Charged particle beam apparatus and charged particle gun

Abstract

[Project] To provide a charged particle beam device capable of realizing further appropriate positioning of a charged particle source. [Solution] The charged particle beam device comprises a charged particle source support member (106) that directly or indirectly supports a charged particle source (103) and a moving mechanism (107) that moves the charged particle source support member (106). The moving mechanism (107) has a first function of moving the charged particle source support member (106) in the X direction, Y direction, and Z direction, with the direction of travel of the charged particle emitted from the charged particle source (103) being the Z direction, the direction orthogonal to the Z direction being the X direction, and the direction orthogonal to the Z direction and the X direction being the Y direction, and a second function of moving the charged particle source support member (106) in the Z direction from outside the vacuum chamber (101) separately from the first function.

Description

Technology Field

[0001] The present invention relates to a charged particle beam device and a charged particle gun. Background Technology

[0002] As background technology in this technical field, the following patent documents 1 and 2 describe, for example, a technology for adjusting the position of a charged particle source, such as an electron source. The technology of these documents is incorporated as part of the present specification. Prior art literature

[0003] Japanese Patent Publication No. 10-255711 and Japanese Patent Publication No. 2007-19045 The problem to be solved

[0004] However, regarding the aforementioned technology, there is a desire to realize even more appropriate positioning of the charged particle source.

[0005] The present invention has been made in consideration of the circumstances described above, and aims to provide a charged particle beam device and a charged particle gun capable of realizing appropriate positional adjustment of a charged particle source. means of solving the problem

[0006] To solve the above problem, the charged particle beam device of the present invention comprises a charged particle gun for irradiating a charged particle beam and a focusing lens, wherein the focusing lens focuses charged particles by an electric field or a magnetic field and irradiates them onto a sample, and the charged particle gun comprises a charged particle source for emitting charged particles, a vacuum chamber surrounding the charged particle source, a charged particle source support member for directly or indirectly supporting the charged particle source, and a moving mechanism for moving the charged particle source support member, wherein the moving mechanism is characterized by having a first function of moving the charged particle source support member in the X direction, the direction orthogonal to the Z direction, the direction orthogonal to the Z direction, and the direction orthogonal to the Z direction and the X direction, and a second function of moving the charged particle source support member in the Z direction from outside the vacuum chamber, separately from the first function. Effects of the invention

[0007] According to the present invention, appropriate positioning of a charged particle source can be realized. Brief explanation of the drawing

[0008] FIG. 1 is a schematic diagram of an electron gun according to a first embodiment. FIG. 2 is a schematic diagram of an electron gun according to a second embodiment. FIG. 3 is a schematic perspective view of a key part of an electron gun according to a third embodiment. FIG. 4 is a schematic cross-sectional view of a key part of an electron gun according to a fourth embodiment. FIG. 5 is a schematic diagram of an electron gun according to the fifth embodiment. FIG. 6 is a schematic diagram of an electron gun according to the sixth embodiment. FIG. 7 is a schematic diagram of a charged particle beam device according to the seventh embodiment. FIG. 8 is a schematic diagram of a charged particle beam device according to the eighth embodiment. FIG. 9 is a schematic diagram of a charged particle beam device according to the ninth embodiment. Figure 10 is a block diagram of a computer. Specific details for implementing the invention

[0009] [Overview of Embodiments]

[0010] A charged particle beam device has a charged particle gun that emits a charged particle beam. For example, in the case of a Scanning Electron Microscope (SEM), it has an electron gun. In addition, the charged particle gun has a charged particle source, and a charged particle beam emitted from the charged particle source is ejected from the charged particle gun. In the case of an SEM, an electron beam is emitted from an electron source equipped in the electron gun and ejected from the electron gun. For example, a tungsten crystal is used as the electron source.

[0011] Recently, to achieve high throughput using high-current probes, many short-focus or magnetic field superposition type charged particle guns have been developed, in which the distance between the charged particle source and the focusing lens is short. In charged particle beam devices, it is important to provide a movement mechanism to adjust the position of the charged particle source. This is because the position of the charged particle source may deviate from the design position due to assembly tolerances and other factors. In the case of SEMs, if the position of the electron source deviates, the opening angle or aberration coefficient of the sample image changes from the design values, which can be considered a cause for failing to achieve the target resolution.

[0012] Therefore, in a charged particle beam device, it is desirable to have a mechanism for moving a charged particle source so that the charged particle source can move. Hereinafter, in this specification, the direction of travel of the charged particle beam emitted from the charged particle source is designated as the Z direction, and the first and second directions orthogonal to the Z direction are referred to as the X direction and the Y direction, respectively. By applying the technology of Patent Document 1 described above, it can be thought of realizing an ultra-high vacuum surface observation device having a mechanism based on a piezoelectric element capable of moving the charged particle source in the XYZ directions, respectively, within a vacuum chamber. Furthermore, by applying the technology of Patent Document 2, it can be thought of realizing an electron beam application device having a mechanism capable of moving the charged particle source in the XY directions, respectively, outside a vacuum chamber.

