A low-e coating glass with high selectivity.

Abstract

The invention relates to a coated (20) glass (10) structured for use in architectural applications and vehicles.

Description

1 TARIFF A low-e coating glass with high selectivity. TECHNICAL AREA 5 The invention involves a glass that is translucent to daylight and heat-insulating, and contains infrared radiation. It involves a low-emissivity (low-e) coating with reflective layers. PREVIOUS TECHNIQUE 10 One of the factors that differentiates the optical properties of glasses is the treatment applied to the glass surface. These are coating applications. One of the coating applications is in a vacuum environment. It is a magnetic field-assisted sputtering method. Especially suitable for architectures with low-e properties. and is a frequently used method in the production of automotive coatings. The 15 mentioned Glass coated using this method exhibits properties in the visible, near-infrared, and infrared regions. Transmittance and reflectivity values ​​can be achieved at the targeted levels. In addition to transmittance and reflectivity values, coated glass also has a selectivity value. Selectivity is an important parameter. In ISO 9050 (2003) standard, visible area 20 The transmittance value is defined as the solar factor ratio. Coatings The selectivity values ​​also include the number of Ag layers and the nucleating layer used. type, at targeted levels through parametric optimizations of layers It can be held. Patent number EP4204378 describes at least one silver-based functional metallic compound. a transparent substrate coated with a stack containing at least two dielectric coatings It relates to a material containing layers. Each dielectric coating contains at least one dielectric It contains two layers. Thus, each functional metallic layer consists of two dielectric coatings. It is positioned between them, and is characterized by the fact that the stack contains the following: 30 - in contact with a silver-based functional metallic layer above and below. There are two inhibitory layers present, and these inhibitory layers are attached to a metal. 2 or one or more of the following selected materials: titanium, nickel, chromium, tantalum, zirconium, and niobium. The excess elements are selected from metallic layers based on metal alloys, - in contact with a barrier layer and that barrier A titanium nitride layer separated from a silver-based functional layer by a layering system. A BRIEF DESCRIPTION OF THE INVENTION The present invention eliminates the aforementioned disadvantages and the related technical It is about coated glass, aiming to bring new advantages to the field. The main aim of the invention is to produce coated glass with high selectivity values. to place. Another aim of the invention is to create a coated glass with a low emissivity value. to put. 15 Another aim of the invention is to create a coated glass with reduced internal and external reflection. to reveal. Another objective of the invention is to create a coated 20 with reduced external reflection and angular color change. It is about putting the glass on display. Another aim of the invention is to create a thermally treatable coated glass. All the objectives mentioned above and those that will emerge from the detailed explanation below are 25 The present invention can be used in architectural applications and vehicles. It is a coated glass, properly structured. Accordingly, the invention in question... This feature is designed to achieve the targeted transmittance, color, and reflection values. out of the window, in order - A sub-dielectric structure containing at least one layer with a high refractive index; 30 - A primary functional layer containing Ag; - A medium containing a fourth dielectric layer with an optical path of 100 nm and above. sub-dielectric structure - A second functional layer containing Ag; 3 - A medium containing a sixth dielectric layer with an optical path of 100 nm and above. superior dielectric structure - A third functional layer containing Ag; - It must contain a top dielectric structure with at least one layer having a high refractive index. A preferred configuration of the invention is the total optical structure of the mid-subdielectric. its path is at least 10% of the total optical path of the mid-upper dielectric structure (25). It is the excess. A preferred configuration of the invention is that the optical path of the sub-central dielectric structure is in the middle 10 The optical path of the top dielectric structure should not exceed 20%. A preferred configuration of the invention is a bottom dielectric structure and a top dielectric structure. The thickness of the supplied high refractive index material is medium and low refractive index. It is thinner than the materials. 