Display apparatus and method of manufacturing the same

Abstract

The display device comprises a biometric information sensing layer including a sensor, a display module disposed on the biometric information sensing layer and including a plurality of pixels, and an optical pattern layer disposed between the biometric information sensing layer and the display module and including a light-blocking part including a plurality of light-blocking layers and a light-transmitting part having a higher light transmittance than the light-blocking part, wherein a plurality of holes are defined in each of the light-blocking layers and the light-transmitting part fills the spaces between the light-blocking layers and the interiors of the holes.

Description

Technology Field

[0001] The present invention relates to a display device including a fingerprint recognition function and a method for manufacturing the same. Background Technology

[0002] Display devices provide various functions that enable organic communication with the user, such as displaying images to provide information or detecting user input. Recent display devices also include a function for detecting the user's fingerprint. Fingerprint recognition methods include capacitive methods that detect changes in capacitance formed between electrodes, optical methods that detect incident light using optical sensors, and ultrasonic methods that detect vibrations using piezoelectric materials. In recent display devices, the detection unit for fingerprint recognition can be placed on the back of the display panel. The problem to be solved

[0003] The present invention aims to provide a display device comprising a sensing unit with improved fingerprint recognition sensitivity and a method for manufacturing the same. means of solving the problem

[0004] In one embodiment of the present invention, another display device comprises a bio-information sensing layer including a sensor, a display module disposed on the bio-information sensing layer and including a plurality of pixels, and an optical pattern layer disposed between the bio-information sensing layer and the display module and including a light-shielding portion including a plurality of light-shielding layers and a light-transmitting portion having a higher light transmittance than the light-shielding portion, wherein a plurality of holes are defined in each of the light-shielding layers and the light-transmitting portion fills the spaces between the light-shielding layers and the interiors of the holes.

[0005] The light-blocking layers include first to third light-blocking layers, and a plurality of first holes formed in the first light-blocking layer, a plurality of second holes formed in the second light-blocking layer, and a plurality of third holes formed in the third light-blocking layer may be aligned along the thickness direction of the light-blocking portion.

[0006] The first to third holes mentioned above may have equal widths on a plane.

[0007] The first to third holes mentioned above may have identical shapes on a plane.

[0008] The first holes and the second holes may have different widths on a plane.

[0009] The first holes and the second holes can be arranged at the same pitch.

[0010] The width of each of the first holes is greater than the width of each of the second holes and the width of each of the third holes, and the width of each of the third holes may be smaller than the width of each of the second holes.

[0011] The spacing between the above shading layers can be equal to each other.

[0012] The spacing between the above shading layers may vary.

[0013] The light-blocking part may include at least one of molybdenum, titanium, or aluminum.

[0014] Each of the above shading layers may have a multilayer structure.

[0015] The above light-blocking part may include chromium or carbon.

[0016] A display device in which some of the above-mentioned transparent portions cover the upper surface of the above-mentioned light-blocking portion.

[0017] In one embodiment of the present invention, another display device comprises a display module including a plurality of pixels, and a sensing unit disposed on the lower side of the display module and comprising a bio-information sensing layer and an optical pattern layer disposed on the bio-information sensing layer, wherein the optical pattern layer comprises a first light-blocking layer having a plurality of first holes defined to overlap in a plane with at least some of the pixels, a second light-blocking layer having a plurality of second holes defined to overlap each of the first holes, a third light-blocking layer having a plurality of third holes defined to overlap each of the second holes, and a transparent portion disposed between the first to third light-blocking layers, wherein the transparent portion fills each of the first to third holes, and each of the first to third light-blocking layers may comprise at least one of molybdenum, titanium, and aluminum.

[0018] The above-mentioned transparent part may have a single shape.

[0019] The above-mentioned transparent portion can cover the upper surface of the third light-blocking layer.

[0020] The first to third holes can be aligned along the thickness direction of the light-blocking layers.

[0021] A method for manufacturing a display device according to one embodiment of the present invention comprises the steps of forming a sensing unit and coupling the sensing unit to the lower side of a display module, wherein the step of forming the sensing unit comprises the steps of alternately stacking a plurality of transparent layers and a plurality of initial light-blocking layers on a base layer, forming a mask having a plurality of holes formed on the uppermost surface of the initial light-blocking layers, forming a plurality of holes corresponding to the holes in the initial light-blocking layers and the transparent layers, and filling the holes with a light-transmitting material to form a transparent portion.

[0022] The holes formed in the initial light-blocking layers and the transparent layers can be formed through a dry etching process.

[0023] The above-mentioned transparent layers and the above-mentioned light-blocking layers can be etched by the same etching gas. Effects of the invention

[0024] According to the present invention, light reflected from a fingerprint can pass through an optical pattern layer and be incident on a biometric information sensing layer. The angle of incidence of light that can pass through the optical pattern layer can be limited to a predetermined angle or less by the optical pattern layer. As the angle of incidence is limited, the accuracy of fingerprint recognition can be improved.

[0025] In addition, according to the present invention, the optical pattern layer can be formed through dry etching. Accordingly, the size of the hole serving as the optical path can be finely adjusted, thereby providing a sensing unit with improved sensitivity. Brief explanation of the drawing

[0026] FIG. 1 is a perspective view of a display device according to one embodiment of the present invention. FIG. 2 is an exploded perspective view of a display device according to one embodiment of the present invention. FIG. 3 is a schematic cross-sectional view of a display device according to one embodiment of the present invention. FIG. 4 is a schematic cross-sectional view of a display device according to one embodiment of the present invention. FIG. 5 is a cross-sectional view of a display module according to one embodiment of the present invention. FIG. 6a is a cross-sectional view of a sensing unit according to one embodiment of the present invention. FIG. 6b is a schematic cross-sectional view of a display device according to one embodiment of the present invention. FIG. 7 is a plan view of a light-blocking section according to one embodiment of the present invention. FIG. 8 is a plan view illustrating the relationship between some components of a display device. FIGS. 9a to 9c are cross-sectional views of a light-shielding portion according to an embodiment of the present invention. FIGS. 10a and FIGS. 10b are cross-sectional views of light-shielding parts according to one embodiment of the present invention. FIGS. 10c and FIGS. 10d are partial plan views of light-shielding parts according to one embodiment of the present invention. FIGS. 11a to 11f are cross-sectional views illustrating a method for forming a sensing unit according to an embodiment of the present invention. Specific details for implementing the invention

[0027] In this specification, where a component (or region, layer, part, etc.) is described as being "on," "connected," or "combined" with another component, it means that it may be directly placed / connected / combined with the other component, or that a third component may be placed between them.

[0028] Identical reference numerals denote identical components. Additionally, in the drawings, the thicknesses, proportions, and dimensions of the components are exaggerated for the effective illustration of the technical content.

[0029] "And / or" includes all one or more combinations that the associated configurations can define.

[0030] Terms such as "first," "second," etc., may be used to describe various components, but said components should not be limited by said terms. These terms are used solely for the purpose of distinguishing one component from another. For example, without departing from the scope of the present invention, the first component may be named the second component, and similarly, the second component may be named the first component. A singular expression includes a plural expression unless the context clearly indicates otherwise.

[0031] Additionally, terms such as "below," "lower side," "on," and "upper side" are used to describe the relationships between the components depicted in the drawings. These terms are relative concepts and are described based on the directions indicated in the drawings.

[0032] Unless otherwise defined, all terms used herein (including technical and scientific terms) have the same meaning as generally understood by those skilled in the art to which the present invention pertains. Additionally, terms such as those defined in commonly used dictionaries should be interpreted as having a meaning consistent with their meaning in the context of the relevant technology, and may be explicitly defined herein unless interpreted in an ideal or overly formal sense.

[0033] Terms such as "include" or "have" are intended to specify the existence of the features, numbers, steps, actions, components, parts, or combinations thereof described in the specification, and should be understood as not precluding the existence or addition of one or more other features, numbers, steps, actions, components, parts, or combinations thereof.

[0034] Hereinafter, embodiments of the present invention will be described with reference to the drawings.

[0035] FIG. 1 is a perspective view of a display device according to one embodiment of the present invention. FIG. 2 is an exploded perspective view of a display device according to one embodiment of the present invention.

