Exhaust system and baking apparatus including same

Abstract

The present invention relates to an exhaust system capable of exhausting to the outside a reaction byproduct or foreign substance generated from a bake device during a baking process of a substrate, and a bake device comprising the same. The system may include an exhaust duct connected to at least one bake device to discharge the exhaust gas to the outside, and a damper device rotatably installed on one side of the exhaust duct to control the opening rate of the exhaust duct so as to control the exhaust pressure supplied to the bake device.

Description

Technology Field

[0001] The present invention relates to an exhaust system and a bake device including the same, and more specifically, to an exhaust system capable of exhausting to the outside exhaust gas containing reaction byproducts or foreign substances generated from a bake device during the baking process of a substrate, and a bake device including the same. Background Technology

[0002] Generally, various processes such as cleaning, deposition, photolithography, etching, and ion implantation are performed to manufacture semiconductor devices. The photolithography process, which is performed to form patterns, plays an important role in achieving high integration of semiconductor devices.

[0003] A photolithography process is performed to form a photoresist pattern on a semiconductor substrate made of silicon. The photolithography process includes a coating and soft bake process to form a photoresist film on the substrate, an exposure and development process to form a photoresist pattern from the photoresist film, an edge bead removal process and an edge exposure of wafer process to remove edge portions of the photoresist film or pattern, and a hard bake process to stabilize and densify the photoresist pattern.

[0004] The baking process is a process of heating a substrate to a temperature of tens of degrees or hundreds of degrees during the manufacturing process of display devices or semiconductor devices. It is typically required when performing a type of chemical treatment, such as HMDS (Hexa Methyl Di Silazane, Si2(CH3)6) treatment, on the surface of a substrate to improve the adhesion between the substrate and the photoresist before applying the photoresist on the substrate, and when solidifying or curing the applied photoresist.

[0005] In particular, during the baking process performed to solidify or cure the applied photoresist, the solvent components contained in the photoresist to impart fluidity are heated and vaporized as the baking process proceeds, leaving only the polymer material behind, which then solidifies into a photoresist film.

[0006] The baking process described above is carried out by a baking device comprising a process chamber, a heating unit, and an exhaust system, and fumes such as reaction byproducts or foreign substances generated from the substrate during the baking process can be discharged to the outside through the exhaust system.

[0007] An exhaust system for exhausting exhaust gas containing reaction byproducts or foreign substances generated from such a bake device to the outside adjusts the opening ratio using a damper device within the exhaust duct to control the exhaust pressure supplied to the process chamber of the bake device. The damper device adjusts the opening ratio by controlling the insertion degree of a shutter inserted into the exhaust passage within the exhaust duct, and the shutter of the damper device remains in a fixed state after the initial adjustment of the opening ratio. However, when fumes are continuously deposited on the fixed shutter of the damper device during the bake process, the cross-sectional area of ​​the shutter continues to increase due to the deposited fumes, which leads to a decrease in the opening ratio of the exhaust passage within the exhaust duct, resulting in a problem where the exhaust pressure supplied to the process chamber gradually decreases. The problem to be solved

[0008] The present invention aims to solve various problems, including the problems described above, by providing an exhaust system and a bake device including the same, which can induce the exhaust pressure supplied to the process chamber to be continuously maintained at a constant level during the substrate bake process by automatically rotating the shutter to adjust the opening ratio of the exhaust passage within the exhaust duct when the cross-sectional area of ​​the shutter increases due to fumes deposited on the shutter of the damper device during the substrate bake process. However, this problem is exemplary and the scope of the present invention is not limited by it. means of solving the problem

[0009] According to one embodiment of the present invention, an exhaust system is provided. The exhaust system is connected to at least one bake device capable of performing a bake process of a substrate and is capable of exhausting exhaust gas containing reaction byproducts or foreign substances generated from the bake device to the outside. The exhaust system may include: an exhaust duct connected to at least one bake device capable of discharging the exhaust gas to the outside; and a damper device rotatably installed on one side of the exhaust duct to control the opening rate of the exhaust duct so as to control the exhaust pressure supplied to the bake device.

