Method for determining the thickness profile of optically transparent thin films

Abstract

A method for determining the thickness profile of optically transparent thin films based on Monochromatic light interferometry is developed in the present work. The method comprises an experimental part that allows the interference pattern to be obtained along an optically transparent thin film and a new data analysis method that connects the experimental results with the physical optic, which is implemented in software. The test sample has a flat side. The method improves the accuracy in determining the thickness profile of thin films of variable thickness. This method allows for greater accuracy in extremely thin film thickness measurements.