Gas purification device

Abstract

One embodiment of the present disclosure provides a gas purification device comprising: a housing having an internal space and provided with a gas inlet and a gas outlet; a first reaction unit disposed inside the housing and filled with a first catalyst for removing a first component contained in the gas; a second reaction unit disposed inside the housing and physically partitioned from the first reaction unit and filled with a second catalyst for removing a second component contained in the gas; and a heating unit provided in the second reaction unit for heating and removing the second component adsorbed on the second catalyst, wherein the gas is introduced through the gas inlet, passes sequentially through the first reaction unit and the second reaction unit, and is discharged through the gas outlet.

Description

Technology Field

[0001] The present disclosure relates to a gas purification device, and more specifically, to an integrated gas purification device capable of performing multiple purification functions within a single device. Background Technology

[0002] Purification processes to increase the purity of specific gases for various purposes are essential across all industries. In particular, high-tech sectors such as hydrogen energy and semiconductor manufacturing require high-purity gases with perfectly controlled trace impurities.

[0003] Generally, to remove multiple impurities contained in a gas, a method is used in which several unit devices with the function of removing each impurity are connected in series. For example, a catalytic reaction device that chemically converts specific components contained in the gas and an adsorption device that physically adsorbs other components, such as moisture, are configured separately and arranged sequentially.

[0004] However, this conventional method had the problem that the entire system occupied a large amount of space and the piping structure for connecting devices became complex because unit devices for each function had to be installed independently. In addition, there were inefficient aspects, such as reduced reaction efficiency due to uneven internal gas flow or temperature distribution caused by the simple structure of each device, or significant energy loss during the process of regenerating the adsorbent by heating it. Prior art literature

[0005] Chinese Patent Publication No. 110129817 (August 16, 2019) The problem to be solved

[0006] The present disclosure is intended to solve the problems of the aforementioned prior art, and the purpose of the present disclosure is to provide a gas purification device capable of maximizing the space efficiency of the facility by integrating multiple gas purification functions into a single device, and improving gas reaction efficiency and energy efficiency through internal structure optimization. means of solving the problem

[0007] To achieve the above objectives, one aspect of the present disclosure provides a gas purification device comprising: a housing having an internal space and equipped with a gas inlet and a gas outlet; a first reaction unit disposed within the housing and filled with a first catalyst for removing a first component contained in the gas; a second reaction unit disposed within the housing and physically partitioned from the first reaction unit and filled with a second catalyst for removing a second component contained in the gas; and a heating unit provided in the second reaction unit for heating and removing the second component adsorbed on the second catalyst, wherein the gas is introduced through the gas inlet, passes sequentially through the first reaction unit and the second reaction unit, and is discharged through the gas outlet.

[0008] In one embodiment of the present disclosure, the gas purification device may be characterized in that the first reaction part is disposed in the central part of the housing, and the second reaction part is disposed annularly inside the housing to surround the first reaction part.

[0009] In one embodiment of the present disclosure, the heating unit may be a gas purification device characterized by being embedded between the second catalysts filled in the second reaction unit.

[0010] In one embodiment of the present disclosure, the heating unit may be a gas purification device characterized by including one or more heating coils.

[0011] In one embodiment of the present disclosure, the heating unit may be a gas purification device characterized by including a plurality of heating rods.

[0012] In one embodiment of the present disclosure, the gas purification device may be characterized in that the gas inlet is connected to the first reaction unit and the gas outlet is connected to the second reaction unit.

[0013] In one embodiment of the present disclosure, the gas purification device may be characterized in that the gas inlet and the gas outlet are formed on the same side of the housing.

[0014] In one embodiment of the present disclosure, the gas purification apparatus may be characterized in that the direction of gas flow passing through the first reaction section and the direction of gas flow passing through the second reaction section are opposite to each other.

[0015] In one embodiment of the present disclosure, the gas purification device may be characterized in that a porous structure in the form of a porous metal plate or a metal mesh is further provided between the first reaction part and the second reaction part.

[0016] In one embodiment of the present disclosure, the porous structure may be a gas purification device characterized in that it includes a plurality of through holes through which gas passing through the first reaction unit flows out, and the plurality of through holes are formed respectively on a side surface to distribute the gas in a lateral direction and on a bottom surface to distribute it in a downward direction.

[0017] In one embodiment of the present disclosure, the gas purification device may be characterized in that the porous structure is formed in a cap shape so as to be detachably attached to the end of the first reaction part.

