Furnace tube equipment and substrate preheating method

Abstract

This disclosure presents a furnace tube device and a substrate preheating method, relating to the field of semiconductor manufacturing equipment. The furnace tube device includes: a process tube, a heater, a housing, a heating element, and a gas circulation element. The process tube has a process zone inside. The heater is used to heat the process tube. The housing has a loading zone inside. The loading zone is used to accommodate a crystal boat. The heating element is disposed in the loading zone to heat the gas in the loading zone, thereby heating the substrate on the crystal boat. The gas circulation element is used to circulate the gas in the loading zone.

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