Plasma source and substrate processing apparatus

Abstract

A plasma source according to one aspect of the present invention comprises a reaction body having a plurality of body portions each having gas diffusion spaces formed therein and a plurality of insulating flanges coupled between the plurality of body portions so as to communicate with each other, wherein the gas diffusion spaces within the plurality of body portions form a toroidal channel overall; a plurality of magnetic cores arranged to surround each of the plurality of insulating flanges; a plurality of windings arranged to wind each of the plurality of magnetic cores and inducing magnetic force within the plurality of magnetic cores through power supplied from a power source; and an ignition assisting member that applies power to at least one of the plurality of body portions to induce an electric field in a part of the reaction body during the ignition stage to induce an electric field to assist plasma ignition within the reaction body.

Description

Technology Field

[0001] The present invention relates to a semiconductor manufacturing apparatus, and more specifically, to a plasma source for generating plasma and a substrate processing apparatus using the same. Background Technology

[0002] In a substrate processing apparatus for forming semiconductor devices, an apparatus and process are being studied in which activated reactants, such as radicals, are supplied into the process chamber using a plasma source outside the process chamber, such as a remote plasma generator, rather than directly forming plasma within the process chamber. By using a remote plasma generator in this manner, desired reactants can be generated and supplied to the process chamber, and since direct plasma formation within the process chamber is avoided, plasma damage to the substrate can be prevented.

[0003] Furthermore, in order to reduce the path of radicals generated from a remote plasma generator being supplied onto a substrate, a structure is being studied in which the plasma source is coupled to the gas injection part of the process chamber. According to this structure, the process efficiency can be increased by increasing the activity ratio of radicals supplied from the plasma source onto the substrate. The problem to be solved

[0004] However, the aforementioned remote plasma generator or plasma source is designed to use power under limited conditions, which leads to a problem where plasma ignition failure occurs frequently.

[0005] The present invention aims to solve the aforementioned problems, and one technical objective according to the present invention is to provide a plasma source capable of increasing the plasma ignition success rate and a substrate processing apparatus using the same.

[0006] However, these tasks are exemplary and do not limit the scope of the invention. means of solving the problem

[0007] A plasma source according to one aspect of the present invention for solving a technical problem according to the present invention comprises a reaction body having a plurality of body parts each having gas diffusion spaces formed therein and a plurality of insulating flanges coupled between the plurality of body parts so that the gas diffusion spaces are in communication with each other, wherein the gas diffusion spaces within the plurality of body parts generally form a toroidal channel; a plurality of magnetic cores arranged to surround each of the plurality of insulating flanges; a plurality of windings arranged to wind each of the plurality of magnetic cores and inducing magnetic force within the plurality of magnetic cores through power supplied from a power source; and an ignition assisting part that applies power to at least one of the plurality of body parts to induce an electric field in a part of the reaction body during the ignition stage to induce an electric field to assist plasma ignition within the reaction body.

[0008] According to the above plasma source, the ignition auxiliary unit includes at least one auxiliary power supply unit, and when igniting the plasma in the toroidal channel, the power of the at least one auxiliary power supply unit can be applied to at least some of the plurality of body parts.

[0009] According to the above plasma source, when igniting the plasma in the toroidal channel, power from the at least one auxiliary power supply can be applied between the body parts disposed on both sides of the at least one insulating flange among the plurality of body parts so as to induce an electric field on both sides of at least one insulating flange among the plurality of insulating flanges.

[0010] According to the above plasma source, it includes a gas discharge plate coupled to the lower part of the reaction body and having a plurality of gas discharge holes formed therein, and when igniting the plasma in the toroidal channel, power from at least one auxiliary power supply can be applied between at least one of the plurality of body parts and the gas discharge plate.

[0011] According to the above plasma source, the at least one auxiliary power supply includes a plurality of auxiliary power supplies, and the power of the plurality of auxiliary power supplies can be applied between the two inductors of the plurality of body parts to induce an electric field on both sides of the plurality of insulating flanges when the plasma in the toroidal channel is ignited.

[0012] According to the above plasma source, the ignition auxiliary member comprises at least one ignition coil arranged to wind at least one magnetic core among the plurality of magnetic cores and connected between the body parts on both sides of the at least one magnetic core among the plurality of body parts via at least one switch, and an electromotive force can be induced in the at least one ignition coil by the magnetic force induced in the at least one magnetic core when the plasma in the toroidal channel is ignited.

[0013] According to the above plasma source, the at least one ignition coil comprises a plurality of ignition coils arranged to wind each of the plurality of magnetic cores, and the plurality of ignition coils are each connected by interposing a plurality of switches between adjacent two of the plurality of body parts, and at least one of the plurality of switches is closed when the plasma in the toroidal channel is ignited, and all of the plurality of switches can be opened when the plasma is maintained.

[0014] According to the above plasma source, the reaction body is coupled to the lower part and includes a gas discharge plate having a plurality of gas discharge holes formed therein, and the ignition auxiliary part includes at least one ignition coil arranged to wind at least one magnetic core among the plurality of magnetic cores and connected between at least one of the plurality of body parts and the gas discharge plate via at least one switch, and when igniting the plasma in the toroidal channel, an electromotive force can be induced in the at least one ignition coil by the magnetic force induced in the at least one magnetic core.

[0015] A substrate processing device according to another aspect of the present invention for solving one technical problem according to the present invention may include a process chamber having a reaction space formed therein, a substrate support member coupled to the lower part of the process chamber to support a substrate within the reaction space, a plasma source coupled to the upper part of the process chamber, and a gas injection member having a gas injection plate formed opposite to the substrate support member and disposed below the plasma source to inject a process gas activated by the plasma source onto the substrate support member.

[0016] According to the above substrate processing device, the process chamber includes a body portion with an upper opening and a top lead coupled to the body portion, and the gas injection plate of the plasma source can be coupled to the top lead. Effects of the invention

[0017] According to some embodiments of the present invention as described above, the plasma source and substrate processing apparatus can increase the success rate of plasma ignition by inducing an electric field within the reaction body using an ignition assisting part, even if an insulating flange is applied within the reaction body.

