Gas-liquid reaction device
TW202631250APending Publication Date: 2026-08-01IND TECH RES INST
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Patent Information
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- IND TECH RES INST
- Filing Date
- 2025-11-25
- Publication Date
- 2026-08-01
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Figure TWG2TA001071255_001 
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Figure TWG2TA001071255_003
Abstract
A gas-liquid reaction device is disclosed, which includes a first cavity, a second cavity disposed within the first cavity, a third cavity disposed within the second cavity, and a plurality of air inlet pipes which are surrounded and connected to the first cavity. A first space of the first cavity respectively communicates with a second space of the second cavity and an external space, and the second space communicates with a third space of the third cavity. Liquid enters the first cavity through a first open end, and gas enters the first cavity through the air inlet pipes, where they undergo a first-stage mixing. and then flow into the second cavity through the hollow groove for a second-stage mixing, and then flow into the third cavity through a third inlet end for a third-stage mixing, and then flow out of the third cavity.
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