Resin composition, cured material, laminate, method for manufacturing cured material, method for manufacturing laminate, method for manufacturing semiconductor device, semiconductor device, resin and compound

TW202631381APending Publication Date: 2026-08-01FUJIFILM CORP
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Patent Information

Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Filing Date
2025-09-22
Publication Date
2026-08-01
Patent Text Reader

Abstract

The present invention provides a resin composition comprising a resin and a photopolymerization initiator, a cured product formed by curing the above composition and a method for manufacturing the same, a laminate comprising the cured product and a method for manufacturing the same, a semiconductor device and a method for manufacturing the same, and novel resins and compounds, wherein the aforementioned resin is at least one resin selected from the group consisting of polyimide and polyamine, and has a structure represented by the following formula (A-1).
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