[0013] However, in a structure equipped with an XYZ movement mechanism using a piezoelectric element inside a vacuum chamber, as in the technology applied in Patent Document 1, a problem arises in that it imposes a limitation on the baking temperature of the charged particle gun. In a charged particle gun, it is common practice to maintain the interior at a high vacuum to ultra-high vacuum to allow the charged particle beam to pass through. Therefore, it is common practice to perform a baking process on the charged particle gun. If a piezoelectric element is installed inside the vacuum chamber, the upper limit of the baking temperature is lowered, and it is conceivable that the degassing of the charged particle gun cannot be sufficiently performed, resulting in a poor achievable vacuum level. It is also conceivable to equip an XYZ movement mechanism using a motor inside the vacuum chamber instead of a piezoelectric element, but in either case, the problem of the baking temperature being lowered arises.

[0014] Furthermore, in a structure where a mechanism for moving the position of a charged particle source is installed outside the vacuum chamber, as in the technology applied in Patent Document 2, a problem arises in that the positioning precision deteriorates due to the pressure difference. In particular, in order to move the position of a charged particle source in the Z direction from outside the vacuum chamber, it can be assumed that it is necessary to install a member that supports the charged particle source while isolating the inside and outside of the vacuum chamber, and to provide a mechanism for moving that member in the Z direction. However, since there is a pressure difference inside and outside the vacuum chamber, in order to move this member in the Z direction, it is necessary to move the member with a force exceeding the force due to atmospheric pressure. Under such conditions, it was difficult to precisely move the position of the charged particle source in the Z direction.

[0015] Meanwhile, in single-focus or magnetic field superposition type charged particle guns, the sensitivity of the positional misalignment of the charged particle source relative to the focusing lens is higher than that of conventional charged particle guns. For this reason, there is a demand to set the XYZ positions of the charged particle source with higher precision than in conventional methods. In particular, regarding the Z position, as the distance between the charged particle source and the focusing lens decreases, the longitudinal magnification of the optical system increases, making it important to determine the position with higher precision. It can be assumed that by applying the technology of Patent Document 2, it is possible to move the charged particle source in the XY direction from outside the charged particle gun. However, Patent Document 2 does not specifically explain in detail the method of moving the charged particle source in the Z direction.

[0016] To solve the above-mentioned problem, the charged particle gun and charged particle beam device provided in the present disclosure are equipped with a moving mechanism for moving a charged particle source support member. The moving mechanism is equipped with a first function for moving the charged particle source support member in the XYZ direction and a second function for moving the charged particle source support member from outside the vacuum chamber, separately from the first function.

[0017] In addition, the charged particle beam device provided by the present disclosure comprises a driving unit for adjusting the position of a charged particle source support member, a detector, and a user interface device, and is configured to enable the position of the charged particle source support member to be adjusted so that a parameter displayed on the user interface device becomes optimal.

[0018] According to an embodiment of the present disclosure, the second function is responsible for the force due to the pressure difference, and by the first function freed from atmospheric pressure, it becomes possible to adjust the position of the charged particle source support member in the three directions of XYZ. In the configuration of the present disclosure, since there is no need to install mechanisms such as piezoelectric elements or motors inside the vacuum chamber, the baking temperature of the charged particle gun can be raised to a high temperature to sufficiently degassing.

[0019] According to an additional embodiment of the present disclosure, it is possible to move a charged particle source in three directions of XYZ so that one or more parameters displayed on a user interface device are optimized.

[0020] Various embodiments will be described below with reference to the drawings. In the drawings described below, the same reference numerals are used for components having the same or similar functions, and descriptions may not be repeated.

[0021] In addition, the following embodiments exemplify the application of the charged particle beam device and charged particle gun primarily to SEM (Scanning Electron Microscope) and electron guns. However, the following embodiments are not limited to these and may also be applied to, for example, ion beam devices or ion guns.

[0022] [First embodiment]

[0023] FIG. 1 is a schematic diagram of an electron gun (100) according to a first embodiment. The electron gun (100) of this embodiment is an example of a charged particle beam device and is mainly applied to an SEM. At this time, the charged particle gun equipped in the charged particle beam device in the example described below is an electron gun, and likewise, the charged particle beam and the charged particle source are an electron beam and an electron source, respectively.

[0024] In FIG. 1, the electron gun (100) (charged particle gun, charged particle beam device) comprises a vacuum chamber (101), an electron source (103) (charged particle source), a condenser coil (105) (focusing lens), an electron source support member (106) (charged particle source support member), and a moving mechanism (107). A high vacuum space (102) is formed inside the vacuum chamber (101). The electron source (103) and the condenser coil (105) are installed inside the vacuum chamber (101). The electron source (103) emits an electron beam (104) (charged particle beam). Additionally, the condenser coil (105) is a coil that focuses the electron beam (104), which is a charged particle beam. That is, a magnetic field is generated by supplying current to the capacitor coil (105), and the electron beam (104) is focused by this magnetic field.

[0025] However, the electron beam (104) does not necessarily need to be focused by a magnetic field, and it is also possible to focus it by an electric field. In that case, two or more electrodes (not shown) having a potential difference can be placed instead of the capacitor coil (105). Also, the component that focuses the electron beam (capacitor coil (105) or the electrodes described above) does not need to be installed inside the electron gun (100), but may be installed in a barrel (not shown) located below the electron gun (100).

