum deposition, comprising: a cylindrical tungsten rod that generates heat when power is applied; a tungsten coil coupled to the outer surface of the tungsten rod; and a plurality of aluminum foils supported along the longitudinal direction of the tungsten coil; wherein the tungsten rod is formed as a single metal rod body rather than a filament structure formed by twisting a plurality of wires, thereby having a structure that alleviates stress concentration due to repeated thermal expansion and contraction, and the aluminum foils are configured such that the uneven portions formed on both sides engage with the tungsten coil, thereby preventing downward slippage even under the action of self-weight due to melting during the deposition process.

[0029] The second invention is characterized in that, in the first invention, the tungsten rod is arranged in a vertical direction and is fixed by a clamp at the top and bottom ends, respectively, which is electrically connected to an electrode part.

[0031] The third invention is characterized in that, in the first invention, the tungsten coil is formed in a coil shape that is wound around the outer circumference of the tungsten rod or detachably coupled.

[0033] delete

[0034] delete

[0035] The fifth invention is characterized in that, in any one of the first to third inventions, the diameter of the tungsten rod is 1 mm to 5 mm, and the diameter of the wire forming the tungsten coil is 0.3 mm to 0.9 mm.

[0037] The sixth invention is characterized in that, in the second invention, a weight is attached to the lower end of the tungsten rod, and the weight is supported by a braided wire or a flexible connecting means so that the tungsten rod can move in the left and right directions due to external force or thermal expansion, thereby relieving impact and stress.

[0039] The seventh invention relates to an aluminum vacuum deposition system, comprising: a vacuum chamber; a multi-stage vacuum pump for forming a vacuum inside the vacuum chamber; a pair of doors hinged to both sides of the vacuum chamber and independently opening and closing to the vacuum chamber; and a cylindrical tungsten evaporator for aluminum vacuum deposition according to the first invention, installed at each door and positioned in the central area of ​​the vacuum chamber; wherein the system is configured such that while one door is coupled to the vacuum chamber to perform a deposition process, preparation work for the next process can be performed at the other door.

[0041] The eighth invention is characterized in that, in the seventh invention, a conductive member extending in a horizontal direction is installed on the inner ceiling and floor surfaces of each door, a clamp is fixed to each conductive member, and the tungsten rod is arranged in a vertical direction through the clamp, so that the tungsten rod and the tungsten coil are positioned in the central area of ​​the vacuum chamber. Effects of the invention

[0043] According to the cylindrical tungsten evaporator for aluminum vacuum deposition and the vacuum deposition system equipped therewith according to the present invention, by applying a cylindrical tungsten rod in the form of a single metal rod instead of a conventional filament structure formed by twisting a plurality of wires,

[0044] In a conventional filament structure formed by twisting multiple wires, the micro-gap between the wires widens due to repeated heating cycles, and the repetitive problem of molten liquid aluminum infiltrating into the said gaps by capillary action can be solved.

[0045] Furthermore, it can alleviate stress concentrations occurring during repetitive thermal expansion and contraction processes, thereby suppressing cracks, short circuits, and fatigue failure, which has the effect of improving the overall durability and service life of the evaporator.

[0046] In addition, by configuring a plurality of aluminum foils to be stably supported on a tungsten coil coupled to the outer surface of a tungsten rod, localized concentrated melting or downward drop of aluminum can be prevented, and the deposition quality and thickness uniformity of the aluminum foil formed on the surface of the substrate can be improved.

[0047] In addition, by configuring the uneven surface of the aluminum foil to catch on the tungsten coil, it is possible to suppress the phenomenon of the aluminum foil sliding downward even in a molten state. Brief explanation of the drawing

[0049] FIG. 1 is a configuration diagram of a round bar type tungsten evaporator for aluminum vacuum deposition according to the present invention. FIG. 2 is a photograph showing the main parts of a round bar type tungsten evaporator for aluminum vacuum deposition according to the present invention. FIG. 3 is a schematic diagram showing a vacuum deposition system equipped with a round bar type tungsten evaporator for aluminum vacuum deposition according to the present invention. Figure 4 is a photograph showing the main part of Figure 3. Fig. 5 is a photograph showing the door opened in Fig. 3. Specific details for implementing the invention

[0050] The following objects, other objects, features, and advantages of the present invention will be easily understood through the following preferred embodiments associated with the accompanying drawings. However, the present invention is not limited to the embodiments described herein and may be embodied in other forms.

[0051] Rather, the embodiments introduced herein are provided to ensure that the disclosed content is thorough and complete, and to ensure that the spirit of the invention is sufficiently conveyed to those skilled in the art.

