Showerhead module

Abstract

The present invention relates to a showerhead module, and more specifically, to a showerhead module capable of controlling plasma density in at least a portion of the chamber when performing a processing process on a substrate using plasma.

Description

Technology Field

[0001] The present invention relates to a showerhead module, and more specifically, to a showerhead module capable of controlling plasma density in at least a portion of the chamber when performing a processing process on a substrate using plasma. Background Technology

[0002] Generally, a substrate processing device performs various processing steps on a substrate, and in this case, plasma can be used to increase the efficiency of the processing steps.

[0003] In a substrate processing device according to the prior art, when using plasma, RF power can be supplied to one of the upper and lower electrodes inside the chamber, and the other electrode can be grounded for use.

[0004] In this case, plasma is generated between the upper and lower electrodes, but the plasma density may be non-uniform during the processing of the substrate. Additionally, depending on the processing of the substrate, it may be necessary to vary the plasma density in some areas of the upper surface of the substrate. The problem to be solved

[0005] The present invention aims to provide a showerhead module capable of controlling the plasma density while performing a processing process on a substrate using plasma, in order to solve the above-mentioned problems. means of solving the problem

[0006] The objective of the present invention as described above is achieved by a showerhead module for providing plasma between a susceptor inside a chamber, characterized by comprising: a backing plate to which an RF load connected to an RF power source is connected; a face plate connected to the lower part of the backing plate and having a plurality of supply holes formed therein for supplying process gas; and one or more control electrodes connected to the RF power source and disposed adjacent to the backing plate, for controlling the plasma density between the face plate and the susceptor.

[0007] Here, the RF power supplied to the one or more control electrodes may have a phase shift in at least one of the current and voltage compared to the RF power supplied to the backing plate.

[0008] Furthermore, one or more inductors may be provided in the connection line connecting the control electrode and the RF power source.

[0009] In addition, the above-mentioned control electrode may be configured to allow for distance adjustment with respect to the above-mentioned backing plate.

[0010] Meanwhile, the plasma density between the backing plate and the susceptor can be controlled by controlling the electric field between the control electrode and the backing plate by controlling at least one of the distance between the control electrode and the backing plate, the number of inductors connected to the control electrode, and the distance between the control electrode and the RF load.

[0011] Furthermore, an electric field guide housing that guides the electric field between the control electrode and the backing plate may be further provided. Effects of the invention

[0012] According to the present invention having the above-described configuration, one or more control electrodes are provided, and plasma density can be controlled by controlling at least one of the distance between the control electrode and the backing plate, the number of inductors connected to the control electrode, and the distance between the control electrode and the RF load. Brief explanation of the drawing

[0013] FIG. 1 is a side cross-sectional view of a chamber equipped with a showerhead module according to an embodiment of the present invention. FIG. 2 is a plan view of the Shawehead module, FIG. 3 is a side cross-sectional view of a chamber equipped with a showerhead module according to another embodiment of the present invention and FIG. 4 is a side cross-sectional view of a chamber equipped with a showerhead module according to another embodiment of the present invention. Specific details for implementing the invention

[0014] Hereinafter, the structure of a shower head module according to an embodiment of the present invention will be examined in detail with reference to the drawings.

[0015] FIG. 1 is a side cross-sectional view of a chamber (1000) equipped with a shower head module (200) according to one embodiment of the present invention.

[0016] Referring to FIG. 1, the chamber (1000) may have a chamber body (100) that provides a processing space (112) for a substrate (10).

[0017] For example, as illustrated in FIG. 1, the chamber body (100) provides a processing space (112) for the substrate (10) on the inside. The chamber body (100) may be composed of a chamber body (110) and a chamber lid (120). The chamber body (110) may have an open top to provide the aforementioned processing space (112) on the inside.

[0018] A susceptor (140) on which the substrate (10) is seated may be provided inside the chamber body (110). The susceptor (140) may be installed inside the chamber body (110) so as to be able to move up and down.

[0019] Meanwhile, the susceptor (140) can function as an RF electrode. For example, the susceptor (140) can be grounded to serve as a ground electrode. Accordingly, plasma can be provided between the showerhead module (200) described later and the susceptor (140) to perform a processing process on the substrate (10).

[0020] Meanwhile, a shower head module (200) may be provided on the upper part of the chamber body (110). In this case, although not illustrated, the shower head module (200) may be connected to and positioned on the chamber lid (120).

