Deposition system with mixer and plasma bypass orifice

Abstract

An apparatus includes: a faceplate having upper and lower surfaces, through holes extending from the upper to lower surface; a gas box supported by the faceplate, a first cavity extending from the upper surface of the faceplate to an upper surface of the gas box; an isolator on the upper surface of gas box, a second cavity extending from a lower surface of the isolator to an upper surface of the isolator and a third cavity extending from an outer surface of the isolator to the second cavity; a mixer suspended in a groove in the upper surface of the isolator, the mixer including blades alternatingly arranged on a shaft; and tubing fluidically coupled to a plasma source, the tubing terminating at the upper surface of the isolator. The first and second cavities can be fluidically coupled, and the third cavity can be fluidically coupled to a precursor source.

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