[0036] Referring to FIGS. 1 and 2, the display device (1000) may be a device that is activated according to an electrical signal. The display device (1000) may include various embodiments. For example, the display device (1000) may be used in large electronic devices such as televisions, monitors, or external billboards, as well as in small and medium-sized electronic devices such as personal computers, laptop computers, personal digital terminals, car navigation units, game consoles, portable electronic devices, and cameras. Furthermore, these are presented merely as embodiments, and it is understood that they may be adopted in other electronic devices as long as they do not depart from the concept of the present invention. In this embodiment, the display device (1000) is illustrated as a smartphone.

[0037] The display device (1000) can display an image (1000-I) toward the third direction (DR3) on a display surface (1000-F) parallel to each of the first direction (DR1) and the second direction (DR2). The image (1000-I) may include a still image as well as a dynamic image. In FIG. 1, a clock window and icons are shown as examples of the image (1000-I). The display surface (1000-F) on which the image (1000-I) is displayed may correspond to the front surface of the display device (1000) and may correspond to the front surface of the window (100).

[0038] In this embodiment, the front (or top) and back (or bottom) surfaces of each member are defined based on the direction in which the image (1000-I) is displayed. The front and back surfaces face each other in a third direction (DR3), and the normal direction of each of the front and back surfaces may be parallel to the third direction (DR3). In this specification, "when viewed in a plane" may mean "when viewed from the third direction (DR3)."

[0039] A display device (1000) according to one embodiment of the present invention can detect user input applied from the outside. User input includes various forms of external inputs such as parts of the user's body, light, heat, or pressure. Additionally, the display device (1000) may detect user input applied to the side or back surface of the display device (1000) depending on the structure of the display device (1000), and is not limited to any one embodiment.

[0040] The display device (1000) can detect a user's fingerprint (2000) that is authorized from the outside. A fingerprint recognition area may be provided on the display surface (1000-F) of the display device (1000). The fingerprint recognition area may be provided in all areas of the transparent area (1000-T) or in some areas of the transparent area (1000-T).

[0041] The display device (1000) may include a window (100), an anti-reflective panel (200), a display module (300), a detection unit (400), and a housing (500). In this embodiment, the window (100) and the housing (500) may be combined to form the exterior of the display device (1000).

[0042] The window (100) may include an optically transparent insulating material. For example, the window (100) may include glass or plastic. The window (100) may have a multilayer structure or a single layer structure. For example, the window (100) may include a plurality of plastic films bonded with an adhesive, or a glass substrate and a plastic film bonded with an adhesive.

[0043] As described above, the front surface of the window (100) defines the display surface (1000-F) of the display device (1000). The transmission area (1000-T) may be an optically transparent area. For example, the transmission area (1000-T) may be an area with a visible light transmittance of about 90% or more.

[0044] The bezel region (1000-B) may be a region with a relatively lower light transmittance compared to the transmission region (1000-T). The bezel region (1000-B) defines the shape of the transmission region (1000-T). The bezel region (1000-B) is adjacent to the transmission region (1000-T) and may surround the transmission region (1000-T).

[0045] The bezel area (1000-B) may have a predetermined color. The bezel area (1000-B) may cover the surrounding area (300-N) of the display module (300) to block the surrounding area (300-N) from being visible from the outside. Meanwhile, this is illustrated as an example, and in a window (100) according to one embodiment of the present invention, the bezel area (1000-B) may be omitted.

[0046] An anti-reflection panel (200) may be placed below the window (100). The anti-reflection panel (200) reduces the reflectivity of external light incident from the upper side of the window (100). In one embodiment of the present invention, the anti-reflection panel (200) may be omitted and may be a component included in the display module (300).

[0047] The display module (300) can display an image (1000-I) and detect an external input. The display module (300) may include an active area (300-A) and a peripheral area (300-N). The active area (300-A) may be an area that is activated according to an electrical signal.

[0048] In this embodiment, the active area (300-A) is an area where the image (1000-I) is displayed and may simultaneously be an area where an external input is detected. The transparent area (1000-T) may overlap with the active area (300-A). For example, the transparent area (1000-T) may overlap with the entire area or at least a part of the active area (300-A). Accordingly, the user may view the image (1000-I) or provide an external input through the transparent area (1000-T). In one embodiment of the present invention, the area where the image (1000-I) is displayed and the area where the external input is detected may be separated from each other within the active area (300-A), and the invention is not limited to any one embodiment.

[0049] The peripheral area (300-N) may be an area covered by the bezel area (1000-B). The peripheral area (300-N) is adjacent to the active area (300-A). The peripheral area (300-N) may surround the active area (300-A). Driving circuits or driving wiring for driving the active area (300-A) may be arranged in the peripheral area (300-N).

[0050] The sensing unit (400) may be placed below the display module (300). The sensing unit (400) may be a layer that detects the user's biometric information. The sensing unit (400) may detect the surface of a touch target. The surface may include surface uniformity or surface curvature shape, etc. For example, the surface may include the user's fingerprint (2000) information.

[0051] The sensing unit (400) may include a sensing area (400-A) and a non-sensing area (400-N). The sensing area (400-A) may be an area that is activated according to an electrical signal. For example, the sensing area (400-A) may be an area that detects bio-information. A driving circuit or driving wiring for driving the sensing area (400-A) may be disposed in the non-sensing area (400-N).

[0052] In one embodiment of the present invention, the sensing area (400-A) may overlap with the entire active area (300-A). In this case, fingerprint recognition may be possible across the entire active area (300-A). That is, the user's fingerprint can be recognized across the entire area, rather than in a specific area limited to a portion. However, the present invention is not limited thereto. For example, in another embodiment of the present invention, the sensing unit (400) may overlap with a portion of the active area (300-A).

[0053] The housing (500) is combined with the window (100). The housing (500) is combined with the window (100) to provide a predetermined internal space. The display module (300) and the detection unit (400) can be accommodated in the internal space. The housing (500) can reliably protect the components of the display device (1000) accommodated in the internal space from external impact. The housing (500) may include a material having relatively high rigidity. For example, the housing (500) may include glass, plastic, or metal, or may include a plurality of frames and / or plates composed of a combination thereof.

[0054] Although not shown, a battery module or the like that supplies power necessary for the overall operation of the display device (1000) may be placed between the detection unit (400) and the housing (500).

[0055] FIG. 3 is a cross-sectional view of a part of a display device according to an embodiment of the present invention. FIG. 3 is illustrated in a schematic cross-sectional view of the components constituting the display module (300) and the detection unit (400).

[0056] Referring to FIG. 3, the display module (300) may include a display panel (310) and an input sensing layer (320).

[0057] The display panel (310) may be a layer that provides an image. The active area (300-A, see FIG. 2) of the display module (300) may correspond to the active area of ​​the display panel (310). That is, the detection area (400-A, see FIG. 2) of the detection unit (400) may overlap with the entire active area of ​​the display panel (310).

[0058] The display panel (310) may include a base layer (311), a circuit layer (312), a light-emitting element layer (313), and an encapsulation layer (314).

[0059] The base layer (311) may include a synthetic resin film. The synthetic resin layer may include a thermosetting resin. In particular, the synthetic resin layer may be a polyimide-based resin layer, and the material is not particularly limited. The synthetic resin layer may include at least one of an acrylic resin, a methacrylate resin, a polyisoprene, a vinyl resin, an epoxy resin, a urethane resin, a cellulose resin, a siloxane resin, a polyamide resin, and a perylene resin. In addition, the base layer may include a glass substrate, a metal substrate, or an organic / inorganic composite material substrate, etc.

[0060] A circuit layer (312) may be disposed on a base layer (311). The circuit layer (312) may be a layer comprising a pixel circuit and insulating layers. The pixel circuit may include at least one transistor and at least one capacitor.

[0061] The light-emitting element layer (313) may be disposed on the circuit layer (312). The light-emitting element layer (313) may be a layer that generates light. The light-emitting element layer (313) may generate light or control the amount of light according to an electrical signal. If the display panel (310) is an organic light-emitting display panel, the light-emitting element layer (313) may include an organic light-emitting material. Or, if the display panel (310) is a quantum dot light-emitting display panel, the light-emitting element layer (313) may include quantum dots or quantum rods, etc. Or, the light-emitting element layer (313) may include a micro LED or a nano LED. The light-emitting element layer (313) may include various embodiments as long as light is generated or the amount of light is controlled according to an electrical signal, and is not limited to any one embodiment.

