Half tone scheme for maskless lithography

Abstract

The embodiments described herein provide a system, software application, and method of a lithography process for recording full tone portions and gray tone portions in a single pass. One embodiment of the system includes a controller configured to provide mask pattern data to a lithography system. The controller is configured to temporally divide a plurality of spatial light modulator pixels into gray tone shots and full tone shots among a plurality of shots, and the controller is configured to change a second intensity of a light beam generated by a light source and change a first intensity of a light beam generated by a light source of each image projection system in the full tone shots.

Description

Technology Field

[0001] The embodiments of the present disclosure generally relate to lithography systems. More specifically, the embodiments of the present disclosure relate to a system, software application, and method of a lithography process for recording full tone portions and gray tone portions in a single pass. Background Technology

[0002] Photolithography is widely used in the manufacture of display devices such as LCDs (liquid crystal displays) and semiconductor devices, such as for back-end processing of semiconductor devices. For example, large-area substrates are commonly used in the manufacture of LCDs. LCDs or flat-panel displays are generally used in active matrix displays such as computers, touch panel devices, PDAs (personal digital assistants), mobile phones, and television monitors. Generally, flat-panel displays include a layer of liquid crystal material sandwiched between two plates as a phase change material at each pixel. When power from a power supply is applied across or through the liquid crystal material, the amount of light passing through the liquid crystal material is controlled, that is, selectively adjusted, at pixel locations, thereby enabling images to be generated on the display.

[0003] In conventional lithography systems, multiple passes of the substrate below the writeable area of ​​the lithography system are required to record a pattern of multiple full-tone portions having a full-tone dose and multiple gray-tone portions having a gray-tone dose onto a photoresist placed on the substrate. Multiple passes of the substrate below the writeable area of ​​the digital lithography system reduce throughput.

[0004] Accordingly, what is needed in the relevant technical field is a system, software application, and method of a lithography process for recording whole tone portions and gray tone portions in a single pass.

[0005] In one embodiment, a system is provided. The system comprises a slab and a movable stage that can be placed on the slab. The stage is configured to support a substrate having a photoresist placed on its upper surface, and an encoder is coupled to the stage to provide the position of the substrate to a controller configured to provide mask pattern data to a lithography system. The mask pattern data has a plurality of full-tone exposed polygons and a plurality of gray-tone exposed polygons. A lithography system support is coupled to the slab, and the lithography system support has an opening that allows the stage to pass under the lithography system support. A lithography system has a processing unit having a plurality of image projection systems that receive mask pattern data. Each image projection system includes a spatial light modulator having a plurality of spatial light modulator pixels for projecting a plurality of shots. A controller is configured to temporally divide the plurality of spatial light modulator pixels into gray tone shots and full tone shots among the plurality of shots, and the controller is configured to change a second intensity of the light beam generated by the light source of each image projection system in the gray tone shots and change a first intensity of the light beam generated by the light source of each image projection system in the full tone shots.

[0006] In another embodiment, a non-transient computer-readable medium is provided. The computer-readable medium stores instructions that, when executed by a processor, cause a computer system to perform the steps of providing mask pattern data having a plurality of exposure polygons to a processing unit of a lithography system, and projecting a plurality of shots onto a plurality of full-tone exposure polygons and a plurality of gray-tone exposure polygons in a single scan under a plurality of image projection systems on a substrate having a photoresist disposed on top. The processing unit has a plurality of image projection systems that receive the mask pattern data. The mask pattern data has a plurality of full-tone exposure polygons and a plurality of gray-tone exposure polygons. The plurality of shots are divided into gray-tone shots having a second intensity and full-tone shots having a first intensity. The gray-tone shots are projected onto a plurality of full-tone exposure polygons and a plurality of gray-tone exposure polygons, and the full-tone shots are projected only onto a plurality of full-tone exposure polygons.

[0007] In another embodiment, a method is provided. The method comprises the step of providing mask pattern data having a plurality of exposure polygons to a processing unit of a lithography system. The processing unit has a plurality of image projection systems that receive the mask pattern data. The mask pattern data has a plurality of full-tone exposure polygons and a plurality of gray-tone exposure polygons. In a single scan under the plurality of image projection systems of a substrate having a photoresist disposed on top, the method comprises the step of projecting a plurality of shots onto the plurality of full-tone exposure polygons and the plurality of gray-tone exposure polygons. The plurality of shots are divided into gray-tone shots having a second intensity and full-tone shots having a first intensity. The gray-tone shots are projected onto the plurality of full-tone exposure polygons and the plurality of gray-tone exposure polygons, and the full-tone shots are projected only onto the plurality of full-tone exposure polygons. Brief explanation of the drawing

[0008] In a manner that the features enumerated above in the present disclosure can be understood in detail, a more specific description of the present disclosure, which has been briefly summarized above, may be made with reference to embodiments, some of which are illustrated in the accompanying drawings. However, it should be noted that the accompanying drawings are merely illustrative of exemplary embodiments and should not be construed as limiting the scope thereof, and that other equally valid embodiments may be permitted.

[0009] FIG. 1 is a perspective view of a system according to one embodiment.

[0010] FIG. 2a is a schematic cross-sectional view of an image projection system according to one embodiment.

[0011] FIGS. 2B and FIGS. 2C are schematic diagrams of a spatial light modulator according to one embodiment.

[0012] FIG. 3 is a schematic diagram of a computing system according to one embodiment.

[0013] FIG. 4 is a schematic diagram of a single-pass lithography application according to one embodiment.

[0014] FIG. 5 is a schematic diagram of a controller according to one embodiment.

[0015] FIG. 6a is a schematic plan view of a substrate after a lithography process according to one embodiment.

[0016] FIGS. 6b - 6d are cross-sectional views of the exposure of photoresist in cross-section according to one embodiment.

[0017] FIG. 7 is a flowchart of a method of a lithography process according to one embodiment.

[0018] FIG. 8 is a flowchart of a method of a lithography process according to one embodiment.

[0019] FIG. 9 is a flowchart of a method of a lithography process according to one embodiment.

[0020] FIGS. 10a–10s are schematic plan views of full-tone exposed polygons and gray-tone exposed polygons during the methods of the lithography process according to the embodiments.

[0021] FIG. 11 is a flowchart of a method of a lithography process according to one embodiment.

[0022] FIGS. 12a–12f are schematic plan views of a full-tone exposed polygon and a gray-tone exposed polygon during a lithography process method according to one embodiment.

