Silicon quantum computer substrate, silicon quantum computer, and method for manufacturing silicon quantum computer substrate
TW202630784APending Publication Date: 2026-07-16SHIN ETSU HANDOTAI CO LTD
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Patent Information
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- SHIN ETSU HANDOTAI CO LTD
- Filing Date
- 2025-11-04
- Publication Date
- 2026-07-16
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Abstract
This invention relates to a silicon quantum computer substrate, characterized by comprising: a silicon substrate, a first SiGe layer on the silicon substrate, a BOX layer on the first SiGe layer, a 28Si layer on the BOX layer, and a second SiGe layer on the 28Si layer. This provides a silicon quantum computer substrate with improved high-frequency characteristics, a silicon quantum computer, and a method for manufacturing the silicon quantum computer substrate.
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