Method for detecting at least one defect on a support, device and computer program associated

MA65162B2Active Publication Date: 2026-06-30AQC IND LLC

Patent Information

Authority / Receiving Office
MA · MA
Patent Type
Patents
Current Assignee / Owner
AQC IND LLC
Filing Date
2022-09-29
Publication Date
2026-06-30
Patent Text Reader

Abstract

Method for detecting at least one defect on a support such as a fabric or a brick, the method comprising:▪ Acquiring (ACQ) at least one first image of the support;▪ Generating a second image that corresponds to the 2D spectrum space of the at least one first image;▪ Shifting at least one selected frequency range from at least a first area of the 2D spectrum space toward a second area of the 2D spectrum space;▪ Filtering at least one frequency range of the 2D spectrum space to remove at least one predefined pattern of the support;▪ Shifting at least a selected frequency range from a second area of the new 2D spectrum space toward a first area of the new 2D spectrum space;▪ Reversing (RVRS) the transformation of the frequency domain of the new 2D spectrum space to obtain a final image.
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