A method for preparing the self-healing high-entropy silicide
LU604758B1Active Publication Date: 2026-07-20XIANGTAN UNIV
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Patent Information
- Authority / Receiving Office
- LU · LU
- Patent Type
- Patents
- Current Assignee / Owner
- XIANGTAN UNIV
- Filing Date
- 2026-01-19
- Publication Date
- 2026-07-20
Abstract
The present invention discloses a method for preparing a self-healing high-entropy silicide (HES). The high-entropy silicide is (Zr0.2Ta0.2Ti0.2Nb0.2Hf0.2)Si2. The preparation method comprises weighing Zr powder, Ta powder, Ti powder, Nb powder, Hf powder, and Si powder according to a molar ratio of 0.2:0.2:0.2:0.2:0.2:2, respectively, and mixing them to obtain a mixed powder. The mixed powder is then placed into a spark plasma sintering (SPS) system and formed through a single-step sintering process. The high-entropy silicide ceramic of the present invention exhibits self-healing capability under long-term high-temperature service conditions. It not only possesses excellent oxidation resistance but also has self-healing properties. The preparation process is simple and easy to operate, and is expected to facilitate the transformation and application of theoretical research results.
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