Method for manufacturing an adsorption means for treating a gas and adsorption means obtained by such method

TW202629303APending Publication Date: 2026-07-16ATLAS COPCO AIRPOWER NV
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Patent Information

Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
ATLAS COPCO AIRPOWER NV
Filing Date
2025-09-30
Publication Date
2026-07-16

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Abstract

The present invention relates to a method for manufacturing an adsorption device for treating gases, wherein a first coating layer (7) is formed on a porous open support structure (1) by applying a first coating suspension (2) having a first solvent (4) and an adsorbent (3). The method includes the steps of: drying (102) the first coating layer such that the first solvent is partially removed; diluting (106) the first coating suspension by adding a second solvent (5) to form a second coating suspension (6); and forming a second coating layer (8) on the first coating layer by applying the second coating suspension, wherein the first solvent is still present in the first coating layer. The invention relates to a method for manufacturing an adsorption means for treating a gas, in which a first coating layer (7) is formed on a porous open support structure (1) by applying a first coating suspension (2) with a first solvent (4) and an adsorbent (3). suspension (6), - forming a second coating layer (8) on the first coating layer in which the first solvent is still present by applying the second coating suspension.
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