[0052] The embodiments described and illustrated herein also include complementary embodiments.

[0053] In this specification, the singular form includes the plural form unless specifically stated otherwise in the text. As used in this specification, 'comprise' and / or 'comprising' does not exclude the presence or addition of one or more other components to the mentioned component.

[0054] The present invention will be described in detail below with reference to the drawings. In describing the specific embodiments below, various specific details have been included to explain the invention more specifically and to aid in understanding. However, a reader with sufficient knowledge in the art to understand the invention will recognize that it can be used without these various specific details. In some cases, it is noted in advance that commonly known parts that are not significantly related to the invention have been omitted to prevent confusion in describing the invention.

[0056] FIG. 1 is a schematic diagram of a round bar type tungsten evaporator for aluminum vacuum deposition according to the present invention, and FIG. 2 is a photograph showing the main parts of a round bar type tungsten evaporator for aluminum vacuum deposition according to the present invention.

[0058] As illustrated in FIGS. 1 and 2, the present invention relates to a tungsten evaporator (100) for aluminum vacuum deposition that can improve durability and lifespan by applying a tungsten rod in the form of a single metal rod rather than a braided structure formed by twisting a plurality of wires, thereby mitigating stress concentration caused by thermal expansion and thermal contraction during repeated heating and cooling processes and preventing structural deformation and wire breakage.

[0059] In addition, the present invention relates to a round bar type tungsten evaporator (100) for aluminum vacuum deposition that can enable uniform heating during the aluminum melting and evaporation process and improve the uniformity of deposition efficiency and deposition quality by configuring a plurality of aluminum foil plates to stably support tungsten coils arranged at regular intervals on the outer surface of a tungsten rod.

[0060] In addition, the present invention relates to a round bar type tungsten evaporator (100) for aluminum vacuum deposition, which is configured so that the uneven portion of the aluminum foil catches on the tungsten coil and applies a movable weight to the bottom of the tungsten rod, thereby preventing downward sliding of the aluminum foil during the deposition process and simultaneously relieving stress caused by external impact or thermal deformation, thereby improving the stable operation and maintenance reliability of the device.

[0062] The cylindrical tungsten evaporator (100) for aluminum vacuum deposition according to the present invention is composed of three main parts, which may consist of a cylindrical tungsten rod (10), a tungsten coil (20), and an aluminum foil (30).

[0064] The above tungsten rod (10) is configured to generate heat when power is applied, and functions as a heat source that provides a heat source for heating and vaporizing the aluminum foil.

[0065] The above tungsten rod (10) is formed as a single metal rod in the shape of a round bar, and is formed as an integrated structure rather than a filament structure in which multiple wires are twisted.

[0066] The above tungsten rod (10) is formed as a single rod body in this way, thereby eliminating structural discontinuities that may occur in conventional multiple wire twist structures and having a structure that relieves stress concentration even in an environment where thermal expansion and contraction are repeated.

[0067] In addition, since the tungsten rod (10) is formed as a single metal rod, the current density can be formed uniformly, and accordingly, the occurrence of local overheating is reduced, thereby enabling more uniform heating characteristics.

[0068] In particular, in conventional filament structures formed by twisting multiple wires, repeated heating cycles cause micro-gap formations between the wires, leading to a recurring problem where molten liquid aluminum infiltrates these gaps through capillary action.

[0069] At this stage, the infiltrated aluminum forcibly expands the gap between the wires due to the difference in thermal expansion coefficients with tungsten when reheated in the subsequent process after solidification; this repeated expansion and contraction rapidly accelerates fatigue failure of the tungsten material, causing the heat source to rupture within a short period of time.

[0070] A single rod structure such as the tungsten rod (10) of the present invention can block this fatigue failure mechanism and significantly extend the service life by fundamentally eliminating spatial gaps through which aluminum can penetrate.

[0071] The above tungsten rod (10) is arranged in a vertical direction, and the top and bottom ends are each fixed by a clamp (40) electrically connected to an electrode part (not shown).

[0072] At this time, the clamp (40) can be configured to perform electrical transmission and mechanical fixation simultaneously, and to stably supply current to the tungsten rod (10).

[0073] The vertical arrangement described above is aligned with the direction of gravity, which can contribute to maintaining the flow and distribution of molten aluminum stably during the deposition process.

[0074] In addition, the diameter of the tungsten rod (10) can be formed to be 1 mm to 5 mm. The diameter range can be set to a range that enables stable heat generation when power is applied, while preventing excessive localized heat generation or mechanical deformation.

[0075] For example, if the diameter is less than 1 mm, the mechanical strength is reduced, and deformation or breakage may occur during long-term use, and if the diameter exceeds 5 mm, excessive power may be required to reach the required heating temperature.

