Flow adaptors for gas flows, and related processing chambers, processing systems, apparatus, and methods

Abstract

Embodiments of the present disclosure generally relate to semiconductor processing equipment. In one or more embodiments, a flow adapter for mounting to a processing chamber includes a first flange, a second flange, and a conduit extending at least partially between the first flange and the second flange. The conduit includes an outer face, an inner flow opening, and one or more angled flow openings extending between the outer face and the inner flow opening. The one or more angled flow openings are oriented at an oblique angle relative to the inner flow opening.

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