[0010] According to one embodiment of the present invention, the damper device may include: a pivot shutter formed to cross at least a portion of the exhaust passage of the exhaust duct, rotatably installed on one side of the exhaust duct by a pivot hinge, and adjusting the opening ratio of the exhaust duct according to the degree of pivoting; and an elastic damper unit connected to one side of the pivot shutter from the outside of the exhaust duct and elastically adjusting the degree of pivoting of the pivot shutter.

[0011] According to one embodiment of the present invention, the pivot shutter may include: a first portion formed to be inserted into the interior of the exhaust duct with respect to the pivot hinge and to cross at least a portion of the exhaust passage; and a second portion exposed to the exterior of the exhaust duct with respect to the pivot hinge and connected to the elastic damper unit.

[0012] According to one embodiment of the present invention, the first part is formed in a shape corresponding to the cross-sectional shape of the exhaust passage of the exhaust duct, and the end may be formed so as to be spaced apart from the inner wall surface of the exhaust passage by a predetermined distance so that the exhaust passage is not completely closed even when the rotating shutter rotates in a direction perpendicular to the extension direction of the exhaust duct.

[0013] According to one embodiment of the present invention, the rotating shutter may be formed such that the area of ​​the first part is larger than the area of ​​the second part.

[0014] According to one embodiment of the present invention, the elastic damper unit may include: an elastic member connected to the second part of the rotating shutter, one end of which is exposed to the outside of the exhaust duct; and a damping control part formed to protrude from the outer wall surface of the exhaust duct and fixing the other end of the elastic member.

[0015] According to one embodiment of the present invention, the damping control member may be installed on the outer wall surface of the exhaust duct so as to be slidably movable along the extension direction of the exhaust duct, so as to be able to adjust the compression length or tension length of the elastic member.

[0016] According to one embodiment of the present invention, the elastic member may include a coiled spring or a torsion spring.

[0017] According to one embodiment of the present invention, the damper device, when a pressure difference occurs between a first pressure behind the first part of the rotating shutter and a second pressure in front of the first part based on the direction of flow of the exhaust gas in the exhaust passage within the exhaust duct, the rotating shutter starts to rotate due to the pressure difference, and can stop rotating when the pressure applied to the first part of the rotating shutter by the elastic force of the elastic member of the elastic damper unit and the pressure difference are in equilibrium.

[0018] According to another embodiment of the present invention, a bake device is provided. The bake device comprises: a process chamber in which a processing space is formed for processing a substrate; a support unit for supporting the substrate in the processing space of the process chamber; a heating unit for heating the substrate supported by the support unit; and an exhaust system connected to the process chamber so as to be connected to an exhaust plate installed on the upper part of the process chamber so as to be opposite to the support unit, for exhausting exhaust gas containing reaction by-products or foreign substances generated in the processing space during the baking process of the substrate to the outside. The exhaust system may include: an exhaust duct connected to the process chamber to discharge the exhaust gas to the outside; and a damper device rotatably installed on one side of the exhaust duct to adjust the opening rate of the exhaust duct so as to adjust the exhaust pressure supplied to the processing space of the process chamber. Effects of the invention

[0019] According to one embodiment of the present invention as described above, a rotating shutter of a damper device is installed in an exhaust passage within an exhaust duct so as to be elastically rotatable by means of an elastic member, and the opening rate of the exhaust passage within the exhaust duct can be adjusted according to the degree of rotation of the rotating shutter.

[0020] Accordingly, when the cross-sectional area of ​​the rotating shutter increases due to fumes deposited on the rotating shutter during the baking process of the substrate, the rotating shutter automatically rotates further until the elastic force of the elastic member and the force applied to the rotating shutter due to the pressure difference between the front and rear of the rotating shutter are in equilibrium, thereby controlling the opening ratio of the exhaust passage in the exhaust duct, so as to minimize changes in the opening ratio of the exhaust passage in the exhaust duct during the baking process of the substrate and continuously maintain it at a constant level.