[0062] The encapsulation layer (314) may be disposed on the light-emitting element layer (313). The encapsulation layer (314) may include at least one insulating layer. For example, the encapsulation layer (314) may include at least one inorganic film and at least one organic film. The inorganic film protects the light-emitting element layer (313) from moisture and oxygen, and the organic film protects the light-emitting element layer (313) from foreign substances such as dust particles.

[0063] The input detection layer (320) may be placed on the display panel (310). The input detection layer (320) can detect an external input and obtain location information of the external input. The external input may include various embodiments. For example, the external input includes various forms of external inputs such as a part of the user's body, light, heat, or pressure. Additionally, the input detection layer (320) may detect inputs that come into contact with the window (100, see FIG. 2), as well as inputs that are close to or adjacent to the window (100).

[0064] The input sensing layer (320) may be placed directly on the display panel (310). For example, the input sensing layer (320) and the display panel (310) may be formed through a continuous process. In one embodiment of the present invention, the input sensing layer (320) may be attached to the display panel (310). In this case, an adhesive layer may be further placed between the input sensing layer (320) and the display panel (310).

[0065] The sensing unit (400) may be placed below the display module (300). For example, the sensing unit (400) may be attached to the back surface of the display panel (310). An adhesive layer (1000-A) may be placed between the sensing unit (400) and the display panel (310). The adhesive layer (1000-A) may be an optically transparent adhesive member, and the adhesive layer (1000-A) may include a conventional adhesive or a pressure-sensitive adhesive.

[0066] The sensing unit (400) may include a base layer (410), a bio-information sensing layer (420), and an optical pattern layer (430).

[0067] The base layer (410) may include a synthetic resin layer. The synthetic resin layer may include a thermosetting resin. In particular, the synthetic resin layer may be a polyimide-based resin layer, and the material is not particularly limited. For example, the base layer (410) may include two layers of polyimide-based resin layers and a barrier layer disposed between the polyimide-based resin layers. The barrier layer may include amorphous silicon and silicon oxide.

[0068] A bio-information sensing layer (420) may be disposed on a base layer (410). The bio-information sensing layer (420) may include a sensing circuit and insulating layers. The sensing circuit may include at least one transistor and at least one photodiode.

[0069] The optical pattern layer (430) can be placed directly on the biometric information sensing layer (420). For example, the optical pattern layer (430) and the biometric information sensing layer (420) can be formed through a continuous process. The optical pattern layer (430) can filter light incident on the biometric information sensing layer (420). For example, the angle of incidence of light that can pass through the optical pattern layer (430) can be controlled by the optical pattern layer (430). For example, the angle of incidence can be limited to a predetermined angle or less. As the angle of incidence is limited, the accuracy of fingerprint recognition can be improved.

[0071] FIG. 4 is a schematic cross-sectional view of a part of a display device according to an embodiment of the present invention. FIG. 4 specifically describes the configuration that differs from FIG. 3, and for the remaining overlapping components, the same reference numerals are used and the description thereof is omitted.

[0072] Referring to FIG. 4, an infrared filter (600) may be further disposed between the display module (300) and the detection unit (400). The infrared filter (600) may be a filter that blocks the transmission of infrared light and transmits visible light.

[0073] The light reflected from the user's fingerprint (2000, see FIG. 1) may be visible light. According to the present embodiment, as the infrared filter (600) blocks light in a wavelength band other than the wavelength band of the light reflected by the fingerprint (2000), the fingerprint recognition accuracy of the biometric information sensing layer (420) can be improved.

[0074] An adhesive layer (1000-A) may be placed between the infrared filter (600) and the display module (300), and between the infrared filter (600) and the detection unit (400), respectively.

[0075] FIG. 5 is a cross-sectional view of a display module (300) according to one embodiment of the present invention.

[0076] Referring to FIG. 5, a circuit layer (312), a light-emitting element layer (313), an encapsulation layer (314), and an input sensing layer (320) may be sequentially arranged on a base layer (311).

[0077] A barrier layer (10) may be disposed on a base layer (311). The barrier layer (10) prevents foreign substances from entering from the outside. The barrier layer (10) may include at least one of a silicon oxide layer and a silicon nitride layer. Each of these may be provided in multiple numbers, and the silicon oxide layers and silicon nitride layers may be stacked alternately.

[0078] A buffer layer (20) may be disposed on a barrier layer (10). The buffer layer (20) improves the bonding strength between the base layer (311) and the semiconductor pattern and / or conductive pattern. The buffer layer (20) may include at least one of a silicon oxide layer and a silicon nitride layer. The silicon oxide layer and the silicon nitride layer may be stacked alternately.

[0079] The transistor (312-T) of the pixel circuit may be placed on the buffer layer (20). The transistor (312-T) may include an active (312-A), a source (312-S), a drain (312-D), and a gate (312-G).

[0080] A semiconductor pattern (312-S, 312-A, 312-D) is disposed on a buffer layer (20). Hereinafter, the semiconductor pattern (312-S, 312-A, 312-D) disposed directly on the buffer layer (20) may include a silicon semiconductor, a polysilicon semiconductor, or an amorphous silicon semiconductor. Alternatively, the semiconductor pattern (312-S, 312-A, 312-D) may include an oxide semiconductor or an organic semiconductor. The semiconductor pattern (312-S, 312-A, 312-D) according to one embodiment of the present invention may include various materials as long as they have semiconductor properties, and is not limited to any one embodiment.

[0081] The semiconductor patterns (312-S, 312-A, 312-D) have different electrical properties depending on whether they are doped. The semiconductor patterns may include a doped region and a non-doped region. The doped region may be doped with an N-type dopant or a P-type dopant. A P-type transistor includes a doped region doped with a P-type dopant.

[0082] The doped region has greater conductivity than the non-doped region and substantially serves as an electrode or signal wiring. The non-doped region substantially corresponds to the active (or channel) of the transistor. In other words, a part of the semiconductor pattern (312-S, 312-A, 312-D) may be the active (312-A) of the transistor (312-T), another part may be the source (312-S) or drain (312-D) of the transistor (312-T), and yet another part may be a connected signal wiring (or connected electrode).

[0083] The first insulating layer (11) is disposed on the buffer layer (20) and covers semiconductor patterns (312-S, 312-A, 312-D). The first insulating layer (11) may be an inorganic layer and / or an organic layer and may have a single-layer or multi-layer structure. The first insulating layer (11) may include at least one of aluminum oxide, titanium oxide, silicon oxide, silicon oxynitride, zirconium oxide, and hafnium oxide. In this embodiment, the first insulating layer (11) may be a single-layer silicon oxide layer. The inorganic layer described below may include at least one of the materials described above.

[0084] The gate (312-G) may be placed on the first insulating layer (11). The gate (312-G) may be part of a metal pattern. On a plane, the gate (312-G) may overlap with the active (312-A). In the process of doping the semiconductor pattern, the gate (312-G) may function as a mask.

[0085] The second insulating layer (12) is disposed on the first insulating layer (11) and can cover the gate (312-G). The second insulating layer (12) may be an inorganic layer and may have a single layer or a multilayer structure. In this embodiment, the second insulating layer (12) may be a single layer of silicon oxide.

[0086] A third insulating layer (13) may be disposed on the second insulating layer (12). The third insulating layer (13) may be an organic layer and may have a single-layer or multi-layer structure. For example, the third insulating layer (13) may be a single-layer polyimide resin layer. However, it is not limited thereto, and the third insulating layer (13) may include at least one of an acrylic resin, a methacrylate resin, a polyisoprene, a vinyl resin, an epoxy resin, a urethane resin, a cellulose resin, a siloxane resin, a polyamide resin, and a perylene resin. The organic layer described below may include at least one of the materials described above.

[0087] The first connecting electrode (312-C1) and the second connecting electrode (312-C2) may be disposed on the third insulating layer (13). Each of the first connecting electrode (312-C1) and the second connecting electrode (312-C2) may be electrically connected to the transistor (312-T) by penetrating the first to third insulating layers (11, 12, 13).

