Optical high-pass edge filter and method of making such a filter

Abstract

The subject of the application is an optical high-pass edge filter and a method for making such a filter. The filter has a transparent substrate, preferably quartz or glass, on which an active layer is located, an AZO layer at least 50 nm thick, containing up to 10 atomic percent aluminum. The method involves first placing the cleaned transparent substrate in the ALD reactor chamber. The interior of the reactor chamber is then heated to a temperature of 50°C - 300°C, and at this temperature, an active AZO layer is deposited. Preferably, the aluminum precursor is TMA, the zinc precursor is DEZn (diethylzinc) or DMZn (dimethylzinc), and the oxygen precursor is water or ozone.