Apparatus and method for injecting gas into the process chamber of a CVD reactor

Abstract

This invention relates to a CVD reactor (1) comprising: a shell and a gas inlet member (21) contained within the shell, the gas inlet member having an uppermost gas inlet region (Z1) and at least one other gas inlet region (Z2, Z3) disposed below it, each of the gas inlet regions having an outlet surface (6, 6', 6"), the outlet surface having a first outlet opening (15) for injecting a gas into a process chamber (19); disposed in the process chamber (19) and above the gas inlet region (Z1) and its... An extension plate (4) is located adjacent to the gas inlet component (21) between the other gas inlet zones (Z2) below. This extension plate spatially separates the gases flowing through the upper gas inlet zone (Z1) from those flowing through the other gas inlet zones (Z2) arranged below it. To simplify the installation of the extension plate (4), the present invention proposes that the extension plate (4) be connected to a holding device (18) by means of a connecting element (20), which is fastened to the shell (2) of the CVD reactor (1) or to a fixed component of the shell.