Photosensitive composition containing polyvinyl alcohol

PK140759AUndetermined Publication Date: 2010-05-31KLLAN SPA
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Patent Information

Application Number
PK200800994
Authority / Receiving Office
PK · PK
Patent Type
Applications
Current Assignee / Owner
Publication Date
2010-05-31
Patent Text Reader

Abstract

A photosensitive composition includes polyvinyl alcohol (PVA), one or more synthetic resins, at least one cross-linking agent for the PVA, and a sensitizer component comprising at least one gelling agent and at least one photosensitive organic compound chosen from diazonium salts. The composition is suitable for the production of rotary printing cylinders, in particular in the textile field.
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