[0018] In one embodiment of the present disclosure, the housing may be a gas purification device comprising a first housing forming the first reaction part and a second housing forming the second reaction part, wherein the first housing is characterized by having a cover part integrally formed to cover the upper part of the second housing.

[0019] In one embodiment of the present disclosure, the gas inlet and the gas outlet are formed in the cover portion, the gas inlet is in communication with the first reaction portion, and the gas outlet is in communication with the second reaction portion, the gas purification device may be characterized in that.

[0020] In one embodiment of the present disclosure, the gas introduced into the gas inlet is low-purity hydrogen, the gas discharged from the gas outlet is high-purity hydrogen, the first component is oxygen, and the second component is water, the gas purification device may be characterized in that.

[0021] Another aspect of the present disclosure may provide a gas purification system according to any one of claims 1 to 14, comprising a first gas purification device and a second gas purification device connected in parallel, wherein gas is selectively supplied to either the first gas purification device or the second gas purification device to perform a purification process, while the other device is alternately operated to perform a regeneration process using the heating unit. Effects of the invention

[0022] According to one aspect of the present disclosure, by integrating a first reaction unit that performs a first component removal function (catalytic reaction) and a second reaction unit that performs a second component removal function (adsorption) within a single housing, the installation area of ​​the entire facility can be reduced compared to a conventional separated system, thereby maximizing space efficiency.

[0023] In addition, by adopting a structure in which the heating unit is directly embedded inside the second reaction chamber, heat loss to the outside is minimized during catalyst regeneration, and the catalyst layer can be heated rapidly and uniformly. This significantly reduces the energy required for regeneration and shortens the regeneration time, thereby improving the operational efficiency of the device.

[0024] In addition, by forming a gas flow in which the gas passing through the central first reaction section in the first direction (downward direction) is uniformly distributed through the porous structure and then passes through the annular second reaction section in the second direction (upward direction), the gas purification efficiency and reaction stability can be significantly improved.

[0025] In addition, if a system is configured in which two integrated gas purification devices of the present disclosure are connected in parallel and operated alternately, the complex gas purification system that was conventionally composed of multiple separate reactors can be simplified, thereby improving operational efficiency.

[0026] The effects of the present disclosure are not limited to the effects described above, and should be understood to include all effects that can be inferred from the detailed description of the present disclosure or the configuration of the invention described in the claims. Brief explanation of the drawing

[0027] FIG. 1 is a perspective view of a gas purification device according to one embodiment of the present disclosure. FIGS. 2 and 3 are longitudinal cross-sectional views of a gas purification apparatus according to one embodiment of the present disclosure (cross-sectional view AA' of FIG. 1). FIG. 4 is a transverse cross-sectional view of a gas purification apparatus according to one embodiment of the present disclosure (cross-sectional view BB' of FIG. 1). FIGS. 5 and 6 are exploded views of a gas purification apparatus according to one embodiment of the present disclosure. Specific details for implementing the invention

[0028] The present invention will be described below with reference to the attached drawings. However, the present invention may be implemented in various different forms and is therefore not limited to the embodiments described herein. Furthermore, in order to clearly explain the present invention in the drawings, parts unrelated to the explanation have been omitted, and similar parts throughout the specification have been given similar reference numerals.

[0029] Throughout the specification, when it is stated that a part is "connected" to another part, this includes not only cases where they are "directly connected," but also cases where they are "indirectly connected" with other members interposed between them. Furthermore, when it is stated that a part "includes" a certain component, this means that, unless specifically stated otherwise, it does not exclude other components but rather allows for the inclusion of additional components.

[0030] Embodiments of the present invention will be described in detail below with reference to the attached drawings.

[0031] FIG. 1 is a perspective view of a gas purification device according to one embodiment of the present disclosure, FIG. 2 and FIG. 3 are longitudinal cross-sectional views of a gas purification device according to one embodiment of the present disclosure (cross-sectional view AA' of FIG. 1), FIG. 6 is a transverse cross-sectional view of a gas purification device according to one embodiment of the present disclosure (cross-sectional view BB' of FIG. 1), and FIG. 5 and FIG. 6 are exploded views of a gas purification device according to one embodiment of the present disclosure.

[0032] Referring to FIG. 1, the gas purification device (100) may be a device for removing a plurality of impurities contained in the gas to be processed.

