Resin composition, cured material, laminate, method for manufacturing cured material, method for manufacturing laminate, method for manufacturing semiconductor device, semiconductor device, resin and compound
TW202631381APending Publication Date: 2026-08-01FUJIFILM CORP
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Patent Information
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- Filing Date
- 2025-09-22
- Publication Date
- 2026-08-01
Abstract
The present invention provides a resin composition comprising a resin and a photopolymerization initiator, a cured product formed by curing the above composition and a method for manufacturing the same, a laminate comprising the cured product and a method for manufacturing the same, a semiconductor device and a method for manufacturing the same, and novel resins and compounds, wherein the aforementioned resin is at least one resin selected from the group consisting of polyimide and polyamine, and has a structure represented by the following formula (A-1).
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