Chemical supply system and method of supplying chemical using the same

Abstract

A method for supplying a chemical agent is disclosed. A method for supplying a chemical agent according to one aspect of the present invention may include: a step of supplying a first chemical agent to a semiconductor manufacturing device; a step of controlling the flow rate of the first chemical agent to be constant using a flow rate controller; a step in which a control unit switches from a supply line for the first chemical agent to a supply line for the second chemical agent so as to stop supplying the first chemical agent and supply a second chemical agent to the semiconductor manufacturing device; a step in which a first pressure sensor measures a first pressure of the supply line for the first chemical agent; a step in which the control unit receives first pressure measurement data; a step in which the control unit determines whether the first pressure is greater than or equal to a first pressure setting value based on the first pressure measurement data; and, if the first pressure is greater than or equal to the first pressure setting value, the control unit applies a second control signal to the first valve to open the first valve, and the control unit applies the second control signal to the second valve to close the second valve.

Description

Technology Field

[0001] The present invention relates to a chemical supply system, and more specifically, to a chemical supply system having a plurality of chemical supply lines. Background Technology

[0002] A supply system for supplying chemical reagents in a gaseous state can be utilized in semiconductor manufacturing processes. For example, the chemical reagent may sublimate within a stored container and be supplied to the semiconductor manufacturing facility in a gaseous state. In this case, if the amount of the chemical reagent decreases below a certain level, the surface area of ​​the chemical reagent stored within the container decreases, thereby reducing the amount sublimated into gas. Consequently, the pressure and flow rate of the chemical reagent supplied to the semiconductor manufacturing facility may decrease below the supply conditions. Therefore, to continuously supply the chemical reagent to the semiconductor manufacturing facility while maintaining the pressure and flow rate above the supply conditions, a chemical reagent supply system equipped with multiple supply lines was utilized.

[0003] However, there is a problem where the chemicals stored in the containers are not supplied in sufficient quantities, resulting in a certain amount of chemicals remaining inside. Consequently, the amount of chemicals requiring disposal increases, leading to reduced process efficiency due to increased costs and the need for frequent container replacement. Furthermore, the remaining chemicals pose a safety risk to workers during container replacement operations. Additionally, there is a problem where supply efficiency decreases when all internal valves of the flow controller are fully open. The problem to be solved

[0004] The present invention is intended to solve the above-mentioned problems, and the objective of the present invention is to provide a chemical supply system for minimizing the amount of chemical remaining in a storage container for chemical substances.

[0005] In addition, another objective of the present invention is to provide a method for supplying chemicals using the chemical supply system described above.

[0006] The problems of the present invention are not limited to those mentioned above, and other unmentioned problems will be clearly understood by a person skilled in the art to which the present invention pertains from the description below. means of solving the problem

[0007] According to one aspect of the present invention, a chemical supply system for supplying a chemical to a semiconductor manufacturing device comprises: a first chemical supply line including a first supply tank in which a first chemical is stored and a first supply pipe for connecting the first supply tank and the semiconductor manufacturing device; a second chemical supply line including a second supply tank in which a second chemical identical to the first chemical is stored and a second supply pipe in which the second supply pipe is fluidly connected to the first supply pipe and the semiconductor manufacturing device and the second supply tank; a flow controller in which the first chemical supply line and the second chemical supply line are fluidly connected to each other and for controlling the flow rate of at least one of the first chemical and the second chemical; and a first valve installed in the first supply pipe for selectively allowing the flow of the first chemical moving from the first supply tank to the flow controller. A chemical supply system is provided, comprising: a second valve installed within the second supply pipe and selectively allowing the flow of the second chemical moving from the second supply tank to the flow controller; and a first pressure sensor connected to the first supply pipe and for measuring a first pressure inside the first supply pipe.

[0008] At this time, the chemical supply system further includes a control unit for controlling the first valve and the second valve, and the control unit applies a first control signal to the first valve and the second valve to supply the second chemical to the semiconductor manufacturing device, thereby switching from the supply line for the first chemical to the supply line for the second chemical, and the control unit applies a second control signal to the first valve and the second valve to supply the first chemical to the semiconductor manufacturing device, thereby switching from the supply line for the second chemical to the supply line for the first chemical.

[0009] Additionally, switching from the first chemical supply line to the second chemical supply line may include the flow controller measuring the degree of opening of an internal valve provided inside the flow controller, the control unit receiving first valve measurement data regarding the degree of opening of the internal valve, the control unit determining whether the degree of opening is greater than or equal to a first valve setting value based on the first valve measurement data, and, if the degree of opening is greater than or equal to the first valve setting value, the control unit applying the first control signal to the first valve to close the first valve, and the control unit applying the first control signal to the second valve to open the second valve.

[0010] Additionally, switching from the first chemical supply line to the second chemical supply line may include the first pressure sensor measuring the first pressure, the control unit receiving first pressure measurement data for the first pressure, the control unit determining whether the first pressure is less than or equal to a first pressure set value based on the first pressure measurement data, and, if the first pressure is less than or equal to the first pressure set value, the control unit applying the first control signal to the first valve to close the first valve, and the control unit applying the first control signal to the second valve to open the second valve.

[0011] Additionally, switching from the second chemical supply line to the first chemical supply line may include the first pressure sensor measuring the first pressure, the control unit receiving first pressure measurement data for the first pressure from the first pressure sensor, the control unit determining whether the first pressure is greater than or equal to a first pressure setting value based on the first pressure measurement data, and, if the first pressure is greater than or equal to the first pressure setting value, the control unit applying the second control signal to the second valve to close the second valve, and the control unit applying the second control signal to the first valve to open the first valve.

[0012] According to another aspect of the present invention, a chemical supply system for supplying a chemical to a semiconductor manufacturing device comprises: a first chemical supply line including a first supply tank in which a first chemical is stored and a first supply pipe for connecting the semiconductor manufacturing device and the first supply tank; a second chemical supply line including a second supply tank in which a second chemical identical to the first chemical is stored and a second supply pipe in fluid communication with the first supply pipe and for connecting the semiconductor manufacturing device and the second supply tank; a first valve installed in the first supply pipe for selectively allowing the flow of the first chemical moving from the first supply tank to the semiconductor manufacturing device; a second valve installed in the second supply pipe for selectively allowing the flow of the second chemical moving from the second supply tank to the semiconductor manufacturing device; and a first pressure sensor connected to the first supply pipe for measuring a first pressure inside the first supply pipe.