15 A preferred configuration of the invention is that the sub-dielectric structure can be optionally a It contains an absorbent layer. A preferred configuration of the invention is a sub-dielectric structure with an absorber layer 20 It contains. BRIEF DESCRIPTION OF THE FIGURE Figure 1 shows a representative general view of coated glass. 25 REFERENCE NUMBERS GIVEN IN THE FIGURE Pine Coating 30 21 Sub-Dielectric Structure 211 First Dielectric Layer 2111Absorbent layer 212 Second Dielectric Layer 4 213 First Nucleating Layer 214 Lower Barrier Layers 22 First Functional Layer 23 Medium Sub-Dielectric Structure 231 First Barrier Layer 5 232 Third Dielectric Layer 233 Fourth Dielectric Layer 234 Second Nucleating Layer 24 Second Functional Layer Medium Top Dielectric Structure 10 251 Second Barrier Layer 252 Fifth Dielectric Layer 253 Sixth Dielectric Layer 254 Third Nucleating Layer 26 Third Functional Layer 15 27. Top Dielectric Structure 271 Upper Barrier Layer 272 Seventh Dielectric Layer 273 Eighth Dielectric Layer 274 Upper Dielectric Layer 20 DETAILED DESCRIPTION OF THE INVENTION In this detailed description, the subject of the invention is coated (20) glass (10) only the subject of the invention with examples that will not create any limiting effect on a better understanding. It is explained. Production of multilayer coated (20) glass (10) for architecture and automotive applications. This is achieved using the sputtering method (also known as splashing in technical terms). This invention is generally used as daylight-transmitting and heat-insulating glass (10), 30 multilayer coated (20) glasses (10), the multilayer coating mentioned (20) It is related to its content and application. The subject of the invention is multilayer coated (20) glass. (10), also in insulated glass units and laminated structures for the architectural and automotive sectors. It is available for use. The term "optical performance" mentioned in the invention refers to the second surface of a double-glazed unit. visible region light for multilayer coated glass (20) (10) in use. transmittance (hereinafter referred to as %Tvis), total solar energy transmittance (solar factor), visible region internal and external reflection values, and single glass 5 CIE L*, a*, b* color values ​​in use indicate the medium level. The term "transmittance" in double-glazed units describes a transmittance of 47% and above, while "high transmittance" refers to... The term "low reflection" describes a reflection rate of 67% or higher in double-glazed units. This refers to 15% or less in double-glazed units. The subject of the invention is the breaking of all layers in multilayer coated (20) glass (10). optical constants obtained from single-layer measurements with indexes These refractive indices were determined using computational methods. The refractive indices in question are 550. These are refractive index data in nm. Preferred both for ease of production and for its optical properties. Experimental carried out to improve the multilayer coating (20) array The following data were obtained as a result of the studies. Sputtering method to obtain multilayer coated (20) glass (10) 20 By using, multiple metals, metal oxides and located on the glass (10) surface Multilayer coating consisting of metal nitride / oxynitride layers (20) It has been developed. The layers in question are layered on top of each other in a vacuum environment. They are being accumulated. Heat treatment includes tempering, partial tempering, annealing, At least one or more of the lamination and bending processes together 25 It is available for use. The term "high refractive index" used in this invention encompasses the range between 2.2 and 2.7. The term medium refractive index encompasses the range between 1.8 and 2.2. The term low refractive index... It includes values ​​below 1.8. 