Temperature monitoring system, reactor including the same, and temperature monitoring device

Abstract

A temperature monitoring system for measuring the temperature of a substrate in a reactor comprising: (i) a reaction chamber suitable for the deposition of a film on a deposition surface of a substrate; (ii) a temperature monitoring device comprising an optical device, a remote sensing thermometer, and a supporting device. The remote sensing thermometer comprises at least one detector of IR radiation adapted for temperature measurements. The reaction chamber is provided with at least one aperture; the at least one optical device is adapted to: (i) intercept IR radiation emitted from at least one point of the deposition surface of the substrate through the aperture; and (ii) divert the intercepted IR radiation to the detector.

Images