Process chambers and air inlet liner for vapor deposition process chambers
TW202627197APending Publication Date: 2026-07-01BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
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Patent Information
- Application Number
- TW115105831
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2023-10-31
- Filing Date
- 2024-10-23
- Publication Date
- 2026-07-01
Abstract
An inner liner for a vapor deposition process chamber is provided. An air inlet liner for a vapor deposition process chamber, for docking with an air inlet of an inner liner, is provided. The air inlet liner includes several air inlets arranged in a first direction and isolated from each other. Those air inlets have the same through direction, and the first direction is perpendicular to the through direction of the air inlets.
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