[0021] The showerhead module (200) serves to supply process gas toward the substrate (10). For example, process gas can be supplied from a process gas source (not shown) to the showerhead module (200) and then supplied toward the substrate (10).

[0022] That is, process gas can be supplied toward the showerhead module (200) through the process gas supply line (250) connected by penetrating the upper part of the chamber lid (120).

[0023] The shower head module (200) may be provided with a backing plate (210) to which an RF rod (310) connected to an RF power source (300) is connected, and a facing plate (220) connected to the lower part of the backing plate (210) and having a plurality of supply holes (222) formed therein for supplying process gas.

[0024] The backing plate (210) is provided on the upper part of the chamber body (110) or is connected to the chamber lid (120) and receives RF power through an RF rod (310) connected to the RF power source (300).

[0025] Meanwhile, the above-mentioned facing plate (220) is connected to the lower part of the above-mentioned backing plate (210) and a plurality of supply holes (222) are formed. Accordingly, the process gas supplied through the above-mentioned backing plate (210) is supplied toward the lower substrate (10) through the supply holes (222) of the above-mentioned facing plate (220).

[0026] In addition, the facing plate (220) is electrically connected to the backing plate (210), so that when RF power is supplied to the backing plate (210), the facing plate (220) and the backing plate (210) act as RF electrodes.

[0027] Accordingly, plasma is generated between the susceptor (140) at the bottom of the chamber body (110) and the facing plate (220).

[0028] Meanwhile, while performing a processing process on the substrate (10) using plasma, it is necessary to adjust the plasma density in order to perform the processing on the substrate (10) more uniformly or in a part of the substrate (10) where necessary.

[0029] In order to solve the aforementioned problems, the present invention may provide a control electrode (410, 420) capable of controlling the plasma density in at least a portion of the processing space (112).

[0030] For example, the shower head module (200) may be connected to the RF power source (300) and positioned adjacent to the backing plate (210), and may be equipped with one or more control electrodes (410, 420) that control the plasma density between the facing plate (220) and the susceptor (140).

[0031] The above-mentioned control electrodes (410, 420) may be placed on the upper part of the backing plate (210) and may be spaced apart from the backing plate (210) at a predetermined distance.

[0032] Figure 2 corresponds to a plan view of the shower head module (200).

[0033] Referring to FIGS. 1 and 2, the control electrode (410, 420) may be composed of two parts: a first control electrode (410) and a second control electrode (420).

[0034] For example, the first control electrode (410) may be positioned relatively close to the RF load (310), and the second control electrode (420) may be positioned relatively farther from the RF load (310). The number and position of these control electrodes (410, 420) are merely examples and can be appropriately modified.

[0035] Meanwhile, one or more inductors (510, 522, 524) may be provided in the connecting line (412, 422) connecting the control electrode (410, 420) and the RF power source (300). The number of inductors (510, 522, 524) placed between the control electrode (410, 420) and the RF power source (300) can be appropriately adjusted.

[0036] For example, a first inductor (510) may be disposed in the first connection line (412) connecting the first control electrode (410) and the RF power source (300). Additionally, two inductors, namely a second inductor (522) and a third inductor (524), may be disposed in the second connection line (422) connecting the second control electrode (420) and the RF power source (300).

[0037] In order to provide plasma to the processing space (112) in the shower head module (200) having the above configuration, RF power can be supplied from the RF power source (300) to the RF load (310) and control electrodes (410, 420).

[0038] In this case, the distance between the control electrodes (410, 420) and the RF load (310) from the RF power source (300) may differ, and furthermore, the number of inductors (510, 522, 524) connected to the control electrodes (410, 420) may differ.

[0039] Accordingly, the RF power supplied to the one or more control electrodes (410, 420) may have a phase shift in at least one of the current and voltage compared to the RF power supplied to the backing plate (210).

[0040] In addition, this phase shift may also occur between the two or more control electrodes (410, 420) when two or more control electrodes (410, 420) are provided.

[0041] Ultimately, the plasma density can be controlled by varying the electron density between the facing plate (220) and the susceptor (140) due to the phase shift of the RF power supplied to the backing plate (210) through the aforementioned control electrodes (410, 420).

[0042] Meanwhile, an electric field may be induced between the control electrodes (410, 420) and the backing plate (210). The electric field may induce a strong or weak electrical coupling between the control electrodes (410, 420) and the backing plate (210) to control the plasma density in the lower portion.

