Ion gun for semiconductor manufacturing equipment

Description

Draw 15 The item that is the subject of the design Ion gun for semiconductor manufacturing equipment Description of the design 1. The material is metal, synthetic resin, or ceramic. 2. The present invention relates to an ion gun for a semiconductor manufacturing apparatus that is mounted on the semiconductor manufacturing apparatus and selectively removes a deposited film by irradiating a local area on a deposited film formed on a semiconductor wafer with an ion beam. The tip from which the ion beam is emitted is shaped like an arc with an outer edge, allowing it to approach the surface of the deposited film, which is the target of ion beam irradiation, at a low angle (e.g., 5 to 10 degrees). 3. Drawings 1 to 7 are a perspective view, front view, rear view, left side view, right side view, top view, and bottom view of the present design, respectively. 4. The combination of the shape and form of the "ion gun for semiconductor manufacturing equipment" is the key point of the design creation content.

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