[0023] For ease of understanding, the same reference numerals have been used where possible to denote the same elements common to the drawings. It is considered that the elements and features of one embodiment may be advantageously incorporated into other embodiments without further mention. Specific details for implementing the invention

[0024] The embodiments described herein provide a system, software application, and method for a lithography process, such as a digital lithography process, for recording full tone portions and gray tone portions in a single pass. One embodiment of the system includes a controller configured to provide mask pattern data to the lithography system. The mask pattern data has a plurality of full tone exposure polygons and a plurality of gray tone exposure polygons. The lithography system has a processing unit having a plurality of image projection systems that receive the mask pattern data. Each image projection system includes a spatial light modulator having a plurality of spatial light modulator pixels for projecting a plurality of shots. The controller is configured to temporally divide the plurality of spatial light modulator pixels into gray tone shots and full tone shots among the plurality of shots, and the controller is configured to change a second intensity of the light beam generated by the light source of each image projection system in the gray tone shots and change a first intensity of the light beam generated by the light source of each image projection system in the full tone shots.

[0025] FIG. 1 is a perspective view of a system (100), such as a digital lithography system, which can benefit from the embodiments described herein. The system (100) includes a stage (114) and a processing device (104). The stage (114) is supported by a pair of tracks (116) disposed on a slab (102). A substrate (120) is supported by the stage (114). The stage (114) is supported by a pair of tracks (116) disposed on the slab (102). The stage (114) moves along the pair of tracks (116) in the X direction as indicated by the coordinate system shown in FIG. 1. In one embodiment that can be combined with other embodiments described herein, the pair of tracks (116) are a pair of parallel magnetic channels. As illustrated, each track of the pair of tracks (116) extends along a straight path. To provide information about the position of the stage (114) to the controller (122), an encoder (118) is coupled to the stage (114).

[0026] The controller (122) is generally designed to enable the control and automation of the processing techniques described herein. The controller (122) may be coupled to or communicate with the processing device (104), the stage (114), and the encoder (118). The processing device (104) and the encoder (118) may provide the controller (122) with information regarding substrate processing and substrate alignment. For example, the processing device (104) may provide the controller (122) with information to warn the controller (122) that substrate processing is complete. The controller (122) enables the control and automation of methods of a lithography process for recording full tone portions and gray tone portions in a single pass. A program (or computer commands), which may be referred to as an imaging program and is readable by the controller (122), determines what operations can be performed on the substrate (120). The program includes mask pattern data and code for monitoring and controlling processing time and substrate position. Mask pattern data corresponds to the pattern to be recorded on the photoresist using electromagnetic radiation.

[0027] The substrate (120) comprises any suitable material used as part of a flat panel display, e.g., glass. In other embodiments that may be combined with other embodiments described herein, the substrate (120) is made of other materials that may be used as part of a flat panel display. The substrate (120) has a film layer to be patterned formed on the substrate (120), e.g., by pattern etching of the substrate (120), and a photoresist layer formed on the film layer to be patterned, which is sensitive to electromagnetic radiation, e.g., UV or deep UV "light." The positive photoresist comprises portions of photoresist that are each soluble in a photoresist developer applied to the photoresist after a pattern is recorded on the photoresist using electromagnetic radiation when exposed to radiation. A negative photoresist comprises portions of the photoresist that are insoluble in the photoresist developer applied to the photoresist after a pattern is recorded on the photoresist using electromagnetic radiation when exposed to radiation. The chemical composition of the photoresist determines whether the photoresist is a positive photoresist or a negative photoresist. Examples of photoresists include, but are not limited to, at least one of diazonaphthoquinone, phenol formaldehyde resin, poly(methyl methacrylate), poly(methyl glutarimide), and SU-8. After the photoresist is exposed to electromagnetic radiation, the resist is developed, leaving the patterned photoresist on the underlying film layer. Subsequently, using the patterned photoresist, the underlying film is pattern-etched through the openings of the photoresist to form part of the electronic circuit network of the display panel.

[0028] The processing unit (104) includes a support member (108) and a processing unit (106). The processing unit (104) spans a pair of tracks (116) and is placed on a slab (102), thereby including an opening (112) for the pair of tracks (116) and a stage (114) to pass under the processing unit (106). The processing unit (106) is supported on the slab (102) by the support member (108). In one embodiment that may be combined with other embodiments described herein, the processing unit (106) is a pattern generator configured to expose a photoresist in a photolithography process. In some embodiments that may be combined with other embodiments described herein, the pattern generator is configured to perform a maskless lithography process. The processing unit (106) includes a plurality of image projection systems. An example of an image projection system is shown in FIG. 2a. In one embodiment that can be combined with other embodiments described herein, the processing unit (106) includes as many as 84 image projection systems. Each image projection system is placed within a case (110). The processing unit (106) is useful for performing maskless direct pattern recording on photoresist or other electromagnetic radiation sensitive materials.

[0029] FIG. 2a is a schematic cross-sectional view of an image projection system (200) that can be used in a system (100). The image projection system (200) includes a spatial light modulator (210) and a projection optical device (212). The components of the image projection system (200) vary depending on the spatial light modulator (210) used. The spatial light modulator (210) includes an array of electrically addressable elements. The electrically addressable elements include (but are not limited to) digital micromirrors, liquid crystal displays (LCDs), liquid crystal over silicon (LCoS) devices, ferroelectric liquid crystal on silicon (FLCoS) devices, and microshutters. The spatial light modulator (210) includes a plurality of spatial light modulator pixels. Each of the plurality of spatial light modulator pixels is individually controllable and configured to project a recording beam corresponding to one of the plurality of pixels. A compilation of multiple pixels forms a pattern that is recorded on a photoresist, which is referred to herein as a mask pattern. A projection optical unit (212) includes projection lenses, such as 10x objective lenses, used to project light onto a substrate (120). During operation, based on mask pattern data provided to the spatial light modulator (210) by the controller (122), each spatial light modulator pixel of the multiple spatial light modulator pixels is in an "on" position or an "off" position. Each spatial light modulator pixel in the "on" position forms a recording beam, and then the projection optical unit (212) projects the recording beam onto the surface of the photoresist layer of the substrate (120) to form a pixel of the mask pattern.