30 The coating (20) which is the subject of the invention shall preferably contain three functional layers (20). Thanks to the mentioned coating (20), the reflection values ​​of the coated (20) glass (10) are It can be reduced. 6 The subject of the invention is a sub-dielectric structure located on the coated (20) glass (10). (21), a middle bottom dielectric structure (23), a middle top dielectric structure (25) and a top It includes dielectric structures (27). Among the dielectric structures are functional structures containing Ag. There are layers. A sub-dielectric structure (21) and a middle sub-dielectric structure (23) 5 between the first functional layer (22); the middle lower dielectric structure (23) and the middle upper second functional layer (24) between dielectric structure (25); middle upper dielectric structure (25) with a top dielectric structure (27) third functional layer (26) It is located. Each functional layer has a barrier layer below and above it. It is located below the first functional layer (22). (214), a first barrier layer (231) is located on it. Second a second nucleating layer (234) under the functional layer (24), on top of it The second barrier layer (251) is located. The third functional layer (26), 15 an upper barrier layer on top of a third nucleating layer (254) (271) is located. The sub-dielectric structure (21) is a first dielectric layer (211), the first dielectric mentioned A second dielectric layer (212) located in the vicinity of layer (211), 20 a first one located on the second dielectric layer mentioned (212) nucleating layer (213), the first nucleating layer mentioned (213) It includes a lower barrier layer (214) located on top of it. The invention's alternative an optional first dielectric layer (211) on a structure The absorber layer (2111) is located. 25 The thickness of the first dielectric layer (211) is between 20 nm and 38 nm. Preferred In practice, the thickness of the first dielectric layer (211) is between 23 nm and 35 nm. The most preferable thickness of the first dielectric layer (211) is between 26 nm and 32 nm. The optionally used absorber layer is structured as (2111). Preferably the absorber NiCr, NiCrOx, NiCrWOx, NiCrMoOx are used as layers (2111). Preference In the application, NiCrOx is used as the absorber layer (2111). In the alternative design of the invention, NiCr is used as the absorber layer (2111). 7 It is used. The thickness of the absorber layer (2111) is between 1 nm and 7 nm. In the preferred application, the absorber layer (2111) thickness is between 1 nm and 5 nm. It is between 1 nm and 3 nm. The most preferable absorber layer (2111) thickness is 1 nm and 3 nm. It is among them. The thickness of the second dielectric layer (212) is between 1 nm and 13 nm. Preferred In practice, the thickness of the second dielectric layer (212) is between 3 nm and 11 nm. preferably the second dielectric layer (212) thickness is between 5 nm and 9 nm. The thickness of the first nucleating layer (213) is between 8 nm and 26 nm. Preference 10 In the application, the thickness of the first nucleating layer (213) is between 11 nm and 23 nm. It is among them. The most preferable first nucleating layer (213) thickness is between 14 nm and 20 nm. It is between nm. The thickness of the bottom barrier layer (214) is between 1 nm and 7 nm. The preferred 15 In practice, the thickness of the bottom barrier layer (214) is between 1 nm and 5 nm. preferably the thickness of the bottom barrier layer (214) is between 1 nm and 3 nm. The middle sub-dielectric structure (23) is a first barrier layer (231); the first mentioned a third dielectric layer located in the vicinity of the barrier layer (231) 20 (232); a fourth located in the neighborhood of the third dielectric layer (232) in the vicinity of the dielectric layer (233) and the fourth dielectric layer (233) It includes a second nucleating layer located there (234). The thickness of the first barrier layer (231) is between 1 nm and 7 nm. The preferred 25 In practice, the thickness of the first barrier layer (231) is between 1 nm and 5 nm. preferably the thickness of the first barrier layer (231) is between 1 nm and 3 nm. The thickness of the third dielectric layer (232) is between 10 nm and 28 nm. Preferred In practice, the thickness of the third dielectric layer (231) is between 13 nm and 25 nm. 30 The most