Iodine-containing compound, iodine-containing hydroxyl compound, iodine-containing (CO)polymer, composition, method for forming pattern, and method for preparing iodine-containing compound

TW202631569APending Publication Date: 2026-08-01MITSUBISHI GAS CHEM CO INC
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Patent Information

Authority / Receiving Office
TW · TW
Patent Type
Applications
Current Assignee / Owner
MITSUBISHI GAS CHEM CO INC
Filing Date
2025-09-09
Publication Date
2026-08-01

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Abstract

The present invention provides iodine-containing compounds, iodine-containing hydroxyl compounds, iodine-containing (co)polymers, compositions, a method for forming patterns, and a method for preparing iodine-containing compounds, capable of forming a film with high resolution and high sensitivity. The iodine-containing compounds are represented by formula
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