[0088] The fourth insulating layer (14) is disposed on the third insulating layer (13) and can cover the first connecting electrode (312-C1) and the second connecting electrode (312-C2). The fourth insulating layer (14) may be an inorganic layer.

[0089] The fifth insulating layer (15) may be disposed on the fourth insulating layer (14). The fifth insulating layer (15) may be an organic layer and may have a single layer or a multilayer structure.

[0090] The light-emitting element layer (313) may be disposed on the fifth insulating layer (15). The light-emitting element layer (313) may include a first electrode (313-E1), a light-emitting layer (313-EL), and a second electrode (313-E2). The first electrode (313-E1) may be electrically connected to a transistor (312-T) by penetrating the fourth insulating layer (14) and the fifth insulating layer (15).

[0091] A pixel defining film (16) may be disposed on a fifth insulating layer (15). An opening that exposes a first electrode (313-E1) may be defined in the pixel defining film (16). The shape of the opening in a planar view may correspond to a light-emitting region (PXA).

[0092] The light-emitting layer (313-EL) may be disposed on the first electrode (313-E1). The light-emitting layer (313-EL) may provide light of a predetermined color. In this embodiment, a patterned single-layer light-emitting layer (313-EL) is illustrated as an example, but the present invention is not limited thereto. For example, the light-emitting layer (313-EL) may have a multilayer structure. Additionally, the light-emitting layer (313-EL) may extend toward the upper surface of the pixel defining film (16).

[0093] The second electrode (313-E2) may be disposed on the light-emitting layer (313-EL). Although not illustrated, an electronic control layer may be disposed between the second electrode (313-E2) and the light-emitting layer (313-EL), and a hole control layer may be disposed between the first electrode (313-E1) and the light-emitting layer (313-EL).

[0094] In one embodiment of the present invention, the first electrode (313-E1) and the second electrode (313-E2) may each comprise a transparent conductive material. For example, the first electrode (313-E1) and the second electrode (313-E2) may each comprise at least one of indium tin oxide (ITO), indium zinc oxide (IZO), indium gallium oxide (IGO), indium zinc gallium oxide (IGZO), and mixtures / compounds thereof. However, the present invention is not limited thereto.

[0095] The encapsulation layer (314) may be disposed on the second electrode (313-E2). The encapsulation layer (314) may include a first inorganic layer (314-1), an organic layer (314-2), and a second inorganic layer (314-3).

[0096] The first inorganic layer (314-1) may be disposed on the second electrode (313-E2). The organic layer (314-2) may be disposed on the first inorganic layer (314-1). The second inorganic layer (314-3) may be disposed on the organic layer (314-2) and may cover the organic layer (314-2). The first inorganic layer (314-1) and the second inorganic layer (314-3) may include a silicon nitride layer, a silicon oxynitride layer, a silicon oxide layer, a titanium oxide layer, or an aluminum oxide layer, but are not particularly limited thereto. The organic layer (314-2) may include an acrylic-based organic layer, but is not particularly limited thereto. The first inorganic layer (314-1) and the second inorganic layer (314-3) can protect the first to third light-emitting layers (EL1, EL2, EL3) from moisture / oxygen, and the organic layer (314-2) can protect the first to third light-emitting layers (EL1, EL2, EL3) from foreign substances such as dust particles.

[0097] The input sensing layer (320) may be disposed on the encapsulation layer (314). The input sensing layer (320) may include a first conductive layer (321-M), a first sensing insulating layer (321), a second conductive layer (322-M), and a second sensing insulating layer (322). At least one of the first conductive layer (321-M) and the second conductive layer (322-M) may include sensing electrodes. The input sensing layer (320) can obtain information about an external input through a change in capacitance between the sensing electrodes.

[0099] FIG. 6a is a cross-sectional view of a sensing unit according to an embodiment of the present invention. FIG. 6b is a schematic cross-sectional view of a display device according to an embodiment of the present invention. FIG. 6b briefly illustrates a state in which a fingerprint (2000) is input into a display device (1000). The display device (1000) illustrated in FIG. 6b is briefly illustrated as a stacked structure excluding the housing (500) among the components of the display device (1000) illustrated in FIG. 2. Hereinafter, the present invention will be described with reference to FIG. 6a and FIG. 6b.

[0100] Referring to FIG. 6a, the sensing unit (400) may include a base layer (410), a bio-information sensing layer (420) disposed on the base layer (410), and an optical pattern layer (430) disposed on the bio-information sensing layer (420). FIG. 6a shows a cross-sectional view corresponding to one effective sensing area (420-AAR). The effective sensing area (420-AAR) may be an area defined within the sensing area (420-AR) and in which one sensing element (420-PD) and a transistor (420-T) connected thereto are disposed.

[0101] The detection area (420-AR) may be a rectangular unit area, and the planar area of ​​the detection unit (400) may be divided into multiple detection areas. The detection area (420-AR) may include one effective detection area (420-AAR) and a surrounding area of ​​the effective detection area (420-AAR).

[0102] A barrier layer (421) may be placed on a base layer (410). A buffer layer (422) may be placed on a barrier layer (421). The description of the barrier layer (421) and the buffer layer (422) may correspond to the barrier layer (10) and the buffer layer (20) described above in FIG. 5.

[0103] A transistor (420-T) may be placed on a buffer layer (422). The transistor (420-T) may include an active (420-A), a source (420-S), a drain (420-D), and a gate (420-G). The active (420-A), the source (420-S), and the drain (420-D) may be placed on the buffer layer (422).

[0104] The first insulating layer (423) is disposed on the buffer layer (422) and covers the active (420-A), source (420-S), and drain (420-D). The first insulating layer (423) may be an inorganic layer and / or an organic layer and may have a single layer or a multilayer structure. In this embodiment, the first insulating layer (423) may be a single layer of silicon oxide.

[0105] The gate (420-G) and the wiring layer (420-L) may be disposed on the first insulating layer (423). A predetermined voltage, for example, a bias voltage, may be provided to the wiring layer (420-L). The wiring layer (420-L) may be electrically connected to a sensing element (420-PD) to be described later.

[0106] The second insulating layer (424) is disposed on the first insulating layer (423) and can cover the gate (420-G) and the wiring layer (420-L). The second insulating layer (424) may be an inorganic layer and may have a single-layer or multi-layer structure. In this embodiment, the second insulating layer (424) may be a single-layer silicon oxide layer.

[0107] The sensing element (420-PD) may be placed on the second insulating layer (424). The sensing element (420-PD) may be electrically connected to the transistor (420-T) and the wiring layer (420-L). For example, the operation of the sensing element (420-PD) may be controlled by a signal provided from the transistor (420-T) and may receive a predetermined voltage from the wiring layer (420-L). The sensing element (420-PD) may be referred to as a sensor.

[0108] The sensing element (420-PD) may include a first sensing electrode (420-E1), a sensing layer (420-SA), and a second sensing electrode (420-E2).

[0109] The first sensing electrode (420-E1) can penetrate the first and second insulating layers (422, 423) and be electrically connected to the transistor (420-T). The first sensing electrode (420-E1) may include an opaque conductive material. For example, the first sensing electrode (420-E1) may include molybdenum (Mo).

[0110] The sensing layer (420-SA) may be disposed on the first sensing electrode (420-E1). The sensing layer (420-SA) may include amorphous silicon.

[0111] The second sensing electrode (420-E2) may be disposed on the sensing layer (420-SA). The second sensing electrode (420-E2) may include a transparent conductive material. For example, the second sensing electrode (420-E2) may include indium tin oxide (ITO).

[0112] The third insulating layer (425) may be disposed on the second sensing electrode (420-E2). The third insulating layer (425) may be an inorganic layer and may have a single layer or a multilayer structure. For example, the third insulating layer (425) may include a silicon oxide layer and a silicon nitride layer.

[0113] The connecting electrode (420-C) may be placed on the third insulating layer (425). The connecting electrode (420-C) may be electrically connected to the second sensing electrode (420-E2) by penetrating the third insulating layer (425). Additionally, the connecting electrode (420-C) may be electrically connected to the wiring layer (420-L) by penetrating the second and third insulating layers (424, 425).

