Radiosensitive linear components, patterning methods, onium salt compounds and polymers

Abstract

This invention provides a radiosensitive linear composition that exhibits good storage stability and maintains the same or better sensitivity, LWR, and MinCD as previous methods during pattern formation. A radiosensitive linear composition comprises: a polymer containing a structural unit (I) having an acid-dissociable group; and a solvent, wherein the polymer has a partial structure (w) represented by formula (w1) or formula (w2), or the radiosensitive linear composition comprises an onium salt compound having a partial structure (w) represented by formula (w1) or formula (w2). (At least one of the group consisting of R1, R2, and R3 is an iodine atom or a bromine atom. X is an iodine atom or a bromine atom.)