[0030] In one embodiment that may be combined with other embodiments described herein, the spatial light modulator (210) is a DMD. The image projection system (200) includes a light source (202), an aperture (204), a lens (206), a frustrated prism assembly (208), a DMD, and a projection optical device (212). The DMD includes a plurality of mirrors, i.e., a plurality of spatial light modulator pixels. Each of the plurality of mirrors corresponds to a pixel that can correspond to a pixel of the mask pattern. In some embodiments that may be combined with other embodiments described herein, the DMD includes more than about 4,000,000 mirrors. The light source (202) is any suitable light source capable of generating light having a predetermined wavelength, such as a light emitting diode (LED) or a laser. In one embodiment that may be combined with other embodiments described herein, the predetermined wavelength is in the blue or near-ultraviolet (UV) range, e.g., less than about 450 nm. The bent prism assembly (208) comprises a plurality of reflective surfaces. During operation, a light beam (201) is generated by a light source (202). The light beam (201) is reflected to the DMD by the bent prism assembly (208). When the light beam (201) reaches the mirrors of the DMD, each mirror in the "on" position reflects the light beam (201), that is, each mirror forms a recording beam also known as a "shot," and then a projection optical device (212) projects the recording beam to shoot a shot onto the surface of the photoresist layer of the substrate (120). A plurality of recording beams (203), also known as a plurality of shots, form a plurality of pixels of the mask pattern.

[0031] FIGS. 2b and FIGS. 2c are schematic diagrams of a spatial light modulator (210) which is a DMD. A plurality of mirrors (213), also known as a plurality of spatial light modulator pixels, are arranged in a grid having M rows and N columns. In FIG. 2b, rows (214, 216, 218, 220, 222, 224) and columns (215, 217, 219, 221, 223, 225) are shown. In a method (700) of a lithography process for recording whole tone portions and gray tone portions in a single pass, a controller (122) divides one of the N columns and M rows of the mirrors (213) into a gray tone group (226) and a whole tone group (227), as shown in FIG. 2b. In embodiments of the methods (700, 800, 900) described herein, dividing one of the N columns and M rows of the mirrors (213) depends on the movement of the stage (114). When the movement of the stage (114) is substantially perpendicular to the N columns, the N columns are divided by the controller (122). When the movement of the stage (114) is substantially perpendicular to the M rows, the M rows are divided by the controller (122). When the movement of the stage (114) is not substantially perpendicular to one of the N columns and M rows, an array of grids having M rows and N columns is divided by the controller (122). In the embodiments described below, the movement of the stage (114) is substantially perpendicular to the N columns, and thus the N columns are divided by the controller (122). However, the embodiments described below of the methods (700, 800, 900) can be performed by moving the stage (114) substantially perpendicular to the N rows by dividing the N rows, and by moving the stage (114) not substantially perpendicular to one of the N columns and M rows by dividing the arrays of grids having M rows and N columns.In one embodiment of the method (700) which can be combined with other embodiments described herein, the gray tone group (226) and the whole tone group (227) have the same number of columns. In the method (800) of the lithography process for recording whole tone portions and gray tone portions in a single pass, the controller (122) divides N columns of mirrors (213) into a gray tone group (226) and a whole tone group (227) having different numbers of columns, as shown in FIG. 2b. In the method (900) of the lithography process for recording whole tone portions and gray tone portions in a single pass, the controller (122) divides N columns of mirrors (213) into a gray tone group (226), a whole tone group (227), and a remaining group (228), as shown in FIG. 2c. In one embodiment that can be combined with other embodiments described herein, the gray tone group (226) and the whole tone group (227) have the same number of columns. In another embodiment that can be combined with other embodiments described herein, the gray tone group (226) and the whole tone group (227) have different numbers of columns.

[0032] FIG. 3 is a schematic diagram of a computing system (300) configured to record whole tone portions and gray tone portions in a single pass in which embodiments of the present disclosure may be implemented. As illustrated in FIG. 3, the computing system (300) may include a plurality of servers (308), a single-pass lithography application (312), and a plurality of controllers (i.e., computers, personal computers, mobile / wireless devices) (122) (only two of these are shown for clarity), each of which is connected to a communication network (306) (e.g., the Internet). The servers (308) may communicate with a database (314) via a local connection (e.g., a Storage Area Network (SAN) or Network Attached Storage (NAS)) or via the Internet. The servers (308) are configured to interface with a database manager configured to directly access data contained in the database (314) or to manage data contained within the database (314).

[0033] Each controller (122) may include conventional components of a computing device, such as a processor, system memory, a hard disk drive, a battery, input devices, such as a mouse and keyboard, and / or output devices, such as a monitor or a graphical user interface, and / or combined input / output devices such as a touch screen that receives input as well as displays output. Each server (308) and single-pass lithography application (312) may include a processor and (not shown) system memory and may be configured to manage content stored in a database (314) using, for example, relational database software and / or a file system. I / O device interfaces (408) as shown in FIG. 4 may be programmed to communicate with each other, the controllers (122) and the single-pass lithography application (312), using a network protocol such as, for example, the TCP / IP protocol. The single-pass lithography application (312) may communicate directly with the controllers (122) via a communication network (306). Controllers (122) are programmed to execute software (304), such as programs and / or other software applications, and to access applications managed by servers (308).

[0034] In the embodiments described below, users may each operate controllers (122) that can be connected to servers (308) via a communication network (306). Pages, images, data, documents, etc., may be displayed to the user through the controllers (122). Information and images may be displayed through a display device and / or a graphical user interface that communicates with the controller (122).

[0035] It is noted that the controller (122) may be a personal computer, a laptop mobile computing device, a smartphone, a video game console, a home digital media player, a network-connected television, a set-top box, and / or other computing devices having components suitable for communicating with a communication network (306) and / or essential applications or software. The controller (122) may also run other software applications configured to receive content and information from a single-pass lithography application (312).

[0036] FIG. 4 is a schematic diagram of a single-pass lithography application (312). The single-pass lithography application (312) includes, without limitation, a CPU (central processing unit) (402), a network interface (404), memory (420), and storage (430) communicating through an interconnection unit (406). The single-pass lithography application (312) may also include I / O device interfaces (408) connecting I / O devices (410) (e.g., keyboard, video, mouse, audio, touch screen, etc.). The single-pass lithography application (312) may further include a network interface (504) configured to transmit data through a data communication network (shown in FIG. 5).

[0037] The CPU (402) retrieves and executes programming instructions stored in memory (420) and generally controls and coordinates the operations of other system components. Similarly, the CPU (402) stores and retrieves application data residing in memory (420). The CPU (402) includes representing a single CPU, multiple CPUs, a single CPU having multiple processing cores, etc. The interconnection part (406) is used to transmit programming instructions and application data between the CPU (402), I / O device interfaces (408), storage (430), network interfaces (404), and memory (420).