[0033] The gas purification device (100) can produce high-purity gas (e.g., high-purity hydrogen) by sequentially removing different types of impurities (e.g., oxygen as a first component and moisture as a second component) contained in an incoming gas to be treated (e.g., low-purity hydrogen containing oxygen and moisture) within a single integrated device. In particular, the gas purification device (100) may be a device for purifying low-purity hydrogen produced from a water electrolysis stack. Although the present specification mainly describes cases where oxygen and moisture contained in hydrogen gas are removed, the scope of application of the present disclosure is not limited thereto. For example, the same structure may be applied to remove oxygen, moisture, carbon dioxide, and hydrocarbon-based impurities contained in inert gases such as nitrogen, argon, etc., by changing the type of catalyst filled in the first reaction section and the second reaction section.

[0034] To this end, the gas purification device (100) may be physically partitioned and formed with multiple reaction spaces that perform different functions inside.

[0035] Specifically, the gas purification device (100) may have a double coaxial structure comprising a first reaction unit (120) positioned at the center of the device and a second reaction unit (130) positioned to surround the outside of the first reaction unit (120) in a concentric shape. Through this integrated structure, the space occupied by the equipment can be significantly reduced compared to when multiple devices are connected in series as in the conventional method, and the structure of the entire system can be simplified.

[0036] Each component of the gas purification device (100) will be described in more detail with reference to FIGS. 2 to 4.

[0037] The gas purification device (100) may include a housing (110), a first reaction section (120), a second reaction section (130), a heating section (140), and a porous structure (150).

[0038] More specifically, the gas purification device (100) may include a housing (110) having an internal space and equipped with a gas inlet (111) and a gas outlet (112), a first reaction unit (120) disposed inside the housing (110) and filled with a first catalyst (C1) for removing a first component contained in the gas, a second reaction unit (130) disposed inside the housing (110) and physically partitioned from the first reaction unit (120) and filled with a second catalyst (C2) for removing a second component contained in the gas, and a heating unit (140) provided in the second reaction unit (130) for heating and removing the second component adsorbed on the second catalyst (C2). Here, the gas can be introduced through the gas inlet (111), sequentially pass through the first reaction unit (120) and the second reaction unit (130), and then be discharged through the gas outlet (112).

[0039] The housing (110) forms the overall shape of the gas purification device (100) and may be configured to accommodate internal components.

[0040] The housing (110) can be made of a material that is highly corrosion-resistant and can maintain mechanical strength in high temperature and high pressure environments (e.g., stainless steel, other alloy steel, or engineering plastics that have chemical resistance and heat resistance). In particular, if the housing (110) is made of plastic material, the total weight of the device can be significantly reduced to facilitate transportation and installation, and manufacturing costs can be reduced through mass production methods such as injection molding.

[0041] On the upper side of the housing (110), a gas inlet (111) into which the gas to be processed is introduced and a gas outlet (112) into which the purified gas is discharged may be formed.

[0042] The first reaction section (120) may be implemented in the form of an inner container positioned in the center of the housing (110). The internal space of the first reaction section (120) may be filled with a first catalyst (C1) for removing a first component contained in the gas. Depending on the type of first component to be removed, various catalysts may be selected for the first catalyst (C1), and its shape may also be selected in various forms, such as pellets, spheres, extruded forms, or monolithic forms like honeycomb, taking into account reaction efficiency and pressure drop. In one embodiment, when the gas to be treated is hydrogen and the first component is oxygen, the first catalyst (C1) may be a De-oxo catalyst that promotes the reaction between oxygen and hydrogen to convert them into water (for example, a catalyst in which a precious metal such as palladium (Pd) or platinum (Pt) is supported on a support).

[0043] The second reaction section (130) may be defined as an annular space between the first reaction section (120) and the inner wall of the housing (110). This space may be filled with a second catalyst (C2) for removing a second component contained in the gas. The second catalyst (C2) may include any type of adsorbent that removes the second component through physical adsorption or chemical adsorption. In one embodiment, if the second component is water, the second catalyst (C2) may be an adsorbent having the property of physically adsorbing water molecules (e.g., molecular sieve, activated alumina, silica gel, etc.).

[0044] The heating unit (140) can play a role in restoring (regenerating) the performance of the second catalyst (C2) by heating it to desorb the adsorbed moisture when the moisture adsorption capacity of the second catalyst (C2) is saturated.