[0021] In this way, by maintaining a constant opening ratio of the exhaust passage within the exhaust duct during the baking process of the substrate, the exhaust pressure supplied to the process chamber is induced to remain constant throughout the baking process of the substrate, thereby smoothly discharging fumes such as reaction by-products or foreign substances generated from the baking device to the outside, and thus enabling the implementation of an exhaust system and a baking device including the same that can improve the processing quality of the substrate. Of course, the scope of the present invention is not limited by this effect. Brief explanation of the drawing

[0022] FIG. 1 is a cross-sectional view schematically showing a bake apparatus according to one embodiment of the present invention. FIG. 2 is a cross-sectional view schematically showing one embodiment of an exhaust system connected to a plurality of bake devices. FIGS. 3 to 5 are cross-sectional views schematically illustrating an embodiment of the exhaust system of FIG. 2. FIGS. 6 and FIGS. 7 are cross-sectional views schematically illustrating other embodiments of the exhaust system of FIGS. 2. Specific details for implementing the invention

[0023] Hereinafter, several preferred embodiments of the present invention will be described in detail with reference to the attached drawings.

[0024] The embodiments of the present invention are provided to more fully explain the invention to those skilled in the art, and the following embodiments may be modified in various different forms, and the scope of the invention is not limited to the following embodiments. Rather, these embodiments are provided to make the disclosure more faithful and complete and to fully convey the spirit of the invention to those skilled in the art. In addition, the thickness or size of each layer in the drawings is exaggerated for convenience and clarity of explanation.

[0025] Hereinafter, embodiments of the present invention are described with reference to drawings that schematically illustrate ideal embodiments of the present invention. In the drawings, variations of the illustrated shapes may be expected, for example, depending on manufacturing techniques and / or tolerances. Accordingly, embodiments of the inventive concept should not be interpreted as being limited to specific shapes of the areas illustrated herein, but should include, for example, variations in shape resulting from manufacturing.

[0026] FIG. 1 is a cross-sectional view schematically showing a bake device (1000) according to one embodiment of the present invention, and FIG. 2 is a cross-sectional view schematically showing one embodiment of an exhaust system (100) connected to a plurality of bake devices (1000). FIG. 3 to 5 are cross-sectional views schematically showing one embodiment of the exhaust system (100) of FIG. 2, and FIG. 6 and FIG. 7 are cross-sectional views schematically showing other embodiments of the exhaust system (100) of FIG. 2.

[0027] As illustrated in FIG. 1, a bake device (1000) according to one embodiment of the present invention may be configured to include, largely, an exhaust system (100), a process chamber (200), a support unit (300), and a heating unit (400).

[0028] As illustrated in FIG. 1, the process chamber (200) may form a processing space (A) in which a substrate (S) can be processed. More specifically, the process chamber (200) may be formed in a cylindrical shape to provide a sealed processing space (A) during the baking process of the substrate (S). Such a process chamber (200) may include an upper body (210) and a lower body (220).

[0029] For example, the upper body (210) may be formed in a circular shape when viewed from above. Additionally, a lower body (220) formed in a circular shape corresponding to the upper body (210) may be located at the bottom of the upper body (210).

[0030] The upper body (210) and the lower body (220) can be combined vertically to form a processing space (A) inside, and the upper body (210) and the lower body (220) can be formed of the same material. For example, it may be preferable for the upper body (210) and the lower body (220) to be formed of a material with excellent heat resistance.

[0031] Additionally, a drive unit (230) may be coupled to one side of the upper body (210). The drive unit (230) can raise or lower the upper body (210) relative to the lower body (220).

[0032] For example, the actuator (230) can raise the upper body (210) to open the process chamber (200) when a substrate (S) is brought in from the outside, and the actuator (230) can also lower the upper body (210) to close the process chamber (200) when the baking process of the substrate (S) is in progress. In this embodiment, the actuator (230) is coupled to the upper body (210) to raise or lower the upper body (210), but it is not necessarily limited to FIG. 1, and the actuator (230) can be coupled to the lower body (220) to raise or lower the lower body (220) relative to the upper body (210).

[0033] As illustrated in FIG. 1, the support unit (300) can support a substrate (S) in the processing space (A) of the process chamber (200). The support unit (300) may be configured to include a support plate (310) and a lift pin (320).

[0034] For example, a substrate (S) may be placed on the upper surface of the support plate (310). The support plate (310) may be formed in a circular shape when viewed from above and may be located within the processing space (A). It may be preferable for such a support plate (310) to be formed of a material with good thermal conductivity.