[0114] The fourth insulating layer (426) is disposed on the third insulating layer (425) and can cover the connecting electrode (420-C). The fourth insulating layer (426) may be an organic layer and may have a single layer or a multilayer structure. For example, the fourth insulating layer (426) may be a single layer of polyimide-based resin.

[0115] The optical pattern layer (430) can be placed directly on the bio-information sensing layer (420). For example, the optical pattern layer (430) can be placed directly on the fourth insulating layer (426). That is, the optical pattern layer (430) and the bio-information sensing layer (420) can be formed through a continuous process.

[0116] The optical pattern layer (430) may include a light-blocking portion (431) and a light-transmitting portion (432). The light-blocking portion (431) has light-absorbing properties. The light-blocking portion (431) may include a metal or an organic material with high light-absorbing properties. The light transmittance of the light-blocking portion (431) may be about 60% or less. For example, the light-blocking portion (431) may include molybdenum (Mo), titanium (Ti), aluminum (Al), chromium (Cr), alloys thereof, or combinations thereof. Alternatively, the light-blocking portion (431) may include an organic material such as carbon or a photosensitive material.

[0117] The light-blocking portion (431) may have a predetermined height (431H) in the third direction (DR3). The light-blocking portion (431) may include a plurality of light-blocking layers (4311, 4312, 4313) spaced apart from each other along the third direction (DR3) within the height (431H) range. The light-blocking layers (4311, 4312, 4313) may include first to third light-blocking layers (4311, 4312, 4313).

[0118] In this embodiment, the spacing (431-H) of the first to third light-blocking layers (4311, 4312, 4313) spaced apart along the third direction (DR3) may be uniform. However, this is described as an example, and the light-blocking layers (4311, 4312, 4313) may be spaced apart at different intervals from each other, and the light-blocking portion (431) may include four or more light-blocking layers, and is not limited to any one embodiment.

[0119] Each of the light-blocking layers (4311, 4312, 4313) can be formed with a thickness that can have a light transmittance of about 60% or less. Even if the light-blocking layers (4311, 4312, 4313) are formed with a material that has a relatively high transmittance, by forming them with a thickness that can have a low light transmittance, the light incident on the bio-information sensing layer (420) can be filtered within a predetermined range.

[0120] In each of the light-blocking layers (4311, 4312, 4313), a plurality of holes (H1, H2, H3) spaced apart from each other in a plane may be defined. Specifically, a plurality of first holes (H1) spaced apart from each other and penetrating the first light-blocking layer (4311) may be defined in the first light-blocking layer (4311), a plurality of second holes (H2) may be defined in the second light-blocking layer (4312), and a plurality of third holes (H3) may be defined in the third light-blocking layer (4313).

[0121] In this embodiment, the first to third holes (H1, H2, H3) may be defined at corresponding positions along the third direction (DR3). Additionally, the first to third holes (H1, H2, H3) may be defined with the same shape on the plane defined by the first direction (DR1) and the second direction (DR2).

[0122] For example, the first to third holes (H1, H2, H3) may be defined as circular shapes in a planar plane and may have a diameter corresponding to the width (432-W, hereinafter hole width) defined in the first direction (DR1). Additionally, each of the first to third holes (H1, H2, H3) may be formed spaced apart from each other by a predetermined pitch (431-P, hereinafter hole pitch) in a planar plane. However, this is illustrated as an example, and the first to third holes (H1, H2, H3) may have different shapes from each other or be defined in various shapes such as circular, elliptical, or polygonal, and are not limited to any one embodiment.

[0123] The transparent portion (432) may be optically transparent. The transparent portion (432) may include a material having a light transmittance of about 90% or more. For example, the transparent portion (432) may include polyimide.

[0124] The transparent portion (432) fills the spaces between the light-blocking layers (4311, 4312, 4313) and the holes (H1, H2, H3), respectively. The transparent portion (432) may be provided as a single unit. In this embodiment, a portion of the transparent portion (432) may cover the light-blocking portion (431). Accordingly, the thickness of the optical pattern layer (430) may be greater than or equal to the height (431H) of the light-blocking portion. However, this is illustrated as an example, and the upper surface of the light-blocking portion (431) may be exposed from the transparent portion (432). In this case, the height (431H) of the light-blocking portion may correspond to the thickness of the optical pattern layer (430).

[0125] Light (2000-L) reflected from the fingerprint (2000) can pass through the transparent portion (432), particularly the transparent portion (432) filled in the holes (H1, H2, H3), and be incident on the sensing element (420-PD). In this embodiment, the transparent portion (432) filled in the holes (H1, H2, H3) can substantially correspond to the transparent window of the optical pattern layer (430).

[0126] Referring to FIG. 6b, the fingerprint (2000) includes a plurality of ridges (2000-R) and a plurality of valleys (2000-V). A sensing unit (400) recognizes the fingerprint by receiving light reflected from each of the valleys (2000-V). A predetermined viewing angle (VA) may be defined in the sensing unit (400). The viewing angle (VA) may be designed to receive only light reflected from one valley (2000-V). Accordingly, the viewing angle (VA) may have a maximum value at which light reflected from the vertices of two adjacent ridges (2000-R) with one valley (2000-V) in between is incident.

[0127] Referring to FIGS. 6a and 6b, the optical pattern layer (430) filters only the light within the maximum incident angle (2000-AG) among the incident light and provides it to the biometric information sensing layer (420). The maximum incident angle (2000-AG) may be an angle at which the side brightness relative to the front brightness is approximately 25% or less. At this time, the maximum incident angle (2000-AG) is designed to correspond to the acceptance angle (VA). If the incident angle (2000-AG) is greater than the acceptance angle (VA), light reflected from the valley of the fingerprint (2000) corresponding to the sensing element (420-PD), as well as light reflected from other valleys adjacent to said valley, may be incident on the sensing element (420-PD). This may reduce the accuracy of fingerprint recognition. According to an embodiment of the present invention, the incident angle (2000-AG) of light that can pass through the optical pattern layer (430) may be limited by the optical pattern layer (430). For example, only light incident at a predetermined angle of incidence (2000-AG) or less by the optical pattern layer (430) can be incident on the sensing element (420-PD). Accordingly, the accuracy or sensitivity of fingerprint recognition can be improved.

[0128] Since the maximum angle of incidence (2000-AG) corresponds to the angle of acceptance (VA), it can be determined by considering half the value of the pitch (2000-P) of the fingerprint (2000) and the distance (LT) between the outermost surface of the display device (1000) and the optical pattern layer (430). For example, the pitch of the fingerprint (2000) can be defined as the distance between valleys (2000-V) and valleys (2000-V) or between ridges (2000-R) and ridges (2000-R). The pitch (2000-P) of the fingerprint (2000) can generally have a range of 400 micrometers or more and 600 micrometers or less. In this embodiment, the distance (LT) may be the distance between the upper surface of the optical pattern layer (430) and the upper surface of the window (100).

[0129] For example, if the pitch (2000-P) of the fingerprint (2000) is 400 micrometers and the separation distance (LT) is 1200 micrometers, the maximum angle of incidence (2000-AG) is tan -1 It can be defined as (200 / 1200), which may be approximately 10 degrees. Alternatively, if the pitch of the fingerprint (2000) is 600 micrometers and the separation distance is 800 micrometers, the maximum angle of incidence (2000-AG) is tan -1 It can be (300 / 800), which can be 20 degrees. A predetermined angle can be set as a design condition by considering the pitch (2000-P) of the fingerprint (2000) and the separation distance (LT).

[0130] Referring to FIG. 6a, the angle of incidence (2000-AG) can be controlled by the ratio of the hole width (431-W) and the height (432H) of the light-blocking portion (431). The hole width (431-W) can be defined as the width of the transparent window. By filling the holes (H1, H2, H3) with the transparent portion (432), the holes (H1, H2, H3) can serve as transparent windows through which incident light is transmitted. According to the present embodiment, the ratio of the hole width (431-W) and the height (431H) of the light-blocking portion (431) can be set to satisfy the following mathematical formula so that the maximum angle of incidence (2000-AG) of the light passing through the optical pattern layer (430) is 13 degrees or less.