[0076] Meanwhile, a weight (50) can be attached to the lower part of the tungsten rod (10).

[0077] The weight (50) is supported by a braided wire or a flexible connecting means (60), and allows the tungsten rod (10) to move in the left and right directions when displacement occurs due to external force or thermal expansion.

[0078] Accordingly, even if deformation occurs due to external impact or heat, the stress concentrated on the tungsten rod (10) can be relieved, thereby improving structural stability.

[0079] The tungsten rod (10) configured in this way can maintain durability even in a repetitive thermal cycle environment through a movable flexible connecting means (60) and can provide stable heating characteristics.

[0081] The tungsten coil (20) is formed as a single coil and is structured to be coupled to the outer surface of the tungsten rod (10).

[0082] These tungsten coils (20) function to support aluminum foils that are joined together in multiple numbers at regular intervals along the length direction of the tungsten rod (10).

[0083] The tungsten coil (20) can be installed by being wound around the outer circumference of the tungsten rod (10) or by being fitted together in a detachable manner.

[0084] The tungsten coil (20) has a structure that is heated by heat generated from the tungsten rod (10) being conducted without the application of a separate power source, and accordingly, the tungsten coil (20) itself is not a direct heat source but is heated indirectly by the heat transferred from the tungsten rod (10).

[0085] The tungsten coil (20) performs a support function until the aluminum foil (30) is vaporized, and serves to prevent the aluminum foil (30) from moving downward along the tungsten rod (10) even if it melts due to the heat generated during the deposition process.

[0086] In addition, the diameter of the wire forming the tungsten coil (20) can be formed to be 0.3 mm to 0.9 mm.

[0087] The above diameter range can be set to a range for effectively accommodating heat transferred from the tungsten rod, along with maintaining the coil shape stably.

[0088] For example, if the diameter of the wire is less than 0.3 mm, deformation may occur in a high-temperature environment, and if it exceeds 0.9 mm, the elasticity and bonding strength of the coil may be reduced.

[0089] The tungsten coil (20) configured in this way can stably support the aluminum foil (30) through combination with the tungsten rod (10), and by suppressing positional fluctuations that may occur due to heat and gravity during the deposition process, it is possible to provide a uniform deposition environment.

[0091] The aluminum foil (30) is a material that is vaporized in a vacuum deposition process and deposited on a substrate, and is positioned in a state supported by the tungsten coil (20).

[0092] The aluminum foil (30) can be arranged in multiple numbers at regular intervals along the outer surface of the tungsten rod (10), and each aluminum foil (30) is vaporized while supported by the tungsten coil (20).

[0093] The aluminum foil (30) is heated by heat transferred from the tungsten rod (10) and heat transferred through the tungsten coil (20), melts, and then vaporizes, thereby performing a deposition process.

[0094] At this time, the aluminum foil (30) tends to move downward due to its own weight as it melts in a high-temperature environment.

[0095] To prevent this, an uneven surface (31) may be formed on the side of the aluminum foil (30).

[0096] The above-mentioned uneven portion (31) is formed to be engaged with the tungsten coil (20), and accordingly, the aluminum foil (30) has a structure that is mechanically supported against the tungsten coil (20).

[0097] The above-mentioned uneven portion (31) may be formed in a zigzag shape or a sawtooth shape and may be configured to be held in place by being caught on the wire of the tungsten coil (20).

[0098] With this structure, the aluminum foil (30) is prevented from sliding downward along the tungsten coil (20) even in a molten state during the deposition process, and can be stably maintained in a set position.

[0099] Accordingly, the vaporization position of aluminum is maintained at a constant level, thereby ensuring uniformity of the deposition thickness on the substrate.

[0100] In addition, since the aluminum foil (30) has a structure supported by the tungsten coil (20), it can be easily mounted and replaced without separate fixing means, thereby improving workability.

[0101] Although the present invention has been described above with reference to preferred embodiments, this is merely for illustrative purposes only and is not intended to limit the scope of the invention. Therefore, it is obvious to those skilled in the art that various modifications and applications are possible within the scope of the technical concept of the invention.

[0102] For example, the diameter of the tungsten rod, the shape and joining method of the tungsten coil, the shape of the aluminum foil, and the specific structure of the uneven surface can be appropriately changed depending on the purpose of use or process conditions. In addition, the arrangement structure of the tungsten coil, the number and spacing of the aluminum foil, etc., can also be modified in various forms, and all such modifications should be interpreted as being included within the technical concept of the present invention.

[0104] Hereinafter, a vacuum deposition system equipped with a round bar type tungsten evaporator for aluminum vacuum deposition according to the present invention will be described in detail together with the attached drawings.