[0045] The heating unit (140) can be installed inside the second reaction unit (130) in a form that is directly embedded between the particles of the second catalyst (C2) to maximize heat transfer efficiency. This internal direct heating method has very little heat loss compared to the method of indirectly heating from outside the housing, which can reduce energy consumption and enable a rapid temperature rise.

[0046] The porous structure (150) is positioned at the bottom of the first reaction section (120) and can serve to change the flow direction of the gas passing through the first reaction section (120) and to distribute the gas uniformly before it enters the second reaction section (130). In addition, if there are liquid water particles formed in the first reaction section (120) that can be scattered by the gas flow, it can also perform the function of physically colliding with the surface of the porous structure (150) to separate these liquid particles.

[0047] The porous structure (150) can be made of a structure (e.g., a metal plate or metal mesh having holes (151) of a predetermined size formed therein) that allows gas to pass through while preventing the first catalyst (C1) at the top from escaping to the bottom.

[0048] Additionally, the porous structure (150) may have various structures to effectively distribute the gas passing through the first reaction section (120) to the second reaction section (130). The material of the porous structure (150) may be implemented in various materials other than metal, such as ceramics and sintered metals that are resistant to high temperatures and chemical environments, and the size, number, and distribution of the holes (151) may be designed to minimize pressure drop by considering the flow rate, pressure, and size of the catalyst particles of the processing gas.

[0049] In one embodiment, the porous structure (150) may have the shape of a porous metal plate having a plurality of uniformly sized holes (151). This metal plate shape is easy to manufacture and can perform basic gas distribution and catalyst support functions.

[0050] In another embodiment, the porous structure (150) may have a convex shape with a central portion that protrudes gently downward to maximize gas distribution efficiency. This convex shape allows the gas descending vertically from the first reaction section (120) to spread out naturally by sliding sideways along the inclined surface of the porous structure (150), while also inducing it to be distributed downward through the through-hole in the central portion. That is, by producing an effect similar to having through-holes formed on the side and bottom surfaces, the gas is distributed more uniformly across the entire radial direction rather than being concentrated in the center of the lower space, thereby inducing a uniform reaction across the entire second reaction section (130).

[0051] Meanwhile, the porous structure (150) can be manufactured in the form of a cap that can be attached to the bottom of the first reaction section (120) via mechanical fastening means such as screw fastening or clamp fastening. This structure allows the porous structure (150) to be easily separated during replacement or replenishment of the first catalyst (C1), thereby greatly improving work convenience and maintainability.

[0052] Figure 3 shows an ideal gas flow inside a gas purification device (100).

[0053] The gas to be treated is supplied to the upper part of the first reaction section (120) through the gas inlet (111), and then undergoes a first purification process in which a first component (e.g., oxygen) is removed by coming into contact with a first catalyst (C1) while descending along a first direction (e.g., the direction of gravity). The gas that reaches the bottom of the first reaction section (120) spreads into the lower space of the second reaction section (130) while passing through a porous structure (150). At this time, the porous structure (150) can induce the gas to be distributed uniformly without leaning to one side.

[0054] The gas distributed to the lower space has its flow direction changed by 180° and rises along the annular space of the second reaction section (130) in a second direction (e.g., opposite direction of gravity) to come into contact with the second catalyst (C2). During this process, a second purification process is performed in which the second component (e.g., moisture) is adsorbed and removed. The high-purity gas purified while passing through the first reaction section (120) and the second reaction section (130) can be discharged to the outside through the gas discharge section (112).

[0055] As such, a counter-flow structure in which the downward flow in the first reaction section (120) and the upward flow in the second reaction section (130) are in opposite directions can contribute to improving overall purification performance by maximizing the residence time of the gas within a limited space and increasing the contact efficiency with the catalyst. Additionally, it can be advantageous for optimizing heat exchange between the first reaction section (120), where an exothermic reaction occurs, and the second reaction section (130), where an adsorption process occurs.

[0056] Meanwhile, the above-described gas flow direction and catalyst arrangement are merely one embodiment and are not limited thereto. According to other embodiments, the type of catalyst filled in each reaction section and the gas flow direction may be formed in reverse. For example, a first catalyst (C1) for removing a first component may be filled in an annular second reaction section (130), and a second catalyst (C2) for removing a second component may be filled in a central first reaction section (120). In this case, the gas may be introduced through a port that served as a conventional gas discharge section (112), pass through the second reaction section (130) first to remove the first component, pass through the first reaction section (120) to remove the second component, and finally be discharged through a port that served as a conventional gas inlet section (111).