[0131] [Mathematical Formula]

[0132] Hole width (431-W) / Height of shading part (431H) ≤ tan(13 degrees)

[0133] In this embodiment, the hole width (431-W) / height of the light-shielding part (431H) may be 0.2311 or less. For example, the height of the light-shielding part (431H) may be 1 / tan(AG) times the hole width (431-W). The AG may be an angle set according to design conditions. When the height of the light-shielding part (431H) is 1 / tan(AG) times the hole width (431-W), the angle may correspond to the maximum incident angle (2000-AG) of light that can pass through the optical pattern layer (430).

[0134] The hole width (431-W), the height of the light-shielding section (431H), and the hole pitch (431-P) can be designed by considering the above mathematical formula. Additionally, the hole width (431-W), the height of the light-shielding section (431H), and the hole pitch (431-P) may have a complementary relationship with each other.

[0135] For example, as the hole width (431-W) becomes smaller, the number of holes that can be formed within the same effective detection area (420-AAR) can be increased, thereby improving the sensitivity of a single detection element (420-PD). However, as the hole width (431-W) becomes smaller, the process cost may increase and the process reliability may decrease. Conversely, as the hole width (431-W) becomes larger, the process may become easier, but the height (431H) of the light-blocking part to satisfy the maximum incident angle (2000-AG) may be increased.

[0136] As the height (431H) of the light-blocking portion decreases, the hole width (431-W) required to satisfy the maximum incident angle becomes finer, which may increase the difficulty of the process. Conversely, as the height (431H) of the light-blocking portion increases, the thickness of the optical pattern layer (430) increases, which may increase the amount of light loss reaching the bio-information sensing layer (420).

[0137] As the hole pitch (431-P) increases, the number of holes that can be formed within the effective detection area (420-AAR) decreases, so the light transmittance of the optical pattern layer (430) may decrease. Conversely, as the hole pitch (431-P) decreases, process reliability may decrease.

[0138] According to the present embodiment, the hole width (431-W) can be designed to be 1.5 micrometers or more, the hole pitch (431-P) to be 3 micrometers or more, and the height of the light-shielding layer (431H) to be 15 micrometers or less, so that the maximum angle of incidence (2000-AG) satisfies 13 degrees or less. According to the present invention, a fine hole width (431-H) can be designed by forming a plurality of holes (H1, H2, H3) in the light-shielding layers (4311, 4312, 4313) and filling the transparent portion (432). By forming the hole width (431-H) finely, the height of the light-shielding layer (431H) can also be reduced. Accordingly, the thickness of the optical pattern layer (430) can be reduced and the sensitivity of the sensing unit (400) can be improved. A detailed explanation thereof will be provided later.

[0140] FIG. 7 is a plan view of a light-blocking section according to an embodiment of the present invention. FIG. 8 is a plan view illustrating the relationship between some components of a display device. FIG. 8 illustrates light-emitting regions (PXA-R, PXA-G, PXA-B), an optical pattern layer (430), and a sensing region (420-AR). Additionally, FIG. 8 illustrates the optical pattern layer (430) as a light-blocking section (431) and a transparent section (432) filled in holes for ease of explanation. Accordingly, the transparent section (432) filled in holes can substantially correspond to the holes (H1, H2, H3: see FIG. 6a). The present invention will be described below with reference to FIG. 7 and FIG. 8. A plurality of holes are formed in the light-blocking section (431). The upper surface of the light-blocking section (431) shown in FIG. 7 can substantially correspond to the upper surface of the first light-blocking layer (4311: see FIG. 6a).

[0141] When viewed in a planar view, each of the holes may have a circular shape. The hole width (431-W) may correspond to the diameter of the circle. Meanwhile, the shape of the hole is not limited to this, and the hole may be deformed into various shapes such as an ellipse or a polygon.

[0142] The holes may be arranged along a first direction (DR1) and a second direction (DR2). For example, the permeable portion (432) may be arranged in a matrix form. In this embodiment, the hole pitch (431-P) may be defined along the first direction (DR1). Meanwhile, the hole pitch (431-P) may differ from each other in the first direction (DR1) and the second direction (DR2), and is not limited to any one embodiment.

[0143] Each of the light-emitting regions (PXA-R, PXA-G, PXA-B) may correspond to the light-emitting region (PXA) illustrated in FIG. 5. For example, the light-emitting regions (PXA-R, PXA-G, PXA-B) may include a first light-emitting region (PXA-R), a second pixel region (PXA-G), and a third light-emitting region (PXA-B). The first light-emitting region (PXA-R) may be a region that provides red light, the second light-emitting region (PXA-G) may be a region that provides green light, and the third light-emitting region (PXA-B) may be a region that provides blue light.

[0144] The area of ​​the second light-emitting region (PXA-G) may be smaller than the area of ​​the first light-emitting region (PXA-R) and the area of ​​the third light-emitting region (PXA-B). Additionally, the area of ​​the third light-emitting region (PXA-B) may be larger than the area of ​​the first light-emitting region (PXA-R) and the area of ​​the second light-emitting region (PXA-G).

[0145] In one embodiment of the present invention, a single sensing area (420-AR) may overlap with a plurality of light-emitting areas. For example, a single sensing area (420-AR) may overlap with parts of two first light-emitting areas (PXA-R), one second light-emitting area (PXA-G), and parts of two third light-emitting areas (PXA-B).

[0146] In one embodiment of the present invention, each of the first to third light-emitting regions (PXA-R, PXA-G, PXA-B) can overlap with a transparent portion (432) filled in a plurality of holes. That is, each of the first electrodes (313-E1, see FIG. 5) placed in the first to third light-emitting regions (PXA-R, PXA-G, PXA-B) can also overlap with a transparent portion (432) filled in a plurality of holes.

[0147] The number of transparent portions (431) overlapping with each of the first to third light-emitting regions (PXA-R, PXA-G, PXA-B) may vary depending on the area of ​​each of the first to third light-emitting regions (PXA-R, PXA-G, PXA-B). For example, the number of transparent portions (432) filled in the holes overlapping with the third light-emitting region (PXA-B) may be the largest, the number of transparent portions (432) filled in the holes overlapping with the first light-emitting region (PXA-R) may be the next largest, and the number of transparent portions (432) filled in the holes overlapping with the second light-emitting region (PXA-G) may be the smallest. The area of ​​each of the first to third light-emitting regions (PXA-R, PXA-G, PXA-B) may be smaller than the area of ​​the detection region (420-AR). Accordingly, the number of holes overlapping with each of the first to third light-emitting regions (PXA-R, PXA-G, PXA-B) may be less than the number of holes overlapping with the sensing region (420-AR). Additionally, the number of holes overlapping with the first electrode (313-E1, see FIG. 5) may be less than the number of holes overlapping with the second sensing electrode (420-E2, see FIG. 6). However, this is illustrated as an example, and the area of ​​each of the first to third light-emitting regions (PXA-R, PXA-G, PXA-B) according to one embodiment of the present invention may be designed in various ways and is not limited to any one embodiment.

[0149] FIGS. 9a to 9c are cross-sectional views of a light-shielding portion according to an embodiment of the present invention. FIGS. 9a to 9c exemplarily illustrate light-shielding portions comprising three light-shielding layers. Hereinafter, the present invention will be described with reference to FIGS. 9a to 9c.

[0150] FIG. 9a illustrates a light-blocking portion (431) corresponding to the light-blocking portion (431) illustrated in FIG. 6a. That is, a plurality of first holes (H1) are defined in the first light-blocking layer (4311), the first holes (H1) are arranged at a predetermined pitch (431-P), and each of the first holes (H1) can be formed with a predetermined width (431-H).

[0151] A plurality of second holes (H2) are defined in the second light-blocking layer (4312), and the second holes (H2) may have a pitch and width corresponding to the hole pitch (431-P) and hole width (431-H) defined in the first light-blocking layer (4311). Similarly, a plurality of third holes (H3) are defined in the third light-blocking layer (4313), and the third holes (H3) may have a pitch and width corresponding to the hole pitch (431-P) and hole width (431-H) defined in the first light-blocking layer (4311).

[0152] The gap (R1-H) between the first light-blocking layer (4311) and the second light-blocking layer (4312) may be the same as the gap (R2-H) between the second light-blocking layer (4312) and the third light-blocking layer (4313). According to the present invention, the process can be simplified by forming the light-blocking portion (431) with a plurality of identical light-blocking layers.

