The process of preparing a sensor base made of glass material by coating it with a thin silicon dioxide film and using plasma techniques.
TH2301006103APending Publication Date: 2026-08-10NATIONAL SCIENCE TECHNOLOGY DEVELOPMENT AGENCY
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Patent Information
- Application Number
- TH2301006103
- Authority / Receiving Office
- TH · TH
- Patent Type
- Applications
- Current Assignee / Owner
- Filing Date
- 2023-09-25
- Publication Date
- 2026-08-10
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Abstract
OCR09WP19 / 02 / 2569 This invention presents a process for preparing sensor mounts made of glass material through coating. Thin silicon dioxide films and plasma techniques by coating thin silicon dioxide films onto... The glass substrate is prepared using the sputtering technique, followed by surface treatment of the substrate using gas plasma. Oxygen, with its post-surface refining process, is a unique characteristic of... This invention The process used in this invention involves improving the properties of the glass base by applying a film coating. Some silicon dioxide is then modified with gas plasma to improve the hydrophilic properties of the substrate surface. Oxygen causes the glass sensor base to have hydrophilic properties comparable to sensor bases made of other materials. Silicon wafers and colloidal particles can be arranged using a blade-scraping technique to create the desired structure. High-quality nanoscale technology makes the sensor base developed from this fabrication process suitable for... It has been developed into a sensor that relies on both its light-reflecting and translucent properties.
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