[0026] The electron source (103) is supported directly or indirectly inside the vacuum chamber (101) by the electron source support member (106). Here, the meaning of the expression "supported directly or indirectly" is explained. The electron source support member (106) is made of a metal such as, for example, SUS (stainless steel) and has a cylindrical shape. It is possible to support the electron source (103) by joining the electron source (103) to the bottom of the electron source support member (106). In this form, it can be said that the electron source support member (106) directly supports the electron source (103).

[0027] In addition, as another method, it is conceivable to support the electron source (103) by making the electron source support member (106) into an insulator, and by having the electron source support member (106) further equipped with a metal wire and joining the metal wire to the electron source (103). In this form, it can be said that the electron source support member (106) indirectly supports the electron source (103) through the metal wire. In the example of FIG. 1, the electron source support member (106) is shown to directly support the electron source (103), but as described above, a form may be adopted in which another member on which the electron source support member (106) is installed supports the electron source (103).

[0028] The moving mechanism (107) moves the electron source support member (106) in the XYZ direction. Here, "moving in the XYZ direction" means moving the electron source support member (106) by a desired distance in each of the three directions: X direction, Y direction, and Z direction. In FIG. 1, the electron source support member (106) is held in the vacuum chamber (101) via the moving mechanism (107), but the electron source support member (106) may be held directly in the vacuum chamber (101).

[0029] Here, the moving mechanism (107) has a first function of moving the electron source support member (106) in the XYZ direction and, separately from this first function, a second function of moving the electron source support member (106) from outside the vacuum chamber (101). Here, "outside the vacuum chamber (101)" means an environment of external pressure that is not in contact with the high vacuum space (102).

[0030] By providing the second function described above, the force generated by the pressure difference between the outside of the vacuum chamber (101) and the first function can be offset. Accordingly, when moving the electron source support member (106) to a desired position in the XYZ direction by the first function, it is possible to achieve precise position determination.

[0031] [Second embodiment]

[0032] FIG. 2 is a schematic diagram of an electron gun (100) according to a second embodiment.

[0033] In the second embodiment, the moving mechanism (107) comprises a first moving device (10) and a second moving device (30). The first moving device (10) realizes a first function of moving the electron source support member (106) in the XYZ direction. Additionally, the second moving device (30) realizes a second function of moving the electron source support member (106) in the Z direction separately from the first moving device (10).

[0034] Here, the second moving device (30) is installed outside the vacuum chamber (101). The second moving device (30) applies a force to the electron source support member (106) that counteracts the force generated by the pressure difference, thereby freeing the first moving device (10) from the force caused by the pressure difference. In that state, the first moving device (10) moves the electron source support member (106) to a desired position in the XYZ direction. By doing so, it is possible to achieve precise position determination when moving the electron source support member (106) by the first moving device (10). The configuration of the second embodiment other than that described above is the same as that of the first embodiment.

[0035] [Third Embodiment]

[0036] FIG. 3 is a schematic perspective view of a key part of an electron gun (100) according to a third embodiment. Specifically, FIG. 3 shows a second moving device (30), a part of the upper surface of a vacuum chamber (101), and a part of an electron source support member (106) of the electron gun (100). The third embodiment provides a specific configuration of the second moving device (30) in the second embodiment. As shown in FIG. 3, the second moving device (30) is installed outside the vacuum chamber (101), that is, above the vacuum chamber (101).

[0037] The electron source support member (106) and the vacuum chamber (101) are connected through a connecting member (112). The connecting member (112) is a member that enables movement of the electron source support member (106) in the XYZ direction while maintaining the vacuum state of the vacuum chamber (101), and can be configured, for example, using a bellows.

[0038] In the example of the city, the second moving device (30) is equipped with a cylindrical part (32) and three female screws (34). The cylindrical part (32) is formed in a cylindrical shape, and through holes (not marked) are formed along the Z direction at three equal positions in the rotational direction, and female screws are threaded into these through holes (not shown).

[0039] Additionally, the cylindrical portion (32) is in contact with the cylindrical electron source support member (106) on its inner surface and is fixed to the electron source support member (106). Each cylindrical screw (34) is formed approximately cylindrically, and a male screw is formed on its outer surface (not shown). Each cylindrical screw (34) is inserted and passes through a through hole formed in the cylindrical portion (32) while being screw-coupled. The lower end of each cylindrical screw (34) is in contact with the upper surface of the vacuum chamber (101).

[0040] When the lower end of the immersion screw (34) is in contact with the upper surface of the vacuum chamber (101) and the immersion screw (34) is rotated, a force is applied to the electron source support member (106) in the negative direction of the Z-axis through the cylindrical part (32). By rotating the immersion screw (34) by an appropriate amount, the force due to atmospheric pressure applied to the electron source support member (106) is canceled out. As a result, the electron source support member (106) can be precisely positioned by the first moving device (10) (see FIG. 2) which is freed up.