[0035] Additionally, the lift pin (320) can place a substrate (S) transported from the outside onto the support plate (310). Alternatively, the lift pin (320) can move the substrate (S) placed on the support plate (310) upward so that it is spaced apart from the upper surface of the support plate (310) by a predetermined distance, thereby allowing it to be transported to the outside. At this time, transporting the substrate (S) to the outside or transporting the substrate (S) to the support plate (310) located in the processing space (A) of the process chamber (200) can be accomplished through a separate transport unit (not shown). Additionally, a plurality of holes (not shown) through which the lift pin (320) can pass may be formed on the upper surface of the support plate (310).

[0036] As illustrated in FIG. 1, the heating unit (400) can heat a substrate (S) supported by a support unit (300). For example, the heating unit (400) may be formed as a heater located inside the support plate (310). In addition, the heating unit (400) may be formed as a heater formed to surround the support plate (310) by contacting it, or as a device that irradiates heat from the top of the substrate (S).

[0037] As illustrated in FIGS. 1 to 3, the exhaust system (100) includes an exhaust duct (110) and a damper device (120) installed in the exhaust duct (110), and is connected to the process chamber (200) so that the exhaust duct (110) can be connected to an exhaust plate (130) installed on the upper part of the process chamber (200) so as to be opposite to the support unit (300), thereby allowing exhaust gas containing fumes such as reaction byproducts or foreign substances generated in the processing space (A) during the baking process of the substrate (S) to be exhausted to the outside.

[0038] Here, an exhaust plate (130) connected to the exhaust duct (110) of the exhaust system (100) in the processing space (A) of the process chamber (200) can guide the formation of an airflow when the processing space (A) is exhausted by the exhaust system (100). For example, the exhaust plate (130) may be formed in a circular plate shape and positioned on the upper part of the process chamber (200) so as to face the support unit (300) that supports the substrate (S). It may be preferable for the exhaust plate (130) to be formed with a radius equal to or larger than that of the support plate (310) of the support unit (300).

[0039] Additionally, in the process chamber (200), a plurality of inlet pipes (140) may be connected to a portion adjacent to the exhaust duct (110) of the exhaust system (100). The inlet pipes (140) may supply external airflow to the processing space (A). The external airflow that can be supplied through the inlet pipes (140) may be clean dry air.

[0040] Below, the configuration and operation of the exhaust system (100) described above will be described in more detail.

[0041] As illustrated in FIGS. 1 and 2, the exhaust duct (110) of the exhaust system (100) is connected to at least one bake device (1000) to exhaust exhaust gas generated from each bake device (1000) to the outside. At this time, as illustrated in FIGS. 2 and 3, a damper device (120) is rotatably installed on one side of the exhaust duct (110) so as to regulate the exhaust pressure supplied to the bake device (1000) through the exhaust duct (110), thereby allowing the opening rate of the exhaust passage (P) within the exhaust duct (110) to be adjusted.

[0042] For example, the damper device (120) may be configured to include a rotating shutter (121) that is formed to cross at least a portion of the exhaust passage (P) of the exhaust duct (110), is rotatably installed on one side of the exhaust duct (110) by means of a rotating hinge (H) and adjusts the opening ratio of the exhaust duct (110) according to the degree of rotation, and an elastic damper unit (122) that is connected to one side of the rotating shutter (121) from the outside of the exhaust duct (110) and elastically adjusts the degree of rotation of the rotating shutter (121).

[0043] More specifically, the rotating shutter (121) of the damper device (120) can be divided into a first part (121a) that is inserted into the interior of the exhaust duct (110) with respect to the rotating hinge (H) and formed to cross at least a portion of the exhaust passage (P), and a second part (121b) that is exposed to the outside of the exhaust duct (110) with respect to the rotating hinge (H) and connected to the elastic damper unit (122).

[0044] The first part (121a) of the rotating shutter (121) is formed with a shape corresponding to the cross-sectional shape of the exhaust passage (P) of the exhaust duct (110), and the end may be formed so as to be spaced apart from the inner wall surface of the exhaust passage (P) by a predetermined distance (D1) so that the exhaust passage (P) is not completely closed even when the rotating shutter (121) rotates in a direction perpendicular to the extension direction of the exhaust duct (110). Additionally, the rotating shutter (121) may be formed such that the area of ​​the first part (121a) is larger than the area of ​​the second part (121b) to which the elastic damper unit (122) is connected.

