Resistor materials and pattern formation methods
TW202631028APending Publication Date: 2026-08-01TOKYO OHKA KOGYO CO LTD
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Patent Information
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- TOKYO OHKA KOGYO CO LTD
- Filing Date
- 2025-09-23
- Publication Date
- 2026-08-01
Abstract
The present invention provides an inhibitor material, which is an inhibitor material containing (A) a heteropoly acid salt or a mixture thereof modified with defective sites and (B) an acid diffusion control agent, wherein the aforementioned (B) acid diffusion control agent is (B1) a photodisintegrating base having iodine atoms.
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