[0041] Additionally, regarding the second moving device (30), a component such as a screw or block (not shown) other than the simulacrum screw (34) may be installed. That is, by using these components, it is possible to operate the second moving device (30) and, at the same time, offset the force due to atmospheric pressure applied to the first moving device (10) (see FIG. 2). For example, one can conceive of a male screw being cut on the circumferential surface of the electron source support member (106) and a female screw being cut on the inner circumferential surface of the cylindrical part (32), and screw-couple the two. By doing so, by rotating the cylindrical part (32), a force in the negative direction of the Z-axis can be applied to the electron source support member (106), and it is possible to offset the force due to atmospheric pressure applied to the first moving device (10).

[0042] [Fourth embodiment]

[0043] FIG. 4 is a schematic cross-sectional view of a key part of an electron gun (100) according to a fourth embodiment. That is, FIG. 4 mainly shows the first moving device (10) and the surrounding part of the electron gun (100).

[0044] The first moving device (10) illustrated in FIG. 4 is equipped with a rotating member (12), a projection (14), and a female screw (16). Additionally, the electron source support member (106) has a male screw portion (106a) with a male screw cut on its circumferential surface. The rotating member (12) is formed, for example, in a cylindrical shape, and a female screw (not marked) is cut on its inner circumferential surface. By screwing this female screw with the male screw portion (106a) of the electron source support member (106), the rotating member (12) is mounted on the electron source support member (106).

[0045] The protrusions (14) are installed around the rotating member (12) at four positions in the rotational direction, namely positive and negative positions in the X direction and positive and negative positions in the Y direction. However, in FIG. 4, only two protrusions (14) installed at the positive and negative positions in the X direction are shown. Each protrusion (14) is installed to protrude upward from the upper surface of the vacuum chamber (101). In addition, a through hole (not shown) is formed in each protrusion (14) facing from the outer side of each protrusion (14) toward the inner side, and a female screw is formed in these through holes.

[0046] Four simulant screws (16) are installed in total and are screw-coupled to through holes (not shown) formed in each projection (14). However, only two simulant screws (16) are shown in FIG. 4. When the simulant screw (16) is rotated, the tip of the simulant screw (16) moves in the direction of pushing the rotating member (12), thereby moving the electron source support member (106). For example, when the two simulant screws (16) shown in FIG. 4 are rotated, they move the electron source support member (106) in the X direction through the rotating member (12).

[0047] Here, a procedure for determining the position of an electronic source support member (106) using a first moving device (10) and a second moving device (30) is described.

[0048] · Procedure #1: First, in the first moving device (10), the screw (16) is loosened so that no force from the screw (16) is applied to the rotating member (12). Then, the rotating member (12) is rotated in the release direction to separate the rotating member (12) from the upper surface of the vacuum chamber (101).

[0049] · Step #2: Next, the second moving device (30) is used to perform a rough adjustment of the Z-direction position of the electron source support member (106). When the electron source support member (106) is moved in the Z-direction by the second moving device (30), the rotating member (12) also moves along with the electron source support member (106). In the rough adjustment, the Z-direction position of the electron source support member (106) should be set slightly lower than the ideal position.

[0050] · Step #3: Next, in the first moving device (10), as the rotating member (12) is rotated in the tightening direction, the rotating member (12) eventually comes into contact with the upper surface of the vacuum chamber (101). In this contact state, as the rotating member (12) is further rotated in the tightening direction, the electron source support member (106) gradually moves upward.

[0051] Conversely, when the rotating member (12) is in contact with the vacuum chamber (101) and the rotating member (12) is rotated in the release direction, the electron source support member (106) gradually moves downward. By doing so, fine adjustment of the Z-direction position of the electron source support member (106) is performed by operating the rotating member (12). As described above, the force due to atmospheric pressure applied to the electron source support member (106) is almost offset by the second moving device (30) (e.g., the one in FIG. 3). Therefore, the user can rotate the rotating member (12) with a relatively weak force. By doing so, the user can operate the rotating member (12) to make precise Z-direction position adjustment of the electron source support member (106).

[0052] · Step #4: Next, the X and Y direction positioning of the electron source support member (106) is adjusted by rotating the four homing screws (16).

[0053] In this way, according to the present embodiment, the user can finely adjust the Z-direction position of the electron source support member (106) by using the first moving device (10) after freeing the first moving device (10) from atmospheric pressure by the second moving device (30) and by operating the rotating member (12). According to the present embodiment, since there is no need to include a piezoelectric element or the like inside the vacuum chamber (101), baking of the vacuum chamber (101) at a high temperature is possible, and an electron gun (100) capable of moving the electron source (103) in the Z-direction can also be configured. Furthermore, the configuration of the fourth embodiment other than that described above is the same as any one of the first to third embodiments.

[0054] [Fifth embodiment]

[0055] FIG. 5 is a schematic diagram of an electron gun (100) according to a fifth embodiment.

[0056] The fifth embodiment is one in which a position determining part (130) is installed in any of the second to fourth embodiments. This position determining part (130) is a device that determines the position in the Z direction of an electron source support member (106) adjusted by a first moving device (10) (see FIG. 2). In FIG. 5, the position determining part (130) is equipped with a pad part (131), a micrometer (132), a conductivity detection part (133), and a micrometer support member (136).

