Dressing composition and dressing method

Abstract

Provided is a dressing composition capable of obtaining a magnetic disk substrate having a desired surface accuracy in polishing a substrate such as a magnetic disk substrate immediately after the dressing treatment of the polishing pad. The dressing composition is used for dressing the polishing pad, the dressing composition including: surfactant; and water, wherein the surfactant is an anionic surfactant including repeating units having aromatic group in the main chain, and sulfonic acid groups and / or sulfonic acid base groups bonded to the repeating units. The anionic surfactant is at least one selected from the group of a naphthalene sulfonic acid compound, a lignin sulfonic acid compound, an aromatic aminosulfonic acid compound, and salts thereof. [No suitable figure.]