Resist composition, laminate, and patterning process
TW202631567APending Publication Date: 2026-08-01SHIN ETSU CHEMICAL CO LTD
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Patent Information
- Authority / Receiving Office
- TW · TW
- Patent Type
- Applications
- Current Assignee / Owner
- Filing Date
- 2026-01-15
- Publication Date
- 2026-08-01
Abstract
carbon atoms. This can provide a non-chemically amplified resist composition that is excellent in sensitivity and a resolution limit in photolithography with a high-energy beam, in particular in electron beam (EB) lithography and EUV lithography.
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