[0153] Meanwhile, the first to third light-blocking layers (4311, 4312, 4313) may be formed of the same or different materials. For example, the first to third light-blocking layers (4311, 4312, 4313) may all be formed of metal or organic layers. Alternatively, some of the first to third light-blocking layers (4311, 4312, 4313) may be formed of metal and the remainder of organic layers. Alternatively, some of the first to third light-blocking layers (4311, 4312, 4313) may be formed of a first metal and the remainder of a second metal. Alternatively, each of the first to third light-blocking layers (4311, 4312, 4313) may be formed of different materials. The light-blocking portion (431) according to one embodiment of the present invention may be formed in various combinations and is not limited to any one embodiment.

[0154] Alternatively, as illustrated in FIG. 9b, each of the first to third light-blocking layers (4311_1, 4312_1, 4313_1) constituting the light-blocking portion (431_1) may have a multilayer structure. Specifically, the first light-blocking layer (4311_1) may include a stacked first layer (4311a) and a second layer (4311b). The first layer (4311a) and the second layer (4311b) may be formed of different materials. For example, the first layer (4311a) and the second layer (4311b) may be formed of different metals. Alternatively, either of the first layer (4311a) and the second layer (4311b) may be formed of an insulating material and the other may be formed of a metal.

[0155] Each of the second light-blocking layer (4312_1) and the third light-blocking layer (4313_1) may have the same structure as the first light-blocking layer (4311_1). For example, the second light-blocking layer (4312_1) may include a stacked first layer (4312a) and a second layer (4312b), and the third light-blocking layer (4313_1) may include a stacked first layer (4313a) and a second layer (4313b). However, this is illustrated as an example, and the second light-blocking layer (4312_1) and the third light-blocking layer (4313_1) may have a different structure from the first light-blocking layer (4311_1).

[0156] For example, one of the first to third light-blocking layers (4311_1, 4312_1, 4313_1) may have a multilayer structure, and the remaining layers may have a single-layer structure. Alternatively, one of the first to third light-blocking layers (4311_1, 4312_1, 4313_1) may have a three-layer structure, another layer may have a two-layer structure, and the remaining layer may have a single-layer structure. Meanwhile, this is described by way of example, and the light-blocking part (431_1) according to one embodiment of the present invention can be designed in various combinations and is not limited to any one embodiment.

[0157] Alternatively, as illustrated in FIG. 9c, the light-shielding portion (431_2) may include first to third light-shielding layers (4311_2, 4312_2, 4313_3) spaced apart at different intervals. The gap (R1_H, hereinafter the first gap) between the first light-shielding layer (4311_2) and the second light-shielding layer (4312_2) may be smaller than the gap (R2_H, hereinafter the second gap) between the second light-shielding layer (4312_2) and the third light-shielding layer (4313_2). According to the present invention, by independently controlling the first gap (R1_H) and the second gap (R2_H), a light-shielding portion of various structures can be designed within the height (431H) of the light-shielding layer.

[0158] Meanwhile, in this embodiment, the hole pitch (431-P) is designed to be the same for each layer (4311_2, 4312_2, 4313_2). However, this is illustrated as an example, and the hole pitch (431-P) may be designed differently for each layer (4311_2, 4312_2, 4313_2) and is not limited to any one embodiment.

[0160] FIGS. 10a and 10b are cross-sectional views of light-shielding sections according to an embodiment of the present invention. FIGS. 10c and 10d are partial plan views of light-shielding sections according to an embodiment of the present invention. FIG. 10c shows a partial area of ​​the light-shielding section (431_3) shown in FIG. 10a, and FIG. 10d shows a partial area of ​​the light-shielding section (431_4) shown in FIG. 10b. Hereinafter, the present invention will be described with reference to FIGS. 10a to 10d. Meanwhile, the same reference numerals are assigned to components identical to those described in FIGS. 1 to 9c, and redundant descriptions are omitted.

[0161] As illustrated in FIG. 10a and FIG. 10c, the light-shielding portion (431_3) includes first to third light-shielding layers (4311_3, 4312_3, 4313_3). In this case, the first to third holes (H1_3, H2_3, H3_3) may be designed differently from each other.

[0162] Specifically, the first holes (H1_3) formed in the first light-blocking layer (4311_3) are arranged at a first pitch (431-P1) and each may have a first width (431-W1). The second holes (H2_3) formed in the second light-blocking layer (4312_3) are arranged at a second pitch (431-P2) and each may have a second width (431-W2). The third holes (H3_3) formed in the third light-blocking layer (4313_3) are arranged at a third pitch (431-P3) and each may have a third width (431-W3).

[0163] The first to third widths (431-W1, 431-W2, 431-W3) may differ from each other. For example, the first width (431-W1) may be larger than the second width (431-W2) and equal to the third width (431-W3). Meanwhile, the centers (CC) of the first to third holes (H1_3, H2_3, H3_3) may be aligned to coincide along the thickness direction. Additionally, the first to third pitches (431-P1, 431-P2, 431-P3) may be the same as each other.

[0164] Alternatively, as illustrated in FIG. 10b and FIG. 10d, the light-blocking portion (431_4) includes first to third light-blocking layers (4311_4, 4312_4, 4313_4), and the first to third holes (H1_4, H2_4, H3_4) may have widths that decrease sequentially.

[0165] Specifically, the first hole width (4311-H1) of the first holes (H1_4) defined in the first light-blocking layer (4311_4) positioned at the top of the light-blocking section (431_4) can be designed to be larger than the second hole width (4312_H1) and the third hole width (4313_H1), and the third hole width (4313-H1) of the second holes (H3_4) defined in the third light-blocking layer (4313_4) positioned at the bottom of the light-blocking section (431_4) can be designed to be smaller than the first hole width (4311-H1) and the second hole width (4312-H1).

[0166] Meanwhile, the first to third pitches (4311-P1, 4312-P1, 4313-P1) are shown as identical to each other, but this is for illustrative purposes only, and the first to third pitches (4311-P1, 4312-P1, 4313-P1) may be designed with different values ​​and are not limited to any one embodiment.

[0167] According to the present invention, the first to third light-blocking layers (4311_3, 4311_4, 4312_3, 4312_4, 4313_3, 4313_4) can be designed independently of each other. Additionally, the first to third holes (H1_3, H1_4, H2_3, H2_4, H3_3) can be formed independently of each other. Accordingly, by forming the first to third widths (4311_W, 4311-W1, 4312-W, 4312-W1, 4313-W, 4313-W1) or the first to third pitches (4311-P, 4311-P1, 4312-P, 4312-P, 4313-P, 4313-P1) with various numerical values, the design freedom of the light-shielding portion (431_3, 431_4) can be increased.

[0168] Meanwhile, a light-shielding portion according to one embodiment of the present invention may be formed by a combination of light-shielding layers shown in FIGS. 9a to 10d. According to the present invention, if the maximum incident angle of the incident light can be set to 13 degrees or less, various types of light-shielding layers can be designed and are not limited to any one embodiment.

[0170] FIGS. 11a to 11f are cross-sectional views illustrating a method for forming a sensing unit according to an embodiment of the present invention. Hereinafter, the present invention will be described with reference to FIGS. 11a to 11f.

[0171] As illustrated in FIG. 11a, a first transparent layer (OC1) and a first initial light-blocking layer (BP1) are sequentially formed on the upper surface on which the base layer (410) and the bio-information sensing layer (420) are formed. The first transparent layer (OC1) can be formed by depositing, coating, or printing an insulating material with high light transmittance onto the bio-information sensing layer (420). For example, the first transparent layer (OC1) can be formed by coating the upper surface of the bio-information sensing layer (420) with a polyimide solution and then curing it.

[0172] The first initial light-blocking layer (BP1) can be formed by depositing, printing, or coating a material having high light absorption on the first transparent layer (OC1). For example, the first initial light-blocking layer (BP1) can be formed by depositing a metal or inorganic insulating material on the upper surface of the first transparent layer (OC1), or by printing / coating a chromium-based organic material. Meanwhile, this is described as an example, and the first transparent layer (OC1) can be formed on a separate carrier substrate. Subsequently, a process of removing the carrier substrate and attaching the bio-information sensing layer (420) may be further included.