[0057] The micrometer support member (136) is provided with an insulating part (136a) and a mounting part (136b). The mounting part (136b) is mounted on the micrometer support member (136) and supports the insulating part (136a). The insulating part (136a) is formed in a circular shape from an insulating material such as resin, and a female screw (not shown) is formed on its inner surface.

[0058] The micrometer (132) is provided with a male screw portion (132a) formed in the shape of a male screw, and the male screw portion (132a) is screw-coupled to an insulating portion (136a). As a result, the tip of the male screw portion (132a) of the micrometer (132) protrudes downward from the micrometer support member (136). The micrometer (132) measures the length of the protrusion of the male screw portion (132a) from the micrometer support member (136).

[0059] The pad portion (131) is a sheet-shaped member mounted on the upper surface of the vacuum chamber (101) and comprises an insulating sheet portion (131a) and a conductor sheet portion (131b). The insulating sheet portion (131a) is an insulator formed into a sheet shape using resin or the like and is mounted on the upper surface of the vacuum chamber (101). Additionally, the conductor sheet portion (131b) is a sheet-shaped conductor bonded to the upper surface of the insulating sheet portion (131a).

[0060] The conductivity detection unit (133) detects whether the pad unit (131) and the micrometer (132) are in contact. More specifically, the conductivity detection unit (133) detects whether the male screw unit (132a) of the micrometer (132) and the conductor sheet unit (131b) of the pad unit (131) are conductive.

[0061] Here, the method of using the position specification part (130) is described. First, the micrometer (132) is operated so that the protrusion length from the micrometer support member (136) of the male screw part (132a) becomes a length corresponding to the desired Z-direction position of the electron source support member (106). Next, the electron source support member (106) is moved by the first moving device (10) (see FIG. 2). Then, the conductivity detection part (133) detects that the pad part (131) and the micrometer (132) have come into contact with an appropriate amount of movement. At that time, the Z-direction position of the electron source support member (106) can be fixed. In this way, by providing the position specification part (130), the electron source support member (106) can be moved while quantitatively detecting the position of the electron source support member (106).

[0062] [Sixth embodiment]

[0063] FIG. 6 is a schematic diagram of an electron gun (100) according to a sixth embodiment.

[0064] The electron gun (100) of the present embodiment is equipped with a vacuum chamber (101), an electron source (103), a capacitor coil (105), an electron source support member (106), and a moving mechanism (107), just like that of the first embodiment (see FIG. 1). In addition, the electron gun (100) of the present embodiment is equipped with a driving unit (210) and a controller (208).

[0065] The controller (208) outputs a position command signal that commands the position of the electronic source support member (106). The driving unit (210) drives the moving mechanism (107) based on the position command signal. For example, when the second moving device (30) shown in FIG. 3 is adopted, the controller (208) and the driving unit (210) can rotate the ion screw (34) with a motor (not shown).

[0066] In addition, when the first moving device (10) shown in FIG. 4 is adopted, the controller (208) and the driving unit (210) can rotate the rotating member (12) and the protrusion (14) by a motor (not shown). In addition, a suitable actuator (not shown) can be installed in place of the rotating member (12) and the screw (16), and the controller (208) and the driving unit (210) can move the electron source support member (106) by driving this actuator. In this way, by providing the controller (208) and the driving unit (210), the user does not need to directly adjust the position of the electron source support member (106), and effects such as a reduction in maintenance time are obtained.

[0067] In addition, in FIG. 4, when a motor or actuator is applied instead of the rotating member (12) and the screw (16), it is clear that the temperature constraint during baking described as a problem in all cases is not a problem in this embodiment. This is because the moving mechanism (107) in the present disclosure can adjust the position of the electron source support member (106) from outside the vacuum chamber (101).

[0068] At the installation location of the moving mechanism (107) outside the vacuum chamber (101), the temperature does not rise as much as inside the vacuum chamber (101), and a motor or actuator can be installed. Additionally, if necessary, the motor or actuator can be made to be detachable during baking.

[0069] In addition, when using control by actuators or motors, interlocking control may be employed to allow automatic movement in the X or Y directions while also enabling movement in the Z direction.

[0070] [Seventh Embodiment]

[0071] FIG. 7 is a schematic diagram of a charged particle beam device (200) according to the seventh embodiment. As with the first to sixth embodiments, the charged particle beam device (200) can be applied, for example, to an SEM.

[0072] The charged particle beam device (200) is equipped with an electron gun (100), a vacuum chamber (201), an aperture (202), a capacitor coil (203), and a detector (204). A sample (205) is placed at a predetermined location in the vacuum chamber (201). The configuration of the electron gun (100) is the same as that of the first embodiment. And, the high vacuum space (102) of the vacuum chamber (101) is connected to the internal space of the vacuum chamber (201).

[0073] An electron beam (104) emitted by an electron gun (100) is guided to a downstream vacuum chamber (201), focused, and irradiated onto a sample (205). At that time, after the electron beam (104) is focused by a capacitor coil (105), it is cut by an aperture (202), further focused by a capacitor coil (203), and irradiated onto the sample (205).