[0057] Meanwhile, the heating unit (140) can be implemented in various forms that can be efficiently placed in the annular space of the second reaction unit (130).

[0058] In one embodiment, the heating unit (140) may include one or more heating coils. The structure of the heating unit (140) is described in more detail with reference to FIG. 5. The heating unit (140) may include a coil portion (141) that actually generates heat and a terminal portion (142) for connecting to an external power source. The heating unit (140) in the form of a heating coil may be embedded between the second catalyst (C2) and simultaneously arranged to wrap around the outer perimeter of the first reaction unit (120). This may be advantageous for securing a large heating area to uniformly heat the entire second catalyst (C2). The terminal portion (142) may protrude outward through a terminal hole (113) formed in the cover portion (110c) and be electrically connected to an external power supply.

[0059] In another embodiment, the heating unit (140) may include a plurality of heating rods. These plurality of heating rods may be embedded between the second catalyst (C2) and spaced apart at regular intervals (e.g., 60 or 90 degree intervals) along the outer circumference of the first reaction unit (120). The heating rod method is easy to replace even if a problem occurs with a specific rod, thus providing excellent maintainability, and may enable more precise temperature control by individually controlling the heat output of each rod.

[0060] The maximum temperature reached by the heating unit (140) may vary depending on the type of second catalyst (C2) and the regeneration conditions, and can generally be set within the range of 150 to 400 degrees Celsius (e.g., heating to 350 degrees Celsius for molecular sieve regeneration). During the regeneration process, a dry inert gas (e.g., nitrogen) may be flowed as a purge gas simultaneously with heating, or a small amount of a portion of a gas purified in another device within the system (e.g., hydrogen) may be flowed in the reverse direction to efficiently discharge the desorbed impurities to the outside of the device.

[0061] Referring to FIGS. 5 and 6, the housing (110) may have a structure in which multiple parts are combined for ease of assembly and maintenance of internal components.

[0062] Specifically, the housing (110) may include a first housing (110a) forming a first reaction section (120) and a second housing (110b) forming a second reaction section (130).

[0063] At this time, the first housing (110a) may have a structure in which a cover portion (110c) covering the upper part of the second housing (110b), which has an open top, is integrally formed. A sealing member (e.g., an O-ring or a metal gasket) to ensure airtightness may be interposed at the joint between the cover portion (110c) of the first housing (110a) and the second housing (110b), and may be firmly fixed through a plurality of fastening members (e.g., bolts and nuts).

[0064] Additionally, the gas inlet (111) and the gas outlet (112) can both be formed in the cover portion (110c). The gas inlet (111) can pass through the cover portion (110c) to communicate with the internal space of the first reaction portion (120), and the gas outlet (112) can pass through the cover portion (110c) to communicate with the internal space of the second reaction portion (130). By concentrating all ports to which gas pipes are connected in this manner on the upper cover portion (110c), piping work can be facilitated during device installation, and work efficiency can be increased during maintenance work such as catalyst replacement.

[0065] Meanwhile, in cases where a continuous supply of high-purity gas is required, a gas purification system utilizing a gas purification device (100) according to the present disclosure may install two gas purification devices (100) in parallel and operate them alternately.

[0066] The system may include valves for controlling the flow path of the incoming gas to be treated. For example, while the first gas purification device performs the purification process, the second gas purification device may operate the heating unit (140) to perform the process of regenerating the saturated second catalyst (C2).

[0067] When the second catalyst (C2) of the first gas purification device reaches a saturation point, the state of the valves can be switched so that the second gas purification device takes over the purification process and the first gas purification device enters the regeneration process.

[0068] Through this alternating operation system, high-purity gas can be produced and supplied uninterruptedly through the other device even while one device is being regenerated.

[0069] Thus, according to one aspect of the present disclosure, by integrating a first reaction unit that performs a first component removal function (catalytic reaction) and a second reaction unit that performs a second component removal function (adsorption) within a single housing, the installation area of ​​the entire facility can be reduced compared to a conventional separated system, thereby maximizing space efficiency.

[0070] In addition, by adopting a structure in which the heating unit is directly embedded inside the second reaction chamber, heat loss to the outside is minimized during catalyst regeneration, and the catalyst layer can be heated rapidly and uniformly. This significantly reduces the energy required for regeneration and shortens the regeneration time, thereby improving the operational efficiency of the device.

