Laser processing apparatus, method for manufacturing semiconductor products, and laser processing method
TW202626237APending Publication Date: 2026-07-01HAMAMATSU PHOTONICS KK
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Patent Information
- Application Number
- TW114130142
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2025-01-17
- Filing Date
- 2025-08-07
- Publication Date
- 2026-07-01
Abstract
The laser processing apparatus 1A of the present invention includes a light generating unit 3A, a light-collecting optical system 5, and a control unit 6A. The light generating unit 3A generates laser light L with radial or angular polarization and a helical phase distribution. The light-collecting optical system 5 focuses the laser light L onto a focusing position within the workpiece 11, which is a uniaxial birefringent crystal. The control unit 6A moves the focusing position within the workpiece 11 to form a modified region 12 for cutting the workpiece 11.
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