[0074] However, what is shown in this embodiment is an example of an optical system that irradiates a sample with a focused charged particle beam and does not limit the present disclosure. For example, the charged particle beam device (200) may be equipped with an electrode instead of a capacitor coil (203), may focus an electron beam (104) by an electric field, or may be equipped with both a capacitor coil (203) and an electrode.

[0075] Regarding the member that focuses the electron beam (104), it is possible to consider installing one or more of them. Regarding the aperture (202), two or more may also be installed. Additionally, as with the other embodiments described above, the capacitor coil (105) or the aperture (202) may be installed either inside or outside the electron gun (100).

[0076] A focused electron beam (104) is irradiated onto a sample (205), and a detector (204) detects a signal generated by the irradiation of the electron beam. Here, various types of signals can be considered as the detected signals. In the SEM of this embodiment, secondary electrons emitted from the sample are typically detected, but in the case of a TEM (Transmission Electron Microscope), transmitted electrons that interact with the sample, and depending on the application, electromagnetic waves such as X-rays or cathode luminescence can also be detected.

[0077] In FIG. 7, the detector (204) detects secondary electrons emitted from the sample (205) having a component in the negative direction of the Z-axis. However, as previously explained, various things can be considered as detection targets, and the scope of the present disclosure is not limited by the configuration of FIG. 7. The signal detected by the detector (204) is input into a computer system (207) and, after processing, is displayed on a GUI device (206) (user interface device) equipped with a GUI (Graphical User Interface) function.

[0078] In this embodiment, the position of the electron source support member (106) can be adjusted using a moving mechanism (107) while referring to one or more signals displayed on the GUI device (206). As for the signals displayed on the GUI device (206), for example, an image obtained by irradiating an electron beam (104) or a current value obtained by capturing an electron beam (104) can be considered.

[0079] For adjusting the position of the electron source support member (106) while viewing the GUI device (206), for example, the following method can be considered. In the adjustment step of the charged particle beam device (200) after mounting the electron gun (100), it can be assumed that the axes of the electron source (103) and the aperture (202) do not align due to assembly tolerances. Therefore, their axes are aligned. First, the axis of the member below the aperture (202) is adjusted in advance so that it aligns with the center of the screen on the GUI device (206).

[0080] Next, no current is passed through the capacitor coils (105, 203), and the electron beam emitted from the sample (205) is displayed on the GUI device (206). If the axes of the electron source (103) and the aperture (202) are not aligned, the image of the electron beam emitted from the sample (205) is displayed in a part that is off-center from the screen center of the GUI device (206). Therefore, the electron source support member (106) is moved using the XY movement mechanism of the movement mechanism (107) so that the image of the electron is positioned at the screen center of the GUI device (206). By doing so, it is possible to align the axis of the electron source (103) with the axis of the aperture (202).

[0081] In addition, there are adjustment methods using the movement function in the Z direction of the moving mechanism (107), such as the following. First, the current value of the capacitor coil (105, 203) is adjusted so that the electron beam emitted from the Z coordinate of the desired electron source (103) is focused onto the sample (205). Here, if the Z coordinate of the electron source (103) is not at the desired position, the SEM image displayed on the GUI device (206) becomes blurry. In this case, the Z coordinate of the electron source (103) can be adjusted using the movement function in the Z direction of the moving mechanism (107) so that the SEM image is in focus. By doing so, it is possible to adjust the Z coordinate of the electron source (103) to the desired position.

[0082] [Eighth Embodiment]

[0083] FIG. 8 is a schematic diagram of a charged particle beam device (200) according to the eighth embodiment.

[0084] In this embodiment, the moving mechanism (107) is configured in the same way as that of the second embodiment (see FIG. 2). That is, the moving mechanism (107) is equipped with a first moving device (10) and a second moving device (30) that moves the electron source support member (106) in the Z direction from outside the vacuum chamber (101). The configuration of this embodiment other than that described above is the same as that of the seventh embodiment (see FIG. 7). According to this embodiment, just like the second embodiment described above, it is possible to configure an electron gun (100) that can adjust the electron source support member (106) in three directions of XYZ without causing a restriction on the baking temperature.

[0085] [9th embodiment]

[0086] FIG. 9 is a schematic diagram of a charged particle beam device (200) according to the ninth embodiment.

[0087] In this embodiment, the charged particle beam device (200) is configured similarly to that of the eighth embodiment (see FIG. 8), and further comprises a controller (208) and a driving unit (210). Similar to that of the sixth embodiment (see FIG. 6), the controller (208) outputs a position command signal that commands the position of the electron source support member (106). Additionally, the driving unit (210) drives a moving mechanism (107) based on the position command signal.

[0088] In this embodiment, the user can remotely operate the moving mechanism (107) through the controller (208) and the driving unit (210). By doing so, the position of the electron source support member (106) can be adjusted so that various parameters are optimized while referring to the SEM image displayed on the GUI device (206). Furthermore, the position adjustment of the electron source support member (106) is not limited to manual operation by the user, but may also be performed automatically by the computer system (207).

[0089] [Computer Components]

[0090] FIG. 10 is a block diagram of a computer (980). The GUI device (206), computer system (207), and controller (208) shown in FIG. 6 to 9 all have one or more of the computer (980) shown in FIG. 10.

