Radiosensitive linear components, resist patterning methods, radiosensitive linear acid generators and compounds

Abstract

A radiosensitive linear composition comprising: a polymer having an acid-dissociable group, and a compound represented by formula (1). In formula (1), X1 is *1-SO2-NH- or *1-NH-SO2-. *1 represents a bond with R1. Of R1 and A1, R1 is a monovalent organic group and A1 is a divalent organic group, or R1 and A1 are combined to represent a group having a ring structure containing -SO2-NH- in the ring skeleton. M+ is a substituted or unsubstituted monazonium cation, or a strontium cation having at least one group selected from the group consisting of fluorine, bromine, iodo, haloalkyl, cyano, carbonyl, and sulfonyl. Wherein, when M+ is an unsubstituted monazonium cation, A1 has an aromatic ring.