[0013] At this time, the chemical supply system further includes a control unit for controlling the first valve and the second valve, and the control unit applies a first control signal to the first valve and the second valve to supply the second chemical to the semiconductor manufacturing device, thereby switching from the supply line for the first chemical to the supply line for the second chemical, and the control unit applies a second control signal to the first valve and the second valve to supply the first chemical to the semiconductor manufacturing device, thereby switching from the supply line for the second chemical to the supply line for the first chemical.

[0014] Additionally, switching from the first chemical supply line to the second chemical supply line may include the first pressure sensor measuring the first pressure, the control unit receiving first pressure measurement data for the first pressure, the control unit determining whether the first pressure is less than or equal to a first pressure set value based on the first pressure measurement data, and, if the first pressure measurement data indicates that the first pressure is less than or equal to the first pressure set value, the control unit applying the first control signal to the first valve to close the first valve, and the control unit applying the first control signal to the second valve to open the second valve.

[0015] Additionally, switching from the supply line for the second chemical agent to the supply line for the first chemical agent may include the first pressure sensor measuring the first pressure, the control unit receiving first pressure measurement data for the first pressure, and the control unit determining whether the first pressure is greater than or equal to the first pressure setting value based on the first pressure measurement data, and if the first pressure is greater than or equal to the first pressure setting value, the control unit applying the second control signal to the second valve to close the second valve, and the control unit applying the second control signal to the first valve to open the first valve.

[0016] In addition, the chemical supply system is connected to the second supply pipe and may further include a second pressure sensor for measuring a second pressure inside the second supply pipe.

[0017] According to another aspect of the present invention, a method for supplying a chemical agent to a semiconductor manufacturing device comprises: supplying a first chemical agent stored in a first supply tank to a semiconductor manufacturing device through a first chemical agent supply line; controlling the flow rate of the first chemical agent supplied to the semiconductor manufacturing device by a flow controller to be constant; switching from the first chemical agent supply line to the second chemical agent supply line by a control unit applying a first control signal to a first valve and a second valve to selectively supply the second chemical agent to the semiconductor manufacturing device; measuring a first pressure, which is an internal pressure of the first chemical agent supply line, by a first pressure sensor connected to the first chemical agent supply line; receiving first pressure measurement data for the first pressure from the first pressure sensor; and determining whether the first pressure is greater than or equal to a first pressure set value based on the first pressure measurement data. A chemical supply method is provided, comprising the step of, when the first pressure is greater than or equal to the first pressure setting value, applying a second control signal to the first valve to open the first valve, and applying the second control signal to the second valve to close the second valve.

[0018] At this time, the step of switching from the first chemical supply line to the second chemical supply line may include: a step in which the flow controller measures the degree of opening of an internal valve provided inside the flow controller; a step in which the control unit receives first valve measurement data regarding the degree of opening of the internal valve; a step in which the control unit determines whether the degree of opening is greater than or equal to a first valve setting value based on the first valve measurement data; and, if the degree of opening is greater than or equal to the first valve setting value, the control unit applies the first control signal to the first valve to close the first valve, and the control unit applies the first control signal to the second valve to open the second valve.

[0019] Additionally, the step of switching from the first chemical supply line to the second chemical supply line may include: the first pressure sensor measuring the first pressure; the control unit receiving second pressure measurement data for the first pressure; the control unit determining whether the first pressure is less than or equal to a second pressure setting value based on the second pressure measurement data; and, if the first pressure is less than or equal to the second pressure setting value, the control unit applying the first control signal to the first valve to close the first valve, and the control unit applying the first control signal to the second valve to open the second valve.

[0020] In addition, the first pressure setting value may be the same as the second pressure setting value. Effects of the invention

[0021] According to the above configuration, a chemical supply system according to one aspect of the present invention may include a first chemical supply line for supplying a first chemical, a second chemical supply line for supplying a second chemical, a first valve installed within the first chemical supply line, a second valve installed within the second chemical supply line, a first pressure sensor connected to the first supply pipe, and a control unit for controlling the first valve and the second valve.

[0022] The control unit may close the first valve and open the second valve when the first pressure inside the first supply pipe, measured by the first pressure sensor, is below a preset pressure. Additionally, the control unit may open the first valve and close the second valve again when the first pressure is above a preset pressure.

[0023] Accordingly, the chemical supply system prevents the pressure of the first chemical supply line from decreasing below a preset pressure, and furthermore, can reduce process costs by minimizing the residual amount of the first chemical. In addition, since the chemical supply system can continuously supply chemicals by utilizing the first chemical supply line and the second chemical supply line, process efficiency can be increased.

[0024] In addition, the chemical supply system may further include a flow controller for fluidly communicating with the first chemical supply line and the second chemical supply line, respectively.

[0025] The control unit may close the first valve and open the second valve when the degree of opening of the flow controller measured by the flow controller is greater than or equal to a preset value. Additionally, the control unit may again open the first valve and close the second valve when the first pressure is greater than or equal to a preset pressure.

[0026] Accordingly, the chemical supply system prevents the pressure of the first chemical supply line from decreasing below a preset pressure, and furthermore, the chemical supply system can prevent the flow controller from opening completely, thereby preventing a decrease in process efficiency. Moreover, process costs can be reduced by minimizing the remaining amount of the first chemical supply line. Additionally, since the chemical supply system can continuously supply chemicals by utilizing the first chemical supply line and the second chemical supply line, process efficiency can be increased.