[0091] In FIG. 10, the computer (980) is equipped with a CPU (981), a memory unit (982), a communication I / F (interface) (983), an input / output I / F (984), and a media I / F (985).

[0092] Here, the memory unit (982) is equipped with RAM (982a), ROM (982b), and SSD (Solid State Drive) (982c). The communication I / F (983) is connected to the communication circuit (986). The input / output I / F (984) is connected to the input / output device (987). The media I / F (985) reads and writes data from the recording medium (988). The ROM (982b) stores the Initial Program Loader (IPL) executed by the CPU. The SSD (982c) stores the control program and various data. The CPU (981) realizes various functions by executing the control program, etc., read from the SSD (982c) into the RAM (982a).

[0093] [Variation Example]

[0094] The present disclosure is not limited to the embodiments described above, and various modifications are possible. The embodiments described above are examples provided to facilitate understanding of the present disclosure and are not limited to having all the configurations described. Furthermore, it is possible to substitute a part of the configuration of one embodiment with a part of another embodiment, and it is also possible to add a part of another embodiment to a part of one embodiment. Additionally, it is possible to delete a part of the configuration of each embodiment, or to add or replace it with other configurations. Furthermore, control lines and information lines shown in the drawings are those deemed necessary for explanation and cannot be said to represent all control lines and information lines necessary for the product. In reality, it can be assumed that almost all configurations are interconnected. Possible modifications to the above embodiments are, for example, as follows.

[0095] (1) In each of the above embodiments, the placement position or number of capacitor coils (105, 203) may be appropriately changed, and as described above, capacitor coils (105, 203) may be replaced with electrodes.

[0096] (2) Since the hardware of the GUI device (206), computer system (207), and controller (208) in each of the above embodiments can be realized by a general computer, the program that executes the various processes described above may be stored in a storage medium (a computer-readable recording medium that records the program) or distributed through a transmission line.

[0097] (3) Various processing performed on the GUI device (206), computer system (207), and controller (208) in each of the above embodiments is described as software processing using a program in the above embodiments, but some or all of it may be replaced with hardware processing using an ASIC (Application Specific Integrated Circuit; IC for specific purposes) or FPGA (Field Programmable Gate Array), etc.

[0098] (4) Various processing performed on the GUI device (206), computer system (207), and controller (208) in each of the above embodiments may be performed on a server computer via a network not shown, and various data stored in the above embodiments may also be stored on the server computer.

[0099] [Effect of the embodiment]

[0100] According to the embodiment described above, the moving mechanism (107) in the charged particle beam device (100, 200) has a first function of moving the charged particle source support member (106) in the X direction, Y direction, and Z direction, and a second function of moving the charged particle source support member (106) from outside the vacuum chamber (101) in the Z direction separately from the first function. As a result, since the force in the Z direction applied to the charged particle source support member (106) can be handled by the first function and the second function, high-precision position adjustment is possible by both, and appropriate position adjustment of the charged particle source can be realized.

[0101] Additionally, the moving mechanism (107) comprises a first moving device (10) having a first function and a second moving device (30) having a second function, and it is further preferable that the second moving device (30) be installed outside the vacuum chamber (101). In this way, by installing the second moving device (30) outside the vacuum chamber (101), it becomes possible to easily handle the second moving device (30) and to suppress the temperature of the second moving device (30).

[0102] Additionally, the charged particle source support member (106) has a cylindrical shape having a male screw portion (106a) formed on its outer surface, and the first moving device (10) is further preferably equipped with a rotating member (12) that has a female screw portion that screws with the male screw portion (106a) and moves the charged particle source support member (106) in the Z direction when rotated. By doing so, the charged particle source support member (106) can be moved by rotating the rotating member (12).

[0103] In addition, it is further preferable to provide a position specifying part (130) that specifies the position of the charged particle source support member (106) adjusted by the first moving device (10). By doing so, the charged particle source support member (106) can be moved while quantitatively detecting the position of the charged particle source support member (106).

[0104] Additionally, the charged particle beam device (100, 200) is further preferably equipped with a controller (208) that outputs a position command signal for commanding the position of a charged particle source support member (106), and a driving unit (210) that drives a moving mechanism (107) based on the position command signal. By doing so, the user can remotely operate the moving mechanism (107).

[0105] Additionally, according to another aspect, the charged particle beam device (200) of the 7th to 9th embodiments comprises one or more detectors (204) for detecting charged particles that have passed through a sample (205), charged particles emitted from the sample (205), or electromagnetic waves emitted from the sample (205), and a user interface device (206). The user interface device (206) has a function of displaying an output signal when the detector (204) detects a charged particle or electromagnetic wave, and a function of adjusting the position of a charged particle source (103) by a moving mechanism (107) based on user operation. Accordingly, the user can adjust the position of the charged particle source (103) by the moving mechanism (107) while referring to various signals displayed on the user interface device (206). Explanation of the symbols