[0038] Memory (420) is generally included to represent random access memory and, in operation, stores software applications and data for use by the CPU (402). Although illustrated as a single unit, storage (430) may be a combination of fixed and / or removable storage devices, such as fixed disk drives, floppy disk drives, hard disk drives, flash memory storage drives, tape drives, removable memory cards, CD-ROMs, DVD-ROMs, Blu-ray, HD-DVDs, optical storage, NAS (network attached storage), cloud storage, or a SAN (storage area-network) configured to store non-volatile data.

[0039] The memory (420) may store commands and logic for executing an application platform (426) that may include single-pass lithography application software (428). The storage (430) may include a database (432) configured to store data (434) and associated application platform content (436). The database (432) may be any type of storage device.

[0040] Network computers are another type of computer system that can be used with the disclosures provided herein. Network computers generally do not include a hard disk or other mass storage, and executable programs are loaded from a network connection into memory (420) for execution by a CPU (502) (shown in FIG. 5). A typical computer system will generally include at least a processor, memory, and an interconnection connecting the memory to the processor.

[0041] FIG. 5 is a schematic diagram of a controller (122) used to access a single-pass lithography application (312) and to retrieve or display data associated with an application platform (426). The controller (122) may include, without limitation, a central processing unit (CPU) (502), a network interface (504), an interconnection unit (506), a memory (520), a storage (530), and supporting circuits (540). The controller (122) may also include an I / O device interface (508) for connecting I / O devices (510) (e.g., keyboard, display, touch screen, and mouse devices) to the controller (122).

[0042] As with the CPU (402), the CPU (502) is included to represent a single CPU, multiple CPUs, a single CPU having multiple processing cores, etc., and the memory (520) is included to generally represent random access memory. The interconnection (506) may be used to transmit programming commands and application data between the CPU (502), I / O device interfaces (508), storage (530), network interface (504), and memory (520). The network interface (504) may be configured to transmit data through the communication network (306), for example, to transmit content from a single-pass lithography application (312). Storage (430), such as a hard disk drive or a solid-state storage drive (SSD), may store non-volatile data. Storage (530) may include a database (531). The database (531) may include data (532), other content (534), and an image processing unit (536) having data (538) and control logic (539). For example, the memory (520) may include an application interface (522), and the application interface (522) itself may display software commands (524) and / or store or display data (526). The application interface (522) may provide one or more software applications that enable the controller to access data and other content hosted by the single-pass lithography application (312).

[0043] As illustrated in FIG. 1, the system (100) includes a controller (122). The controller (122) includes a CPU (central processing unit) (502), memory (520), and support circuits (540) (or I / O (508)). The CPU (502) may be any type of computer processor used in industrial settings to control various processes and hardware (e.g., pattern generators, motors, and other hardware) and to monitor processes (e.g., processing time and substrate position). The memory (520) illustrated in FIG. 5 is connected to the CPU (502) and may be one or more of readily available memory, such as RAM (random access memory), ROM (read only memory), floppy disk, hard disk, or any other form of local or remote digital storage. Software instructions and data may be coded and stored in memory to command the CPU (502). Support circuits (540) are also connected to the CPU (502) to support the processor in a conventional manner. The support circuits (540) may include a conventional cache (542), power supply units (544), clock circuits (546), an input / output network (548), subsystems (550), etc. A program (or computer instructions) readable by the controller (122) determines what operations can be performed on the substrate (120). The program may be software readable by the controller (122) and may include, for example, code for monitoring and controlling processing time and substrate position.

[0044] However, it should be noted that all such and similar terms must be associated with appropriate physical quantities and are merely convenient designations applied to these quantities. As is evident from the following discussions, unless specifically stated otherwise, discussions throughout the description using terms such as "processing," "computing," "calculation," "decision," or "display" are recognized as referring to the operations and processes of a computer system or similar electronic computing device that manipulate data represented as physical (electronic) quantities within the registers and memories of a computer system and convert it into other data similarly represented as physical quantities within the computer system memories or registers or other such information storage, transmission, or display devices.

[0045] This example also relates to an apparatus for performing the operations of this specification. The apparatus may include a general-purpose computer that can be specifically configured for the required purposes or is selectively activated or reconfigured by a computer program stored in the computer. Such computer program may be stored in a computer-readable storage medium, such as read-only memory (ROM), random access memory (RAM), EPROMs, EEPROMs, flash memory, magnetic or optical cards, any type of disk including floppy disks, optical disks, CD-ROMs and magneto-optical disks, or any type of medium suitable for storing electronic instructions (but not limited thereto), each of which is coupled to a computer system interconnect.

[0046] The algorithms and displays presented herein are not inherently associated with any specific computer or other device. Various general-purpose systems may be used with programs in accordance with the teachings of this specification, or it may prove convenient to configure a more specialized device to perform the necessary method operations. The structure of such various systems will be indicated from the above description. Additionally, the examples are not described by reference to any specific programming language, and thus various examples may be implemented using various programming languages.

[0047] As described in more detail in the embodiments of the present disclosure, a lithography application is disclosed that relates to the ability to apply mask pattern data (610) to a substrate (120) in a single-pass lithography process. The embodiments described herein relate to a software application platform. The software application platform includes methods for recording whole tone portions and gray tone portions in a single pass.

[0048] FIG. 6a is a schematic plan view of a substrate (120) after a lithography process. A plurality of full-tone portions (602) exposed to a full-tone dose (606) of light intensity emitted from a light source (202) (shown in FIG. 6b–6d) and a plurality of gray-tone portions (604) exposed to a gray-tone dose (608) of light intensity emitted from a light source (202) (shown in FIG. 6b–6d) are recorded on a photoresist (601). In one embodiment that may be combined with other embodiments described herein, the intensity is about 10 mJ / cm² to about 200 mJ / cm². During the lithography process, the mask pattern data (610) has a plurality of full-tone exposure polygons (612) corresponding to full-tone portions (602) to be formed by the lithography process and a plurality of gray-tone exposure polygons (614) corresponding to gray-tone portions (604) to be formed by the lithography process. A photoresist (601) is placed on a substrate (120). In one embodiment that may be combined with other embodiments described herein, the substrate (120) has a film layer to be patterned formed, for example, by pattern etching of the substrate (120), and a photoresist is placed on the film layer to be patterned.