[0045] Additionally, the elastic damper unit (122) of the damper device (120) may include an elastic member (122a) connected to a second part (121b) of a rotating shutter (121) with one end exposed to the outside of the exhaust duct (110), and a damping control part (122b) formed to protrude from the outer wall surface of the exhaust duct (110) and fixing the other end of the elastic member (122a).

[0046] The elastic member (122a) of the elastic damper unit (122) may be a coiled spring (CS), as shown in FIG. 3.

[0047] Accordingly, as illustrated in FIG. 3, the damper device (120) can adjust the initial opening ratio by rotating the rotating shutter (121) up and down within the exhaust duct (110) to adjust the rotation angle. Here, when adjusting the initial opening ratio, the rotating shutter (121) is adjusted perpendicular to the extension direction of the exhaust duct (110) as an example, but it is not necessarily limited to FIG. 3 and can be adjusted to a wide variety of rotation angles depending on the required exhaust pressure of the bake device (1000).

[0048] Additionally, the rotation angle adjustment of the rotation shutter (121) can be performed by adjusting the elastic force according to the expansion length of the elastic member (122a), i.e., the coil spring (CS), which is connected to the second part (121b) of the rotation shutter (121) outside the exhaust duct (110).

[0049] For example, the length adjustment of the elastic member (122a) can be adjusted by sliding the damping adjustment part (122b) to fix the other end of the elastic member (122a) as shown in FIG. 4, so that the damping adjustment part (122b) is installed to be slidably movable along the extension direction of the exhaust duct (110).

[0050] However, the length adjustment of the elastic member (122a) is not necessarily limited to FIG. 4, and any structure capable of adjusting the compression length or tension length of the elastic member (122a) can be applied, such as adjusting the part where the damping adjustment part (122b) fixes the elastic member (122a) while the damping adjustment part (122b) is installed fixedly on the outer wall surface of the exhaust duct (110) (fixing the end part of the elastic member (122a), fixing a part spaced a predetermined distance from the end, etc.). In addition, depending on the required exhaust pressure of the bake device (1000), it may also be possible to replace the elastic member (122a) with one having appropriate elasticity.

[0051] Accordingly, as illustrated in FIG. 5, the damper device (120) can increase the force received by the rotating shutter (121) in the direction of the first pressure (P1) due to the pressure difference when a pressure difference occurs between the first pressure (P1) behind the first part (121a) of the rotating shutter (121) and the second pressure (P2) in front of the first part (121a) based on the direction of flow of the exhaust gas in the exhaust passage (P) within the exhaust duct (110) (where the second pressure (P2) is formed significantly larger than the first pressure (P1)).

[0052] In this way, when the force received by the rotating shutter (121) in the direction of the first pressure (P1) increases, the rotating shutter (121) overcomes the elastic force of the elastic member (122a) and rotates in the direction of the first pressure (P1), thereby increasing the predetermined distance (D2) separated between the end of the rotating shutter (121) and the inner wall surface of the exhaust passage (P), so that the opening ratio can be increased again to a level equivalent to the initial state.

[0053] At this time, the rotation of the rotating shutter (121) is controlled by the expansion of the elastic member (122a) installed outside the exhaust duct (110), and when the elastic force of the elastic member (122a) and the force applied to the rotating shutter (121) due to the pressure difference between the first pressure (P1) and the second pressure (P2) are in equilibrium, the rotation of the rotating shutter (121) can be stopped.

[0054] The principle of rotation of the rotating shutter (121) according to the difference between the first pressure (P1) and the second pressure (P2) can be expressed by the following [Equation 1].

[0055] [Formula 1]

[0056] k * l = A * (P2 P1)

[0057] k: Spring constant

[0058] l: Change in spring length

[0059] A: Cross-sectional area of ​​the rotating shutter

[0060] P1, P2: Pressure before / after the rotating shutter

[0062] For example, when fumes contained in the exhaust gas exhausted through the exhaust duct (110) are deposited on the rotating shutter (121), the cross-sectional area of ​​the rotating shutter (121) increases from A to A2, and the pressure P2 in front of the rotating shutter (121) can increase to P22. (Here, A < A2, P2 < P22)

[0063] Accordingly, based on [Equation 1], the state k * l < A2 * (P22 P1) can be achieved, and by increasing the length of the spring from l to l2 to balance the forces, k * l2 = A2 * (P22 P1) can be achieved based on [Equation 1].