[0018] Of course, the scope of the present invention is not limited by these effects. Brief explanation of the drawing

[0019] FIG. 1 is a schematic diagram showing a plasma source according to one embodiment of the present invention. Figure 2 is a schematic perspective view showing the plasma source of Figure 1. Figure 3 is a schematic diagram showing power transfer from the plasma source of Figure 1. FIGS. 4 to 6 are schematic partially cut-off perspective views showing a plasma source according to some embodiments of the present invention. FIGS. 7 to 11 are schematic diagrams partially showing a plasma source according to some embodiments of the present invention. FIG. 12 is a schematic cross-sectional view showing substrate processing apparatus according to some embodiments of the present invention. Specific details for implementing the invention

[0020] Hereinafter, several preferred embodiments of the present invention will be described in detail with reference to the attached drawings.

[0021] The embodiments of the present invention are provided to more fully explain the invention to those skilled in the art, and the following embodiments may be modified in various different forms, and the scope of the invention is not limited to the following embodiments. Rather, these embodiments are provided to make the disclosure more faithful and complete and to fully convey the spirit of the invention to those skilled in the art.

[0022] In addition, the thickness or size of each layer in the drawings is exaggerated for convenience and clarity of explanation. Furthermore, embodiments of the concept of the present invention should not be interpreted as being limited to specific shapes of the areas depicted in this specification, and should include, for example, variations in shape resulting from manufacturing.

[0023] FIG. 1 is a schematic diagram showing a plasma source (200) according to one embodiment of the present invention, FIG. 2 is a schematic perspective view showing the plasma source (200) of FIG. 1, and FIG. 3 is a schematic diagram showing power transfer in the plasma source (200) of FIG. 1.

[0024] Referring to FIGS. 1 to 3, the plasma source (200) may include a reaction body (210), a plurality of magnetic cores (220a, 220b, 220c), and a plurality of windings (224a, 224b, 224c).

[0025] The reaction body (210) may include a plurality of body portions (212a, 212b, 212c) and a plurality of insulating flanges (216a, 216b, 216c). Gas diffusion spaces (214a, 214b, 214c) may each be formed inside the body portions (212a, 212b, 212c). More specifically, a gas diffusion space (214a) may be formed inside the body portion (212a), a gas diffusion space (214b) may be formed inside the body portion (212b), and a gas diffusion space (214c) may be formed inside the body portion (212c). The cross-sectional shape of the gas diffusion spaces (214a, 214b, 214c) may have various shapes, such as a circle, an ellipse, or a polygon.

[0026] In some embodiments, the body portions (212a, 212b, 212c) may be formed by coating an insulating material onto a conductive material. For example, the body portions (212a, 212b, 212c) may be formed by coating an insulating material, such as a metal oxide, a metal nitride, etc., onto a metal.

[0027] Insulating flanges (216a, 216b, 216c) can be joined between body parts (212a, 212b, 212c). Insulating flanges (216a, 216b, 216c) can be interposed between each of the body parts (212a, 212b, 212c) so that they are spaced apart from each other and are not directly electrically connected. Insulating flanges (216a, 216b, 216c) can serve to connect the body parts (212a, 212b, 212c) to each other.

[0028] For example, the insulating flanges (216a, 216b, 216c) may have a flow path formed therein so that the gas diffusion spaces (214a, 214b, 214c) within the body portions (212a, 212b, 212c) communicate with each other. The insulating flanges (216a, 216b, 216c) may be formed of a suitable insulating material, such as ceramic material, resin material, etc. Optionally, the insulating flanges (216a, 216b, 216c) may be referred to as the first insulating flange (216a), the second insulating flange (216b), and the third insulating flange (216c) for convenience.

[0029] In some embodiments, in the reaction body (210), gas diffusion spaces (214a, 214b, 214c) may form the toroidal channel (214) as a whole. More specifically, the body portions (212a, 212b, 212c) may be formed to correspond to structures that divide the overall shape of the toroidal channel (214) so ​​as to define the toroidal channel (214) as a whole. For example, if the toroidal channel (214) is formed as a donut shape as a whole, the body portions (212a, 212b, 212c) may be formed to correspond to structures that divide this donut shape into multiple parts.

[0030] In some embodiments, the reaction body (210) may be formed with a gas inlet (2123) for introducing gas into a toroidal channel (214) and an opening (2124) for discharging gas.

[0031] Magnetic cores (220a, 220b, 220c) may be arranged to surround each of the insulating flanges (216a, 216b, 216c). Accordingly, the magnetic cores (220a, 220b, 220c) may be spaced apart from each other along the toroidal channel (214). More specifically, the magnetic core (220a) may be arranged to surround the outer surface of the insulating flange (216a), the magnetic core (220b) may be arranged to surround the outer surface of the insulating flange (216b), and the magnetic core (220c) may be arranged to surround the outer surface of the insulating flange (216c). For example, the magnetic cores (220a, 220b, 220c) may comprise a magnetic material, such as a ferrite material.

[0032] In some embodiments, each of the magnetic cores (220a, 220b, 220c) may be formed as a single closed structure or may have a structure in which a plurality of divided parts are combined.

[0033] Multiple windings (224a, 224b, 224c) may be arranged to wind magnetic cores (220a, 220b, 220c). For example, winding (224a) may be arranged to wind magnetic core (220a), winding (224b) may be arranged to wind magnetic core (220b), and winding (224c) may be arranged to wind magnetic core (220c).

[0034] The windings (224a, 224b, 224c) can induce a magnetic force within the magnetic cores (220a, 220b, 220c) through power supplied from the power supply unit (230). For example, when the windings (224a, 224b, 224c) are wound in the width direction of the magnetic cores (220a, 220b, 220c), when power is applied to the windings (224a, 224b, 224c), a magnetic force can be induced along the circumferential direction within the magnetic cores (220a, 220b, 220c).

[0035] The power supply unit (230) may include a power supply device and may supply RF power to windings (224a, 224b, 224c) through a resonant circuit unit, etc. (not shown). For example, the power supply unit (230) may include a switching mode power supply (SMPS). Furthermore, the power supply unit (230) may include a full bridge or half bridge switching circuit for DC-AC conversion. The resonant circuit may include an LCC, etc.

[0036] In the plasma source (200), the number of body parts (212a, 212b, 212c) is illustrated by example and can be selected as two or more. Furthermore, depending on the number of body parts (212a, 212b, 212c), the number of magnetic cores (220a, 220b, 220c), windings (224a, 224b, 224c), and insulating parts (216a, 216b, 216c) may be varied.