preferable thickness of the third dielectric layer (231) is between 16 nm and 122 nm. The thickness of the fourth dielectric layer (233) is between 35 nm and 70 nm. Preferred In the implemented application, the thickness of the fourth dielectric layer (233) is between 40 nm and 65 nm. 8 It is between 45 nm and 60 nm. The most preferable fourth dielectric layer (233) thickness is 45 nm to 60 nm. It is among them. The thickness of the second nucleating layer (234) is between 10 nm and 28 nm. Preference In the implemented application, the thickness of the second nucleating layer (234) is between 13 nm and 25 nm. It is between 16 nm and 22 nm. The most preferable second nucleating layer (234) thickness is 16 nm to 22 nm. It is between nm. The middle top dielectric structure (25) is a second barrier layer (251); the aforementioned second barrier a fifth dielectric layer (252) located in the vicinity of layer (251); 10 a sixth dielectric located in the neighborhood of the fifth dielectric layer (252) a layer (253) and a sixth dielectric layer located in the neighborhood of (253) It contains a second barrier layer (254). The thickness of the second barrier layer (251) is between 1 nm and 8 nm. The preferred 15 In practice, the thickness of the second barrier layer (251) is between 1 nm and 5 nm. preferably the thickness of the second barrier layer (251) is between 1 nm and 3 nm. The thickness of the fifth dielectric layer (252) is between 4 nm and 21 nm. Preferred In practice, the thickness of the fifth dielectric layer (252) is between 6 nm and 18 nm. EN 20 preferably the thickness of the fifth dielectric layer (252) is between 9 nm and 15 nm. The thickness of the sixth dielectric layer (253) is between 35 nm and 70 nm. Preferred In practice, the thickness of the sixth dielectric layer (253) is between 40 nm and 65 nm. The most preferable sixth dielectric layer (253) thickness is between 45 nm and 60 nm. 25 The thickness of the third nucleating layer (254) is between 4 nm and 22 nm. Preferred In the implemented application, the thickness of the third nucleating layer (254) is between 7 nm and 19 nm. It is among them. The most preferable third nucleating layer (254) thickness is 10 nm to 16 nm. It is between nm. 30 The upper dielectric structure (27) is an upper barrier layer (271); the aforementioned upper barrier layer (271) a seventh dielectric layer located in the neighborhood (272); seventh an eighth dielectric layer located in the vicinity of the dielectric layer (272) 9 (273) and a top located in the neighborhood of the eighth dielectric layer (273). It contains a dielectric layer (274). The thickness of the upper barrier layer (271) is between 1 nm and 8 nm. Preferred In practice, the thickness of the upper barrier layer (271) is between 1 nm and 5 nm. EN 5 preferably the thickness of the upper barrier layer (271) is between 1 nm and 3 nm. The thickness of the seventh dielectric layer (272) is between 8 nm and 26 nm. Preferred In practice, the thickness of the seventh dielectric layer (272) is between 11 nm and 23 nm. The most preferable thickness of the seventh dielectric layer (272) is between 14 nm and 20 nm. 10 The thickness of the eighth dielectric layer (273) is between 13 nm and 32 nm. Preferred In the implemented application, the thickness of the eighth dielectric layer (273) is between 16 nm and 29 nm. It is between 19 nm and 26 nm. The most preferable eighth dielectric layer (273) thickness is 19 nm to 26 nm. It is among them. 15 The thickness of the top dielectric layer (274) is between 1 nm and 9 nm. Preferred In practice, the thickness of the top dielectric layer (274) is between 1 nm and 7 nm. preferably the thickness of the upper dielectric layer (274) is between 1 nm and 5 nm. Each of the dielectric layers described above is SixNy, SiOxNy, ZnAlNx, ZnAlOx, ZnAlOxNy, ZnSnNx, ZnSnOx, ZnSnOxNy, TaOx, TaOxNy, TiOx, TiNx, TiOxNy, TiSiZrOxNy, ZrNx, ZrOx, ZrOxNy, SiZrN, SiZrOx, SiZrOxNy, WZrOx, one or more of the materials NbNx, NbOx, NbOxNy, NbZrOx together It includes. 