[0173] Subsequently, as illustrated in FIG. 11b and FIG. 11c, a second transparent layer (OC2), a second initial light-blocking layer (BP2), a third transparent layer (OC3), and a third initial light-blocking layer (BP3) are sequentially stacked. The spacing between the first to third initial light-blocking layers (BP1, BP2, BP3) can be controlled by the thicknesses of the second transparent layer (OC2) and the third transparent layer (OC3), respectively.

[0174] Subsequently, as illustrated in FIG. 11d, a mask (MIC) is formed on the third initial light-blocking layer (BP3). The mask (MIC) can be formed by forming a plurality of holes (HH) in a layer formed to cover the front surface of the third initial light-blocking layer (BP3).

[0175] Subsequently, as illustrated in FIG. 11e, the first to third initial light-blocking layers (BP1, BP2, BP3) are patterned so that a plurality of holes (H1, H2, H3) are formed in each of the first to third initial light-blocking layers (BP1, BP2, BP3). The holes (H1, H2, H3) may be formed in the area exposed by the holes (HH) of the mask (MIC).

[0176] The patterning of the first to third initial light-blocking layers (BP1, BP2, BP3) can be formed through an etching process. In this embodiment, the patterning of the first to third initial light-blocking layers (BP1, BP2, BP3) can be formed through a dry etching process. The first to third initial light-blocking layers (BP1, BP2, BP3) can be patterned to form a light-blocking portion (431) in which the first to third holes (H1, H2, H3) are formed.

[0177] At this time, the first to third transparent layers (OC1, OC2, OC3) may also be patterned together. In this embodiment, the first to third initial light-blocking layers (BP1, BP2, BP3) may be formed from materials that can be etched by the same etching gas as the first to third transparent layers (OC1, OC2, OC3). In this case, the first to third holes (H1, H2, H3) can be formed at once through a single etching process, thereby simplifying the process and reducing process costs. However, this is illustrated as an example, and the first to third transparent layers (OC1, OC2, OC3) or the first to third initial light-blocking layers (BP1, BP2, BP3) may be etched by different etching gases or patterned through different masks, and are not limited to any one embodiment.

[0178] Afterward, as illustrated in FIG. 11f, a transparent portion (432) is formed after removing the mask (MIC). The transparent portion (432) can be formed by providing a light-transmitting material to the upper surface of the holes (H1, H2, H3) and the light-blocking portion (431). The light-transmitting material fills the holes (H1, H2, H3) and covers the upper surface of the light-blocking portion (431). The transparent portion (432) can be formed from the same material as the first to third transparent layers (OC1, OC2, OC3). Accordingly, the transparent portion (432) can be formed integrally.

[0179] Meanwhile, although not shown, a polishing process may be added later. The polishing process may flatten the upper surface of the transparent portion (432). Alternatively, the polishing process may remove the transparent portion (432) covering the upper surface of the light-blocking portion (431) to expose the upper surface of the light-blocking portion (431).

[0180] According to the present invention, an optical pattern layer can be formed through a process of forming holes in a light-blocking portion (431) and then filling the holes to form a transparent portion. When using a dry etching process, it may be advantageous for forming fine-sized holes. Accordingly, the width of the holes (H1, H2, H3) can be finely controlled, thereby easily forming an optical pattern layer (430) with reduced thickness and improved light transmittance. Thus, a sensing unit (400) with improved sensitivity can be provided.

[0181] Although the present invention has been described above with reference to preferred embodiments, those skilled in the art or those with ordinary knowledge in the relevant technical field will understand that various modifications and changes can be made to the invention without departing from the spirit and technical scope of the invention as set forth in the claims below. Accordingly, the technical scope of the present invention should not be limited to the contents described in the detailed description of the specification, but should be determined by the claims. Explanation of the symbols

[0182] 1000: Display device 100: Window 200: Anti-reflective panel 300: Display module 400: Detection unit 420: Biometric information detection layer 430: Optical pattern layer

Claims

Claim 1 A display device comprising: a bio-information sensing layer including a sensor; a display module disposed on the bio-information sensing layer and having a light-emitting region defined therein; and an optical pattern layer disposed between the bio-information sensing layer and the display module and including a light-shielding portion comprising a plurality of light-shielding layers and a light-transmitting portion having a higher light transmittance than the light-shielding portion, wherein a plurality of holes are defined in each of the plurality of light-shielding layers, the plurality of light-shielding layers are electrically insulated from each other, the light-transmitting portion fills the spaces between the light-shielding layers and the interiors of the plurality of holes, and each of the sensor and the light-emitting region overlaps with two or more of the plurality of holes. Claim 2 In claim 1, the light-blocking layers include first to third light-blocking layers, and a plurality of first holes formed in the first light-blocking layer, a plurality of second holes formed in the second light-blocking layer, and a plurality of third holes formed in the third light-blocking layer are aligned along the thickness direction of the light-blocking portion. Claim 3 In claim 2, the first to third holes are a display device having equal widths on a plane. Claim 4 In claim 3, the first to third holes are a display device having identical shapes on a plane. Claim 5 In claim 2, the first holes and the second holes are a display device having different widths on a plane. Claim 6 In claim 5, the first holes and the second holes are arranged at the same pitch as each other in a display device. Claim 7 A display device according to claim 5, wherein the width of each of the first holes is greater than the width of each of the second holes and the width of each of the third holes, and the width of each of the third holes is smaller than the width of each of the second holes. Claim 8 In claim 1, the spacing between the light-blocking layers is the same for the display device. Claim 9 In claim 1, the spacing between the light-blocking layers is different from each other in the display device. Claim 10 In claim 1, the light-blocking part comprises at least one of molybdenum, titanium, or aluminum in a display device. Claim 11 In claim 10, each of the light-blocking layers is a display device having a multilayer structure. Claim 12 In claim 1, the light-blocking part is a display device comprising chromium or carbon. Claim 13 In claim 12, a display device in which a portion of the transparent part covers the upper surface of the light-blocking part. Claim 14 A display device comprising: a display module having a defined light-emitting region; a bio-information sensing layer disposed on the lower side of the display module and including a sensor; and an optical pattern layer disposed on the bio-information sensing layer, wherein the optical pattern layer comprises: a first light-blocking layer having a plurality of first holes defined that overlap with the light-emitting region in a plane; a second light-blocking layer having a plurality of second holes defined that overlap with each of the first holes; a third light-blocking layer having a plurality of third holes defined that overlap with each of the second holes; and a transparent portion disposed between the first to third light-blocking layers, wherein each of the first to third light-blocking layers is electrically insulated from each other and the transparent portion fills each of the first to third holes, and each of the first to third light-blocking layers comprises at least one of molybdenum, titanium, and aluminum, and wherein each of the sensor and the light-emitting region overlaps with at least two of the plurality of first holes. Claim 15 In claim 14, the above-mentioned transparent part is a display device having a single shape. Claim 16 In claim 15, the transparent part is a display device that covers the upper surface of the third light-blocking layer. Claim 17 In claim 14, the first to third holes are a display device aligned along the thickness direction of the first to third light-blocking layers. Claim 18 A method for manufacturing a display device comprising: a step of forming a sensing unit; and a step of coupling the sensing unit to the lower side of a display module in which a light-emitting region is defined, wherein the step of forming the sensing unit comprises: a step of alternately stacking a plurality of transparent layers and a plurality of initial light-blocking layers on the upper surface of a bio-information sensing layer disposed on a base layer; a step of forming a mask in which a plurality of holes are formed on the uppermost surface of the initial light-blocking layers; a step of forming a plurality of holes corresponding to the holes in the initial light-blocking layers and the transparent layers; and a step of filling the holes with a light-transmitting material to form a transparent portion, wherein the plurality of initial light-blocking layers are electrically insulated, the bio-information sensing layer includes a sensor, and each of the sensor and the light-emitting region overlaps with two or more of the plurality of holes. Claim 19 A method for manufacturing a display device according to claim 18, wherein holes formed in the initial light-blocking layers and the transparent layers are formed through a dry etching process. Claim 20 A method for manufacturing a display device according to claim 19, wherein the initial light-blocking layers and the transparent layers are etched by the same etching gas.

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