[0106] FIG. 3 is a schematic diagram showing a vacuum deposition system equipped with a round bar type tungsten evaporator for aluminum vacuum deposition according to the present invention, FIG. 4 is a schematic diagram showing the main part of FIG. 3, and FIG. 5 is a photograph showing the door in FIG. 3 with the door open.

[0108] As shown in FIGS. 3 to 5, the present invention relates to an aluminum vacuum deposition system (200) equipped with a tungsten evaporator for aluminum vacuum deposition, wherein the tungsten evaporator (100) for aluminum vacuum deposition, comprising a tungsten rod with a single metal rod structure and a tungsten coil, is placed inside a vacuum chamber to ensure stable melting and evaporation of aluminum, and to suppress thermal deformation and wire breakage even in a repetitive deposition process, thereby improving the reliability of the deposition process and the lifespan of the device.

[0110] In addition, the present invention relates to an aluminum vacuum deposition system (200) equipped with a round bar type tungsten evaporator for aluminum vacuum deposition, which can shorten process waiting time and improve continuous productivity by using a pair of doors hinged to each side of a vacuum chamber, so that while a deposition process is performed at one door, mounting, replacement, and preparation work of the deposited object can be performed simultaneously at the other door.

[0112] In addition, the present invention relates to an aluminum vacuum deposition system (200) equipped with a cylindrical tungsten evaporator for aluminum vacuum deposition, wherein a cylindrical tungsten evaporator (100) is installed in each door and a substrate is placed around the periphery thereof, thereby forming a uniform aluminum deposition layer over the substrate and minimizing variations in deposition quality.

[0114] The above vacuum chamber (210) is a component that provides a space for an aluminum vacuum deposition process to be performed inside, and has a sealed structure that is isolated from the outside.

[0115] The interior of the above vacuum chamber (210) is formed into a vacuum state by a vacuum pump, thereby providing an environment in which the vaporization and deposition of aluminum can be carried out smoothly.

[0116] And a multi-stage vacuum pump for forming a vacuum inside the vacuum chamber (210) may be connected to the above vacuum chamber (210).

[0118] As shown in FIG. 3, the multi-stage vacuum pump is a component for forming a vacuum inside a vacuum chamber (210), and is structured such that a plurality of pumps responsible for different pressure ranges are connected in stages and operate sequentially.

[0119] In one embodiment, the multi-stage vacuum pump may include a rotary piston pump (220a), a vacuum pump (220b), and a high vacuum pump (220c), and the rotary piston pump (220a), the vacuum pump (220b), and the high vacuum pump (220c) may be configured to operate sequentially.

[0120] The rotary piston pump (220a) can be configured to discharge air inside the vacuum chamber (210) in the initial section to perform depressurization in a relatively high pressure region.

[0121] Afterward, the vacuum pump (220b) may be configured to perform additional gas removal in the pressure state lowered by the rotary piston pump (220a) to proceed with depressurization to an intermediate pressure region.

[0122] Next, the high vacuum pump (220c) can be configured to reduce pressure from the pressure state formed by the vacuum pump (220b) to a lower pressure region to form a high vacuum state suitable for a deposition process.

[0123] In this way, by operating multiple pumps sequentially, efficient pressure reduction is achieved in a manner suitable for each pressure range, allowing the target vacuum level to be reached more stably and quickly.

[0124] Here, the configuration of the rotary piston pump (220a), vacuum pump (220b), and high vacuum pump (220c) is merely one embodiment, and the type or combination of pumps in each stage may be changed as needed.

[0126] A pair of doors (230) may be installed on each side of the vacuum chamber (210) by hinge connection.

[0127] Each door (230) is a component that opens and closes the internal space of the vacuum chamber (210) and is configured to be selectively open and close.

[0128] As shown in FIG. 5, a plurality of supports (240) for supporting a deposition object may be provided inside the vacuum chamber (210) along with the inside of each door (230).

[0129] The above-mentioned mounting bracket (240) can be placed around the substrate so that the aluminum vaporized from the evaporation device (100) can reach the substrate uniformly.

[0130] Additionally, each door (230) can be configured to open and close independently of each other.

[0131] Accordingly, while the one-sided door (230) is coupled with the vacuum chamber (210) and the deposition process is being performed, the other-sided door (230) is kept open so that the mounting or replacement of the deposition object for the next process can be performed.

[0132] With this structure, the deposition process and the preparation process can be performed in parallel, thereby improving overall process efficiency. Meanwhile, a conductive member (231) extending horizontally to correspond to each other can be installed on the inner ceiling and floor surfaces of each door (230).

