Reflectors, chamber arrangements, and material layer deposition methods
TW202629817APending Publication Date: 2026-07-16ASM IP HLDG BV
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Patent Information
- Application Number
- TW114137113
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2024-10-01
- Filing Date
- 2025-09-26
- Publication Date
- 2026-07-16
Abstract
A reflector includes a body with a first surface having a first aperture and a second surface with a reflective material and a second aperture, separated by the body’s thickness. The apertures are fluidly coupled by a channel extending through the body, with one aperture positioned closer to the side than the other. The channel is angled to issue coolant from the second aperture at an oblique flow angle relative to the reflector body. Chamber arrangements, semiconductor processing systems, and material layer deposition methods using the reflector are also described.
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