[0037] In some embodiments, at least one gas inlet (2123) may be formed on the upper surface (A1) of the body portions (212a, 212b, 212c), and at least one opening (2124) may be formed on the lower surface (A2) of the body portions (212a, 212b, 212c). Gas introduced into the toroidal channel (214) through the gas inlet (2123) can be activated by plasma and discharged to the lower part of the plasma source (200) through the opening (2124). For example, the opening (2124) may be formed in a slit shape to increase gas discharge efficiency.

[0038] In some embodiments, the gas inlet (2123) may be formed on the side of the body portions (212a, 212b, 212c).

[0039] In some embodiments, an inlet (H1) for the inflow of a cooling medium and a cooling outlet (H2) for the outflow of a cooling medium may be formed within at least a portion of each of the body parts (212a, 212b, 212c). A cooling line (not shown) connected to the cooling inlet (H1) and the cooling outlet (H2) may be formed inside the body parts (212a, 212b, 212c). The cooling medium may be circulated through the cooling lines, thereby cooling the reaction body (210). For example, the cooling medium may include cooling water.

[0040] According to the plasma source (200), when power is applied from the power supply unit (230) to the windings (224a, 224b, 224c), a magnetic force is induced in the magnetic cores (220a, 220b, 220c), and by this induced magnetic force, a current can be induced in the toroidal channel (214) penetrating the interior of the magnetic cores (220a, 220b, 220c). By this current, a gas within the toroidal channel (214) can be activated to form a plasma atmosphere.

[0041] In a plasma source (200), a structure in which a magnetic force is induced in the magnetic cores (220a, 220b, 220c) from the current flowing through the windings (224a, 224b, 224c), and a current is induced in the toroidal channel (214) by this induced magnetic force, can correspond to the principle of a transformer. In this respect, the plasma source (200) may be called a transformer coupled plasma (TCP) device or a magnetic induction plasma device.

[0042] In the transformer structure, the windings (224a, 224b, 224c) can function as primary coils, and the toroidal channel (214) defined by the body portions (212a, 212b, 212c) can function as secondary coils. In this regard, the windings (224a, 224b, 224c) can be referred to as primary coils or primary windings, and the current flowing through the windings (224a, 224b, 224c) can be referred to as primary current. Furthermore, the current induced within the toroidal channel (214) can be referred to as secondary current.

[0043] The plasma source (200) can form a plasma atmosphere within the reaction body (210) using this secondary current. A more detailed description of the ignition and control of the plasma in the plasma source (200) will be provided later.

[0044] FIGS. 4 to 6 are schematic partially cut-off perspective views showing plasma sources (3000, 3000a, 3000b) according to some embodiments of the present invention.

[0045] Referring to FIG. 4, the plasma source (3000) may include a structure in which a plasma source (3100) is coupled on a gas discharge plate (7000). In this respect, the plasma source (3000) may also be referred to as a plasma source assembly.

[0046] The plasma source (3100) may have substantially the same structure as the aforementioned plasma source (200), and thus the configuration and description of the plasma source (200) may be referenced. A plurality of gas discharge holes (7100) may be formed in the gas discharge plate (7000). The gas discharge holes (7100) are hole structures that penetrate the gas discharge plate (7000) and may be formed in the shape of a cylinder, a cone, a pyramid, etc.

[0047] A plasma source (3100) may be coupled to a gas discharge plate (7000) to supply activated process gas to the gas discharge plate (7000). For example, the gas discharge holes (7100) may be formed on the gas discharge plate (7000) to match the shape of the plasma source (3100) so that the gas discharge holes (7100) communicate with the opening (2124) of the plasma source (3100) and are aligned with the opening (2124).

[0048] In this way, by combining the gas discharge plate (7000) with the plasma source (3100), the activated process gas generated in the plasma source (3100) can be easily supplied to the lower part of the plasma source (3100) through the opening (2124) and then sprayed through the gas discharge plate (7000), and conversely, the inflow of particles, etc. into the plasma source (3100) from outside the gas discharge plate (7000) can be suppressed.

[0049] In some embodiments, an insulating member (3170) may be interposed between the plasma source (3100) and the gas discharge plate (7000) to electrically insulate the two.

[0050] In some embodiments, the gas discharge plate (7000) may be formed of a conductive material and may be connected to a ground portion.

[0051] FIGS. 5 and 6 are schematic drawings showing plasma sources (3000a, 3000b) according to some embodiments of the present invention.

[0052] Referring to FIGS. 5 and 6, plasma sources (3000a, 3000b) may each include a gas discharge plate (7000), a first plasma source (3200), and a second plasma source (3100).

[0053] The second plasma source (3100) may have substantially the same structure as the aforementioned plasma source (200), and thus the configuration and description of the plasma source (200) may be referenced. The first plasma source (3200) may have a structure similar to the aforementioned plasma source (200), but some configurations may be modified from the plasma source (200) in that its diameter is smaller. For example, in the first plasma source (3200), the reaction body (210) may be composed of one or two pieces rather than three pieces, and accordingly, one or two magnetic cores may also be provided.

[0054] The first plasma source (3200) may be provided with a first opening (2124a) through which process gas activated through the first plasma source (3200) is discharged, and the second plasma source (3100) may be provided with a second opening (2124b) through which process gas activated through the second plasma source (3100) is discharged. For the first opening (2124a) and the second opening (2124b), refer to the description of the opening (2124) of the plasma source (200).

[0055] The first plasma source (3200) and the second plasma source (3100) can each be coupled to the gas exhaust plate (7000). For example, the second plasma source (3100) can be coupled to the gas exhaust plate (7000) on the outside of the first plasma source (3200). More specifically, the first plasma source (3200) can be coupled to the inside of the gas exhaust plate (7000), and the second plasma source (3100) can be coupled to the outside of the gas exhaust plate (7000) to surround the first plasma source (3200).

[0056] In some embodiments, the gas exhaust plate (7000) may include a first gas exhaust plate (7000a) to which a first plasma source (3200) is coupled and a second gas exhaust plate (7000b) to which a second plasma source (3100) is coupled. For example, the first gas exhaust plate (7000a) may refer to an inner portion of the gas exhaust plate (7000), and the second gas exhaust plate (7000b) may refer to an outer portion of the gas exhaust plate (7000). An insulating member (3270) may be interposed between the first gas exhaust plate (7000a) and the first plasma source (3200), and an insulating member (3170) may be interposed between the second gas exhaust plate (7000b) and the second plasma source (3100).

