Substrate, selective membrane deposition method, organic deposition film and organic matter

Abstract

A selective film deposition method characterized by exposing a substrate having a structure in which both a first surface region containing a metal element and a second surface region containing a non-metal inorganic material are exposed to a solution containing an organic material and a solvent represented by the following general formula (1), thereby selectively depositing a film of the organic material on the first surface region rather than the second surface region. (In general formula (1), R1 is a hydrocarbon group that may have a heteroatom or a halogen atom having 4 to 100 carbon atoms, and m hydrogen atoms of the hydrocarbon group are substituted with X. X is -PO3(R2)2, -O-PO3(R2)2, -CO2R2, -SR2, or -SSR1. R2 is a hydrogen atom or an alkyl group having 1 to 6 carbon atoms, respectively. m is a positive integer, and if the number of carbon atoms of the hydrocarbon group is r, m / r is 0.01 to 0.25.)

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