[0043] In this case, the plasma density between the backing plate (210) and the susceptor (140) can be controlled by adjusting at least one of the distance between the control electrode (410, 420) and the backing plate (210), the number of inductors (510, 522, 524) connected to the control electrode (410, 420), and the distance between the control electrode (410, 420) and the RF load (310) to control the electric field.

[0044] Meanwhile, FIG. 3 is a side cross-sectional view of a chamber (1000') equipped with a showerhead module (200') according to another embodiment of the present invention.

[0045] Referring to FIG. 3, in the shower head module (200') according to the present embodiment, the control electrodes (410, 420) may be provided to be adjustable in distance from the backing plate (210).

[0046] That is, by adjusting the distance between the control electrode (410, 420) and the backing plate (210), the electric field strength between the control electrode (410, 420) and the backing plate (210) can be adjusted, thereby controlling the plasma density between the backing plate (210) and the susceptor (140).

[0047] For example, the control electrode (410, 420) may be connected to the driving unit (440, 450) by a support bar (442, 452). By driving the driving unit (440, 450), the support bar (442, 452) may move up and down to adjust the distance between the control electrode (410, 420) and the backing plate (210). The driving unit (440, 450) may be implemented in various forms, such as a cylinder or a motor. The configuration for the up and down movement of the control electrode (410, 420) described above is merely an example and can be appropriately modified and applied.

[0048] In addition, when the above-described control electrodes (410, 420) are provided in multiple numbers, the configuration of the aforementioned driving unit (440, 450) may be provided on at least one control electrode (410, 420).

[0049] Meanwhile, FIG. 4 is a side cross-sectional view of a chamber (1000”) equipped with a showerhead module (200”) according to another embodiment of the present invention.

[0050] Referring to FIG. 4, the shower head module (200”) according to the present embodiment may have an electric field guide housing (460) that guides the electric field between the control electrode (420) and the backing plate (210).

[0051] The aforementioned electric field guide housing (460) serves to guide the electric field between the control electrode (420) and the backing plate (210) when the control electrode (420) and the backing plate (210) are spaced far apart.

[0052] In FIG. 4, the electric field guide housing (460) is shown placed only on the second control electrode (420), but is not limited thereto.

[0053] For example, when the above-described control electrodes (410, 420) are provided in multiple numbers, the configuration of the electric field guide housing (460) described above may be provided on at least one control electrode (410, 420).

[0054] Additionally, although not shown in the drawing, the electric field guide housing (460) may be provided together with the driving unit (440, 450) according to FIG. 3.

[0055] Although the present invention has been described above with reference to preferred embodiments, those skilled in the art may modify and change the present invention in various ways without departing from the spirit and scope of the invention as described in the claims below. Therefore, if a modified embodiment basically includes the components of the claims of the present invention, it should be considered to be included within the technical scope of the present invention. Explanation of the symbols

[0056] 100 : Chamber body 110 : Chamber body 112 : Processing space 120 : Chamber Lid 140 : Susceptor 200 : Shower head module 210 : Backing plate 220 : Face plate 300 : RF power 310 : RF Load 410, 420: Control electrodes 440, 450: Drive unit 460 : Electric field guide housing 510, 522, 524: Inductor 1000 : Chamber

Claims

Claim 1 A showerhead module for providing plasma between a susceptor inside a chamber, comprising: a backing plate to which an RF load connected to an RF power source is connected; a face plate formed with a plurality of supply holes connected to the lower part of the backing plate for supplying process gas; and one or more control electrodes connected to the RF power source via a connection line and disposed adjacent to the backing plate, controlling plasma density in a portion of the area between the face plate and the susceptor; and an electric field guide housing for guiding an electric field between the control electrode and the backing plate. Claim 2 A shower head module according to claim 1, characterized in that the RF power supplied to the one or more control electrodes has a phase shift in at least one of the current and voltage compared to the RF power supplied to the backing plate. Claim 3 A shower head module according to claim 1, characterized in that the connection line connecting the control electrode and the RF power source is provided with one or more inductors. Claim 4 A shower head module according to claim 1, characterized in that the adjustment electrode is configured to allow for distance adjustment with respect to the backing plate. Claim 5 A showerhead module according to claim 1, characterized in that it controls the electric field between the control electrode and the backing plate to control the plasma density between the backing plate and the susceptor by controlling at least one of the distance between the control electrode and the backing plate, the number of inductors connected to the control electrode, and the distance between the control electrode and the RF load. Claim 6 delete

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