[0057] Process gas activated from the first plasma source (3200) can be supplied to the first gas discharge plate (7000) through the first opening (2124a), and process gas activated from the second plasma source (3100) can be supplied to the second gas discharge plate (7000b) through the second opening (2124b).

[0058] In this way, a plurality of plasma sources, such as a first plasma source (3200) and a second plasma source (3100), are arranged on a gas discharge plate (7000), thereby allowing the discharge amount of activated process gas, such as radicals, to be controlled by region. For example, the amount of radicals discharged from the first plasma source (3200) and the second plasma source (3100) can be controlled according to the size and shape of the first opening (2124a) and the second opening (2124b).

[0059] In some embodiments, as illustrated in FIG. 5, the first gas exhaust plate (7000a) and the second gas exhaust plate (7000b) may be integrally formed on the same plane so that the first opening (2124a) of the first plasma source (3200) and the second opening (2124b) of the second plasma source (3100) are positioned at the same height in the plasma source (3000a). In this case, process gas controlled by region can be supplied through the gas exhaust plate (7000) by controlling the process gas supply conditions and / or plasma generation conditions of the first plasma source (3200) and the second plasma source (3100).

[0060] In some embodiments, as illustrated in FIG. 6, the first gas exhaust plate (7000a) and the second gas exhaust plate (7000b) may be joined to each other at different heights so that the heights of the first opening (2124a) and the second opening (2124b) in the plasma source (3000b) are positioned at different heights. For example, the gas exhaust plate (7000) may be formed with a stepped structure. Through this structure, the process gas supplied from the inner side of the gas exhaust plate (7000), i.e., the first gas exhaust plate (7000a), may be dispersed relatively far, and the process gas supplied from the outer side, i.e., the second gas exhaust plate (7000b), may be dispersed relatively little. The first gas discharge plate (7000a) and the second gas discharge plate (7000b) can be formed separately and then combined, or formed integrally and then undergo processing such as bending to form the gas discharge plate (7000).

[0061] For example, the first gas exhaust plate (7000a) may be positioned higher than the second gas exhaust plate (7000b) so that the first opening (2124a) in the plasma source (3000b) is positioned higher than the second opening (2124b). In this case, the supply density of the process gas on the outside of the gas exhaust plate (7000) may be higher than on the inside.

[0062] Plasma sources (3000, 3000a, 3000b) can utilize the advantages of the plasma source (200) by using the aforementioned plasma source (200). Furthermore, plasma sources (3000a, 3000b) can adjust the emitted plasma density by changing the arrangement of the first plasma source (3200) and the second plasma source (3100).

[0063] The aforementioned plasma sources (200, 3000, 3000a, 3000b) employ insulating flanges (216a, 216b, 216c), which have the effect of reducing current loss and heat generation through the insulating flanges (216a, 216b, 216c). However, there is a problem in that plasma ignition is difficult because the electromotive force through the insulating flanges (216a, 216b, 216c) is weak. Accordingly, the following describes a structure that improves plasma ignition by adding certain components to the plasma sources (200, 3000, 3000a, 3000b).

[0064] FIGS. 7 to 11 are schematic diagrams partially showing plasma sources (3000-1, 3000-2, 3000-3, 3000-4, 3000-5) according to some embodiments of the present invention. Although the body portion (212c) is not shown in FIGS. 7 to 11, it can be understood from FIGS. 1 and 2 that the body portion (212c) is coupled to the body portions (212a, 212b) of the plasma sources (3000-1, 3000-2, 3000-3, 3000-4, 3000-5).

[0065] Referring to FIG. 7, the plasma source (3000-1) can be understood as having some configuration modified or added to the plasma source (3000). The plasma source (3000-1) may further include an ignition assisting part (270a) compared to the plasma source (3000).

[0066] The ignition assisting part (270a) may be provided to apply power to at least a part of the reaction body (210) during the ignition phase in order to induce an electric field to assist plasma ignition inside the reaction body (210). For example, the ignition assisting part (270a) may apply power to at least a part of the body parts (212a, 212b, 212c) during the ignition phase.

[0067] In some embodiments, the ignition auxiliary unit (270a) may include at least one auxiliary power unit (272). Furthermore, the ignition auxiliary unit (270a) may include a conductive line unit (274) for delivering power from the auxiliary power unit (272). When igniting the plasma in the toroidal channel (214), power from the auxiliary power unit (272) may be applied to at least some of the body units (212a, 212b, 212c).

[0068] The auxiliary power supply unit (272) may include various power supply devices for supplying RF or DC power, for example, a high-frequency power supply device for supplying high-frequency power. The auxiliary power supply unit (272) may supply a voltage higher than the breakdown voltage required for plasma formation according to the gas, for example, Paschen's law. For example, the auxiliary power supply unit (272) may be provided as a separate power source separated from the power supply unit (230), or it may be a high-voltage power source branched from the power supply unit (230) and boosted.

[0069] In some embodiments, power from an auxiliary power supply (270) may be applied between body parts positioned on both sides of at least one insulating flange among the body parts (212a, 212b, 212c) to induce an electric field on both sides of at least one insulating flange among the body parts (212a, 212b, 212c) when igniting the plasma in the toroidal channel (214). For example, as shown in FIG. 7, a conductive line (274) may electrically connect the auxiliary power supply (272) to the body parts (212a, 212b) positioned on both sides of the first insulating flange (216a). Accordingly, an electric field may be induced between the body parts (212a, 212b), i.e. on both sides of the first insulating flange (216a), through the auxiliary power supply (272).

[0070] When voltage is applied to both sides of the insulating flange (216a) by the ignition assist member (270a), an electric field can be induced between the body parts (212a, 212b). Accordingly, plasma ignition can be initiated in a capacitively coupled plasma (CCP) manner in the toroidal channel (214) within the insulating flange (216a). The induction of an electric field by such an ignition assist member (270a) can serve to trigger or assist plasma ignition.

