Sintered body of gallium nitride

TW202631542APending Publication Date: 2026-08-01TOSOH CORP
View PDF 0 Cites 0 Cited by

Patent Information

Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
TOSOH CORP
Filing Date
2025-09-09
Publication Date
2026-08-01

Smart Images

  • Figure TWG2TA001070368_001
    Figure TWG2TA001070368_001
  • Figure TWG2TA001070368_002
    Figure TWG2TA001070368_002
  • Figure TWG2TA001070368_003
    Figure TWG2TA001070368_003
Patent Text Reader

Abstract

This invention provides at least one of a gallium nitride sintered body and a method for manufacturing the same; the aforementioned sintered body, despite containing more than 1.0% by mass of doping elements, still possesses high flexural strength and allows for the direct formation of p-type gallium nitride films. The gallium nitride sintered body of this invention is characterized by containing an alloy comprising one or more doping elements selected from the group consisting of beryllium (Be), magnesium (Mg), calcium (Ca), strontium (Sr), barium (Ba), zinc (Zn), and cadmium (Cd), wherein the content of the doping element is more than 1.0% by mass, and the oxygen content is less than 0.6 atm%.
Need to check novelty before this filing date? Find Prior Art