[0027] The effects of the present invention are not limited to the effects described above, and should be understood to include all effects that can be inferred from the configuration of the invention described in the detailed description or claims of the present invention. Brief explanation of the drawing

[0028] FIG. 1 is a configuration diagram showing a chemical supply system according to an embodiment of the present invention. FIG. 2 is a flowchart showing a chemical supply method according to an embodiment of the present invention. FIG. 3 is a diagram showing the supply of a first chemical in a supply method according to an embodiment of the present invention. FIG. 4 is a diagram showing the measurement of the supply status of the first chemical in a supply method according to an embodiment of the present invention. FIG. 5 is a diagram showing the supply of the first chemical being cut off and the supply of a second chemical being supplied in a supply method according to an embodiment of the present invention. FIG. 6 is a diagram showing the measurement of the first pressure of the first supply pipe in a supply method according to an embodiment of the present invention. FIG. 7 is a diagram showing the supply of the second chemical being cut off and the supply of the first chemical being supplied in a supply method according to an embodiment of the present invention. FIG. 8 is a flowchart showing a chemical supply method according to an embodiment of the present invention. FIG. 9 is a flowchart showing a chemical supply method according to an embodiment of the present invention. FIG. 10 is a diagram showing the waiting for the supply of the second chemical in a supply method according to an embodiment of the present invention. FIG. 11 is a drawing showing the measurement of the remaining amount of the first chemical in a supply method according to an embodiment of the present invention. FIG. 12 to FIG. 14 are drawings showing the replacement of the first supply tank in which the first chemical is stored in a supply method according to an embodiment of the present invention. Specific details for implementing the invention

[0029] Hereinafter, embodiments of the present invention are described in detail with reference to the attached drawings so that those skilled in the art can easily implement the present invention. The present invention may be embodied in various different forms and is not limited to the embodiments described herein. To clearly explain the present invention, parts unrelated to the description in the drawings have been omitted, and the same reference numerals have been used throughout the specification for identical or similar components.

[0030] The words and terms used in this specification and claims are not limited to their ordinary or dictionary meanings, but should be interpreted in a meaning and concept consistent with the technical spirit of the invention in accordance with the principles by which the inventor defines terms and concepts to best describe his invention.

[0031] Therefore, the embodiments described in this specification and the configurations illustrated in the drawings correspond to preferred embodiments of the present invention and do not represent all technical concepts of the present invention; thus, various equivalents and modifications that may replace such configurations may exist at the time of filing the present invention.

[0032] In this specification, terms such as "comprising" or "having" are intended to describe the existence of the features, numbers, steps, actions, components, parts, or combinations thereof described in the specification, and should not be understood as precluding the existence or addition of one or more other features, numbers, steps, actions, components, parts, or combinations thereof.

[0033] The statement that a component is "in front," "rear," "upper," or "lower" of another component includes, unless there are special circumstances, not only being positioned "in front," "rear," "upper," or "lower" in direct contact with the other component, but also cases where another component is positioned in between. Furthermore, the statement that a component is "connected" to another component includes, unless there are special circumstances, not only being directly connected to each other, but also being indirectly connected to each other.

[0034] Hereinafter, a chemical supply system according to one embodiment of the present invention will be described with reference to the drawings.

[0035] FIG. 1 is a schematic diagram showing a chemical supply system according to one embodiment of the present invention.

[0036] Referring to FIG. 1, a chemical supply system (10) according to one embodiment of the present invention may include a chemical supply device (100) comprising a plurality of chemical supply lines and a control unit (200) for controlling the chemical supply device (100). The chemical supply device may include a first chemical supply line (110) for supplying a first chemical to a semiconductor manufacturing device (SA), a second chemical supply line (120) for supplying a second chemical to a semiconductor manufacturing device (SA), and a flow controller (130) for controlling the flow rates of the first chemical and the second chemical supplied to the semiconductor manufacturing device (SA). Additionally, the chemical supply device may further include a first pressure sensor (142) for measuring a first pressure of the first chemical supply line (110) and a second pressure sensor (144) for measuring a second pressure of the second chemical supply line (120).

[0037] Additionally, the chemical supply device (100) may further include a first remaining amount measuring sensor (113) for measuring the remaining amount of the first chemical and a second remaining amount measuring sensor (123) for measuring the remaining amount of the second chemical. However, it will be understood that the present invention is not limited thereto. Accordingly, the chemical supply device may not include separate remaining amount measuring sensors. In this case, the chemical supply device may use a flow controller (130) to measure the first chemical and the second chemical supplied to the semiconductor manufacturing device and calculate the remaining amount of the first chemical and the remaining amount of the second chemical.

[0038] Additionally, the control unit (200) can be connected to the first chemical supply line (110), the second chemical supply line (120), the flow controller (130), the first pressure sensor (142), the second pressure sensor (144), the first remaining amount measuring sensor (113), and the second remaining amount measuring sensor (123), respectively.

[0039] In exemplary embodiments, the first chemical supply line (110) may include a first supply tank (112) for storing (or storing) the first chemical and a first supply pipe (114) for connecting the first supply tank (112) to a semiconductor manufacturing device (SA). For example, the first chemical may be a chemical used in a semiconductor manufacturing process using the semiconductor manufacturing device (SA). Additionally, the first chemical supply line (110) may include a first valve (VA1) and a third valve (VA2) installed sequentially in the first supply pipe (114).

[0040] For example, the first supply pipe (114) is positioned between the first supply tank (112) and the flow controller (130) and may be fluidly connected to the first supply tank (112) and the flow controller (130), respectively. Additionally, the first supply pipe (114) is sequentially connected to the flow controller (130), the supply line (SL), and the semiconductor manufacturing device (SA), and may supply the first chemical stored in the first supply tank (112) to the semiconductor manufacturing device (SA). For example, the supply line (SL) may include a supply valve (SV) to control the chemical supplied to the semiconductor manufacturing device (SA).

[0041] Additionally, the supply line (110) for the first chemical may be connected to a first remaining amount measuring sensor (113). The first remaining amount measuring sensor (113) may be a device for measuring a first remaining amount of the first chemical stored in the first supply tank (112). For example, the first remaining amount measuring sensor may include a load cell for measuring the weight of the first chemical in the first supply tank (112) or a level sensor for measuring the height of the first chemical in the first supply tank (112). However, it will be understood that the present invention is not limited thereto. Accordingly, the type of the first remaining amount measuring sensor may be changed.

[0042] In exemplary embodiments, the second chemical supply line (120) may include a second supply tank (122) for storing (or storing) the second chemical and a second supply pipe (124) for connecting the second supply tank (122) to a semiconductor manufacturing device (SA). For example, the second chemical may be a chemical used in a semiconductor manufacturing process using the semiconductor manufacturing device (SA). For example, the second chemical may be the same as the first chemical. Additionally, the second chemical supply line (120) may include a second valve (VA3) and a fourth valve (VA4) installed sequentially in the second supply pipe (124).

