Methods for manufacturing pseudo-adhesives, wafer stacks, and thin wafers for wafer fabrication
TW202629748APending Publication Date: 2026-07-16SHIN ETSU CHEMICAL CO LTD
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Patent Information
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- SHIN ETSU CHEMICAL CO LTD
- Filing Date
- 2020-12-01
- Publication Date
- 2026-07-16
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Abstract
The present invention addresses the problem of providing a dummy adhesive for wafer processing, a wafer stack, and a method for manufacturing thin wafers. This dummy adhesive provides sufficient substrate retention after wafer bonding, even when using high-gradient substrates, exhibits excellent subsequent wafer processing toughness, and demonstrates excellent wafer peelability and post-peeling cleaning and removal properties. The solution of the present invention is a dummy adhesive for wafer processing, which is composed of a thermosetting polysiloxane-based composition containing a nonfunctional organopolysiloxane, used for dummy bonding of a wafer to a support.
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