[0071] In addition, by forming a gas flow in which the gas passing through the central first reaction section in the first direction (downward direction) is uniformly distributed through the porous structure and then passes through the annular second reaction section in the second direction (upward direction), the gas purification efficiency and reaction stability can be significantly improved.

[0072] The foregoing description of the present invention is for illustrative purposes only, and those skilled in the art will understand that other specific forms can be easily modified without altering the technical spirit or essential features of the present invention. Therefore, the embodiments described above should be understood as illustrative in all respects and not restrictive. For example, each component described as a single unit may be implemented in a distributed manner, and components described as distributed may likewise be implemented in a combined form.

[0073] The scope of the present invention is defined by the claims set forth below, and all modifications or variations derived from the meaning and scope of the claims and equivalent concepts thereof should be interpreted as being included within the scope of the present invention. Explanation of the symbols

[0074] 100: Gas purification device 110: Housing 110a: First housing 110b: Second housing 110c: Cover part 111: Gas inlet 112: Gas exhaust part 113: Terminal hole 120: First reaction section 130: Second reaction unit 140: Heating part 141: Coil section 142: Terminal section 150: Porous structure 151: Communion C1: First catalyst C2: Second catalyst

Claims

Claim 1 A gas purification device comprising: a housing having an internal space and equipped with a gas inlet and a gas outlet; a first reaction unit disposed inside the housing and filled with a first catalyst for removing a first component contained in the gas; a second reaction unit disposed inside the housing and physically partitioned from the first reaction unit and filled with a second catalyst for removing a second component contained in the gas; and a heating unit provided in the second reaction unit for heating and removing the second component adsorbed on the second catalyst, wherein the gas is introduced through the gas inlet, passes sequentially through the first reaction unit and the second reaction unit, and is discharged through the gas outlet; one of the first reaction unit and the second reaction unit is disposed in the central part of the housing, and the other of the first reaction unit and the second reaction unit is disposed annularly inside the housing to surround the reaction unit disposed in the central part, and the direction of flow of the gas passing through the first reaction unit and the direction of flow of the gas passing through the second reaction unit are opposite to each other. Claim 2 delete Claim 3 A gas purification device according to claim 1, characterized in that the heating part is embedded between the second catalyst filled in the second reaction part. Claim 4 A gas purification device according to claim 1, wherein the heating unit comprises one or more heating coils. Claim 5 A gas purification device according to claim 1, wherein the heating unit comprises a plurality of heating rods. Claim 6 A gas purification device according to claim 1, characterized in that the gas inlet is connected to the first reaction unit and the gas outlet is connected to the second reaction unit. Claim 7 A gas purification device according to claim 1, characterized in that the gas inlet and the gas outlet are formed on the same side of the housing. Claim 8 delete Claim 9 A gas purification device according to claim 1, characterized in that a porous structure in the form of a porous metal plate or a metal mesh is further provided between the first reaction part and the second reaction part. Claim 10 A gas purification device according to claim 9, wherein the porous structure comprises a plurality of through holes through which gas passing through the first reaction section flows out, and wherein the plurality of through holes are formed respectively on a side surface to distribute the gas in a lateral direction and on a bottom surface to distribute it in a downward direction. Claim 11 A gas purification device according to claim 9, characterized in that the porous structure is formed in a cap shape so as to be detachably attached to the end of the first reaction section. Claim 12 A gas purification device according to claim 1, wherein the housing comprises a first housing forming the first reaction section; and a second housing forming the second reaction section, wherein the first housing is integrally formed with a cover section covering the upper part of the second housing. Claim 13 A gas purification device according to claim 12, wherein the gas inlet and the gas outlet are formed in the cover portion, the gas inlet is in communication with the first reaction portion, and the gas outlet is in communication with the second reaction portion. Claim 14 A gas purification device according to claim 1, wherein the gas introduced into the gas inlet is low-purity hydrogen and the gas discharged from the gas outlet is high-purity hydrogen, the first component is oxygen, and the second component is water. Claim 15 A gas purification system according to any one of claims 1, 3 to 7 and 9 to 14, comprising a first gas purification device and a second gas purification device connected in parallel, wherein gas is selectively supplied to either the first gas purification device or the second gas purification device to perform a purification process, while the other device is alternately operated to perform a regeneration process using the heating unit.

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