[0043] For example, the second supply pipe (124) is positioned between the second supply tank (122) and the first supply pipe (114) and may be fluidly connected to the second supply tank (122) and the first supply pipe (114), respectively. Additionally, the second supply pipe (124) is sequentially connected to the first supply pipe (114), a flow controller (130), a supply line (SL), and a semiconductor manufacturing device (SA), and may supply the second chemical stored in the second supply tank (122) to the semiconductor manufacturing device (SA).

[0044] Additionally, the supply line (120) for the second chemical may be connected to a second remaining amount measuring sensor (123). The second remaining amount measuring sensor (123) may be a device for measuring the second remaining amount of the second chemical stored in the second supply tank (122). For example, the second remaining amount measuring sensor may include a load cell for measuring the weight of the second chemical in the second supply tank (122) or a level sensor for measuring the height of the second chemical in the second supply tank (122). However, it will be understood that the present invention is not limited thereto. Accordingly, the type of the second remaining amount measuring sensor may be changed.

[0045] In exemplary embodiments, the flow controller (130) is connected to the supply line (SL), the first supply pipe (114), and the second supply pipe (124), respectively, and may be a device for controlling the supply flow rates of the first chemical and the second chemical supplied to the semiconductor manufacturing device (SA). For example, the flow controller may be a mass flow controller (MFC).

[0046] For example, the flow controller may include an internal valve. When the pressure of the chemical supplied from the first chemical supply line (110) or the second chemical supply line (120) decreases, the flow controller may gradually open the internal valve to regulate the supply flow rate supplied to the semiconductor manufacturing device (SA) to a constant level. At this time, the flow controller (130) may measure the degree of opening of the internal valve, that is, the degree of opening of the internal valve. In addition, the flow controller (130) may measure the first supply amount of the first chemical and the second supply amount of the second chemical passing through the flow controller (130).

[0047] In exemplary embodiments, the first pressure sensor (142) is fluidly connected to the first supply pipe (114) of the first chemical supply line (110) and can measure the first pressure inside the first supply pipe (114). For example, when the first valve (VA1) is closed and the third valve (VA2) is open, the first pressure sensor (142) can measure the first pressure inside the first supply pipe (114) and the first supply tank (112).

[0048] In exemplary embodiments, the second pressure sensor (144) is fluidly connected to the second supply pipe (124) of the second chemical supply line (120) and can measure the second pressure inside the second supply pipe (124). For example, when the second valve (VA3) is closed and the fourth valve (VA4) is open, the second pressure sensor (144) can measure the second pressure inside the second supply pipe (124) and the second supply tank (122).

[0049] In exemplary embodiments, the control unit (200) is connected to the supply line (SL) and can control the opening and closing of the supply valve (SV). Additionally, the control unit (200) is connected to the first chemical supply line (110) and can control the opening and closing of the first valve (VA1) and the third valve (VA2), and the control unit (200) is connected to the second chemical supply line (120) and can control the opening and closing of the second valve (VA3) and the fourth valve (VA4).

[0050] Additionally, the control unit (200) may receive first pressure measurement data for the first pressure of the first supply pipe and the first supply tank measured from the first pressure sensor (142) and second pressure measurement data for the second pressure of the second supply pipe and the second supply tank measured from the second pressure sensor (144). Additionally, the control unit (200) may receive first valve measurement data and second valve measurement data measured from the flow controller (130). For example, the first valve measurement data may be data regarding the degree of opening of the internal valve of the flow controller (130) measured while the first chemical is supplied. Additionally, the second valve measurement data may be data regarding the degree of opening of the internal valve of the flow controller (130) measured while the second chemical is supplied.

[0051] Additionally, the control unit (200) may receive first remaining amount data for the first remaining amount of the first chemical measured by the first remaining amount measuring sensor (113) and second remaining amount data for the second remaining amount of the second chemical measured by the second remaining amount measuring sensor (123). For example, the control unit (200) may analyze the first remaining amount data and the second remaining amount data to classify the first remaining amount and the second remaining amount, respectively, into a first level (L1), a second level (L2), and a third level (L3). For example, the first level (L1), the second level (L2), and the third level (L3) may be sequentially defined to indicate a state where the first remaining amount (or the second remaining amount) is relatively large, an intermediate state, and a relatively small state, respectively. However, it will be understood that the present invention is not limited thereto. Accordingly, the number of levels and the remaining amount represented by each of the levels may be changed.

[0052] As described above, the chemical supply system (10) may include a first chemical supply line (110) for supplying a first chemical, a second chemical supply line (120) for supplying a second chemical, a first valve (VA1) installed in the first chemical supply line, a second valve (VA3) installed in the second chemical supply line, a first pressure sensor (142) connected to the first supply pipe (114), and a control unit (200) for controlling the first valve and the second valve.

[0053] The control unit may close the first valve (VA1) and open the second valve (VA3) when the first pressure measured by the first pressure sensor is less than or equal to a preset pressure. Additionally, the control unit may open the first valve (VA1) and close the second valve (VA3) again when the first pressure is greater than or equal to a preset pressure.

[0054] Accordingly, the chemical supply system (10) prevents the pressure of the first chemical supply line (110) from decreasing below a preset pressure, and furthermore, can reduce process costs by minimizing the remaining amount of the first chemical. In addition, the chemical supply system (10) can continuously supply chemicals by utilizing the first chemical supply line (110) and the second chemical supply line (120), thereby increasing process efficiency.

[0055] Additionally, the chemical supply system (10) may further include a flow controller (130) for fluidly communicating with the first chemical supply line (110) and the second chemical supply line (120), respectively.

[0056] The control unit may close the first valve (VA1) and open the second valve (VA3) when the degree of opening of the internal valve of the flow controller (130), measured by the flow controller (130), is greater than or equal to a preset value. Additionally, the control unit may open the first valve (VA1) and close the second valve (VA3) again when the first pressure is greater than or equal to a preset pressure.

[0057] Accordingly, the chemical supply system (10) prevents the first pressure of the first chemical supply line (110) from decreasing below a preset pressure, and the chemical supply system (10) can prevent the internal valve of the flow controller (130) from opening completely, thereby preventing a decrease in process efficiency. Furthermore, the remaining amount of the first chemical supply line (110) can be minimized to reduce process costs. In addition, since the chemical supply system (10) can continuously supply chemicals by utilizing the first chemical supply line (110) and the second chemical supply line (120), process efficiency can be increased.