[0071] In some embodiments, the operation of the ignition auxiliary unit (270a) may be controlled by the control unit (250). For example, the control unit (250) may control the ignition auxiliary unit (270a) to induce an electric field in the toroidal channel (214) inside the reaction body (210), such as in the insulating flange (216a), so that plasma ignition is initiated in a CCP manner. Subsequently, the control unit (250) may apply power from the power supply unit (230) to the windings (224a, 224b, 224c) so that plasma ignition and maintenance are stably performed in a TCP manner inside the reaction body (210), such as in the toroidal channel (214). When the plasma ignition is stabilized, the voltage application through the ignition auxiliary unit (270a) is stopped, and the plasma can be maintained by the power applied to the windings (224a, 224b, 224c).

[0072] As another example, plasma ignition using the CCP method by the ignition auxiliary unit (270a) and plasma ignition using the TCP method by the power supply unit (230) are started simultaneously, and when the plasma ignition is stabilized, the voltage application through the ignition auxiliary unit (270a) is stopped, and the plasma can be maintained by the power applied to the windings (224a, 224b, 224c).

[0073] Therefore, the plasma ignition success rate can be increased through plasma ignition via electric field induction using the CCP method, and the plasma can be stably maintained using the TCP method. Accordingly, compared to the case where plasma ignition and maintenance are performed solely using the conventional TCP method, the plasma can be stably ignited and maintained by combining the CCP method and the TCP method.

[0074] In some embodiments, the ignition assist member (270a) may be provided to apply voltage to both sides of a selected insulating flange to induce an electric field in at least one selected insulating flange among the insulating flanges (216a, 216b, 216c). For example, the ignition assist member (270a) may apply power between the body parts (212a, 212b) on both sides of the insulating flange (216a), apply power to the body parts (212b, 212c) on both sides of the insulating flange (216b), or apply power between the body parts (212a, 212c) on both sides of the insulating flange (216c). For example, the control unit (250) can control plasma ignition and maintenance within the reaction body (210), such as a toroidal channel (214), by inducing an electric field within an insulating flange selected by the ignition assist unit (270a) and applying power from the power supply unit (230) to the windings (224a, 224b, 224c).

[0075] In some embodiments, the ignition auxiliary unit (270a) may include a plurality of auxiliary power units (272). The auxiliary power units (272) may apply power between the body units (212a, 212b, 212c). When igniting the plasma in the toroidal channel (214), power from the auxiliary power units (270) may be applied between two adjacent body units (212a, 212b, 212c) to induce an electric field on both sides of the insulating flanges (216a, 216b, 216c). For example, if there are three body units (212a, 212b, 212c), two auxiliary power units (272) may be used to induce an electric field between two of the insulating flanges (216a, 216b, 216c).

[0076] In some embodiments, a plurality of ignition auxiliary units (270a) may be provided to apply power between body units (212a, 212b, 212c). Each of the ignition auxiliary units (270a) may include a plurality of auxiliary power units (272). In this case, the control unit (250) may control each of the ignition auxiliary units (270a) to apply power from the power units (270) between two adjacent body units (212a, 212b, 212c).

[0077] According to the aforementioned plasma source (3000-1), by using the ignition assisting part (270a) to induce an electric field in at least a portion of the insulating flanges (216a, 216b, 216c) where plasma ignition is initiated, the success rate of plasma ignition can be increased.

[0078] Referring to FIG. 8, the plasma source (3000-2) may further include at least one ignition assisting unit (270b) and a control unit (250) for controlling the plasma source (3000). The ignition assisting unit (270b) may be electrically connected between the reaction body (210) and the gas discharge plate (7000) to induce an electric field to assist plasma ignition within the reaction body (210).

[0079] For example, at least one ignition auxiliary unit (270b) can apply power between at least a portion of the body parts (212a, 212b, 212c) and the gas discharge plate (7000). When igniting the plasma in the toroidal channel (214), power from at least one auxiliary power unit (272) can be applied between at least one of the body parts (212a, 212b, 212c) and the gas discharge plate (7000).

[0080] In some embodiments, as shown in FIG. 8, power can be applied between the body part (212a) and the gas discharge plate (7000) using one ignition auxiliary part (270b) and power can be applied between the body part (212b) and the gas discharge plate (7000) using another ignition auxiliary part (270b). Optionally, the gas discharge plate (7000) may be grounded.

[0081] In some embodiments, the ignition assist unit (270b) may apply power, such as voltage, between the reaction body (210) and the gas discharge plate (7000). The ignition assist unit (270b) may include an auxiliary power supply unit (272) and a conductive line unit (274). For the auxiliary power supply unit (272) and the conductive line unit (274), refer to the description of the ignition assist unit (270a). According to the ignition assist unit (270b), an electric field may be induced over a wide range between the body units (212a, 212b, 212c) and the gas discharge plate (7000).

[0082] When voltage is applied between the reaction body (210) and the gas discharge plate (7000) by the ignition assist unit (270b), plasma ignition can be initiated in the toroidal channel (214) in a capacitively coupled plasma (CCP) manner due to the electric field induced between them. After or simultaneously with the plasma ignition in the CCP manner, power is applied from the power supply unit (230) to the windings (224a, 224b, 224c) so that plasma ignition and maintenance in the TCP manner can be stably achieved inside the reaction body (210), for example, within the toroidal channel (214). Once the plasma ignition is stabilized, the voltage application through the ignition assist unit (270b) is stopped, and the plasma can be maintained by the power applied to the windings (224a, 224b, 224c).

[0083] In some embodiments, the ignition auxiliary part (270b) may be electrically connected between one of the body parts (212a, 212b, 212c) and the gas discharge plate (7000). For example, the ignition auxiliary part (270b) may apply power between the body part (212a) and the gas discharge plate (7000), apply power between the body part (212b) and the gas discharge plate (7000), or apply power between the body part (212c) and the gas discharge plate (7000).

[0084] In some embodiments, ignition auxiliary parts (270b) may be electrically connected between the body part (212a) and the gas discharge plate (7000), between the body part (212b) and the gas discharge plate (7000), and between the body part (212c) and the gas discharge plate (7000), respectively. The ignition auxiliary parts (270b) may be driven simultaneously or selectively by the control unit (250). For example, through the ignition auxiliary parts (270b), an electric field may be induced between the body parts (212a, 212b, 212c) and the gas discharge plate (7000).