[0049] FIGS. 6b–6d are cross-sectional views of the exposure of the photoresist (601) in cross-section (603). Cross-section (603) includes a plurality of whole-tone portions (602) exposed to a whole-tone dose (606) and a plurality of gray-tone portions (604) exposed to a gray-tone dose (608). The whole-tone dose (606) corresponds to a percentage of the photoresist (601) developed by exposing the plurality of whole-tone portions (602) to a whole-tone percentage of the intensity of light emitted from the light source (202). The gray-tone dose (608) corresponds to a percentage of the photoresist (601) developed by exposing the plurality of gray-tone portions (604) to a gray-tone percentage of the intensity of light emitted from the light source (202). If the width of one of the multiple whole tone parts (602) is not greater than the width of one of the spatial light modulator pixels, the width of each of the multiple whole tone parts (602) controls the whole tone dose (606) from the whole tone percentage of intensity. For example, if the width of one of the multiple whole tone parts (602) is smaller than the width of one of the spatial light modulator pixels, the whole tone dose (606) of the whole tone part becomes less than the whole tone percentage. If the width of one of the multiple whole tone parts (602) is greater than or equal to the width of one of the spatial light modulator pixels, the whole tone dose (606) of the whole tone part becomes equal to the whole tone percentage. If the width of one of the multiple gray tone portions (604) is not greater than the width of one of the spatial light modulator pixels, the width of each of the multiple gray tone portions (604) controls the gray tone dose (608) from the gray tone percentage of intensity. For example, if the width of one of the multiple gray tone portions (604) is smaller than the width of one of the spatial light modulator pixels, the gray tone dose (608) of the gray tone portion becomes less than the gray tone percentage.The width of one of the plurality of gray tone portions (604) is greater than or equal to the width of one of the spatial light modulator pixels, so that the gray tone dose (608) of the gray tone portion is equal to the gray tone percentage. In one embodiment that can be combined with other embodiments described herein, each of the plurality of whole tone portions (602) and the plurality of gray tone portions (604) has the same width less than the width of the spatial light modulator pixel.

[0050] As illustrated in FIG. 6b and further described herein, a method (700) using a gray tone group (226) and a whole tone group (227) having the same number of columns makes the gray tone percentage half of the whole tone percentage. For example, a gray tone group (226) having 50% of the columns and a whole tone portion having 50% of the columns result in a gray tone percentage of 50% and a whole tone percentage of 100%. The gray tone dose (608) is 42% of the gray tone percentage of the intensity of light emitted from a light source (202) exposed to each of a plurality of gray tone portions (604) having the same width less than the width of a spatial light modulator pixel. The total tone dose (606) is 84% ​​of the total tone percentage of 100% of the intensity of light emitted from a light source (202) exposed to each of a plurality of total tone portions (602) having the same width less than the width of a spatial light modulator pixel.

[0051] As illustrated in FIG. 6c and further described herein, a method (800) using a gray tone group (226) and a whole tone group (227) having different numbers of columns makes the gray tone percentage greater than half of the whole tone percentage. For example, a gray tone group (226) having 55% of the columns and a whole tone portion having 45% of the columns result in a gray tone percentage of 55% and a whole tone percentage of 95%. The gray tone dose (608) is 48.1% of the intensity of light emitted from a light source (202) exposed to each of a plurality of gray tone portions (604) having the same width less than the width of a spatial light modulator pixel, from a gray tone percentage of 55%. The total tone dose (606) is 87.5% of the total tone percentage of the intensity of light emitted from a light source (202) exposed to each of a plurality of total tone portions (602) having the same width less than the width of a spatial light modulator pixel, which is 95%.

[0052] As illustrated in FIG. 6d and further described herein, a method (900) using a gray tone group (226) and a whole tone group (227) having the same number of columns, and a gray tone group (226), a whole tone group (227), and a remainder group (228), results in a gray tone percentage being less than half of the whole tone percentage. For example, a gray tone group (226) having 48% of the columns, a whole tone portion having 48% of the columns, and a remainder group (228) having 4% of the columns result in a gray tone percentage of 48% and a whole tone percentage of 104%. The gray tone dose (608) is 40.86% of the intensity of light emitted from a light source (202) exposed to each of a plurality of gray tone portions (604) having the same width less than the width of a spatial light modulator pixel, which is 48% of the gray tone percentage. The total tone dose (606) is 85.47% of the total tone percentage of 104% of the intensity of light emitted from the light source (202) exposed to each of the plurality of total tone portions (602) having the same width less than the width of the spatial light modulator pixel.

[0053] FIG. 7 is a flowchart of a method (700) of a lithography process for recording full tone portions (602) and gray tone portions (604) in a single pass. FIG. 10a–10f are schematic plan views of a full tone exposed polygon (1002) and a gray tone exposed polygon (1004) during the method (700). In operation (701), as described above, a controller (122) divides N columns of mirrors (213) into a gray tone group (226) and a full tone group (227) having an equal number of columns. In operation (702), as the substrate (120) is scanned under an image projection system (200) in a single pass, a processing unit (106) projects multiple shots onto the full tone exposed polygon (1002) and the gray tone exposed polygon (1004). A plurality of spatial light modulator pixels of a spatial light modulator (210) form an aggregated shot pattern (1006) when each of the plurality of shots is projected onto one of the address points (1008). Each address point represents the center of the pixel. In one embodiment that may be combined with other embodiments described herein, the aggregated shot pattern (1006) is a hexagonal close-packed (HCP) pattern, but other patterns may be used for the aggregated shot pattern (1006). The plurality of shots are shots that form the entire tone portion of a plurality of entire tone portions (602) exposed to an entire tone dose (606). For example, the plurality of shots are 50 to 500 shots.

[0054] As illustrated in FIG. 10a, a first gray tone shot (1010a) of a plurality of shots from a gray tone group (226) of a spatial light modulator (210) is projected onto a full tone exposed polygon (1002) and a gray tone exposed polygon (1004) at least one first address point (1008a) among a plurality of address points (1008). Each shot of the plurality of shots in the full tone exposed polygon (1002) and the gray tone exposed polygon (1004) has an intensity of light emitted from a light source (202). As illustrated in FIG. 10b, a second gray tone shot (1010b) from a gray tone group (226) is projected onto a full tone exposed polygon (1002) and a gray tone exposed polygon (1004). As illustrated in FIG. 10c, projecting multiple shots from a gray tone group (226) onto a gray tone exposure polygon (1004) having a full tone exposure polygon (1002) and a gray tone group (226) is repeated until the final gray tone shot (1010n) among the multiple shots is projected onto at least one final address point (1008n). The division of the spatial light modulator (210) for the method (700) causes the final gray tone shot (1010n) to become a half point of the multiple shots. As illustrated in FIG. 10d, the full tone group (227) projects a first full tone shot (1012a) of the multiple shots inside the full tone exposure polygon (1002) onto at least one first address point (1008a) among the multiple address points (1008). As illustrated in FIG. 10e, the whole tone group (227) projects a second whole tone shot (1012b) inside the whole tone exposure polygon (1002) onto at least one second address point (1008b) among a plurality of address points (1008).As illustrated in FIG. 10f, projecting a number of shots having a whole tone group (227) is repeated until the final whole tone shot (1012n) of the number of shots is projected onto at least one final address point (1008n).

