Photosensitive composition containing polyvinyl alcohol
PK140759AUndetermined Publication Date: 2010-05-31KLLAN SPA
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Patent Information
- Application Number
- PK200800994
- Authority / Receiving Office
- PK · PK
- Patent Type
- Applications
- Current Assignee / Owner
- Publication Date
- 2010-05-31
Abstract
A photosensitive composition includes polyvinyl alcohol (PVA), one or more synthetic resins, at least one cross-linking agent for the PVA, and a sensitizer component comprising at least one gelling agent and at least one photosensitive organic compound chosen from diazonium salts. The composition is suitable for the production of rotary printing cylinders, in particular in the textile field.
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