[0106] 10 First moving device 12 Rotating member 30 Second moving device 100 electron gun (charged particle gun, charged particle beam device) 101 Vacuum chamber 103 Electron source (charged particle source) 104 Electron beam (charged particle beam) 105 Condenser coil (focusing lens) 106 Electron source support member (charged particle source support member) 106a Male screw part 107 Moving mechanism 130 Position-specific part 200 Charged particle beam device 203 Capacitor coil (focusing lens) 204 Detector 205 samples 206 GUI device (User Interface device) 208 Controller 210 Drive Unit

Claims

Claim 1 A charged particle beam device comprising a charged particle gun for irradiating a charged particle beam and a focusing lens, wherein the focusing lens focuses charged particles by an electric or magnetic field and irradiates them onto a sample, and the charged particle gun comprises a charged particle source for emitting charged particles, a vacuum chamber surrounding the charged particle source, a charged particle source support member for directly or indirectly supporting the charged particle source, and a moving mechanism for moving the charged particle source support member, wherein the moving mechanism has the direction of travel of the charged particles emitted from the charged particle source as the Z direction, the direction orthogonal to the Z direction as the X direction, and the direction orthogonal to the Z direction and the X direction as the Y direction, and (i) a mechanism for moving the charged particle source support member in the X direction, the Y direction, and the Z direction as a first moving function, and (ii) a mechanism for moving the charged particle source support member in the Z direction from outside the vacuum chamber as a second moving function, thereby the A charged particle beam device characterized in that the second moving function is responsible for the force in the Z direction generated by the pressure difference between the inside and outside of the vacuum chamber, while the first moving function, which is mechanically blocked, is not responsible for the force in the Z direction. Claim 2 A charged particle beam device according to claim 1, wherein the moving mechanism comprises a first moving device having the first moving function and a second moving device having the second moving function, and wherein the second moving device is installed outside the vacuum chamber. Claim 3 A charged particle beam device according to claim 2, wherein the charged particle source support member has a cylindrical shape having a male screw portion formed with a male screw on its outer surface, and the first moving device has a female screw portion that screw-couples with the male screw portion and is equipped with a rotating member that moves the charged particle source support member in the Z direction when rotated. Claim 4 A charged particle beam device characterized by further comprising, in paragraph 2 or 3, a position specifying part for specifying the position of the charged particle source support member adjusted by the first moving device. Claim 5 A charged particle beam device according to claim 4, further comprising a controller that outputs a position command signal for commanding the position of the charged particle source support member, and a driving unit that drives the moving mechanism based on the position command signal. Claim 6 A charged particle beam device for irradiating a sample with a focused charged particle beam comprises a charged particle source that emits charged particles, a vacuum chamber surrounding the charged particle source, a charged particle source support member that directly or indirectly supports the charged particle source, a moving mechanism for moving the charged particle source support member, one or more detectors for detecting charged particles that have passed through the sample, charged particles emitted from the sample, or electromagnetic waves, and a user interface device. The user interface device comprises a function for displaying an output signal of the detector and a function for adjusting the position of the charged particle source by the moving mechanism based on user operation. The moving mechanism has the direction of travel of the charged particles emitted from the charged particle source as the Z direction, the direction orthogonal to the Z direction as the X direction, and the direction orthogonal to the Z direction and the X direction as the Y direction. (i) a first moving function for moving the charged particle source support member in the X direction, the Y direction, and the Z direction within the vacuum chamber, and (ii) of the vacuum chamber A charged particle beam device characterized by having a second movement function that moves the charged particle source support member in the Z direction from the outside, wherein the second movement function is responsible for the force in the Z direction generated by the pressure difference inside and outside the vacuum chamber, while the first movement function, which is mechanically blocked, is not responsible for the force in the Z direction. Claim 7 delete Claim 8 A charged particle beam device according to claim 6, wherein the moving mechanism comprises a first moving device having the first moving function and a second moving device having the second moving function, and wherein the second moving device is installed outside the vacuum chamber. Claim 9 A charged particle beam device according to claim 6 or 8, further comprising a controller that outputs a position command signal that commands the position of the charged particle source support member, and a driving unit that drives the moving mechanism based on the position command signal. Claim 10 A charged particle source that emits charged particles, a vacuum chamber surrounding the charged particle source, a charged particle source support member that directly or indirectly supports the charged particle source, and two movement mechanisms, a first movement mechanism and a second movement mechanism, for moving the charged particle source support member; wherein the charged particle source support member has a cylindrical shape having a male screw portion formed by a male screw on its outer surface, and the first movement mechanism has a female screw portion that screws into the male screw portion, and a rotating member that, when rotated, moves the charged particle source support member in the Z direction, which is the direction of travel of the charged particles emitted from the charged particle source, and furthermore, the movement mechanism defines the Z direction and the X and Y directions orthogonal thereto, and then has a first movement function for moving the charged particle source support member in the X direction, the Y direction, and the Z direction within the vacuum chamber, and a second movement function for moving the charged particle source support member in the Z direction from outside the vacuum chamber, and the inside and outside of the vacuum chamber A charged particle gun characterized in that the second moving function is responsible for the force in the Z direction generated by the pressure difference, while the first moving function, which is mechanically blocked, is not responsible for the force in the Z direction. Claim 11 delete

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