[0058] Hereinafter, a chemical supply method according to one embodiment using a chemical supply system (10) will be described.

[0059] FIG. 2 is a flowchart illustrating a chemical supply method according to an embodiment of the present invention. FIG. 3 is a diagram illustrating the supply of a first chemical in a supply method according to an embodiment of the present invention. FIG. 4 is a diagram illustrating the measurement of the supply status of the first chemical in a supply method according to an embodiment of the present invention. FIG. 5 is a diagram illustrating the supply of the first chemical being cut off and the supply of a second chemical being supplied in a supply method according to an embodiment of the present invention. FIG. 6 is a diagram illustrating the measurement of the first pressure of the first supply pipe in a supply method according to an embodiment of the present invention. FIG. 7 is a diagram illustrating the supply of the first chemical being cut off and the supply of the second chemical being supplied in a supply method according to an embodiment of the present invention.

[0060] In the chemical supply method described with reference to FIGS. 2 to 7, the chemical supply system (10) is substantially the same as the chemical supply system described with reference to FIG. 1, so the same configuration is indicated by the same reference numeral, and the repeated description of the same configuration is omitted.

[0061] Referring to FIGS. 2 and 3, the remaining amount of the second chemical stored in the second supply tank (122) is measured (S110), and the first valve (VA1) and the third valve (VA2) are opened to supply the first chemical to the semiconductor manufacturing device (SA) through the first chemical supply line, and the flow rate can be controlled to a constant flow rate through the flow controller (130) (S120). For example, the first valve (VA1) and the third valve (VA2) may be open, and the second valve (VA3) and the fourth valve (VA4) may be closed.

[0062] Referring to FIGS. 2, FIGS. 4, and FIGS. 5, a first control signal is applied to the first valve (VA1) and the second valve (VA3) to switch from the first chemical supply line (110) to the second chemical supply line (120) so as to selectively supply the second chemical to the semiconductor manufacturing device (SA) (S130).

[0063] For example, while the first chemical agent is being supplied, the flow controller (130) measures the degree of opening of the internal valve (S132a), the control unit (200) receives first valve measurement data regarding the degree of opening measured from the flow controller (130) (S134a), the control unit (200) determines whether the degree of opening is greater than or equal to the first valve setting value based on the first valve measurement data (S136a), and the control unit (200) can apply the first control signal to the first valve (VA1) and the second valve (VA3) to close the first valve (VA1) so that the first chemical agent is stopped and open the second valve (VA3) so that the second chemical agent is supplied (S138).

[0064] For example, the first valve measurement data may be within a range of '0%' to '100%'. For example, '0%' may mean that the internal valve is in a closed state. '100%' may mean that the internal valve is in a fully open state. Additionally, the first valve setting value may be determined within a range of '0%' to '100%'.

[0065] The chemical supply method according to the exemplary embodiment can increase supply efficiency. For example, if all internal valves of the flow controller (130) are open, the supply efficiency may decrease. Therefore, the chemical supply method according to the exemplary embodiment can prevent the decrease in supply efficiency by switching from the first chemical supply line (110) to the second chemical supply line (120) when the degree of opening of the internal valve is greater than or equal to the first valve setting value.

[0066] Referring to FIGS. 2, 6, and 7, a second control signal is applied to the first valve (VA1) and the second valve (VA3) to selectively supply the first chemical to the semiconductor manufacturing device (SA) by switching from the second chemical supply line (120) to the first chemical supply line (110) (S140).

[0067] For example, while the second chemical is being supplied, the first pressure sensor (142) measures the first pressure inside the first supply tank (112) and the first supply pipe (114) (S141), the control unit (200) receives first pressure measurement data for the first pressure measured from the first pressure sensor (142) (S142), the control unit (200) determines whether the first pressure is greater than or equal to the first pressure set value based on the first pressure measurement data (S143), and the control unit (200) can apply the second control signal to the first valve (VA1) and the second valve (VA3) to close the second valve (VA3) so that the second chemical is stopped and open the first valve (VA1) so that the first chemical is supplied (S144).

[0068] A chemical supply method according to an exemplary embodiment supplies a second chemical through a second chemical supply line (120) while the first pressure inside the first supply tank (112) is sufficiently recovered, and switches from the second chemical supply line (120) to the first chemical supply line (110) when the first pressure becomes greater than or equal to the first pressure setting value based on the first pressure measurement data, so that the first chemical can be supplied only when the pressure inside the first supply tank has sufficiently increased. Accordingly, the chemical supply method according to an exemplary embodiment can increase supply efficiency and further minimize the remaining amount.

[0069] Referring to FIGS. 2 through 7, only the supply of a chemical to minimize the remaining amount of the first chemical in the first supply tank (112) is illustrated. However, it will be understood that the chemical supply method according to exemplary embodiments can be substantially applied to the supply line (120) for the second chemical to minimize the remaining amount of the second chemical in the second supply tank (122). Therefore, a description of the method for minimizing the second chemical using substantially the same chemical supply method is omitted.

[0070] As described above, the chemical supply method according to exemplary embodiments may stop supplying the first chemical and supply the second chemical through the second chemical supply line (120) when the degree of opening of the internal valve of the flow controller (130) is greater than or equal to the first valve setting value. Additionally, the chemical supply method according to exemplary embodiments may stop supplying the second chemical and supply the first chemical through the first chemical supply line (110) when the first pressure is greater than or equal to the first pressure setting value.

[0071] Accordingly, the chemical supply method according to the exemplary embodiments can prevent the pressure of the first chemical supply line from decreasing below a preset pressure, and also prevent the flow controller from being fully opened, thereby preventing a decrease in process efficiency. Furthermore, the chemical supply method according to the exemplary embodiments can reduce process costs by minimizing the remaining amount of the first chemical supply line. In addition, since the chemical supply system can continuously supply chemicals by utilizing the first chemical supply line and the second chemical supply line, process efficiency can be increased.

[0072] Hereinafter, a chemical supply method according to another embodiment using a chemical supply system (10) will be described.

[0073] FIG. 8 is a flowchart illustrating a chemical supply method according to one embodiment of the present invention.

