Flow control methods, equipment and media for spray systems

TW202631259APending Publication Date: 2026-08-01ACM RES (SHANGHAI) INC
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Patent Information

Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
ACM RES (SHANGHAI) INC
Filing Date
2025-11-26
Publication Date
2026-08-01

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Abstract

A flow control method, apparatus, and medium for a spray device are disclosed. The flow control method includes setting a target outflow rate at the outlet of the spray device; determining a predetermined liquid level within the spray device; introducing at least two chemical solutions into the inlet of the spray device to mix the two chemical solutions within the spray device to form a mixture, wherein the mixture is discharged from the outlet while the inlet is receiving the mixture; and controlling the inlet flow rate such that when the inlet duration is a first predetermined duration, the liquid level within the spray device increases to the predetermined liquid level, and the inlet flow rate is equal to the target outflow rate, and the outlet flow rate is close to or equal to the target outflow rate, so that the mixing duration of the mixture within the spray device is a second predetermined duration.
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