25 Each of the barrier layers described above can be NiCr, NiCrOx, TiOx, ZnSnOx, ZnAlOx contains at least one or more of the ZnOx materials together. barrier layer (214), first barrier layer (231), second barrier layer (251) and top barrier layer (271) coated (20) glass (10) heat treatment processes 30 It plays a role in increasing its strength. Ag-containing first functional layer (22), second functional layer (24) and third The thickness of the functional layer (26) is between 7 nm and 22 nm. Preferably containing Ag. first functional layer (22), second functional layer (24) and third The thickness of the functional layer (26) is between 7 nm and 18 nm. The most preferred is Ag containing the first functional layer (22), the second functional layer (24) and the third The thickness of the functional layer (26) is between 7 nm and 15 nm. The thicknesses of the functional layers are equal to each other or have a maximum variation of 20%. It shows. According to an application of the invention, the coated (20) glass (10) structure is made of glass (10) Outwardly, it is as follows: 10 - SixNy, SiOxNy, ZnAlNx, ZnAlOx, ZnAlOxNy, ZnSnNx, ZnSnOx, ZnSnOxNy, TaOx, TaOxNy, TiOx, TiNx, TiOxNy, TiSiZrOxNy, ZrNx, ZrOx, ZrOxNy, one of SiZrN, SiZrOx, SiZrOxNy, WZrOx, NbNx, NbOx, NbOxNy, NbZrOx a first dialectic layer containing or several of them (211); 15 - At least one of the following materials: NiCr, NiCrOx, TiOx, ZnSnOx, ZnAlOx, ZnOx or an optional absorber layer containing several of them together (2111) - SixNy, SiOxNy, ZnAlNx, ZnAlOx, ZnAlOxNy, ZnSnNx, ZnSnOx, ZnSnOxNy, TaOx, TaOxNy, TiOx, TiNx, TiOxNy, TiSiZrOxNy, ZrNx, ZrOx, ZrOxNy, 20 one of SiZrN, SiZrOx, SiZrOxNy, WZrOx, NbNx, NbOx, NbOxNy, NbZrOx a second dialectic layer containing several of them (212); - SixNy, SiOxNy, ZnAlNx, ZnAlOx, ZnAlOxNy, ZnSnNx, ZnSnOx, ZnSnOxNy, TaOx, TaOxNy, TiOx, TiNx, TiOxNy, TiSiZrOxNy, ZrNx, ZrOx, ZrOxNy, one of SiZrN, SiZrOx, SiZrOxNy, WZrOx, NbNx, NbOx, NbOxNy, NbZrOx a first nucleating layer containing or several of them (213); 25 - At least one of the following materials: NiCr, NiCrOx, TiOx, ZnSnOx, ZnAlOx, ZnOx or a sub-barrier layer containing several of them together (214) - Ag containing first functional layer (22) - At least one of the following materials: NiCr, NiCrOx, TiOx, ZnSnOx, ZnAlOx, ZnOx a first barrier layer (231) 30 which includes or several of them together - SixNy, SiOxNy, ZnAlNx, ZnAlOx, ZnAlOxNy, ZnSnNx, ZnSnOx, ZnSnOxNy, TaOx, TaOxNy, TiOx, TiNx, TiOxNy, TiSiZrOxNy, ZrNx, ZrOx, ZrOxNy, one of SiZrN, SiZrOx, SiZrOxNy, WZrOx, NbNx, NbOx, NbOxNy, NbZrOx a third dialectic layer containing or several of them (232); 11 - SixNy, SiOxNy, ZnAlNx, ZnAlOx, ZnAlOxNy, ZnSnNx, ZnSnOx, ZnSnOxNy, TaOx, TaOxNy, TiOx, TiNx, TiOxNy, TiSiZrOxNy, ZrNx, ZrOx, ZrOxNy, one of SiZrN, SiZrOx, SiZrOxNy, WZrOx, NbNx, NbOx, NbOxNy, NbZrOx a fourth dialectic layer containing or several of them (233); - ZnAlOx, ZnSnOx, ZnOx materials, or several of them together in 5 a second nucleating layer containing (234) - Second functional layer containing Ag (24) - At least one of the following materials: NiCr, NiCrOx, TiOx, ZnSnOx, ZnAlOx, ZnOx or a second barrier layer containing several of them together (251) - SixNy, SiOxNy, ZnAlNx, ZnAlOx, ZnAlOxNy, ZnSnNx, ZnSnOx, ZnSnOxNy, 10 TaOx, TaOxNy, TiOx, TiNx, TiOxNy, TiSiZrOxNy, ZrNx, ZrOx, ZrOxNy, one of SiZrN, SiZrOx, SiZrOxNy, WZrOx, NbNx, NbOx, NbOxNy, NbZrOx a fifth dielectric layer containing or several of them (252); - SixNy, SiOxNy, ZnAlNx, ZnAlOx, ZnAlOxNy, ZnSnNx, ZnSnOx, ZnSnOxNy, TaOx, TaOxNy, TiOx, TiNx, TiOxNy, TiSiZrOxNy, ZrNx, ZrOx, ZrOxNy, 15 one of SiZrN, SiZrOx, SiZrOxNy, WZrOx, NbNx, NbOx, NbOxNy, NbZrOx a sixth dielectic layer containing or several of them (253); - At least one or more of the following materials: ZnAlOx, ZnSnOx, ZnOx. a third nucleating layer (254) - Third functional layer containing Ag (26) 20 - At least one of the following materials: NiCr, NiCrOx, TiOx, ZnSnOx, ZnAlOx, ZnOx an upper barrier layer containing or several of them together (271) - SixNy, SiOxNy, ZnAlNx, ZnAlOx, ZnAlOxNy, ZnSnNx, ZnSnOx, ZnSnOxNy, TaOx, TaOxNy, TiOx, TiNx, TiOxNy, TiSiZrOxNy, ZrNx, ZrOx, ZrOxNy, 25 one of SiZrN, SiZrOx, SiZrOxNy, WZrOx, NbNx, NbOx, NbOxNy, NbZrOx a seventh dielectic layer containing or several of them (272); - SixNy, SiOxNy, ZnAlNx, ZnAlOx, ZnAlOxNy, ZnSnNx, ZnSnOx, ZnSnOxNy, TaOx, TaOxNy, TiOx, TiNx, TiOxNy, TiSiZrOxNy, ZrNx, ZrOx, ZrOxNy, one of SiZrN, SiZrOx, SiZrOxNy, WZrOx, NbNx, NbOx, NbOxNy, NbZrOx an eighth dielectic layer containing or several of them (273); 30 - SixNy, SiOxNy, ZnAlNx, ZnAlOx, ZnAlOxNy, ZnSnNx, ZnSnOx, ZnSnOxNy, TaOx, TaOxNy, TiOx, TiNx, TiOxNy, TiSiZrOxNy, ZrNx, ZrOx, ZrOxNy, one