Method of plasma spheroidization of tantalum powder

KZ12811UUndetermined Publication Date: 2026-08-21NON-COMMERCIAL JOINT CO EAST KAZAKHSTAN TECH UNIV NAMED AFTER D SERIKBAYEV
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Patent Information

Application Number
KZ20261215
Authority / Receiving Office
KZ · KZ
Patent Type
Utility models
Current Assignee / Owner
Filing Date
2026-05-28
Publication Date
2026-08-21
Estimated Expiration
2034-05-28
Patent Text Reader

Abstract

The utility model relates to the field of powder metallurgy, in particular to methods for producing spherical powders of refractory metals by plasma treatment, and can be used to prepare raw materials for additive technologies, the manufacture of magnetron sputtering targets, tantalum capacitors and medical implants. The objective of the claimed utility model is to obtain spherical tantalum powder with a narrow particle size distribution and improved flowability, suitable for use in additive technologies. The technical result of using the claimed utility model is the formation of a spherical tantalum powder with a narrowed particle size distribution, a reduced specific surface area, and the preservation of metallic tantalum with a body-centered cubic lattice as the main phase. The essence of the utility model is as follows. A method for plasma spheroidization of tantalum powder is proposed, which includes melting particles of the initial powder in a flow of induction plasma and crystallization of droplets of the melt in a jet of carrier gas, characterized in that the initial material used is a powder of metallic tantalum with a particle size distribution of D10 = 9-10 μm, D50 = 30-32 μm, D90 = 65-67 μm; argon is used as the plasma-forming, protective and carrier gases; The treatment is carried out at a high-frequency induction plasma torch power of 15 kW, a plasma-forming argon flow rate of 10 standard liters per minute, a protective argon flow rate of 30 standard liters per minute, a pressure in the working chamber of 15 psi (1.03 atm) and a powder flow rate of 0.5 kg / h.
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