[0064] In this process, as the length of the spring increases from l to l2, the opening ratio can be increased by increasing the rotation angle of the rotating shutter (121).

[0065] In addition, in the embodiment of the exhaust system (100) according to FIGS. 3 to 5 described above, the elastic member (122a) used in the elastic damper unit (122) of the damper device (120) is exemplified as being a coil spring (CS), but is not necessarily limited thereto, and as shown in FIGS. 6 to 7, the elastic member (122a) may be a torsion spring (TS). In addition, any elastic member capable of elastically rotating the rotating shutter (121) may be used as the elastic member (122a).

[0066] Even when a torsion spring (TS) is applied as the elastic member (122a), the operation process of the damper device (120) may be the same as when a coil spring (CS) is applied as the elastic member (122a). Therefore, a detailed description is omitted.

[0067] Accordingly, according to an exhaust system (100) and a bake device (1000) including the same according to various embodiments of the present invention, a rotating shutter (121) of a damper device (120) is installed to be elastically rotatable by means of an elastic member (122a) in an exhaust passage (P) within an exhaust duct (110), so that the opening rate of the exhaust passage (P) within the exhaust duct (110) can be adjusted according to the degree of rotation of the rotating shutter (121).

[0068] Accordingly, when the cross-sectional area of ​​the rotating shutter (121) increases due to fumes deposited on the rotating shutter (121) during the baking process of the substrate (S), the rotating shutter (121) automatically rotates further until the force applied to the rotating shutter (121) due to the pressure difference between the front and rear of the rotating shutter (121) and the elastic force of the elastic member (122a) and the pressure difference is balanced, thereby controlling the opening rate of the exhaust passage (P) in the exhaust duct (110), so that the opening rate of the exhaust passage (P) in the exhaust duct (110) during the baking process of the substrate (S) can be continuously maintained at a constant level while minimizing changes in the opening rate of the exhaust passage (P) in the exhaust duct (110).

[0069] In this way, by maintaining the opening rate of the exhaust passage (P) in the exhaust duct (110) constant during the baking process of the substrate (S), the exhaust pressure supplied to the process chamber (200) is continuously maintained constant during the baking process of the substrate (S), thereby smoothly discharging fumes such as reaction by-products or foreign substances generated from the baking device (1000) to the outside, and thus having the effect of improving the processing quality of the substrate (S).

[0070] The present invention has been described with reference to the embodiments illustrated in the drawings, but this is merely illustrative, and those skilled in the art will understand that various modifications and equivalent alternative embodiments are possible therefrom. Accordingly, the true technical scope of protection of the present invention should be determined by the technical spirit of the appended claims. Explanation of the symbols

[0071] 100: Exhaust system 110: Exhaust duct 120: Damper device 121: Meeting Shutter 121a: Part 1 121b: Part 2 122: Elastic damper unit 122a: Elastic member 122b: Damping control section 130: Exhaust plate 140: Inlet pipe 200: Process chamber 210: Upper body 220: Lower body 230: Actuator 300: Support Unit 310: Support plate 320: Lift pin 400: Heating unit 1000: Bake device A: Processing space S: Substrate H: Rotation hinge P: Exhaust passage CS: Coil spring TS: Torsion spring