[0085] In some embodiments, the operation of the ignition source (270b) may be controlled by the control unit (250). Referring to FIG. 9, in the plasma source (3000-2), the gas exhaust plate (7000) may be coupled to the process chamber (1000). For example, the process chamber (1000) may be a component of a substrate processing device, such as the substrate processing device (5000a) of FIG. 12. The process chamber (1000) may be grounded, and the gas exhaust plate (7000) may be coupled to be electrically connected to the process chamber (1000). Accordingly, the gas exhaust plate (7000) may be grounded through the process chamber (1000).

[0086] For example, the ignition auxiliary part (270b) may be electrically connected between at least one of the body parts (212a, 212b, 212c) and the process chamber (1000). When power is applied through the auxiliary power supply part (272) of the ignition auxiliary part (270b), an electric field may be induced between at least one of the body parts (212a, 212b, 212c) and the gas discharge plate (7000) and / or the process chamber (1000).

[0087] Referring to FIG. 10, the plasma source (3000-4) may further include an ignition assist unit (270c) and a control unit (250) compared to the plasma source (3000).

[0088] The ignition auxiliary part (270c) may include at least one ignition coil (276) and at least one switch (277). The ignition coil (276) is arranged to wind at least one magnetic core, such as magnetic core (220a), among a plurality of magnetic cores (220a, 220b, 220c), and may be connected by interposing at least one switch (277) between the body parts (212a, 212b) on both sides of at least one magnetic core, such as magnetic core (220a), among a plurality of body parts (212a, 212b, 212c).

[0089] Meanwhile, as shown in FIG. 3, a winding (224a) is further wound around the magnetic core (220a), and for convenience, the winding (224a) is not shown in this drawing. The winding (224a) and the ignition coil (276) may be wound around the magnetic core (220a) at a distance from each other.

[0090] The control unit (250) can control the ignition assist unit (270c) to induce an electromotive force in at least one ignition coil (276) by the magnetic force induced in at least one magnetic core, such as a magnetic core (220a), during the ignition of plasma in the toroidal channel (214).

[0091] When power is applied from the power supply unit (230) to the windings (224a, 224b, 224c), a magnetic field can be induced in the magnetic cores (220a, 220b, 220c). When a magnetic field is induced in the magnetic cores (220a, 220b, 220c), power can be induced in the toroidal channel (214) and also in the ignition coil (276). Thus, with respect to the magnetic cores (220a, 220b, 220c), if the windings (224a, 224b, 224c) are the primary side, the ignition coil (276) can be the secondary side.

[0092] When the switch (277) is closed, power induced in the ignition coil (276) can be applied between the body parts (212a, 212b). Accordingly, an electric field is induced between the body parts (212a, 212b), so that plasma ignition can be started or assisted in a CCP manner.

[0093] In some embodiments, at least one ignition coil (276) may include a plurality of ignition coils (276). A plurality of ignition coils (276) may be arranged to wind a plurality of magnetic cores among magnetic cores (220a, 220b, 220c). The ignition coils (276) may each be connected by interposing a plurality of switches (277) between two adjacent body portions (212a, 212b, 212c). At least one of the switches (277) may be closed when the plasma in the toroidal channel (214) is ignited, and all of the switches (277) may be opened when the plasma is maintained. For example, a control unit (250) may control the operation of the switches (277).

[0094] In some embodiments, a plurality of ignition auxiliary parts (270c) may be understood to include a plurality of ignition coils (276). At least one of the switches (277) may be closed when igniting the plasma in the toroidal channel (214), and all of the switches (277) may be opened when maintaining the plasma.

[0095] In some embodiments, the control unit (250) can control the switches (277) of the ignition assist units (270c) to control the location where plasma ignition occurs. For example, at least one of the switches (277) may be closed and the others opened so that plasma ignition occurs only in the area where the closed switch (277) is located. As another example, the operation of closing one of the switches (277) and opening the others may be performed sequentially by moving the switches (277).

[0096] According to the aforementioned plasma source (3000-4), the ignition auxiliary unit (270c) can induce power through the ignition coil (276) from the magnetic force induced in the magnetic cores (220a, 220b, 220c) without a separate auxiliary power source.

[0097] Referring to FIG. 11, the plasma source (3000-5) may further include an ignition assisting part (270d) compared to the plasma source (3000).

[0098] The ignition auxiliary part (270d) may include at least one ignition coil (276) and at least one switch (277). The ignition coil (276) is arranged to wind at least one magnetic core, such as magnetic core (220a), among a plurality of magnetic cores (220a, 220b, 220c), and may be connected by interposing at least one switch (277) between a body part (212a) on one side of at least one magnetic core, such as magnetic core (220a), among a plurality of body parts (212a, 212b, 212c) and a gas discharge plate (7000).

[0099] When igniting the plasma in the toroidal channel (214), an electromotive force can be induced in at least one ignition coil (276) by the magnetic force induced in at least one magnetic core, such as a magnetic core (220a).

[0100] Accordingly, an electric field is induced between the reaction body (210) and the gas discharge plate (7000) by the ignition assisting part (270d), so that plasma ignition can be started or assisted in a CCP manner.

[0101] In some embodiments, a plurality of ignition auxiliary parts (270d) may each include a plurality of ignition coils (276). The plurality of ignition coils (276) may be arranged to each wind magnetic cores (220a, 220b, 220c). Furthermore, the ignition coils (276) may be connected by interposing a plurality of switches (277) between the body parts (212a, 212b, 212c) and the gas discharge plate (7000). At least one of the switches (277) may be closed when the plasma in the toroidal channel (214) is ignited, and all of the switches (277) may be opened when the plasma is maintained.

[0102] In some embodiments, the operation of the ignition aids (270d) may be controlled by the control unit (250).

[0103] The configuration of the ignition auxiliary unit (270a, 270b, 270c, 270d) and the control unit (250) in the aforementioned plasma sources (3000-1, 3000-2, 3000-3, 3000-4, 3000-5) can be applied in the same way to the plasma sources (3000a, 3000b) as well as to the aforementioned plasma source (3000).

[0104] According to the aforementioned plasma sources (3000-1, 3000-2, 3000-3, 3000-4, 3000-5), if plasma ignition is difficult with only the power induced in the toroidal channel (214) by the windings (224a, 224b, 224c), the plasma ignition success rate can be increased by using the ignition assisting unit (270a, 270b, 270c, 270d) to start or assist plasma ignition in a CCP manner.

[0105] FIG. 12 is a schematic cross-sectional view showing a substrate processing apparatus (5000a) according to one embodiment of the present invention.