[0055] FIG. 8 is a flowchart of a method (800) of a lithography process for recording full tone portions (602) and gray tone portions (604) in a single pass. FIG. 10g–10l are schematic plan views of the full tone exposure polygon (1002) and the gray tone exposure polygon (1004) during the method (800). In operation (801), as described above, the controller (122) divides N columns of mirrors (213) into a gray tone group (226) and a full tone group (227) having different numbers of columns. The gray tone group (226) has a greater number of columns than the full tone group (227). In operation (802), when the substrate (120) is scanned under the image projection system (200) in a single pass, the processing unit (106) projects multiple shots onto the full-tone exposed polygon (1002) and the gray-tone exposed polygon (1004).

[0056] As illustrated in FIG. 10g, a first gray tone shot (1010a) of a plurality of shots from a gray tone group (226) of a spatial light modulator (210) is projected onto a full tone exposed polygon (1002) and a gray tone exposed polygon (1004) at least one of a plurality of address points (1008a). Each shot of the plurality of shots in the full tone exposed polygon (1002) and the gray tone exposed polygon (1004) has an intensity of light emitted from a light source (202). As illustrated in FIG. 10h, a second gray tone shot (1010b) from a gray tone group (226) is projected onto a full tone exposed polygon (1002) and a gray tone exposed polygon (1004). As illustrated in FIG. 10i, projecting multiple shots from a gray tone group (226) onto a gray tone exposure polygon (1004) having a full tone exposure polygon (1002) and a gray tone group (226) is repeated until the final gray tone shot (1010n) among the multiple shots is projected onto at least one final address point (1008n). The division of the spatial light modulator (210) for the method (800) causes the number of shots of the final gray tone shot (1010n) to exceed the number of shots of the half point of the multiple shots. Thus, since the final full tone shot (1012n) does not address each of the address points (1008) within the full tone exposure polygon (1002), and parts of the multiple address points (1008) within the full tone exposure polygon (1002) will not be addressed twice, the gray tone percentage will exceed half of the full tone percentage.

[0057] As illustrated in FIG. 10j, the whole tone group (227) projects a first whole tone shot (1012a) of a plurality of shots within the whole tone exposure polygon (1002) onto at least one first address point (1008a) among a plurality of address points (1008). As illustrated in FIG. 10k, the whole tone group (227) projects a second whole tone shot (1012b) within the whole tone exposure polygon (1002) onto at least one second address point (1008b) among a plurality of address points (1008). As illustrated in FIG. 10l, projecting the plurality of shots with the whole tone group (227) is repeated until the final whole tone shot (1012n) of the plurality of shots is projected onto at least one final address point (1008n). After the final full tone shot (1012n) is projected onto at least one final address point (1008n), parts of multiple address points (1008) inside the full tone exposure polygon (1002) are not addressed twice.

[0058] FIG. 9 is a flowchart of a method (900) of a lithography process for recording full tone portions (602) and gray tone portions (604) in a single pass. FIG. 10m–10s are schematic plan views of the full tone exposure polygon (1002) and gray tone exposure polygon (1004) during the method (900). In operation (901), as described above, the controller (122) divides N columns of mirrors (213) into a gray tone group (226), a full tone group (227), and a remaining group (228). The gray tone group (226) and the full tone group (227) have the same number of columns. In operation (902), when the substrate (120) is scanned under the image projection system (200) in a single pass, the processing unit (106) projects multiple shots onto the full-tone exposed polygon (1002) and the gray-tone exposed polygon (1004).

[0059] As illustrated in FIG. 10m, a first gray tone shot (1010a) of a plurality of shots from a gray tone group (226) of a spatial light modulator (210) is projected onto a full tone exposed polygon (1002) and a gray tone exposed polygon (1004) at least one of a plurality of address points (1008a). Each shot of the plurality of shots in the full tone exposed polygon (1002) and the gray tone exposed polygon (1004) has an intensity of light emitted from a light source (202). As illustrated in FIG. 10n, a second gray tone shot (1010b) from a gray tone group (226) is projected onto a full tone exposed polygon (1002) and a gray tone exposed polygon (1004). As illustrated in FIG. 10o, projecting multiple shots from a gray tone group (226) onto a gray tone exposure polygon (1004) having a full tone exposure polygon (1002) and a gray tone group (226) is repeated until a final gray tone shot (1010n) among the multiple shots is projected onto at least one final address point (1008n). The division of the spatial light modulator (210) for the method (900) causes each of the multiple address points (1008) inside the gray tone exposure polygon (1004) to be addressed.

[0060] As illustrated in FIG. 10p, the whole tone group (227) projects a first whole tone shot (1012a) of a plurality of shots within the whole tone exposure polygon (1002) onto at least one first address point (1008a) among a plurality of address points (1008). As illustrated in FIG. 10q, the whole tone group (227) projects a second whole tone shot (1012b) within the whole tone exposure polygon (1002) onto at least one second address point (1008b) among a plurality of address points (1008). As illustrated in FIG. 10r, projecting the plurality of shots with the whole tone group (227) is repeated until the final whole tone shot (1012n) of the plurality of shots is projected onto at least one final address point (1008n). As illustrated in FIG. 10s, the remaining group (228) of the spatial light modulator (210) projects the remaining shots (1014) of the plurality of shots onto address points within the full tone exposure polygon (1002), so that half of the total tone percentage exceeds the gray tone percentage. In an embodiment that may be combined with other embodiments described herein, the remaining group (228) of the spatial light modulator (210) projects the remaining shots (1014) of the plurality of shots onto address points within the gray tone exposure polygon (1004), so that half of the total tone percentage becomes less than the gray tone percentage.

