Self-cleaning finishing agents for silk and manufacturing processes.
TH27699UActive Publication Date: 2026-03-25SRINAKHARINWIROT UNIVERSITY
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Patent Information
- Application Number
- TH2303000447
- Authority / Receiving Office
- TH · TH
- Patent Type
- Utility models
- Current Assignee / Owner
- Filing Date
- 2023-02-14
- Publication Date
- 2026-03-25
- Estimated Expiration
- 2029-02-13
Abstract
------26 / 12 / 2568------(OCR) OCR 09WP This invention concerns a self-cleaning finishing compound for silk fabrics, consisting of 10-20% by weight titanium dioxide, 20-30% by weight silicon dioxide, 46-68% by weight distilled water, 1-2% by weight hydrochloric acid, and 1-2% by weight acetic acid. It also includes the preparation method of the self-cleaning finishing compound and the application process to the silk fabric using the dip-press-dry-seal technique.
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Claims
------26 / 12 / 2568------(OCR) OCR 09WP1.
1. A self-cleaning finish for silk fabrics containing 10-20% by weight titanium dioxide, 20-30% by weight silicon dioxide, 46-68% by weight distilled water, 1-2% by weight hydrochloric acid, and 1-2% by weight acetic acid.
2. The manufacturing process for the self-cleaning finish for silk fabrics as per claim 1 consists of the following steps: a) Prepare a titanium dioxide solution by mixing titanium dioxide, hydrochloric acid, acetic acid, and distilled water, then heating the mixture to 80-100°C for 30 minutes and continuing to mix without heating for 2 hours. b) Add silicon dioxide to the titanium dioxide solution and continue to mix without heating for 1 hour.