[0106] Referring to FIG. 12, a substrate processing device (5000a) may include a process chamber (1000), a gas injection unit (4000), a substrate support unit (2000), and at least one plasma source (3000a).

[0107] A process chamber (1000) may have a reaction space (A) formed therein. The process chamber (1000) may include a body portion (1050) with an upper opening and a top lid (1100) coupled to the body portion (105). The process chamber (1000) may be connected to a vacuum pump (1300) through an exhaust portion (1200) to form a vacuum atmosphere. Furthermore, the process chamber (1000) may include an inlet / outlet for loading a substrate (S) into or unloading it from the reaction space (A), and a gate (not shown) for opening and closing the inlet / outlet.

[0108] A gas injection unit (4000) may be coupled to the process chamber (1000) to inject process gas supplied from outside the process chamber (1000) into the reaction space (A). For example, the gas injection unit (4000) may be coupled to the upper part of the process chamber (1000) so as to face the substrate support (2000). The gas injection unit (4000) may supply process gas, such as source gas, reaction gas, inert gas, etc., onto a substrate (S) within the reaction space (A).

[0109] In some embodiments, the gas injection unit (4000) may be understood as a structure coupled to the process chamber (1000) or as a structure coupled to the top lid (1100).

[0110] The plasma source (3000a) is intended to activate a process gas supplied from the outside, and the above description may be referenced. The plasma source (3000a) may be coupled to the process chamber (1000) opposite the substrate support (2000). For example, the plasma source (3000a) may be coupled to the top of the process chamber (1000). For example, the gas injection plate (7000) of the plasma source (3000a) may be coupled to the top lead (1100). The plasma source (3000a) may supply the activated process gas, such as radicals, to the space below it, for example, the internal space of the gas injection unit (4000).

[0111] For example, the first plasma source (3200) may be positioned in a donut shape on the central portion of the top lead (1100), and the second plasma source (3100) may be positioned on the edge portion of the top lead (1100) in a larger diameter donut shape surrounding the donut shape of the first plasma source (3200). The first plasma source (3200) may be supplied with process gas through the first gas pipe (3280), and the second plasma source (3100) may be supplied with process gas through the second gas pipe (3180). These plasma sources (3000a) enable the injection of activated process gas across the entire central and edge portions of the gas injection section (4000).

[0112] In some embodiments, the gas injection unit (4000) may include a distribution plate (4100) for injecting an activated process gas supplied from a plasma source (3000a) into a reaction space (A). A plurality of injection holes may be formed in the vertical direction in the distribution plate (4100). Optionally, the gas injection unit (4000) may further include a middle plate, such as a blocker plate, for injecting gas between the top lead (1100) and the distribution plate (4100).

[0113] In some embodiments, the gas injection unit (4000) may further include a separate gas inlet to supply process gas into it without passing through the plasma source (3000a). In this case, the gas injection unit (4000) may supply process gas activated through the plasma source (3000a) and process gas that is not activated by not passing through the plasma source (3000a) together.

[0114] A substrate support (2000) may be coupled to a process chamber (1000) to support a substrate (S) within a reaction space (A). For example, the substrate support (2000) may be installed in the process chamber (1000) opposite to a gas injection unit (4000). Furthermore, the substrate support (2000) may include a heater (not shown) for heating the substrates (S) inside it. Since the substrate support (2000) is configured to place a substrate (S) thereon, it may also be called a substrate mounting unit, a susceptor, a substrate holder, etc.

[0115] The shape of the top plate of the substrate support (2000) generally corresponds to the shape of the substrate (S), but is not limited thereto and can be provided in various shapes to stably seat the substrate (S). Furthermore, a shaft (1200) is connected to the top plate of the substrate support (2000), and the shaft (1200) can be connected to an external motor (not shown) to enable it to move up and down. Optionally, a means for maintaining airtightness, such as a bellows tube, may be connected between the shaft (1200) and the process chamber (1000).

[0116] In some embodiments, the substrate support (2000) may further include an electrostatic electrode (not shown) to apply an electrostatic force to the substrate (S) and fix it thereon. In this case, the electrostatic electrode can generate an electrostatic force using DC power.

[0117] The aforementioned substrate processing device (5000a) can be used as a thin film deposition device, such as an atomic layer deposition (ALD) device or a chemical vapor deposition (CVD) device.

[0118] According to the substrate processing device (5000a), since the plasma source (3000a) is directly coupled to the gas injection units (4000), the activated process gas, such as radicals, can be directly supplied to the substrate (S), thereby reducing the supply path of the radicals. Accordingly, by using the plasma source (3000a), the recombination of radicals can be reduced compared to the case where a conventional remote plasma device is used, thereby increasing the supply efficiency of radicals and increasing process reliability.

[0119] Meanwhile, although the substrate processing device (5000a) is illustrated with a structure using a plasma source (3000a), it can be modified in various ways, for example, the plasma source (3000a) may be replaced with plasma sources (3000, 3000b, 3000-1, 3000-2, 3000-3, 3000-4, 3000-5). Accordingly, the substrate processing device (5000a) can increase the plasma ignition success rate by using ignition auxiliary parts (270a, 270b, 270c, 270d).

[0120] The present invention has been described with reference to the embodiments illustrated in the drawings, but this is merely illustrative, and those skilled in the art will understand that various modifications and equivalent alternative embodiments are possible therefrom. Accordingly, the true technical scope of protection of the present invention should be determined by the technical spirit of the appended claims. Explanation of the symbols

[0121] 200: Plasma Source 210: Reaction body 212a, 212b, 212c: Body part 216a, 216b, 216c: Insulation flange 220a, 220b, 220c, 220a, 220b, 220c: Magnetic core 224a, 224b, 224c: Windings 230: Power supply 250: Control unit 270a, 270b, 270c, 270d: Ignition auxiliary unit 3000, 3000a, 3000b: Plasma source 3000-1, 3000-2, 3000-3, 3000-4, 3000-5: Plasma source 3100, 3200: Plasma source 3170: Insulating member 7000: Gas discharge plate