[0074] Referring to FIG. 3 and FIG. 8, in a chemical supply method according to exemplary embodiments, the remaining amount of the second chemical stored in the second supply tank (122) is measured (S110), the first valve (VA1) and the third valve (VA2) are opened to supply the first chemical to the semiconductor manufacturing device (SA) through the first chemical supply line, and the flow rate can be controlled to a constant flow rate through the flow controller (130) (S120).

[0075] Referring to FIGS. 4, 5 and 8, a first control signal is applied to the first valve (VA1) and the second valve (VA3) to switch from the first chemical supply line (110) to the second chemical supply line (120) so as to selectively supply the second chemical to the semiconductor manufacturing device (SA) (S130').

[0076] Switching from the first chemical supply line (110) to the second chemical supply line (120) (S130') while the first chemical is being supplied, the first pressure sensor (142) measures the first pressure inside the first supply tank (112) and the first supply pipe (114) (S132b), the control unit (200) receives second pressure measurement data regarding the first pressure measured from the first pressure sensor (142) (S134b), the control unit (200) determines whether the first pressure is less than or equal to the second pressure set value based on the first pressure measurement data (S136b), and the control unit (200) applies the first control signal to the first valve (VA1) and the second valve (VA3) to close the second valve (VA3) so that the second chemical is stopped and to open the first valve (VA1) so that the first chemical is supplied. There is (S138).

[0077] Referring to FIGS. 6 to 8, a second control signal is applied to the first valve (VA1) and the second valve (VA3) to selectively supply the first chemical to the semiconductor manufacturing device (SA) by switching from the second chemical supply line (120) to the first chemical supply line (110) (S140).

[0078] Switching from the second chemical supply line (120) to the first chemical supply line (110) (S140) may be substantially the same as the switching method (S140) described with reference to FIG. 2. Therefore, a description of the method is omitted.

[0079] For example, in the step (S130') of switching from the first chemical supply line (110) to the second chemical supply line (120), the second pressure setting value serving as the basis for the switching may be the same as the third pressure setting value serving as the basis for the switching in the step (S140) of switching from the second chemical supply line (120) to the first chemical supply line (110). However, it will be understood that the present invention is not limited thereto. Accordingly, the magnitude and relative relationship between the second pressure setting value and the third pressure setting value may be changed.

[0080] Referring to FIG. 8, although only a method of supplying a chemical to minimize the remaining amount of the first chemical in the first supply tank (112) has been described, it will be seen that the chemical supply method according to exemplary embodiments can be substantially applied to the supply line (120) for the second chemical to minimize the remaining amount of the second chemical in the second supply tank (122). Therefore, a description of a method to minimize the second chemical using substantially the same chemical supply method is omitted.

[0081] As described above, the chemical supply method according to exemplary embodiments may stop supplying the first chemical when the first pressure is less than or equal to the second pressure setting value and supply the second chemical through the supply line (120) for the second chemical. Additionally, the chemical supply method according to exemplary embodiments may stop supplying the second chemical when the first pressure is greater than or equal to the third pressure setting value and supply the first chemical through the supply line (110) for the first chemical.

[0082] Accordingly, the chemical supply method according to the exemplary embodiments can prevent the pressure of the first chemical supply line from decreasing below a preset pressure. Furthermore, the chemical supply method according to the exemplary embodiments can reduce process costs by minimizing the remaining amount of the first chemical supply line. In addition, since the chemical supply system can continuously supply chemicals by utilizing the first chemical supply line and the second chemical supply line, process efficiency can be increased.

[0083] Hereinafter, a chemical supply method according to another embodiment using a chemical supply system (10) according to the embodiments will be described.

[0084] FIG. 9 is a flowchart illustrating a chemical supply method according to an embodiment of the present invention. FIG. 10 is a diagram illustrating the waiting for the supply of a second chemical in a supply method according to an embodiment of the present invention. FIG. 11 to 13 are diagrams illustrating the replacement of a first supply tank in which a first chemical is stored in a supply method according to an embodiment of the present invention. FIG. 11 is a diagram illustrating the measurement of the remaining amount of the first chemical in a supply method according to an embodiment of the present invention. FIG. 12 is a diagram illustrating the measurement of the remaining amount of the first chemical in a supply method according to an embodiment of the present invention. FIG. 13 is a diagram illustrating the cessation of the supply of the first chemical and the supply of the second chemical in a supply method according to an embodiment. FIG. 14 is a diagram illustrating the replacement of the first supply tank in a supply method according to an embodiment.

[0085] The chemical supply method described with reference to FIGS. 9 to 13 is substantially the same as the chemical supply method described with reference to FIGS. 2 to 7 and the chemical supply method described with reference to FIG. 8, except for some steps (S210, S220, S230, S240, S250), so the substantially identical steps are omitted from repeated description.

[0086] Referring to FIGS. 9 and 10, the remaining amount of the first chemical is inspected before waiting for the supply of the second chemical (S210), and the supply of the second chemical can be prepared according to the result of the inspection (S210) (S220).

[0087] For example, the first remaining amount measuring sensor (113) can measure the first remaining amount of the first chemical stored in the first supply tank (112) (S212). The control unit (200) can receive first remaining amount measuring data for the first remaining amount of the first chemical (S214). Then, the control unit (200) can determine whether the first remaining amount is below the first level (L1) based on the first remaining amount measuring data (S216). Then, if the first remaining amount is below the first level (L1), the control unit (200) can apply a third control signal to the fourth valve (VA4) to open the fourth valve (VA4) (S220). If the first remaining amount is not below the first level (L1), the control unit (200) can continue to measure the first remaining amount while maintaining the supply of the first chemical.

[0088] Referring to FIGS. 9 and FIGS. 11, the remaining amount of the first chemical can be inspected before supplying the second chemical (S230).

[0089] For example, the first remaining amount measuring sensor (113) can measure the first remaining amount of the first chemical stored in the first supply tank (112) (S232). The control unit (200) can receive second remaining amount measuring data for the first remaining amount of the first chemical (S234). Then, the control unit (200) can determine whether the first remaining amount is below a second level (L2) based on the second remaining amount measuring data (S236). Then, if the first remaining amount is below the second level (L2), the control unit (200) can sequentially perform the steps of switching the supply line from the first chemical to the second chemical (S130, S130') and switching the supply line from the second chemical to the first chemical (S140). If the above first remaining amount is not below the second level (L2), the control unit (200) can continue to measure the above first remaining amount while maintaining the supply of the above first chemical agent.

