Method and system for applying thin coatings on dry material by magnetron sputtering

Abstract

The system for applying thin coatings on bulk material by magnetron sputtering is characterized in that it consists of a vacuum chamber (1) in which a nozzle (13) is located, connected to a cylinder (14) of technological gases, wherein the chamber (1) is connected to a pumping system (2) consisting of vacuum pumps, preferably two-stage vane pumps, and a turbomolecular pump and a set of control valves in order to obtain a negative pressure of not less than 5 • 10 -3mbar, and inside the chamber (1) a substrate positioning system is mounted centrally, which consists of a cuboid plate (5), fastened on both sides to the chamber (1) by means of springs (11), a replaceable cassette (6) is fastened to the plate (5) by means of fastening elements, having a cuboid outline and sloping side walls, open in the upper part, and from the bottom the plate (5) is connected to the drive by means of an eccentric (8) and a shaft with an external sleeve of the magnetic clutch, and the inner part of the magnetic clutch is connected to the motor (10) and is separated from the interior of the vacuum chamber (1) by means of a thin-walled element in the form of a "glass", and in the upper part above the plate (5) a magnetron launcher (3) is located, which is connected to the electric power supply system (12), and the magnetron launcher (3) has a target plate (4) attached at the bottom.