Monitoring methods, systems and storage media

Abstract

The purpose of this invention is to more easily and accurately monitor whether substrate processing is normal. The monitoring method of this invention is a monitoring method for substrate processing performed by substrate processing system 1. The monitoring method includes an acquisition step, acquiring at least a plurality of monitoring values ​​containing information related to the cleanliness of the processing fluid supplied to workpiece W. The monitoring method includes a calculation step, calculating scores for each of the acquired plurality of monitoring values, and calculating a composite score combining all the scores. The monitoring method includes a display step, displaying the composite score.

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