[0061] FIG. 11 is a flowchart of a method (1100) of a lithography process for recording full tone portions (602) and gray tone portions (604) in a single pass. FIG. 12a–12f are schematic plan views of a full tone exposure polygon (1002) and a gray tone exposure polygon (1004) during the method (1100). A controller (122) temporally divides a plurality of spatial light modulator pixels of a spatial light modulator (210) into first shots and second shots among a plurality of shots within the full tone exposure polygon (1002) and the gray tone exposure polygon (1004). The controller (122) includes a shot counter for temporally dividing the first shots and second shots among a plurality of shots. The controller (122) includes a control loop for analog emission of light intensity from a light source (202). The control loop provides an analog emission of intensity in the first and second shots at predetermined locations across the photoresist (601).

[0062] When the substrate (120) is scanned under the image projection system (200) in a single pass, the processing unit (106) projects multiple shots. Among the multiple shots, the first shots and the second shots are projected onto the full tone exposure polygon (1002). In one embodiment that may be combined with other embodiments described herein, as illustrated, only the first shots among the multiple shots are projected onto the gray tone exposure polygon (1004). In another embodiment that may be combined with other embodiments described herein, only the second shots among the multiple shots are projected onto the gray tone exposure polygon (1004).

[0063] To enable explanation, FIGS. 11 and FIGS. 12a–12f will be described with reference to gray tone shots projected onto a gray tone exposed polygon (1004) among a plurality of shots, and full tone shots and gray tone shots projected onto a full tone exposed polygon (1002) among a plurality of shots. It should be noted that in one embodiment which may be combined with other embodiments described herein as illustrated in FIGS. 12a–12f, the gray tone shots are first shots and the full tone shots are second shots, and in another embodiment which may be combined with other embodiments described herein, the gray tone shots are second shots and the full tone shots are first shots.

[0064] In operation (1101), multiple shots are projected onto a full-tone exposed polygon (1002) and a gray-tone exposed polygon (1004). As illustrated in FIG. 12a, a gray-tone shot (1210a), which is a gray-tone shot among the multiple shots, is projected onto the gray-tone exposed polygon (1004), the full-tone exposed polygon (1002), and the gray-tone exposed polygon (1004) inside the full-tone exposed polygon (1002) through at least one first address point (1008a) among the multiple address points (1008). As illustrated in FIG. 12b, when the substrate (120) is scanned under the image projection system (200), a full-tone shot (1210b), which is a full-tone shot among the multiple shots, is projected onto the full-tone exposed polygon (1002) through at least one second address point (1008b). In one embodiment that can be combined with other embodiments described herein, as illustrated in FIG. 12c, a half-point shot (1210h) among a plurality of shots is a gray tone shot projected into the full tone exposure polygon (1002) and the gray tone exposure polygon (1004) at least one final address point (1008n). In another embodiment that can be combined with other embodiments described herein, a half-point shot (1210h) among a plurality of shots is a full tone shot projected into the full tone exposure polygon (1002). After the half-point shot (1210h) among a plurality of shots, a plurality of gray tone portions (604) have gray tone shot address points exposed to a first percentage of intensity among a plurality of address points (1008). A plurality of whole tone portions (602) have gray tone shot address points exposed to a second percentage of intensity, i.e., a gray tone percentage of intensity, and whole tone shot address points exposed to a first percentage of intensity. In one embodiment that may be combined with other embodiments described herein, the second intensity is less than the first intensity.The combination of the first intensity and the second intensity, i.e., the total tone percentage of intensity, corresponds to the total tone dose (606). The second intensity, i.e., the gray tone percentage, corresponds to the gray tone dose (608).

[0065] In one embodiment that can be combined with other embodiments described herein, as illustrated in FIG. 12d, after a half-point shot (1210h) which is a gray tone shot, one of the multiple shots (1210d) is a full tone shot projected onto a full tone exposure polygon (1002) at least one first address point (1008a) among the multiple address points (1008). In another embodiment that can be combined with other embodiments described herein, after a half-point shot (1210h) which is a full tone shot, one of the multiple shots (1210d) is a full tone shot projected onto a full tone exposure polygon (1002). In embodiments that may be combined with other embodiments described in this specification, gray tone shots are second shots and full tone shots are first shots, and after the half-point shot (1210h) which is a gray tone shot, the shot (1210d) is a gray tone shot projected onto the full tone exposure polygon (1002) and the gray tone exposure polygon (1004). As illustrated in FIG. 12e, among the multiple shots after the half-point shot (1210h), the full tone shot (1210e) is projected into the full tone exposure polygon (1002) and the gray tone exposure polygon (1004) at least one second address point (1008b) when the substrate (120) is scanned under the image projection system (200). As illustrated in FIG. 12f, among the multiple shots, the final shot (1210n), which is a full tone shot, is projected into the full tone exposure polygon (1002) at least one final address point (1008n).

[0066] For multiple shots, multiple gray tone portions (604) have full tone shot and gray tone shot address points exposed to a second intensity among multiple address points (1008). Multiple full tone portions (602) have full tone shot and gray tone shot address points exposed to a combination of a second intensity and a first intensity. The temporal division of the full tone shots and gray tone shots among the multiple shots and the analog emission capability of the first intensity and the second intensity will allow the full tone dose (606) for the multiple full tone portions (602) and the gray tone dose (608) for the multiple gray tone portions (604) to vary across the photoresist (601).

[0067] In summary, a system, software application, and method for a lithography process for recording full tone portions and gray tone portions in a single pass are provided. A single pass provides greater throughput. The temporal and spatial division of the spatial light modulator of the system between the first and second shots among a plurality of shots provides analog emissions of a second intensity and a first intensity from a light source in a single pass. The analog emissions of the second intensity and the first intensity allow the full tone dose for each full tone portion of the plurality of full tone portions and the gray tone dose for each gray tone portion of the plurality of gray tone portions to vary across the photoresist. Variations in the full tone dose and gray tone dose across the photoresist can accommodate variations caused by photoresist thickness, non-uniformity of the developer during photoresist development, non-uniformity of the etching transfer process, and any other processes before or after the lithography process.

[0068] Although the foregoing relates to examples of the present disclosure, other examples and additional examples of the present disclosure may be devised without departing from the basic scope of the present disclosure, and the scope of the present disclosure is determined by the following claims.