Claims

Claim 1 A reaction body comprising a plurality of body portions, each having gas diffusion spaces formed therein, and a plurality of insulating flanges coupled between the plurality of body portions so that the gas diffusion spaces communicate with each other, wherein the gas diffusion spaces within the plurality of body portions collectively form a toroidal channel; a plurality of magnetic cores arranged to surround each of the plurality of insulating flanges; and a plurality of windings arranged to wind each of the plurality of magnetic cores and inducing magnetic force within the plurality of magnetic cores through power supplied from a power source. A plasma source comprising an ignition assist member that applies power to at least one of the plurality of body parts to induce an electric field in a part of the reaction body during an ignition step to assist plasma ignition in the reaction body, wherein the ignition assist member comprises at least one auxiliary power supply member, and when igniting the plasma in the toroidal channel, power from the at least one auxiliary power supply member is applied to at least one of the plurality of body parts, and when igniting the plasma in the toroidal channel, power from the at least one auxiliary power supply member is applied between the body parts disposed on both sides of the at least one insulating flange among the plurality of body parts to induce an electric field on both sides of at least one insulating flange among the plurality of body parts. Claim 2 delete Claim 3 delete Claim 4 A reaction body comprising a plurality of body portions, each having gas diffusion spaces formed therein, and a plurality of insulating flanges coupled between the plurality of body portions so that the gas diffusion spaces communicate with each other, wherein the gas diffusion spaces within the plurality of body portions collectively form a toroidal channel; a plurality of magnetic cores arranged to surround each of the plurality of insulating flanges; and a plurality of windings arranged to wind each of the plurality of magnetic cores and inducing magnetic force within the plurality of magnetic cores through power supplied from a power source. A plasma source comprising an ignition assisting member that applies power to at least one of the plurality of body parts to induce an electric field in a part of the reaction body during an ignition step to assist plasma ignition within the reaction body, wherein the ignition assisting member comprises at least one auxiliary power supply member, and when igniting the plasma in the toroidal channel, power from the at least one auxiliary power supply member is applied to at least one of the plurality of body parts, and a gas discharge plate coupled to the lower part of the reaction body and having a plurality of gas discharge holes formed therein, wherein when igniting the plasma in the toroidal channel, power from the at least one auxiliary power supply member is applied between at least one of the plurality of body parts and the gas discharge plate. Claim 5 A reaction body comprising a plurality of body portions, each having gas diffusion spaces formed therein, and a plurality of insulating flanges coupled between the plurality of body portions so that the gas diffusion spaces communicate with each other, wherein the gas diffusion spaces within the plurality of body portions collectively form a toroidal channel; a plurality of magnetic cores arranged to surround each of the plurality of insulating flanges; and a plurality of windings arranged to wind each of the plurality of magnetic cores and inducing magnetic force within the plurality of magnetic cores through power supplied from a power source. A plasma source comprising an ignition aid that applies power to at least one of the plurality of body parts to induce an electric field in a part of the reaction body during an ignition step to assist plasma ignition in the reaction body, wherein the ignition aid comprises at least one auxiliary power supply, and when igniting the plasma in the toroidal channel, the power of the at least one auxiliary power supply is applied to at least one of the plurality of body parts, wherein the at least one auxiliary power supply comprises a plurality of auxiliary power supplies, and when igniting the plasma in the toroidal channel, the power of the plurality of auxiliary power supplies is applied between two of the plurality of body parts to induce an electric field on both sides of the plurality of insulating flanges. Claim 6 A reaction body comprising a plurality of body portions, each having gas diffusion spaces formed therein, and a plurality of insulating flanges coupled between the plurality of body portions so that the gas diffusion spaces communicate with each other, wherein the gas diffusion spaces within the plurality of body portions collectively form a toroidal channel; a plurality of magnetic cores arranged to surround each of the plurality of insulating flanges; and a plurality of windings arranged to wind each of the plurality of magnetic cores and inducing magnetic force within the plurality of magnetic cores through power supplied from a power source. A plasma source comprising an ignition assist member that applies power to at least one of the plurality of body parts to induce an electric field in a part of the reaction body during an ignition step to assist plasma ignition within the reaction body, wherein the ignition assist member comprises at least one ignition coil arranged to wind at least one magnetic core among the plurality of magnetic cores and connected between the body parts on both sides of the at least one magnetic core among the plurality of body parts via at least one switch, and wherein an electromotive force is induced in the at least one ignition coil by the magnetic force induced in the at least one magnetic core during ignition of the plasma in the toroidal channel. Claim 7 A plasma source according to claim 6, wherein the at least one ignition coil comprises a plurality of ignition coils arranged to wind each of the plurality of magnetic cores, the plurality of ignition coils are each connected by interposing a plurality of switches between adjacent two of the plurality of body parts, and at least one of the plurality of switches is closed when igniting the plasma in the toroidal channel, and all of the plurality of switches are opened when maintaining the plasma. Claim 8 A reaction body comprising a plurality of body portions, each having gas diffusion spaces formed therein, and a plurality of insulating flanges coupled between the plurality of body portions so that the gas diffusion spaces communicate with each other, wherein the gas diffusion spaces within the plurality of body portions collectively form a toroidal channel; a plurality of magnetic cores arranged to surround each of the plurality of insulating flanges; and a plurality of windings arranged to wind each of the plurality of magnetic cores and inducing magnetic force within the plurality of magnetic cores through power supplied from a power source. A plasma source comprising: an ignition assist member that applies power to at least one of the plurality of body parts to induce an electric field in a part of the reaction body during the ignition stage to assist plasma ignition within the reaction body; a gas discharge plate coupled to the lower part of the reaction body and having a plurality of gas discharge holes formed therein; wherein the ignition assist member comprises at least one ignition coil arranged to wind at least one magnetic core among the plurality of magnetic cores and connected between at least one of the plurality of body parts and the gas discharge plate via at least one switch, and wherein an electromotive force is induced in the at least one ignition coil by the magnetic force induced in the at least one magnetic core during the ignition of the plasma in the toroidal channel. Claim 9 A substrate processing apparatus comprising: a process chamber having a reaction space formed therein; a substrate support member coupled to the lower part of the process chamber to support a substrate within the reaction space; a plasma source according to any one of claims 1, 4 to 8 coupled to the upper part of the process chamber; and a gas injection member having a gas injection plate formed opposite the substrate support member and coupled to the plasma source to inject a process gas activated by the plasma source onto the substrate support member. Claim 10 In claim 9, the process chamber comprises a body portion having an upper opening and a top lead coupled to the body portion, and the plasma source is coupled to the top lead, a substrate processing device.

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