of SiZrN, SiZrOx, SiZrOxNy, WZrOx, NbNx, NbOx, NbOxNy, NbZrOx an upper dialectic layer containing or several of them (274); 12 In one of the inventions, coated (20) glass (10) structure made of glass (10) Outwardly, it is as follows: Glass / SiN / NiCrOx / TiOx / Zn containing layer / NiCr / Ag / NiCrOx / Zn containing layer / / SiN / 5 Zn-containing layer / Ag / NiCrOx / Zn-containing layer / / SiN / Zn-containing layer / Ag / NiCrOx / Zn-containing layer / SiOxNy / TiOx In another configuration of the invention, coated (20) glass (10) configuration from glass (10) outwards it is as follows; 10 Glass / SiN / TiOx / ZnAlOx / NiCr / Ag / NiCrOx / ZnAlOx / SiN / ZnAlOx / Ag / NiCrOx / ZnAlOx / SiN / ZnAlOx / Ag / NiCrOx / ZnAlOx / SiOxNy / TiOx In another configuration of the invention, coated (20) glass (10) configuration is made of glass 15 (10) outwards it is as follows; Glass / SiN / TiOx / ZnAlOx / NiCr / Ag / NiCrOx / ZnSnOx / SiN / ZnAlOx / Ag / NiCrOx / ZnSnOx / S iN / ZnAlOx / Ag / NiCrOx / ZnAlOx / SiOxNy / TiOx In another configuration of the invention, coated (20) glass (10) configuration from glass (10) outwards it is as follows; Glass / SiN / NiCrOx / TiOx / ZnAlOx / NiCr / Ag / NiCrOx / ZnAlOx / SiN / ZnAlOx / Ag / NiCrOx / ZnAlOx / SiN / ZnAlOx / Ag / NiCrOx / ZnAlOx / SiOxNy / TiOx 25 Table 1 Glass Application 1 APPLICATION 2 APPLICATION 3 APPLICATION 4 APPLICATION APPLICATION 6 SiN 29 29 29 30 32 26 NiCrOx (optional) 2.5 2 TiOx 6.7 6.7 6.7 6.2 6 7.5 Zn-containing layer 17.5 17.5 17.5 17.5 17.5 17.5 NiCr 1,3 1,3 1 1,3 1,3 1 13 Ag 14 14 9 12.5 12.5 8.5 NiCrOx 1.8 1.8 1.3 1.5 1.5 1 Zn-containing layer 16 16 16 18 18 17 SiN 52 52 52 50 50 51 Zn-containing layer 19 19 19 19 19 19 Ag 13.5 13.5 13.5 14 14 13 NiCrOx 1.7 1.7 1.3 1.7 1.7 1.3 Zn-containing layer 12 12 12 13 13 13.5 SiN 52 52 52 50 51 50 Zn-containing layer 13.5 13.5 13.5 13 13 13.5 Ag 13.5 13.5 13.5 14 14.5 14 NiCrOx 1.5 1.5 1.3 1.5 1.5 1.3 Zn-containing layer 17 17 17 19 19 18 SiOxNy 22.5 22.5 22.5 21 21 20.5 TiOx 3 3 3 3 3 3 The fourth used in the middle lower dielectric structure (23) and the middle upper dielectric structure (25) 100 nm optical path of dielectric layer (233) and sixth dielectric layer (253) Having it above is critical for color values, keeping the b* value in the negative region. This reduction in thickness causes the coating (20) b* color values ​​to shift to the positive region 5 This is why it leads to deviating from the targeted values. Zn-containing material in the lower mid-dielectric structure (23) and upper mid-dielectric structure (25). use of the second functional layer (24) and the third functional layer (26) It contributes to its preservation and nucleation. 10 Selectivity value of coated (20) glass in (10) double glazing applications in the visible region the ratio of permeability to the total thermal energy transmittance coefficient (solar factor) is being calculated. Selectivity = Apparent Transmittance / Total Thermal Energy Transmittance Coefficient The use of three Ag layers and ensuring that the thickness of these layers is within the specified ranges. Coated (20) glass (10) is of critical importance for selectivity and emissivity value. 14 In addition, the lower barrier layer (214) must be between the specified thickness values. It contributes to selectivity. The selectivity of coated glass (10) is the subject of the invention. The value is 1.90 inclusive and above. The mentioned Lowe coated (20) glass (10) The emissivity value is between 0.010 and 0.024. To obtain these values, all... It is critical that the thickness and order of the layers are as described above. 