Pellicle film for exposure, pellicle, exposure original plate, exposure device, and method of manufacturing pellicle film for exposure

TW202631491APending Publication Date: 2026-08-01MITSUI CHEMICALS INC +1
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Patent Information

Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
Filing Date
2021-04-14
Publication Date
2026-08-01

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Abstract

nm, and when the carbon nanotube film is disposed on a silicon substrate and the reflectivity of the disposed carbon nanotube film is measured in accordance with the following conditions using a reflection spectroscopy film thickness gauge,
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