[0090] Referring to FIG. 9 and FIG. 12 to FIG. 14, the remaining amount of the first chemical is inspected (S240) before replacing the first supply tank (112), and the first supply tank (112) can be replaced according to the result of the inspection (S240).

[0091] For example, the first remaining amount measuring sensor (113) can measure the first remaining amount of the first chemical stored in the first supply tank (112) (S242). The control unit (200) can receive third remaining amount measuring data for the first remaining amount of the first chemical (S214). Then, the control unit (200) can determine whether the first remaining amount is below the third level (L3) based on the third remaining amount measuring data (S246). Then, if the first remaining amount is below the third level (L3), the control unit (200) can apply a fourth control signal to the first valve (VA1) and the second valve (VA3) to close the first valve (VA1), open the second valve (VA3), and replace the first supply tank (112) (S220). If the above first remaining amount is not below the third level (L3), the control unit (200) can continue to measure the first remaining amount while repeatedly performing the switching step (S130, S130') and the second switching step (S140).

[0092] Referring to FIGS. 9 through 14, although only the supply of a chemical to minimize the remaining amount of the first chemical in the first supply tank (112) is illustrated, it will be seen that the chemical supply method according to exemplary embodiments can be substantially applied to the supply line (120) for the second chemical to minimize the remaining amount of the second chemical in the second supply tank (122). Therefore, a description of the method for minimizing the second chemical using substantially the same chemical supply method is omitted.

[0093] Referring to FIGS. 9 to 14, only the method of measuring the first remaining amount through the first remaining amount measuring sensor (113) has been described. However, it will be understood that the present invention is not limited thereto. Accordingly, the chemical supply system (10) may not include the first remaining amount measuring sensor (113) and the second remaining amount measuring sensor (123). In this case, the control unit (200) can calculate the first remaining amount and the second remaining amount from the first chemical supply amount and the second chemical supply amount measured by the flow controller (200).

[0094] As described above, in a chemical supply method according to exemplary embodiments, the remaining amount of the first chemical is inspected before waiting for the supply of the second chemical (S210), the supply of the second chemical is prepared according to the result of the inspection (S210) (S220), the remaining amount of the first chemical is inspected before supplying the second chemical (S230), and the remaining amount of the first chemical can be inspected before replacing the first supply tank (112) (S240).

[0095] Accordingly, the chemical supply method according to exemplary embodiments continuously checks the first remaining amount of the first chemical stored in the first supply tank (112), thereby determining in real time the time to prepare for supplying the second chemical, the time to supply the second chemical, and the time to replace the first supply tank, and furthermore, can effectively supply the chemical.

[0096] Although an embodiment of the present invention has been described, the spirit of the present invention is not limited by the embodiments presented in this specification. Those skilled in the art who understand the spirit of the present invention may easily propose other embodiments within the scope of the same spirit by adding, changing, deleting, or adding components, and such are also to be considered to fall within the scope of the spirit of the present invention. Explanation of the symbols

[0097] 10: Chemical supply system 100: Chemical supply device 110: Supply line for the first chemical 112: First supply tank 113: First remaining quantity measuring sensor 114: First supply piping 120: Supply line for the second chemical 122: Second supply tank 123: Second remaining quantity measuring sensor 124: Second supply piping 130: Flow controller 142: First pressure sensor 144: First pressure sensor 200: Control unit SA: Semiconductor manufacturing device SL: Supply line SV: Supply valve VA1, VA2, VA3, VA4: Valves