[0133] As shown in FIGS. 4 and 5, a clamp (40) of a round bar-shaped tungsten evaporator (100) for aluminum vacuum deposition is fixed to the conductive member (231), and a tungsten rod (10) can be installed in a vertical direction through the clamp (40).

[0134] At this time, the horizontal position of the conductive member (231) can be adjusted so that the distance from the object to be worked on can be adjusted.

[0135] Additionally, each of the above-mentioned conductive members (231) may be further provided with an electrode portion (232) connected to an external power source, thereby enabling a stable current supply to the tungsten rod (10).

[0136] Each door (230) configured in this way performs the function of opening and closing the vacuum chamber (210) and, at the same time, includes a cylindrical tungsten evaporator (100) for aluminum vacuum deposition and a structure for supporting and supplying power to the deposition material, thereby simultaneously improving the efficiency of the deposition process and the convenience of operation.

[0137] Accordingly, the vaporization efficiency of aluminum is improved, and the stability of the deposition process can be ensured.

[0139] The embodiments described in this specification and the configurations illustrated in the drawings are merely the most preferred embodiments of the present invention and do not represent all of the technical ideas of the present invention; therefore, it should be understood that various equivalents and modifications that can replace them may exist at the time of filing this application. Explanation of the symbols

[0141] 10: Tungsten rod 20: Tungsten coil 30: Aluminum foil 31: Irregular / recessed part 40: Clamp 50: Weight 60: Means of connecting sway 100: Round bar type tungsten evaporator for aluminum vacuum deposition 200: Aluminum Vacuum Deposition System 210: Vacuum chamber 220a: Rotary piston pump 220b: Vacuum pump 220c: High vacuum pump 230: Door 231: Conductive member 232: Electrode part 240: Stand

Claims

Claim 1 An evaporator for aluminum vacuum deposition comprising: a tungsten rod (10) that generates heat upon power application; a tungsten coil (20) coupled to the outer surface of the tungsten rod (10); and a plurality of aluminum foils (30) supported along the longitudinal direction of the tungsten coil (20); wherein the tungsten rod (10) is formed as a single metal rod body rather than a filament structure formed by twisting a plurality of wires, thereby having a structure that alleviates stress concentration due to repeated thermal expansion and contraction, and wherein the aluminum foils (30) are configured such that uneven portions (31) formed on both sides engage with the tungsten coil (20), thereby preventing downward slippage even under the action of self-weight due to melting during the deposition process. Claim 2 A cylindrical tungsten evaporator for aluminum vacuum deposition according to claim 1, characterized in that the tungsten rod (10) is arranged in a vertical direction and is fixed by a clamp (40) at the top and bottom ends, respectively, which is electrically connected to an electrode part (232). Claim 3 A cylindrical tungsten evaporator for aluminum vacuum deposition according to claim 1, characterized in that the tungsten coil (20) is formed in a coil shape that is wound around the outer circumference of the tungsten rod (10) or detachably coupled. Claim 4 delete Claim 5 A round bar type tungsten evaporator for aluminum vacuum deposition, characterized in that, in any one of claims 1 to 3, the diameter of the tungsten rod (10) is 1 mm to 5 mm and the diameter of the wire forming the tungsten coil (20) is 0.3 mm to 0.9 mm. Claim 6 A round bar type tungsten evaporator for aluminum vacuum deposition, characterized in that, in paragraph 2, a weight (50) is attached to the lower end of the tungsten rod (10), and the weight (50) is supported by a braided wire or a flexible connecting means (60) so that the tungsten rod can move in the left and right directions due to external force or thermal expansion, thereby relieving impact and stress. Claim 7 An aluminum vacuum deposition system comprising: a vacuum chamber (210); a multi-stage vacuum pump (220b) for forming a vacuum inside the vacuum chamber (210); a pair of doors (230) hinged to both sides of the vacuum chamber (210) and independently opening and closing the vacuum chamber (210); and a cylindrical tungsten evaporator (100) for aluminum vacuum deposition according to claim 1, installed at each door (230) and positioned in the central area of ​​the vacuum chamber (210); wherein one side door (230) is coupled to the vacuum chamber (210) to perform a deposition process, while the other side door is configured to allow preparation work for the next process. Claim 8 An aluminum vacuum deposition system according to claim 7, wherein a conductive member (231) extending horizontally is installed on the inner ceiling and floor surfaces of each door (230), a clamp (40) is fixed to each conductive member (231), and the tungsten rod is arranged vertically through the clamp (40) so that the tungsten rod (10) and the tungsten coil (20) are positioned in the central area of ​​the vacuum chamber (210).

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