Claims

Claim 1 An exhaust system connected to at least one bake device capable of performing a baking process of a substrate, capable of exhausting exhaust gas containing reaction byproducts or foreign substances generated from said bake device to the outside, comprising: an exhaust duct connected to at least one of said bake devices capable of discharging said exhaust gas to the outside; and a damper device rotatably installed on one side of said exhaust duct to control the opening rate of said exhaust duct so as to control the exhaust pressure supplied to said bake device; wherein the damper device comprises a pivot shutter formed to cross at least a portion of the exhaust passage of said exhaust duct, rotatably installed on one side of said exhaust duct by means of a pivot hinge, and controlling the opening rate of said exhaust duct according to the degree of pivoting. An exhaust system comprising: an elastic damper unit connected to one side of the rotating shutter outside the exhaust duct to elastically adjust the degree of rotation of the rotating shutter; wherein, when the opening rate of the exhaust passage decreases as the area blocking the exhaust passage increases due to the reaction byproduct or the foreign substance deposited on the rotating shutter during the baking process, the rotating shutter automatically rotates until the force applied to the rotating shutter by the pressure difference before and after the rotating shutter in the exhaust passage and the force due to the elastic force of the elastic damper unit are in equilibrium, thereby adjusting the opening rate of the exhaust passage within the exhaust duct to be maintained at a constant level. Claim 2 delete Claim 3 An exhaust system according to claim 1, wherein the pivot shutter comprises: a first portion formed to be inserted into the interior of the exhaust duct with respect to the pivot hinge and to cross at least a portion of the exhaust passage; and a second portion exposed to the exterior of the exhaust duct with respect to the pivot hinge and connected to the elastic damper unit. Claim 4 An exhaust system according to claim 3, wherein the first part is formed in a shape corresponding to the shape of the cross-sectional area of ​​the exhaust passage of the exhaust duct, and the end is formed to be spaced apart from the inner wall surface of the exhaust passage by a predetermined distance so as not to completely close the exhaust passage even when the rotating shutter rotates in a direction perpendicular to the extension direction of the exhaust duct. Claim 5 In claim 3, the rotation shutter is an exhaust system in which the area of ​​the first part is formed to be larger than the area of ​​the second part. Claim 6 In claim 3, the elastic damper unit comprises: an elastic member connected to the second part of the rotating shutter, one end of which is exposed to the outside of the exhaust duct; and a damping control part formed to protrude from the outer wall surface of the exhaust duct and fixing the other end of the elastic member; an exhaust system. Claim 7 In claim 6, the damping control unit is installed on the outer wall surface of the exhaust duct to allow sliding movement along the extension direction of the exhaust duct so as to adjust the compression length or tension length of the elastic member, in an exhaust system. Claim 8 In claim 6, the elastic member comprises a coiled spring or a torsion spring, in an exhaust system. Claim 9 In claim 6, the damper device is an exhaust system in which, when a pressure difference occurs between a first pressure behind the first part of the rotating shutter and a second pressure in front of the first part with respect to the flow direction of the exhaust gas in the exhaust passage within the exhaust duct, the rotating shutter starts to rotate due to the pressure difference, and stops rotating when the pressure applied to the first part of the rotating shutter by the elastic force of the elastic member of the elastic damper unit and the pressure difference are in equilibrium. Claim 10 A process chamber in which a processing space capable of processing a substrate is formed; a support unit for supporting the substrate in the processing space of the process chamber; a heating unit for heating the substrate supported by the support unit; and an exhaust system connected to the process chamber so as to be connected to an exhaust plate installed on the upper part of the process chamber opposite to the support unit, for exhausting exhaust gas containing reaction by-products or foreign substances generated in the processing space during the baking process of the substrate to the outside; wherein the exhaust system comprises: an exhaust duct connected to the process chamber to discharge the exhaust gas to the outside; and a damper device rotatably installed on one side of the exhaust duct to adjust the opening rate of the exhaust duct so as to adjust the exhaust pressure supplied to the processing space of the process chamber; wherein the damper device comprises a rotating shutter formed to cross at least a portion of the exhaust passage of the exhaust duct, rotatably installed on one side of the exhaust duct by a rotating hinge, and adjusting the opening rate of the exhaust duct according to the degree of rotation. A baking device comprising: an elastic damper unit connected to one side of the rotating shutter outside the exhaust duct to elastically adjust the degree of rotation of the rotating shutter; wherein, when the opening rate of the exhaust passage decreases as the area blocking the exhaust passage increases due to the reaction byproduct or the foreign substance deposited on the rotating shutter during the baking process, the rotating shutter automatically rotates until the force applied to the rotating shutter by the pressure difference before and after the rotating shutter in the exhaust passage and the force due to the elastic force of the elastic damper unit are in equilibrium, thereby adjusting the opening rate of the exhaust passage within the exhaust duct to be maintained at a constant level.

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