5 The optical path of the lower middle dielectric structure (23) is the optical path of the upper middle dielectric structure (25). It is 10% to 20% more than the path. Thus, color, internal and external reflection This helps ensure that the values ​​are within the targeted range. Lower dielectric structure (21) and upper dielectric structure (27) high refractive index material It includes and the thickness of the high refractive index material is medium and low refractive index. It is structured to be thinner than indexed materials. This allows for both interior and exterior design. This helps to reduce external reflection values. The subject of the invention is the visible area of ​​coated (20) glass in (10) double glazing applications. Internal and external reflection values ​​are below 15%. Coating (20) Internal and external reflection values ​​with the uses as described in the structure. can be kept low. In addition, the visible area in the double glazing unit The permeability values ​​are at least in the order of 47%. In one application of the invention, a double 20 The visible light transmittance values ​​in the glass unit are at least in the order of 57%. In an alternative application of the invention, the visible area in the double-glazed unit Permeability values ​​are at least in the order of 67%. The color of coated (20) glass (10) after heat treatment in single glass (10) applications is 25 It is required that the b* values ​​be in the negative region. The subject of the invention... coated (20) glass (10), after heat treatment, the surface normal angle is at most 10° In the view that will do this, the external reflection b* color value is between -10 and -25, external The reflection a* color value is between -3 and +3. The subject of the invention is coated (20) glass. (10), when viewed at an angle of 30° to the surface normal after heat treatment, the outer 30 Reflection b* color value is between -5 and -20, external reflection a* color value is between -3 and +3 Among them is the subject of the invention, coated (20) glass (10), surface after heat treatment. In a view positioned at a 45° angle to the normal, the external reflection b* color value is between -5 and -20. Among them, the external reflection a* color value is between 0 and +5. The subject of the invention is coated. (20) glass (10) will make an angle of 55° to the surface normal after heat treatment In view, the external reflection b* color value is between 0 and -10, the external reflection a* color value It is between 0 and +3. Measurement results taken at various angles indicate the coated glass. Angular color changes by 3 points for the a* value and 10 points for the b* value. The scope of protection of the invention is set out in the attached claims and is strictly adhered to. The detailed explanation cannot be limited to the examples given. Because in technology... A specialist, without deviating from the main theme of the invention, will do what is described above. It is clear that similar structures can emerge in light of this.

Claims

16 REQUESTS 1. The invention is suitable for use in architectural applications and vehicles. structured, coated (20) glass (10) and its feature is; targeted In order to obtain the transmittance, color and reflection values, glass (10) 5 outwards in order - A sub-dielectric structure containing at least one layer with a high refractive index. (21); - A first functional layer containing Ag (22); - A fourth dielectric layer with an optical path of 100 nm and above (233) 10 a sub-dielectric structure containing (23) - A second functional layer containing Ag (24); - A sixth dielectric layer with an optical path of 100 nm and above (253) a mid-top dielectric structure (25) - A third functional layer containing Ag (26); 15 - Top dielectric structure containing at least one high refractive index layer (27) It includes.

2. According to claim 1, a coated (20) glass (10) has the property of; middle sub-dielectric The total optical path of the structure (23) is 20 of the central upper dielectric structure (25). It must be at least 10% more than the optical path.

3. According to claim 1, a coated (20) glass (10) has the property of; middle sub-dielectric The optical path of the structure (23) is the optical path of the middle upper dielectric structure (25) It should be more than 20%. 25 4. According to claim 1, a coated (20) glass (10) has the property of; sub-dielectric structure (21) and high refractive index material provided in the upper dielectric structure (27) Its thickness is thinner than that of medium and low refractive index materials.

5. According to claim 1, a coated (20) glass (10) has the property of; the sub-dielectric structure (21) is that it optionally includes an absorber layer (2111).

6. According to claim 1, a coated (20) glass (10) has the property of; the sub-dielectric structure (21) is that it contains an absorber layer (2111). 35

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