Claims

Claim 1 A first chemical supply line comprising a first supply tank for storing a first chemical and a first supply pipe for connecting the first supply tank and a semiconductor manufacturing device; a second chemical supply line comprising a second supply tank for storing a second chemical identical to the first chemical and a second supply pipe for connecting the semiconductor manufacturing device and the second supply tank, which is fluidly connected to the first supply pipe; a flow controller for controlling the flow rate of at least one of the first chemical and the second chemical, which is fluidly connected to the first chemical supply line and the second chemical supply line, respectively; a first valve installed within the first supply pipe to enable the first supply pipe to be opened and closed, and for selectively allowing the flow of the first chemical moving from the first supply tank to the flow controller; and a second valve installed within the second supply pipe to enable the second supply pipe to be opened and closed, and for selectively allowing the flow of the second chemical moving from the second supply tank to the flow controller. A chemical supply system comprising: a valve; and a first pressure sensor connected to the first supply pipe and for measuring a first pressure inside the first supply pipe, wherein the first supply pipe has a connection portion connected to the second supply pipe, and the first supply pipe connected to the second supply pipe is fluidly connected to a supply line of the semiconductor manufacturing device, and the flow controller is positioned between the connection portion of the first supply pipe and the supply line of the semiconductor manufacturing device to connect the first supply pipe and the supply line of the semiconductor manufacturing device, the first valve is installed in the first supply pipe to be positioned between the connection portion and the first supply tank, and the second valve is installed in the second supply pipe to be positioned between the connection portion and the second supply tank. Claim 2 A chemical supply system according to claim 1, further comprising a control unit for controlling the first valve and the second valve, wherein the control unit applies a first control signal to the first valve and the second valve to switch from the first chemical supply line to the second chemical supply line to supply the second chemical to the semiconductor manufacturing device, and applies a second control signal to the first valve and the second valve to switch from the second chemical supply line to the first chemical supply line to supply the first chemical to the semiconductor manufacturing device. Claim 3 A chemical supply system according to claim 2, wherein switching from the first chemical supply line to the second chemical supply line comprises: the flow controller measuring the degree of opening of an internal valve provided inside the flow controller; the control unit receiving first valve measurement data regarding the degree of opening of the internal valve; the control unit determining whether the degree of opening is greater than or equal to a first valve setting value based on the first valve measurement data; and, if the degree of opening is greater than or equal to the first valve setting value, the control unit applying the first control signal to the first valve to close the first valve and applying the first control signal to the second valve to open the second valve. Claim 4 A chemical supply system according to claim 2, wherein switching from the first chemical supply line to the second chemical supply line comprises: the first pressure sensor measuring the first pressure; the control unit receiving first pressure measurement data for the first pressure; the control unit determining whether the first pressure is less than or equal to a first pressure set value based on the first pressure measurement data; and, if the first pressure is less than or equal to the first pressure set value, the control unit applying the first control signal to the first valve to close the first valve and applying the first control signal to the second valve to open the second valve. Claim 5 A chemical supply system according to claim 2, wherein switching from the second chemical supply line to the first chemical supply line comprises: the first pressure sensor measuring the first pressure; the control unit receiving first pressure measurement data for the first pressure from the first pressure sensor; the control unit determining whether the first pressure is greater than or equal to a first pressure set value based on the first pressure measurement data; and, if the first pressure is greater than or equal to the first pressure set value, the control unit applying the second control signal to the second valve to close the second valve and applying the second control signal to the first valve to open the first valve. Claim 6 A first supply line for a chemical agent including a first supply tank in which a first chemical agent is stored and a first supply pipe for connecting the semiconductor manufacturing device and the first supply tank; a second supply line for a second chemical agent including a second supply tank in which a second chemical agent identical to the first chemical agent is stored and fluidly connected to the first supply pipe and a second supply pipe for connecting the semiconductor manufacturing device and the second supply tank; a first valve installed within the first supply pipe to enable the first supply pipe to be opened and closed, for selectively allowing the flow of the first chemical agent moving from the first supply tank to the semiconductor manufacturing device; a second valve installed within the second supply pipe to enable the second supply pipe to be opened and closed, for selectively allowing the flow of the second chemical agent moving from the second supply tank to the semiconductor manufacturing device; a first pressure sensor connected to the first supply pipe and for measuring a first pressure inside the first supply pipe; and a second pressure connected to the second supply pipe and for measuring a second pressure inside the second supply pipe A second pressure sensor for;The apparatus includes a control unit for controlling the first valve and the second valve, wherein the first supply pipe has a connection portion connected to the second supply pipe, and the first supply pipe connected to the second supply pipe is fluidly connected to the supply line of the semiconductor manufacturing device, the first valve is installed in the first supply pipe so as to be positioned between the connection portion and the first supply tank, and the second valve is installed in the second supply pipe so as to be positioned between the connection portion and the second supply tank, and the control unit applies a first control signal to the first valve and the second valve to switch from the first chemical supply line to the second chemical supply line so as to supply the second chemical to the semiconductor manufacturing device, and the switching from the first chemical supply line to the second chemical supply line is performed by the first pressure sensor measuring the first pressure, the control unit receiving first pressure measurement data for the first pressure, and the control unit determining whether the first pressure is less than or equal to a first pressure setting value based on the first pressure measurement data A chemical supply system that determines, and, if the first pressure is less than or equal to a first pressure setting value, applies the first control signal to the first valve to close the first valve and applies the first control signal to the second valve to open the second valve.; Claim 7 In claim 6, the control unit applies a second control signal to the first valve and the second valve, thereby switching from the second chemical supply line to the first chemical supply line to supply the first chemical to the semiconductor manufacturing device. Claim 8 delete Claim 9 A chemical supply system according to claim 7, wherein switching from the second chemical supply line to the first chemical supply line is such that the first pressure sensor measures the first pressure, the control unit receives first pressure measurement data for the first pressure, and the control unit determines whether the first pressure is greater than or equal to a first pressure set value based on the first pressure measurement data, and the control unit, if the first pressure is greater than or equal to the first pressure set value, applies the second control signal to the second valve to close the second valve and applies the second control signal to the first valve to open the first valve. Claim 10 delete Claim 11 A step of supplying a first chemical stored in a first supply tank to a semiconductor manufacturing device through a first chemical supply line; a step in which a flow controller controls the flow rate of the first chemical supplied to the semiconductor manufacturing device to be constant; a step in which a control unit applies a first control signal to a first valve and a second valve to selectively supply a second chemical to the semiconductor manufacturing device, thereby switching from the first chemical supply line to the second chemical supply line; a step in which a first pressure sensor connected to the first chemical supply line measures a first pressure, which is the internal pressure of the first chemical supply line; a step in which the control unit receives first pressure measurement data regarding the first pressure from the first pressure sensor; and a step in which the control unit determines whether the first pressure is greater than or equal to a first pressure set value based on the first pressure measurement data. A chemical supply method comprising the step of, when the first pressure is greater than or equal to the first pressure setting value, applying a second control signal to the first valve to open the first valve, and applying the second control signal to the second valve to close the second valve, and the step of switching from the first chemical supply line to the second chemical supply line comprises: the flow controller measuring the degree of opening of an internal valve provided inside the flow controller; the control unit receiving first valve measurement data regarding the degree of opening of the internal valve; the control unit determining whether the degree of opening is greater than or equal to the first valve setting value based on the first valve measurement data; and when the degree of opening is greater than or equal to the first valve setting value, applying the first control signal to the first valve to close the first valve, and applying the first control signal to the second valve to open the second valve. Claim 12 delete Claim 13 A step of supplying a first chemical stored in a first supply tank to a semiconductor manufacturing device through a first chemical supply line; a step in which a flow controller controls the flow rate of the first chemical supplied to the semiconductor manufacturing device to be constant; a step in which a control unit applies a first control signal to a first valve and a second valve to selectively supply the second chemical to the semiconductor manufacturing device, thereby switching from the first chemical supply line to the second chemical supply line; a step in which a first pressure sensor connected to the first chemical supply line measures a first pressure, which is the internal pressure of the first chemical supply line; a step in which the control unit receives first pressure measurement data regarding the first pressure from the first pressure sensor; and a step in which the control unit determines whether the first pressure is greater than or equal to a first pressure set value based on the first pressure measurement data. A chemical supply method comprising the steps of: when the first pressure is greater than or equal to the first pressure setting value, the control unit applies a second control signal to the first valve to open the first valve, and the control unit applies the second control signal to the second valve to close the second valve; and the step of switching from the first chemical supply line to the second chemical supply line comprises: the first pressure sensor measuring the first pressure; the control unit receiving second pressure measurement data for the first pressure; the control unit determining whether the first pressure is less than or equal to the second pressure setting value based on the second pressure measurement data; and when the first pressure is less than or equal to the second pressure setting value, the control unit applying the first control signal to the first valve to close the first valve, and the control unit applying the first control signal to the second valve to open the second valve. Claim 14 In claim 13, the chemical supply method in which the first pressure setting value is the same as the second pressure setting value.

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