Substrate processing system, method for controlling moisture in substrate processing system, and regeneration system
TW202630928APending Publication Date: 2026-07-16ASM IP HLDG BV
View PDF 0 Cites 0 Cited by
Patent Information
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- ASM IP HLDG BV
- Filing Date
- 2025-10-28
- Publication Date
- 2026-07-16
Smart Images

Figure TWG2TA001068887_001 
Figure TWG2TA001068887_002 
Figure TWG2TA001068887_003
Abstract
A substrate processing system is provided for effective moisture control during fabrication operations. The system includes a buffer chamber with a cooling plate, which is coupled to a cryogenic pump to circulate a cryogen, such as liquid nitrogen. Residual moisture and water vapor released during substrate transfer are captured and condensed onto the cooling plate. A regeneration system monitors moisture accumulation using sensors and initiates regeneration when a set threshold is reached.
Need to check novelty before this filing date? Find Prior Art