Claims

Claim 1 A lithography system having a processing unit having a plurality of image projection systems receiving mask pattern data — each image projection system includes a spatial light modulator having a plurality of spatial light modulator pixels to project a plurality of shots —; and a controller configured to provide the mask pattern data to the lithography system, wherein the mask pattern data has a plurality of full-tone exposure polygons and a plurality of gray tone exposure polygons, and the controller is configured to spatially divide the plurality of spatial light modulator pixels by one of the following: a gray tone group and a full tone group — the gray tone group and the full tone group have the same number of spatial light modulator pixels —; a gray tone group and a full tone group — the gray tone group and the full tone group have different numbers of spatial light modulator pixels —; and a gray tone group, a full tone group, and a remainder group — the gray tone group and the full tone group have the same number of spatial light modulator pixels, and the remainder group has the remainder number of pixels —; A system, wherein when divided by the controller, the gray tone group is operable to project a first number of shots among the plurality of shots onto the plurality of full tone exposure polygons and the plurality of gray tone exposure polygons; the full tone group is operable to project a second number of shots among the plurality of shots onto the plurality of full tone exposure polygons; and the remaining group is operable to project a third number of shots among the plurality of shots onto the plurality of full tone exposure polygons. Claim 2 A system according to claim 1, wherein each of the plurality of spatial light modulator pixels of the spatial light modulator is individually controllable and configured to project a recording beam corresponding to one of the plurality of pixels. Claim 3 In claim 2, the spatial optical modulator is a system that is an array of electrically addressable elements. Claim 4 In claim 3, a system wherein a plurality of spatial light modulator pixels of at least one electrically addressable element are mirrors spatially divided by at least one of the gray tone group, the whole tone group, and the remainder group. Claim 5 A system according to claim 1, wherein the gray tone group and the whole tone group having the same number of spatial light modulator pixels produce a gray tone dose equal to half of the whole tone dose; the gray tone group and the whole tone group having different numbers of spatial light modulator pixels produce a gray tone dose greater than or less than half of the whole tone dose; and the gray tone group and the whole tone group having the same number of spatial light modulator pixels, and the remainder group having the remaining number of pixels produce a gray tone dose greater than half of the whole tone dose. Claim 6 As a non-transient computer-readable medium for storing a program, said program, when executed by a processor, causes a computer system to: provide mask pattern data having a plurality of exposure polygons to a processing unit of a lithography system — said processing unit has a plurality of image projection systems receiving said mask pattern data, said mask pattern data having a plurality of full-tone exposure polygons and a plurality of gray-tone exposure polygons —; and divide the spatial light modulator pixels of each of said image projection systems into one of the following: a gray-tone group and a full-tone group — the gray-tone group and the full-tone group have the same number of spatial light modulator pixels —; a gray-tone group and a full-tone group — the gray-tone group and the full-tone group have different numbers of spatial light modulator pixels —; and a gray-tone group, a full-tone group, and a remainder group — the gray-tone group and the full-tone group have the same number of spatial light modulator pixels, and the remainder group has the remainder number of pixels —; A non-transient computer-readable medium that performs the step of, in the process of single-scanning a substrate with the plurality of image projection systems, projecting a first number of shots among a plurality of shots corresponding to the gray tone group onto the plurality of full-tone exposed polygons and the plurality of gray tone exposed polygons; a second number of shots among the plurality of shots corresponding to the full-tone group onto the plurality of full-tone exposed polygons; and a third number of shots among the plurality of shots onto the plurality of full-tone exposed polygons when the remaining group is divided. Claim 7 In claim 6, the spatial light modulator pixels project the plurality of shots onto a plurality of address points of an aggregated shot pattern, a non-transient computer-readable medium. Claim 8 A non-transient computer-readable medium according to claim 7, wherein the plurality of shots form a plurality of gray tone portions having gray tone shot address points exposed to the first number of shots, and the plurality of shots form a plurality of whole tone portions having whole tone shot address points exposed to at least the first number and the second number of shots. Claim 9 A non-transient computer-readable medium according to claim 6, wherein the first number of shots corresponds to a gray tone dose, and the combination of the first number and the second number of shots corresponds to a whole tone dose. Claim 10 In claim 6, the first number of shots corresponds to a gray tone dose, and the combination of the first number, the second number, and the third number of shots corresponds to a total tone dose, a non-transient computer-readable medium. Claim 11 In claim 6, the light beam generated by the light source of each image projection system is a non-transient computer-readable medium having intensity. Claim 12 In claim 11, a non-transient computer-readable medium having an intensity of 10 mJ / cm² to 200 mJ / cm². Claim 13 A step of providing mask pattern data having a plurality of exposure polygons to a processing unit of a lithography system — said processing unit has a plurality of image projection systems receiving said mask pattern data, said mask pattern data having a plurality of full-tone exposure polygons and a plurality of gray-tone exposure polygons —; a step of dividing the spatial light modulator pixels of each of said image projection systems into one of the following: a gray-tone group and a full-tone group — the gray-tone group and the full-tone group have the same number of spatial light modulator pixels —; a gray-tone group and a full-tone group — the gray-tone group and the full-tone group have different numbers of spatial light modulator pixels —; and a gray-tone group, a full-tone group, and a remainder group — the gray-tone group and the full-tone group have the same number of spatial light modulator pixels, and the remainder group has the remainder number of pixels —; and, in the process of a single scan of a substrate by said plurality of image projection systems, a first number of shots among a plurality of shots corresponding to the gray-tone group to the plurality of full-tone exposure polygons and the plurality of gray-tone exposure polygons; A method comprising the step of projecting a second number of shots among the plurality of shots corresponding to the above-mentioned total tone group onto the plurality of total tone exposure polygons; and projecting a third number of shots among the plurality of shots onto the plurality of total tone exposure polygons when the remaining group is divided. Claim 14 In claim 13, the spatial light modulator pixels project the plurality of shots onto a plurality of address points of a combined shot pattern. Claim 15 A method according to claim 14, wherein the plurality of shots form a plurality of gray tone portions having gray tone shot address points exposed to the first number of shots, and the plurality of shots form a plurality of whole tone portions having whole tone shot address points exposed to at least the first number and the second number of shots. Claim 16 In claim 13, the first number of shots corresponds to a gray tone dose, and the combination of the first number and the second number of shots corresponds to a total tone dose. Claim 17 In claim 13, the first number of shots corresponds to a gray tone dose, and the combination of the first number, the second number, and the third number of shots corresponds to a total tone dose. Claim 18 In claim 13, the light beam generated by the light source of each image projection system has an intensity. Claim 19 In claim 18, the method wherein the intensity is 10 mJ / cm² to 200 mJ / cm². Claim 20 In claim 13, the method wherein the plurality of shots is 50 to 500 shots.

Images