Apparatus for Ion Energy Analysis of Plasma Processes

Abstract

A device for measuring ion energy distribution (ied) in a plasma processing system, comprising: a substrate disposed within the plasma processing system and exposed to plasma; an ion energy analyzer disposed on the substrate to measure ion energy distribution on the substrate surface during plasma processing, each comprising a first conductive grid (g0), a second conductive grid (g1), a third conductive grid (g2), a fourth conductive grid (g3), and a current collecting electrode (c), each separated from one another by an insulating layer; a battery power supply and a control circuit integrated within the substrate for supplying and controlling voltage to each grid and current collecting electrode of the ion energy analyzer; and a peripheral portion of at least one insulating layer having a smaller thickness compared to the rest of the insulating layer.

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