Photosensitive element, method for forming resist pattern, and method for producing printed wiring board
TW202631564APending Publication Date: 2026-08-01RESONAC CORP
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Patent Information
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- RESONAC CORP
- Filing Date
- 2025-10-22
- Publication Date
- 2026-08-01
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Figure TWG2TA001070946_001 
Figure TWG2TA001070946_002
Abstract
A photosensitive element according to the present disclosure includes a support body and a photosensitive layer formed on the support body. The photosensitive layer contains a binder polymer, a photopolymerizable compound, a photopolymerization initiator, and a photopolymerization inhibitor. The photopolymerization inhibitor contains a catechol compound represented by Formula
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